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Joseph J. Vegh, Ph.D. - Publications

Affiliations: 
2007 University of California, Berkeley, Berkeley, CA, United States 
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2010 Nest D, Chung TY, Végh JJ, Graves DB, Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS Journal of Physics D: Applied Physics. 43. DOI: 10.1088/0022-3727/43/8/085204  0.674
2010 Bruce RL, Weilnboeck F, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB. Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films Journal of Applied Physics. 107. DOI: 10.1063/1.3373587  0.696
2009 Choudhary GK, Végh JJ, Graves DB. Molecular dynamics simulations of oxygen-containing polymer sputtering and the Ohnishi parameter Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/24/242001  0.625
2009 Végh JJ, Graves DB. Plasma Process. Polym. 5/2009 Plasma Processes and Polymers. 6. DOI: 10.1002/Ppap.200990008  0.61
2009 Végh JJ, Graves DB. Molecular dynamics simulations of Ar+-organic polymer interactions Plasma Processes and Polymers. 6: 320-334. DOI: 10.1002/Ppap.200800223  0.614
2008 Végh JJ, Humbird D, Graves DB. Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 52-61. DOI: 10.1116/1.2812444  0.655
2008 Graves DB, Vegh JJ. Atomistic simulations of feature scale etch profile evolution Aiche Annual Meeting, Conference Proceedings.  0.445
2005 Végh JJ, Humbird D, Graves DB. Silicon etch by fluorocarbon and argon plasmas in the presence of fluorocarbon films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1598-1604. DOI: 10.1116/1.2049304  0.66
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