☰

Ramya Yeluri, Ph.D. - Publications

Affiliations: 
2007 Engineering Physics Indian Institute of Technology - Madras, Chennai, Tamil Nadu, India 
 2013 Electrical & Computer Engineering University of California, Santa Barbara, Santa Barbara, CA, United States 
Area:
Electronics & Photonics
Website:
https://www.linkedin.com/in/ramyay
Tree Info Similar researchers PubMed Report error

15 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2017 Chan SH, Bisi D, Liu X, Yeluri R, Tahhan M, Keller S, DenBaars SP, Meneghini M, Mishra UK. Impact of oxygen precursor flow on the forward bias behavior of MOCVD-Al2O3 dielectrics grown on GaN Journal of Applied Physics. 122: 174101. DOI: 10.1063/1.5009757  0.78
2016 Bisi D, Chan SH, Liu X, Yeluri R, Keller S, Meneghini M, Meneghesso G, Zanoni E, Mishra UK. On trapping mechanisms at oxide-traps in Al2O3/GaN metal-oxide-semiconductor capacitors Applied Physics Letters. 108. DOI: 10.1063/1.4944466  0.802
2016 Liu X, Jackson CM, Wu F, Mazumder B, Yeluri R, Kim J, Keller S, Arehart AR, Ringel SA, Speck JS, Mishra UK. Electrical and structural characterizations of crystallized Al2O3/GaN interfaces formed by in situ metalorganic chemical vapor deposition Journal of Applied Physics. 119. DOI: 10.1063/1.4939157  0.811
2015 Yeluri R, Lu J, Hurni CA, Browne DA, Chowdhury S, Keller S, Speck JS, Mishra UK. Design, fabrication, and performance analysis of GaN vertical electron transistors with a buried p/n junction Applied Physics Letters. 106. DOI: 10.1063/1.4919866  0.734
2014 Yeluri R, Lu J, Browne D, Hurni CA, Chowdhury S, Keller S, Speck JS, Mishra UK. Low ON-resistance and high current GaN Vertical Electron Transistors with buried p-GaN layers Device Research Conference - Conference Digest, Drc. 253-254. DOI: 10.1109/DRC.2014.6872393  0.56
2014 Yeluri R, Liu X, Guidry M, Koksaldi OS, Lal S, Kim J, Lu J, Keller S, Mishra UK. Dielectric stress tests and capacitance-voltage analysis to evaluate the effect of post deposition annealing on Al2O3 films deposited on GaN Applied Physics Letters. 105. DOI: 10.1063/1.4903344  0.754
2014 Mazumder B, Liu X, Yeluri R, Wu F, Mishra UK, Speck JS. Atom probe tomography studies of Al2O3 gate dielectrics on GaN Journal of Applied Physics. 116. DOI: 10.1063/1.4896498  0.654
2014 Liu X, Kim J, Suntrup DJ, Wienecke S, Tahhan M, Yeluri R, Chan SH, Lu J, Li H, Keller S, Mishra UK. In situ metalorganic chemical vapor deposition of Al2O 3 on N-face GaN and evidence of polarity induced fixed charge Applied Physics Letters. 104. DOI: 10.1063/1.4886768  0.704
2013 Liu X, Kim J, Yeluri R, Lal S, Li H, Lu J, Keller S, Mazumder B, Speck JS, Mishra UK. Fixed charge and trap states of in situ Al2O3 on Ga-face GaN metal-oxide-semiconductor capacitors grown by metalorganic chemical vapor deposition Journal of Applied Physics. 114. DOI: 10.1063/1.4827201  0.836
2013 Yeluri R, Liu X, Swenson BL, Lu J, Keller S, Mishra UK. Capacitance-voltage characterization of interfaces between positive valence band offset dielectrics and wide bandgap semiconductors Journal of Applied Physics. 114. DOI: 10.1063/1.4819402  0.811
2013 Liu X, Yeluri R, Kim J, Lal S, Raman A, Lund C, Wienecke S, Lu J, Laurent M, Keller S, Mishra UK. In-situ metalorganic chemical vapor deposition and capacitance-voltage characterizations of Al2O3 on Ga-face GaN metal-oxide-semiconductor capacitors Applied Physics Letters. 103. DOI: 10.1063/1.4817385  0.738
2013 Lu J, Denninghoff D, Yeluri R, Lal S, Gupta G, Laurent M, Keller S, Denbaars SP, Mishra UK. Very high channel conductivity in ultra-thin channel N-polar GaN/(AlN, InAlN, AlGaN) high electron mobility hetero-junctions grown by metalorganic chemical vapor deposition Applied Physics Letters. 102. DOI: 10.1063/1.4809997  0.713
2013 Liu X, Yeluri R, Lu J, Mishra UK. Effects of H2O pretreatment on the capacitance-voltage characteristics of atomic-layer-deposited Al2O3 on Ga-face GaN metal-oxide-semiconductor capacitors Journal of Electronic Materials. 42: 33-39. DOI: 10.1007/S11664-012-2246-8  0.691
2012 Yeluri R, Swenson BL, Mishra UK. Interface states at the SiN/AlGaN interface on GaN heterojunctions for Ga and N-polar material Journal of Applied Physics. 111. DOI: 10.1063/1.3687355  0.807
2011 Fujiwara T, Yeluri R, Denninghoff D, Lu J, Keller S, Speck JS, DenBaars SP, Mishra UK. Enhancement-mode m-plane AlGaN/GaN heterojunction field-effect transistors with +3 v of threshold voltage using Al2O3 deposited by atomic layer deposition Applied Physics Express. 4. DOI: 10.1143/Apex.4.096501  0.801
Show low-probability matches.