Erik N. Hoggan, Ph.D. - Publications
Affiliations: | 2002 | North Carolina State University, Raleigh, NC |
Area:
Chemical EngineeringYear | Citation | Score | |||
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2004 | Hoggan EN, Wang K, Flowers D, DeSimone JM, Carbonell RG. "Dry" lithography using liquid and supercritical carbon dioxide based chemistries and processes Ieee Transactions On Semiconductor Manufacturing. 17: 510-516. DOI: 10.1109/Tsm.2004.837002 | 0.646 | |||
2004 | Hoggan EN, Flowers D, Wang K, DeSimone JM, Carbonell RG. Spin Coating of Photoresists Using Liquid Carbon Dioxide Industrial and Engineering Chemistry Research. 43: 2113-2122. DOI: 10.1021/Ie0308543 | 0.631 | |||
2002 | Hoggan EN, Flowers D, DeSimone JM, Carbonell RG. Spin coating and photolithography using liquid and supercritical carbon dioxide Proceedings of Spie - the International Society For Optical Engineering. 4690: 1217-1223. DOI: 10.1117/12.474199 | 0.64 | |||
2001 | Flowers D, Hoggan E, DeSimone JM, Carbonell R. Designing Photoresist Systems for Microlithography in Carbon Dioxide Mrs Proceedings. 705. DOI: 10.1557/Proc-705-Y7.8 | 0.681 | |||
2001 | Flowers D, Hoggan E, DeSimone JM, Carbonell R. All CO2-Processed Fluoropolymer-Containing Photoresist Systems Mrs Proceedings. 705. DOI: 10.1557/Proc-705-Y2.4 | 0.684 | |||
2001 | McAdams CL, Flowers D, Hoggan EN, Carbonell RG, DeSimone JM. All CO2-processed 157-nm fluoropolymer-containing photoresist systems Proceedings of Spie - the International Society For Optical Engineering. 4345: 327-334. DOI: 10.1117/12.436835 | 0.503 | |||
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