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Gregory S. Doerk, Ph.D. - Publications

Affiliations: 
2010 Chemical Engineering University of California, Berkeley, Berkeley, CA, United States 
Area:
Surface/Interfacial Science and Micro-/Nanosystems Technology
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39 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2024 Bellini B, Willard JR, Cetindag S, Tsai EHR, Li R, Kisslinger K, Kumar SK, Doerk GS. Assembling Vertical Block Copolymer Nanopores via Solvent Vapor Annealing on Homopolymer-Functionalized Substrates. Acs Applied Materials & Interfaces. PMID 38920286 DOI: 10.1021/acsami.4c05715  0.339
2023 Doerk GS, Stein A, Bae S, Noack MM, Fukuto M, Yager KG. Autonomous discovery of emergent morphologies in directed self-assembly of block copolymer blends. Science Advances. 9: eadd3687. PMID 36638174 DOI: 10.1126/sciadv.add3687  0.363
2022 Russell ST, Bae S, Subramanian A, Tiwale N, Doerk G, Nam CY, Fukuto M, Yager KG. Priming self-assembly pathways by stacking block copolymers. Nature Communications. 13: 6947. PMID 36376380 DOI: 10.1038/s41467-022-34729-0  0.353
2022 Al Hossain A, Dick A, Doerk G, Colosqui CE. Toward controlling wetting hysteresis with nanostructured surfaces derived from block copolymer self-assembly. Nanotechnology. PMID 35760037 DOI: 10.1088/1361-6528/ac7c24  0.353
2022 Kulkarni AA, Doerk GS. Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns. Acs Applied Materials & Interfaces. PMID 35656598 DOI: 10.1021/acsami.2c05911  0.397
2022 Kulkarni AA, Doerk GS. Thin film block copolymer self-assembly for nanophotonics. Nanotechnology. 33. PMID 35358955 DOI: 10.1088/1361-6528/ac6315  0.378
2020 Toth K, Osuji CO, Yager KG, Doerk GS. High-throughput morphology mapping of self-assembling ternary polymer blends. Rsc Advances. 10: 42529-42541. PMID 35516747 DOI: 10.1039/d0ra08491c  0.33
2020 Wang Y, Delgado-Fukushima E, Fu RX, Doerk GS, Monclare JK. Controlling Drug Absorption, Release, and Erosion of Photopatterned Protein Engineered Hydrogels. Biomacromolecules. PMID 32786534 DOI: 10.1021/Acs.Biomac.0C00616  0.353
2020 Toth K, Osuji CO, Yager KG, Doerk GS. Electrospray deposition tool: Creating compositionally gradient libraries of nanomaterials. The Review of Scientific Instruments. 91: 013701. PMID 32012628 DOI: 10.1063/1.5129625  0.321
2020 Doerk GS, Li R, Fukuto M, Yager KG. Wet Brush Homopolymers as “Smart Solvents” for Rapid, Large Period Block Copolymer Thin Film Self-Assembly Macromolecules. 53: 1098-1113. DOI: 10.1021/Acs.Macromol.9B02296  0.448
2020 Arango MT, Zhang Y, Zhao C, Li R, Doerk G, Nykypanchuk D, Chen-Wiegart YK, Fluerasu A, Wiegart L. Ink-substrate interactions during 3D printing revealed by time-resolved coherent X-ray scattering Materials Today Physics. 14: 100220. DOI: 10.1016/J.Mtphys.2020.100220  0.358
2020 Al Hossain A, Yang M, Checco A, Doerk G, Colosqui CE. Large-area nanostructured surfaces with tunable zeta potentials Applied Materials Today. 19: 100553. DOI: 10.1016/J.Apmt.2019.100553  0.37
2019 Subramanian A, Tiwale N, Doerk GS, Kisslinger K, Nam CY. Enhanced Hybridization and Nanopatterning via Heated Liquid-Phase Infiltration into Self-Assembled Block Copolymer Thin Films. Acs Applied Materials & Interfaces. PMID 31786911 DOI: 10.1021/Acsami.9B16148  0.417
2019 Zheng J, Lienhard B, Doerk G, Cotlet M, Bersin E, Kim HS, Byun YC, Nam CY, Kim J, Black CT, Englund D. Top-down fabrication of high-uniformity nanodiamonds by self-assembled block copolymer masks. Scientific Reports. 9: 6914. PMID 31061512 DOI: 10.1038/S41598-019-43304-5  0.446
2019 Subramanian A, Doerk G, Kisslinger K, Yi DH, Grubbs RB, Nam CY. Three-dimensional electroactive ZnO nanomesh directly derived from hierarchically self-assembled block copolymer thin films. Nanoscale. PMID 31049522 DOI: 10.1039/C9Nr00206E  0.465
2018 Doerk GS, Li R, Fukuto M, Rodriguez A, Yager KG. Thickness-Dependent Ordering Kinetics in Cylindrical Block Copolymer/Homopolymer Ternary Blends Macromolecules. 51: 10259-10270. DOI: 10.1021/Acs.Macromol.8B01773  0.436
2017 Doerk GS, Yager KG. Rapid Ordering in "Wet Brush" Block Copolymer/Homopolymer Ternary Blends. Acs Nano. 11: 12326-12336. PMID 29195046 DOI: 10.1021/Acsnano.7B06154  0.456
2017 Doerk GS, Yager KG. Beyond native block copolymer morphologies Molecular Systems Design & Engineering. 2: 518-538. DOI: 10.1039/C7ME00069C  0.335
2016 Rahman A, Majewski PW, Doerk G, Black CT, Yager KG. Non-native three-dimensional block copolymer morphologies. Nature Communications. 7: 13988. PMID 28004774 DOI: 10.1038/Ncomms13988  0.454
2016 Stein A, Wright G, Yager KG, Doerk GS, Black CT. Selective directed self-assembly of coexisting morphologies using block copolymer blends. Nature Communications. 7: 12366. PMID 27480327 DOI: 10.1038/Ncomms12366  0.544
2015 Doerk GS, Gao H, Wan L, Lille J, Patel KC, Chapuis YA, Ruiz R, Albrecht TR. Transfer of self-aligned spacer patterns for single-digit nanofabrication. Nanotechnology. 26: 085304. PMID 25656564 DOI: 10.1088/0957-4484/26/8/085304  0.527
2015 Cheng J, Doerk GS, Rettner CT, Singh G, Tjio M, Truong H, Arellano N, Balakrishnan S, Brink M, Tsai H, Liu CC, Guillorn M, Sanders DP. Customization and design of directed self-assembly using hybrid prepatterns Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086973  0.707
2015 Albrecht TR, Arora H, Ayanoor-Vitikkate V, Beaujour JM, Bedau D, Berman D, Bogdanov AL, Chapuis YA, Cushen J, Dobisz EE, Doerk G, Gao H, Grobis M, Gurney B, Hanson W, et al. Bit-patterned magnetic recording: Theory, media fabrication, and recording performance Ieee Transactions On Magnetics. 51. DOI: 10.1109/Tmag.2015.2397880  0.425
2014 Doerk GS, Cheng JY, Singh G, Rettner CT, Pitera JW, Balakrishnan S, Arellano N, Sanders DP. Enabling complex nanoscale pattern customization using directed self-assembly. Nature Communications. 5: 5805. PMID 25512171 DOI: 10.1038/Ncomms6805  0.717
2014 Lai K, Ozlem M, Pitera JW, Liu CC, Schepis A, Dechene D, Krasnoperova A, Brue D, Abdallah J, Tsai H, Guillorn M, Cheng J, Doerk G, Tjio M, Topalogu R, et al. Computational lithography platform for 193i-guided directed self-assembly Proceedings of Spie - the International Society For Optical Engineering. 9052. DOI: 10.1117/12.2046920  0.334
2013 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp LE, Topuria T, Arellano N, Sanders DP. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. Acs Nano. 7: 276-85. PMID 23199006 DOI: 10.1021/Nn303974J  0.72
2013 Tsai H, Guillorn M, Doerk G, Cheng J, Sanders D, Lai K, Liu C, Colburn M. Directed self-assembly for ever-smaller printed circuits Spie Newsroom. DOI: 10.1117/2.1201303.004743  0.424
2013 Lai K, Liu CC, Pitera J, Dechene DJ, Schepis A, Abdallah J, Tsai H, Guillorn M, Cheng J, Doerk G, Tjio M, Rettner C, Odesanya O, Ozlem M, Lafferty N. Computational aspects of optical lithography extension by Directed Self-Assembly Proceedings of Spie - the International Society For Optical Engineering. 8683. DOI: 10.1117/12.2012440  0.387
2013 Doerk GS, Cheng JY, Rettner CT, Balakrishnan S, Arellano N, Sanders DP. Deterministically isolated gratings through the directed self-assembly of block copolymers Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011629  0.716
2012 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp L, Topuria T, Arellano N, Sanders DP. Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916421  0.707
2011 Lee DH, Kim Y, Doerk GS, Laboriante I, Maboudian R. Strategies for controlling Si nanowire formation during Au-assisted electroless etching Journal of Materials Chemistry. 21: 10359-10363. DOI: 10.1039/C1Jm11164G  0.691
2011 Doerk GS, Dhong C, Politi C, Laboriante I, Carraro C, Maboudian R. Micellar block copolymer templated galvanic displacement for epitaxial nanowire device integration Journal of Materials Chemistry. 21: 8807-8815. DOI: 10.1039/C1Jm10693G  0.591
2011 Doerk GS, Carraro C, Maboudian R. Raman spectroscopy for characterization of semiconducting nanowires Raman Spectroscopy For Nanomaterials Characterization. 477-506. DOI: 10.1007/978-3-642-20620-7_17  0.48
2010 Doerk GS, Carraro C, Maboudian R. Single nanowire thermal conductivity measurements by Raman thermography. Acs Nano. 4: 4908-14. PMID 20731463 DOI: 10.1021/Nn1012429  0.52
2010 Doerk GS, Lestari G, Liu F, Carraro C, Maboudian R. Ex situ vapor phase boron doping of silicon nanowires using BBr3. Nanoscale. 2: 1165-70. PMID 20648344 DOI: 10.1039/C0Nr00127A  0.569
2010 Cerruti M, Doerk G, Hernandez G, Carraro C, Maboudian R. Galvanic deposition of Pt clusters on silicon: effect of HF concentration and application as catalyst for silicon nanowire growth. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 432-7. PMID 20038180 DOI: 10.1021/La902032X  0.549
2010 Doerk GS, Radmilovic V, Maboudian R. Branching induced faceting of Si nanotrees Applied Physics Letters. 96. DOI: 10.1063/1.3374328  0.576
2009 Doerk GS, Carraro C, Maboudian R. Temperature dependence of Raman spectra for individual silicon nanowires Physical Review B - Condensed Matter and Materials Physics. 80. DOI: 10.1103/Physrevb.80.073306  0.519
2008 Doerk GS, Ferralis N, Carraro C, Maboudian R. Growth of branching Si nanowires seeded by Au-Si surface migration Journal of Materials Chemistry. 18: 5376-5381. DOI: 10.1039/B811535D  0.587
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