☰

Monica J. Titus, Ph.D. - Publications

Affiliations: 
2010 Chemical Engineering University of California, Berkeley, Berkeley, CA, United States 
Tree Info Similar researchers PubMed Report error

6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2011 Titus MJ, Graves DB, Yamaguchi Y, Hudson EA. Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193nm photoresist Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/8/085204  0.6
2010 Titus MJ, Hsu CC, Graves DB. "sensArray" voltage sensor analysis in an inductively coupled plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 139-146. DOI: 10.1116/1.3268615  0.464
2009 Titus MJ, Nest DG, Chung TY, Graves DB. Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/24/245205  0.608
2009 Titus MJ, Nest DG, Graves DB. Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/15/152001  0.576
2009 Titus MJ, Nest D, Graves DB. Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist Applied Physics Letters. 94. DOI: 10.1063/1.3125260  0.613
2008 Titus MJ, Graves DB. Wafer heating mechanisms in a molecular gas, inductively coupled plasma: In situ, real time wafer surface measurements and three-dimensional thermal modeling Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1154-1160. DOI: 10.1116/1.2953713  0.528
Show low-probability matches.