Year |
Citation |
Score |
2019 |
Lau J, Trojniak AE, Maraugha MJ, VanZanten AJ, Osterbaan AJ, Serino AC, Ohnsorg ML, Cheung KM, Ashby DS, Weiss PS, Dunn BS, Anderson ME. Conformal Ultrathin Film Metal-Organic Framework Analogues: Characterization of Growth, Porosity, and Electronic Transport. Chemistry of Materials : a Publication of the American Chemical Society. 31: 8977-8986. PMID 32536746 DOI: 10.1021/Acs.Chemmater.9B03141 |
0.66 |
|
2018 |
Bowser BH, Brower LJ, Ohnsorg ML, Gentry LK, Beaudoin CK, Anderson ME. Comparison of Surface-Bound and Free-Standing Variations of HKUST-1 MOFs: Effect of Activation and Ammonia Exposure on Morphology, Crystallinity, and Composition. Nanomaterials (Basel, Switzerland). 8. PMID 30142895 DOI: 10.3390/Nano8090650 |
0.371 |
|
2017 |
Brower LJ, Gentry LK, Napier AL, Anderson ME. Tailoring the nanoscale morphology of HKUST-1 thin films via codeposition and seeded growth. Beilstein Journal of Nanotechnology. 8: 2307-2314. PMID 29181287 DOI: 10.3762/Bjnano.8.230 |
0.412 |
|
2017 |
Serino AC, Anderson ME, Saleh LMA, Dziedzic RM, Mills H, Heidenreich LK, Spokoyny AM, Weiss PS. Work Function Control of Germanium through Carborane-Carboxylic Acid Surface Passivation. Acs Applied Materials & Interfaces. PMID 28920673 DOI: 10.1021/Acsami.7B10596 |
0.506 |
|
2015 |
Ohnsorg ML, Beaudoin CK, Anderson ME. Fundamentals of MOF Thin Film Growth via Liquid-Phase Epitaxy: Investigating the Initiation of Deposition and the Influence of Temperature. Langmuir : the Acs Journal of Surfaces and Colloids. 31: 6114-21. PMID 26020573 DOI: 10.1021/Acs.Langmuir.5B01333 |
0.369 |
|
2015 |
Benson AS, Elinski MB, Ohnsorg ML, Beaudoin CK, Alexander KA, Peaslee GF, Deyoung PA, Anderson ME. Metal-organic coordinated multilayer film formation: Quantitative analysis of composition and structure Thin Solid Films. 590: 103-110. DOI: 10.1016/J.Tsf.2015.07.048 |
0.444 |
|
2014 |
Holder CF, Rugen EE, Anderson ME. Comparative growth mechanism study for two thermoelectric compounds Nanomaterials and Energy. 3: 206-214. DOI: 10.1680/Nme.14.00018 |
0.301 |
|
2010 |
Anderson ME, Bharadwaya SSN, Schaak RE. Modified polyol synthesis of bulk-scale nanostructured bismuth antimony telluride Journal of Materials Chemistry. 20: 8362-8367. DOI: 10.1039/C0Jm01424A |
0.31 |
|
2009 |
Leonard BM, Anderson ME, Oyler KD, Phan TH, Schaak RE. Orthogonal reactivity of metal and multimetal nanostructures for selective, stepwise, and spatially-controlled solid-state modification. Acs Nano. 3: 940-8. PMID 19243115 DOI: 10.1021/Nn800892A |
0.323 |
|
2008 |
Anderson ME, Buck MR, Sines IT, Oyler KD, Schaak RE. On-wire conversion chemistry: engineering solid-state complexity into striped metal nanowires using solution chemistry reactions. Journal of the American Chemical Society. 130: 14042-3. PMID 18837501 DOI: 10.1021/Ja804743B |
0.301 |
|
2008 |
Srinivasan C, Hohman JN, Anderson ME, Weiss PS, Horn MW. Sub- 30-nm patterning on quartz for imprint lithography templates Applied Physics Letters. 93. DOI: 10.1063/1.2963982 |
0.733 |
|
2008 |
Shuster MJ, Vaish A, Szapacs ME, Anderson ME, Weiss PS, Andrews AM. Biospecific recognition of tethered small molecules diluted in self-assembled monolayers Advanced Materials. 20: 164-167. DOI: 10.1002/Adma.200700082 |
0.704 |
|
2007 |
Srinivasan C, Mullen TJ, Hohman JN, Anderson ME, Dameron AA, Andrews AM, Dickey EC, Horn MW, Weiss PS. Scanning electron microscopy of nanoscale chemical patterns. Acs Nano. 1: 191-201. PMID 19206649 DOI: 10.1021/Nn7000799 |
0.712 |
|
2007 |
Srinivasan C, Hohman JN, Anderson ME, Zhang P, Weiss PS, Horn MW. Molecular-ruler nanolithography Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.712230 |
0.732 |
|
2007 |
Srinivasan C, Hohman JN, Anderson ME, Weiss PS, Horn MW. Nanostructures using self-assembled multilayers as molecular rulers and etch resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1985-1988. DOI: 10.1116/1.2811712 |
0.763 |
|
2006 |
Srinivasan C, Anderson ME, Carter EM, Hohman JN, Bharadwaja SSN, Trolier-Mckinstry S, Weiss PS, Horn MW. Extensions of molecular ruler technology for nanoscale patterning Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 3200-3204. DOI: 10.1116/1.2393252 |
0.751 |
|
2006 |
Srinivasan C, Anderson ME, Jayaraman R, Weiss PS, Horn MW. Electrically isolated nanostructures fabricated using self-assembled multilayers and a novel negative-tone bi-layer resist stack Microelectronic Engineering. 83: 1517-1520. DOI: 10.1016/J.Mee.2006.01.265 |
0.598 |
|
2006 |
Anderson ME, Srinivasan C, Hohman JN, Carter EM, Horn MW, Weiss PS. Combining conventional lithography with molecular self-assembly for chemical patterning Advanced Materials. 18: 3258-3260. DOI: 10.1002/Adma.200601258 |
0.754 |
|
2006 |
Anderson ME, Mihok M, Tanaka H, Tan LP, Horn MW, McCarty GS, Weiss PS. Hybrid approaches to nanolithography: Photolithographic structures with precise, controllable nanometer-scale spacings created by molecular rulers Advanced Materials. 18: 1020-1022. DOI: 10.1002/Adma.200600108 |
0.665 |
|
2005 |
Anderson ME, Srinivasan C, Jayaraman R, Weiss PS, Horn MW. Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps Microelectronic Engineering. 78: 248-252. DOI: 10.1016/J.Mee.2005.01.003 |
0.632 |
|
2004 |
TANAKA H, ANDERSON ME, TAN L, MIHOK M, HORN MW, WEISS PS. Super-Precise Nanolithography Using Multilayer of Self-Assembled Monolayers Hyomen Kagaku. 25: 650-655. DOI: 10.1380/Jsssj.25.650 |
0.641 |
|
2004 |
Tanaka H, Anderson ME, Horn MW, Weiss PS. Position-Selected Molecular Ruler Japanese Journal of Applied Physics. 43: L950-L953. DOI: 10.1143/Jjap.43.L950 |
0.591 |
|
2003 |
Anderson ME, Tan LP, Tanaka H, Mihok M, Lee H, Horn MW, Weiss PS. Advances in nanolithography using molecular rulers Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3116. DOI: 10.1116/1.1621662 |
0.584 |
|
2002 |
Anderson ME, Smith RK, Donhauser ZJ, Hatzor A, Lewis PA, Tan LP, Tanaka H, Horn MW, Weiss PS. Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2739-2744. DOI: 10.1116/1.1515301 |
0.753 |
|
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