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Jeffrey A. Hopwood - Publications

Affiliations: 
Electrical Engineering Tufts University, Boston 
Area:
Electronics and Electrical Engineering
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78 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Kim H, Hopwood J. Tunable millimeter wave photonic crystal for limiting high power pulses using weakly ionized steady state plasma Journal of Applied Physics. 128: 93302. DOI: 10.1063/5.0018252  0.492
2019 Kim H, Hopwood J. Wave Propagation in Composites of Plasma and Metamaterials with Negative Permittivity and Permeability. Scientific Reports. 9: 3024. PMID 30816256 DOI: 10.1038/S41598-019-39923-7  0.417
2019 Fantini L, Dennison S, Kim H, Sarkarat M, Lanagan M, Hopwood J. Plasma reconfigurable metamaterial using a 6.5 GHz dielectric resonator array Journal of Applied Physics. 126: 203301. DOI: 10.1063/1.5121222  0.494
2019 Kim H, Hopwood J. Scalable microplasma array for argon metastable lasing medium Journal of Applied Physics. 126: 163301. DOI: 10.1063/1.5119511  0.378
2018 Kim H, Hopwood J. Plasma-enhanced metamaterials using microwave radiative power transfer Plasma Sources Science and Technology. 27: 95007. DOI: 10.1088/1361-6595/Aadb64  0.439
2018 Kim H, Parsons S, Hopwood J. Spatially adjustable microplasma generation in proto-metamaterials using microwave radiative power transfer Plasma Sources Science and Technology. 27: 15010. DOI: 10.1088/1361-6595/Aaa2Ee  0.516
2017 Parsons SG, Hopwood J. Millimeter Wave Plasma Formation Within a 2D Photonic Crystal Ieee Electron Device Letters. 38: 1602-1605. DOI: 10.1109/Led.2017.2750486  0.453
2017 Parsons S, Gregório J, Hopwood J. Microwave plasma formation within a 2D photonic crystal Plasma Sources Science and Technology. 26: 55002. DOI: 10.1088/1361-6595/Aa62Ed  0.509
2017 Gregório J, Parsons S, Hopwood J. Reconfigurable photonic crystal using self-initiated gas breakdown Plasma Sources Science and Technology. 26. DOI: 10.1088/1361-6595/26/2/02Lt03  0.43
2017 Hoskinson AR, Gregório J, Hopwood J, Galbally-Kinney KL, Davis SJ, Rawlins WT. Spatially resolved modeling and measurements of metastable argon atoms in argon-helium microplasmas Journal of Applied Physics. 121: 153302. DOI: 10.1063/1.4981922  0.538
2016 Hoskinson AR, Parsons S, Hopwood J. Gas breakdown and plasma impedance in split-ring resonators European Physical Journal D. 70. DOI: 10.1140/Epjd/E2016-60445-X  0.527
2016 Dennison S, Chapman A, Luo W, Lanagan M, Hopwood J. Plasma generation by dielectric resonator arrays Plasma Sources Science and Technology. 25. DOI: 10.1088/0963-0252/25/3/03Lt02  0.466
2016 Gregório J, Parsons S, Hopwood J. Microwave harmonic generation and nonlinearity in microplasmas Plasma Sources Science and Technology. 25: 35018. DOI: 10.1088/0963-0252/25/3/035018  0.388
2016 Hoskinson AR, Gregorío J, Hopwood J, Galbally-Kinney K, Davis SJ, Rawlins WT. Argon metastable production in argon-helium microplasmas Journal of Applied Physics. 119. DOI: 10.1063/1.4954077  0.445
2015 Rawlins WT, Galbally-Kinney KL, Davis SJ, Hoskinson AR, Hopwood JA, Heaven MC. Optically pumped microplasma rare gas laser. Optics Express. 23: 4804-13. PMID 25836515 DOI: 10.1364/Oe.23.004804  0.365
2015 Hoskinson AR, Yared A, Hopwood J. Gas heating and plasma expansion in pulsed microwave-excited microplasmas Plasma Sources Science and Technology. 24. DOI: 10.1088/0963-0252/24/5/055002  0.471
2015 Gregório J, Hoskinson AR, Hopwood J. Modeling of microplasmas from GHz to THz Journal of Applied Physics. 118. DOI: 10.1063/1.4928468  0.498
2015 Hoskinson AR, Gregório J, Parsons S, Hopwood J. Electron confinement and heating in microwave-sustained argon microplasmas Journal of Applied Physics. 117. DOI: 10.1063/1.4919416  0.46
2014 Singh PK, Hopwood J, Sonkusale S. Metamaterials for remote generation of spatially controllable two dimensional array of microplasma. Scientific Reports. 4: 5964. PMID 25098976 DOI: 10.1038/Srep05964  0.401
2014 Rawlins WT, Galbally-Kinney KL, Davis SJ, Hoskinson AR, Hopwood JA. Laser excitation dynamics of argon metastables generated in atmospheric pressure flows by microwave frequency microplasma arrays Proceedings of Spie - the International Society For Optical Engineering. 8962. DOI: 10.1117/12.2040083  0.399
2014 Wu C, Hopwood J. Investigation of instabilities in microstrip-sustained microplasma Ieee Transactions On Plasma Science. 42: 1629-1635. DOI: 10.1109/Tps.2014.2320410  0.556
2014 Hopwood J, Hoskinson AR, Gregório J. Microplasmas ignited and sustained by microwaves Plasma Sources Science and Technology. 23. DOI: 10.1088/0963-0252/23/6/064002  0.535
2014 Hoskinson AR, Hopwood J. Spatially resolved spectroscopy and electrical characterization of microplasmas and switchable microplasma arrays Plasma Sources Science and Technology. 23. DOI: 10.1088/0963-0252/23/1/015024  0.516
2014 Thejaswini HC, Hoskinson AR, Agasanapura B, Grunde M, Hopwood J. Deposition and characterization of diamond-like carbon films by microwave resonator microplasma at one atmosphere Diamond and Related Materials. 48: 24-31. DOI: 10.1016/J.Diamond.2014.06.004  0.35
2013 Hoskinson AR, Singh PK, Sonkusale S, Hopwood J. Low-voltage switchable microplasma arrays generated using microwave resonators Ieee Electron Device Letters. 34: 804-806. DOI: 10.1109/Led.2013.2257659  0.4
2013 Monfared SK, Hoskinson AR, Hopwood J. Time-resolved microplasma electron dynamics in a pulsed microwave discharge Journal of Physics D: Applied Physics. 46. DOI: 10.1088/0022-3727/46/42/425201  0.371
2013 Narayanamoorthy J, Tsioris K, Omenetto FG, Hopwood J. Plasma etching of silk fibroin: Experiments and models Plasma Processes and Polymers. 10: 451-458. DOI: 10.1002/Ppap.201200082  0.417
2012 Hoskinson AR, Hopwood J. A two-dimensional array of microplasmas generated using microwave resonators Plasma Sources Science and Technology. 21. DOI: 10.1088/0963-0252/21/5/052002  0.421
2011 Wu C, Hoskinson AR, Hopwood J. Stable linear plasma arrays at atmospheric pressure Plasma Sources Science and Technology. 20. DOI: 10.1088/0963-0252/20/4/045022  0.578
2011 Miura N, Hopwood J. Internal structure of 0.9 GHz microplasma Journal of Applied Physics. 109. DOI: 10.1063/1.3592269  0.631
2011 Miura N, Hopwood J. Spatially resolved argon microplasma diagnostics by diode laser absorption Journal of Applied Physics. 109. DOI: 10.1063/1.3531557  0.59
2011 Hoskinson AR, Hopwood J, Bostrom NW, Crank JA, Harrison C. Low-power microwave-generated helium microplasma for molecular and atomic spectrometry Journal of Analytical Atomic Spectrometry. 26: 1258-1264. DOI: 10.1039/C0Ja00239A  0.475
2010 Wu C, Zhang ZB, Hoskinson A, Hopwood J. Circular array of stable atmospheric pressure microplasmas European Physical Journal D. 60: 621-625. DOI: 10.1140/Epjd/E2010-00211-8  0.566
2010 Miura N, Xue J, Hopwood JA. Argon microplasma diagnostics by diode laser absorption Ieee Transactions On Plasma Science. 38: 2458-2464. DOI: 10.1109/Tps.2010.2053854  0.638
2009 Miura N, Hopwood J. Metastable helium density probe for remote plasmas. The Review of Scientific Instruments. 80: 113502. PMID 19947726 DOI: 10.1063/1.3258198  0.614
2009 Xue J, Hopwood JA. Microwave-Frequency Effects on Microplasma Ieee Transactions On Plasma Science. 37: 816-822. DOI: 10.1109/Tps.2009.2015453  0.565
2009 Zhang Z, Hopwood J. Linear arrays of stable atmospheric pressure microplasmas Applied Physics Letters. 95: 161502. DOI: 10.1063/1.3251793  0.441
2007 Xue J, Hopwood JA. Microplasma Trapping of Particles Ieee Transactions On Plasma Science. 35: 1574-1579. DOI: 10.1109/Tps.2007.905210  0.499
2007 Mao D, Wang LP, Hopwood J. On-wafer tunable deposition rates using ionized physical vapor deposition Plasma Processes and Polymers. 4: 19-26. DOI: 10.1002/Ppap.200600073  0.404
2005 Iza F, Hopwood JA. Self-organized filaments, striations and other nonuniformities in nonthermal atmospheric microwave excited microdischarges Ieee Transactions On Plasma Science. 33: 306-307. DOI: 10.1109/Tps.2005.845139  0.341
2005 Iza F, Hopwood JA. Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency Plasma Sources Science and Technology. 14: 397-406. DOI: 10.1088/0963-0252/14/2/023  0.448
2005 Hopwood J, Iza F, Coy S, Fenner DB. A microfabricated atmospheric-pressure microplasma source operating in air Journal of Physics D: Applied Physics. 38: 1698-1703. DOI: 10.1088/0022-3727/38/11/009  0.469
2004 Yang X, Hopwood JA. Physical mechanisms for anisotropic plasma etching of cesium iodide Journal of Applied Physics. 96: 4800-4806. DOI: 10.1063/1.1803607  0.403
2004 Mao D, Hopwood J. Ionized physical vapor deposition of titanium nitride: A deposition model Journal of Applied Physics. 96: 820-828. DOI: 10.1063/1.1753663  0.304
2004 Hopwood JA, Iza F. Ultrahigh frequency microplasmas from 1 pascal to 1 atmosphere Journal of Analytical Atomic Spectrometry. 19: 1145-1150. DOI: 10.1039/B403425B  0.477
2003 Hopwood J, Mantei TD. Application-driven development of plasma source technology Journal of Vacuum Science and Technology. 21. DOI: 10.1116/1.1600448  0.499
2003 Iza F, Hopwood JA. Low-power microwave plasma source based on a microstrip split-ring resonator Ieee Transactions On Plasma Science. 31: 782-787. DOI: 10.1109/Tps.2003.815470  0.48
2003 Minayeva OB, Hopwood J. Langmuir probe diagnostics of a microfabricated inductively coupled plasma on a chip Journal of Applied Physics. 94: 2821-2828. DOI: 10.1063/1.1597976  0.548
2003 Minayeva OB, Hopwood JA. Microfabricated inductively coupled plasma-on-a-chip for molecular SO2 detection: a comparison between global model and optical emission spectrometry Journal of Analytical Atomic Spectrometry. 18: 856-863. DOI: 10.1039/B303821A  0.5
2002 Mao D, Tao K, Hopwood J. Ionized physical vapor deposition of titanium nitride: Plasma and film characterization Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 20: 379-387. DOI: 10.1116/1.1446448  0.415
2002 Yang X, Hopwood J, Tipnis S, Nagarkar V, Gaysinskiy V. Plasma etching of cesium iodide Journal of Vacuum Science and Technology. 20: 132-137. DOI: 10.1116/1.1426363  0.389
2002 Iza F, Hopwood JA. Influence of operating frequency and coupling coefficient on the efficiency of microfabricated inductively coupled plasma sources Plasma Sources Science and Technology. 11: 229-235. DOI: 10.1088/0963-0252/11/3/301  0.483
2002 Tao K, Mao D, Hopwood J. Ionized physical vapor deposition of titanium nitride: A global plasma model Journal of Applied Physics. 91: 4040-4048. DOI: 10.1063/1.1455139  0.45
2002 Minayeva OB, Hopwood JA. Emission spectroscopy using a microfabricated inductively coupled plasma-on-a-chip Journal of Analytical Atomic Spectrometry. 17: 1103-1107. DOI: 10.1039/B202121H  0.507
2000 Hopwood J, Minayeva O, Yin Y. Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator Journal of Vacuum Science & Technology B. 18: 2446-2451. DOI: 10.1116/1.1288945  0.556
2000 Hopwood JA. A microfabricated inductively coupled plasma generator Ieee\/Asme Journal of Microelectromechanical Systems. 9: 309-313. DOI: 10.1109/84.870056  0.55
2000 Hopwood JA. The role of ionized physical vapor deposition in integrated circuit fabrication Thin Films. 27: 1-7. DOI: 10.1016/S1079-4050(00)80003-4  0.335
1999 Zhong G, Hopwood J. Ionized titanium deposition into high aspect ratio vias and trenches Journal of Vacuum Science & Technology B. 17: 405-409. DOI: 10.1116/1.590569  0.5
1999 Yin Y, Messier J, Hopwood JA. Miniaturization of inductively coupled plasma sources Ieee Transactions On Plasma Science. 27: 1516-1524. DOI: 10.1109/27.799834  0.491
1998 Dickson M, Zhong G, Hopwood J. Radial uniformity of an external-coil ionized physical vapor deposition source Journal of Vacuum Science & Technology B. 16: 523-531. DOI: 10.1116/1.589856  0.463
1998 Hopwood J. Ionized physical vapor deposition of integrated circuit interconnects Physics of Plasmas. 5: 1624-1631. DOI: 10.1063/1.872829  0.301
1997 Dickson M, Hopwood J. Axially-resolved study of highly ionized physical vapor deposition Journal of Vacuum Science and Technology. 15: 2307-2312. DOI: 10.1116/1.580739  0.428
1997 Dickson M, Qian F, Hopwood J. Quenching of electron temperature and electron density in ionized physical vapor deposition Journal of Vacuum Science and Technology. 15: 340-344. DOI: 10.1116/1.580489  0.411
1996 Forgotson N, Khemka V, Hopwood J. Inductively coupled plasma for polymer etching of 200 mm wafers Journal of Vacuum Science & Technology B. 14: 732-737. DOI: 10.1116/1.588706  0.503
1995 Hopwood J, Qian F. Mechanisms for highly ionized magnetron sputtering Journal of Applied Physics. 78: 758-765. DOI: 10.1063/1.360334  0.477
1994 Rossnagel SM, Hopwood J. Metal ion deposition from ionized mangetron sputtering discharge Journal of Vacuum Science & Technology B. 12: 449-453. DOI: 10.1116/1.587142  0.452
1994 Hopwood J. Planar RF induction plasma coupling efficiency Plasma Sources Science and Technology. 3: 460-464. DOI: 10.1088/0963-0252/3/4/002  0.436
1993 Hopwood J, Guarnieri CR, Whitehair SJ, Cuomo JJ. Langmuir probe measurements of a radio frequency induction plasma Journal of Vacuum Science and Technology. 11: 152-156. DOI: 10.1116/1.578282  0.519
1993 Hopwood J, Guarnieri CR, Whitehair SJ, Cuomo JJ. Electromagnetic fields in a radio‐frequency induction plasma Journal of Vacuum Science and Technology. 11: 147-151. DOI: 10.1116/1.578281  0.381
1993 Rossnagel SM, Hopwood J. Magnetron sputter deposition with high levels of metal ionization Applied Physics Letters. 63: 3285-3287. DOI: 10.1063/1.110176  0.463
1993 Hopwood J. Ion bombardment energy distributions in a radio frequency induction plasma Applied Physics Letters. 62: 940-942. DOI: 10.1063/1.108526  0.451
1992 Hopwood J. Review of inductively coupled plasmas for plasma processing Plasma Sources Science and Technology. 1: 109-116. DOI: 10.1088/0963-0252/1/2/006  0.509
1991 Hopwood J, Asmussen J. Neutral gas temperatures in a multipolar electron cyclotron resonance plasma Applied Physics Letters. 58: 2473-2475. DOI: 10.1063/1.105232  0.489
1990 Hopwood J, Waaner R, Reinhard DK, Asmussen J. Electric fields in a microwave-cavity electron-cyclotron-resonant plasma source Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 2904-2908. DOI: 10.1116/1.576647  0.486
1990 Hopwood J, Reinhard DK, Asmussen J. Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching source Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 8: 3103-3112. DOI: 10.1116/1.576592  0.473
1990 Asmussen J, Hopwood J, Sze FC. A 915 MHz/2.45 GHz ECR plasma source for large area ion beam and plasma processing Review of Scientific Instruments. 61: 250-252. DOI: 10.1063/1.1141310  0.451
1988 Hopwood J, Reinhard DK, Asmussen J. Experimental conditions for uniform anisotropic etching of silicon with a microwave electron cyclotron resonance plasma system Journal of Vacuum Science & Technology B. 6: 1896-1899. DOI: 10.1116/1.584197  0.494
1988 Hopwood J, Dahimene M, Reinhard DK, Asmussen J. Plasma etching with a microwave cavity plasma disk source Journal of Vacuum Science & Technology B. 6: 268-271. DOI: 10.1116/1.584020  0.502
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