| Year |
Citation |
Score |
| 2011 |
Onses MS, Pathak P, Liu CC, Cerrina F, Nealey PF. Localization of multiple DNA sequences on nanopatterns. Acs Nano. 5: 7899-909. PMID 21899356 DOI: 10.1021/Nn2021277 |
0.505 |
|
| 2009 |
Marconi MC, Wachulak PW, Urbanski L, Isoyan A, Jiang F, Cheng YC, Rocca JJ, Menoni CS, Cerrina F. Table-top soft X ray lithography Proceedings of Spie - the International Society For Optical Engineering. 7451. DOI: 10.1117/12.825509 |
0.337 |
|
| 2008 |
Brainard R, Hassanein E, Li J, Pathak P, Thiel B, Cerrina F, Moore R, Rodriguez M, Yakshinskiy B, Loginova E, Madey T, Matyi R, Malloy M, Rudack A, Naulleau P, et al. Photons, electrons, and acid yields in EUV photoresists: A progress report Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773869 |
0.53 |
|
| 2007 |
Cheng YC, Isoyan A, Wallace J, Khan M, Cerrina F. Extreme ultraviolet holographic lithography: Initial results Applied Physics Letters. 90. DOI: 10.1063/1.2430774 |
0.585 |
|
| 2005 |
Leonard Q, Malueg D, Wallace J, Taylor JW, Dhuey S, Cerrina F, Boerger B, Selzer R, Yu M, Ma Y, Myers K, Trybendis M, Moon E, Smith HI. Development, installation, and performance of the x-ray stepper JSAL 5C Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2896-2902. DOI: 10.1116/1.2121711 |
0.413 |
|
| 2004 |
Kim C, Li M, Rodesch M, Lowe A, Richmond K, Cerrina F. Biological lithography: Improvements in DMA synthesis methods Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3163-3167. DOI: 10.1116/1.1824066 |
0.335 |
|
| 2003 |
Alianelli L, Sanchez del Rio M, Khan M, Cerrina F. A comment on 'A new ray-tracing program RIGTRACE for X-ray optical systems' [J. Synchrotron Rad. (2001), 8, 1047-1050]. Journal of Synchrotron Radiation. 10: 191-2. PMID 12606800 DOI: 10.1107/S090904950202352X |
0.566 |
|
| 2003 |
Kim C, Li M, Lowe A, Venkataramaiah N, Richmond K, Kaysen J, Cerrina F. DNA microarrays: An imaging study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2946-2950. DOI: 10.1116/1.1627802 |
0.326 |
|
| 2003 |
Han G, Khan M, Cerrina F. Stochastic modeling of high energy lithographies Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3166. DOI: 10.1116/1.1627798 |
0.558 |
|
| 2002 |
Han G, Khan M, Fang Y, Cerrina F. Comprehensive model of electron energy deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2666-2671. DOI: 10.1116/1.1526633 |
0.526 |
|
| 2002 |
Solak HH, David C, Gobrecht J, Wang L, Cerrina F. Multiple-beam interference lithography with electron beam written gratings Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2844-2848. DOI: 10.1116/1.1518015 |
0.311 |
|
| 2001 |
Khan M, Han G, Tsvid G, Kitayama T, Maldonado J, Cerrina F. Can proximity x-ray lithography print 35 nm features? Yes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2423-2427. DOI: 10.1116/1.1418407 |
0.626 |
|
| 2001 |
Toyota E, Hori T, Khan M, Cerrina F. Technique for 25 nm x-ray nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2428-2433. DOI: 10.1116/1.1415503 |
0.625 |
|
| 2001 |
Feldman M, Khan M, Cerrina F. Focusing x-ray masks for printing very narrow features Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2434-2438. DOI: 10.1116/1.1410093 |
0.597 |
|
| 2001 |
Yi SS, Moran PD, Zhang X, Cerrina F, Carter J, Smith HI, Kuech TF. Oriented crystallization of GaSb on a patterned, amorphous Si substrate Applied Physics Letters. 78: 1358-1360. DOI: 10.1063/1.1352657 |
0.371 |
|
| 2000 |
Cerrina F. X-ray imaging: applications to patterning and lithography Journal of Physics D: Applied Physics. 33. DOI: 10.1088/0022-3727/33/12/201 |
0.355 |
|
| 2000 |
Zhang X, Solak HH, Cerrina F, Lai B, Cai Z, Ilinski P, Legnini DG, Rodrigues W. X-ray microdiffraction study of Cu interconnects Applied Physics Letters. 76: 315-317. DOI: 10.1063/1.125731 |
0.303 |
|
| 2000 |
Cerrina F, Bollepalli S, Khan M, Solak H, Li W, He D. Image formation in EUV lithography: multilayer and resist properties Microelectronic Engineering. 53: 13-20. DOI: 10.1016/S0167-9317(00)00260-4 |
0.566 |
|
| 1999 |
Khan M, Cerrina F, Toyota E. Pattern resolution of an x-ray beamline with a wide exposure field Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3433. DOI: 10.1116/1.591025 |
0.559 |
|
| 1999 |
Khan M, Han G, Bollepalli SB, Cerrina F, Maldonado J. Extension of x-ray lithography to 50 nm with a harder spectrum Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3426. DOI: 10.1116/1.591024 |
0.602 |
|
| 1999 |
Bollepalli SB, Khan M, Cerrina F. Image formation in extreme ultraviolet lithography and numerical aperture effects Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2992. DOI: 10.1116/1.590941 |
0.583 |
|
| 1999 |
Solak HH, Vladimirsky Y, Cerrina F, Lai B, Yun W, Cai Z, Ilinski P, Legnini DG, Rodrigues W. Measurement of strain in Al–Cu interconnect lines with x-ray microdiffraction Journal of Applied Physics. 86: 884-890. DOI: 10.1063/1.370819 |
0.351 |
|
| 1999 |
Solak HH, He D, Li W, Singh-Gasson S, Cerrina F, Sohn BH, Yang XM, Nealey P. Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography Applied Physics Letters. 75: 2328-2330. DOI: 10.1063/1.125005 |
0.39 |
|
| 1999 |
He D, Solak H, Li W, Cerrina F. Extreme ultraviolet and x-ray resist: Comparison study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 3379-3383. |
0.303 |
|
| 1999 |
Khan M, Han G, Bollepalli SB, Cerrina F, Maldonado J. Extension of x-ray lithography to 50 nm with a harder spectrum Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 3426-3432. |
0.314 |
|
| 1998 |
Feng Z, Engelstad RL, Lovell EG, Cerrina F. Transient thermal distortions of x-ray mask membranes during exposure scanning Proceedings of Spie - the International Society For Optical Engineering. 3331: 261-274. DOI: 10.1117/12.309579 |
0.312 |
|
| 1998 |
Bollepalli BS, Khan M, Cerrina F. Modeling study of image formation with point sources Proceedings of Spie - the International Society For Optical Engineering. 3331: 388-399. DOI: 10.1117/12.309569 |
0.564 |
|
| 1998 |
Cazzanti L, Khan M, Cerrina F. Parameter extraction with neural networks Proceedings of Spie - the International Society For Optical Engineering. 3332: 654-664. DOI: 10.1117/12.308780 |
0.46 |
|
| 1998 |
Singh-Gasson S, Vladimirsky Y, Cerrina F. Aspheric collimator for a point source x-ray lithography system Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 3456-3461. DOI: 10.1116/1.590477 |
0.375 |
|
| 1998 |
Lorusso GF, Solak H, Singh S, Cerrina F, Batson PJ, Underwood JH. X-ray scanning photoemission microscopy of titanium silicides and Al-Cu interconnects Characterization and Metrology For Ulsi Technology. 449: 465-468. DOI: 10.1063/1.56833 |
0.414 |
|
| 1998 |
De Stasio G, Gilbert B, Perfetti L, Fauchoux O, Valiquer A, Nelson T, Capozi M, Baudat PA, Cerrina F, Chen Z, Perfetti P, Tonner BP, Margaritondo G. Soft-x-ray transmission photoelectron spectromicroscopy with the MEPHISTO system Review of Scientific Instruments. 69: 3106-3108. DOI: 10.1063/1.1149067 |
0.315 |
|
| 1998 |
Hector S, Pol V, Khan M, Bollepalli S, Cerrina F. Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography Microelectronic Engineering. 41: 271-274. DOI: 10.1016/S0167-9317(98)00062-8 |
0.597 |
|
| 1998 |
Hector S, Pol V, Khan M, Bollepalli S, Cerrina F. Investigation of mask pattern proximity correction to reduce image shortening in x-ray lithography Microelectronic Engineering. 41: 271-274. |
0.303 |
|
| 1997 |
Chen Z, Vladimirsky Y, Brown M, Leonard Q, Vladimirsky O, Moore F, Cerrina F, Lai B, Yun W, Gluskin E. Design and fabrication of Fresnel zone plates with large numbers of zones Journal of Vacuum Science & Technology B. 15: 2522-2527. DOI: 10.1116/1.589678 |
0.377 |
|
| 1997 |
Singh S, Solak H, Krasnoperov N, Cerrina F, Cossy A, Diaz J, Stöhr J, Samant M. An x-ray spectromicroscopic study of the local structure of patterned titanium silicide Applied Physics Letters. 71: 55-57. DOI: 10.1063/1.119467 |
0.41 |
|
| 1997 |
Bollepalli BS, Khan M, Cerrina F. Automatic mask generation in x-ray lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 2238-2242. |
0.341 |
|
| 1996 |
Ted Liang S, Cerrina F, Lucatorto T. Novel x-ray mask inspection tool based on transmission x-ray conversion microscope Proceedings of Spie - the International Society For Optical Engineering. 2723: 211-220. DOI: 10.1117/12.240473 |
0.339 |
|
| 1996 |
Ocola LE, Fryer D, Nealey P, dePablo J, Cerrina F, Kämmer S. Latent image formation: Nanoscale topography and calorimetric measurements in chemically amplified resists Journal of Vacuum Science & Technology B. 14: 3974-3979. DOI: 10.1116/1.588626 |
0.386 |
|
| 1996 |
Ng W, Perera R, Underwood J, Singh S, Solak H, Cerrina F. Installation of the MAXIMUM microscope at the ALS Review of Scientific Instruments. 67: 3358-3359. DOI: 10.1063/1.1147384 |
0.319 |
|
| 1996 |
Wells GM, Wallace JP, Brodsky EL, Leonard QJ, Reilly MT, Anderson PD, Lee WK, Cerrina F, Simon K. Installation and initial operation of the Suss Advanced Lithography Model 4 X‐ray Stepper (abstract) Review of Scientific Instruments. 67: 3358-3358. DOI: 10.1063/1.1147382 |
0.34 |
|
| 1996 |
Singh S, Solak H, Cerrina F. Multilayer roughness and image formation in the Schwarzschild objective Review of Scientific Instruments. 67: 3355-3355. DOI: 10.1063/1.1147374 |
0.325 |
|
| 1996 |
Ocola LE, Fryer D, Nealey P, DePablo J, Cerrina F, Kämmer S. Latent image formation: Nanoscale topography and calorimetric measurements in chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 14: 3974-3979. |
0.304 |
|
| 1995 |
Wells GM, Chen HTH, Wallace JP, Engelstad RL, Cerrina F. Radiation damage-induced changes in silicon nitride membrane mechanical properties Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 13: 3075-3077. DOI: 10.1116/1.588325 |
0.335 |
|
| 1995 |
Resnick DJ, Cummings KD, Dauksher WJ, Johnson WA, Seese PA, Chen HTH, Wells GM, Engelstad R, Cerrina F. Effect of aperturing on radiation damage-induced pattern distortion of x-ray masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 13: 3046-3049. DOI: 10.1116/1.588319 |
0.395 |
|
| 1995 |
Ocola LE, Fryer DS, Reynolds G, Krasnoperova A, Cerrina F. Scanning force microscopy measurements of latent image topography in chemically amplified resists Applied Physics Letters. 717. DOI: 10.1063/1.116602 |
0.4 |
|
| 1995 |
Cerrina F. Limits of patterning in X-ray lithography Materials Research Society Symposium - Proceedings. 380: 173-177. |
0.353 |
|
| 1994 |
Krasnoperova AA, Khan M, Rhyner S, Taylor JW, Zhu Y, Cerrina F. Modeling and simulations of a positive chemically amplified photoresist for x‐ray lithography Journal of Vacuum Science & Technology B. 12: 3900-3904. DOI: 10.1116/1.587571 |
0.582 |
|
| 1994 |
Chen GJ, Guo JZY, Cerrina F. Applications of faceted mirrors to X-ray lithography beamlines Nuclear Inst. and Methods in Physics Research, A. 347: 238-243. DOI: 10.1016/0168-9002(94)91884-8 |
0.329 |
|
| 1994 |
Xiao J, Cerrina F. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline Nuclear Inst. and Methods in Physics Research, A. 347: 231-237. DOI: 10.1016/0168-9002(94)91883-X |
0.315 |
|
| 1993 |
Laudon MF, Laird DL, Engelstad RL, Cerrina F. Mechanical Response Of X-Ray Masks Japanese Journal of Applied Physics. 32: 5928-5932. DOI: 10.1143/Jjap.32.5928 |
0.317 |
|
| 1993 |
Cerrina F, Baszler F, Turner S, Khan M. Transmit: A beamline modelling program Microelectronic Engineering. 21: 103-106. DOI: 10.1016/0167-9317(93)90037-6 |
0.497 |
|
| 1993 |
Cerrina F, Wells GM. Materials and image formation in x-ray lithography Materials Research Society Symposium Proceedings. 306: 19. |
0.318 |
|
| 1993 |
Ocola LE, Cerrina F. Modelling photoelectron effects in x-ray lithography Materials Research Society Symposium Proceedings. 306: 47-56. |
0.314 |
|
| 1992 |
Cerrina F. Recent advances in x-ray lithography Japanese Journal of Applied Physics. 31: 4178-4184. DOI: 10.1143/JJAP.31.4178 |
0.315 |
|
| 1992 |
Wells GM, Taylor JW, Cerrina F, Pearson D, MacKay J. Measurement of x‐ray absorption spectra of photoresists using a silicon lithium detector Journal of Vacuum Science & Technology B. 10: 3252-3255. DOI: 10.1116/1.585924 |
0.335 |
|
| 1992 |
Wells GM, Krasnoperova A, Haytcher EA, Engelstad R, Cerrina F, Fair R, Maldonado J. Novel approach to zero-magnification x-ray mask replication Journal of Vacuum Science & Technology B. 10: 3221-3223. DOI: 10.1116/1.585917 |
0.357 |
|
| 1992 |
Welnak C, Anderson P, Khan M, Singh S, Cerrina F. Recent developments in SHADOW Review of Scientific Instruments. 63: 865-868. DOI: 10.1063/1.1142630 |
0.578 |
|
| 1992 |
Cerrina F, Guo JZY, Turner S, Ocola L, Khan M, Anderson P. Image formation in x-ray lithography: Process optimization Microelectronic Engineering. 17: 135-139. DOI: 10.1016/0167-9317(92)90027-O |
0.596 |
|
| 1991 |
White V, Ocola L, Cerrina F, Vladimirsky Y, Maldonado J. Photoelectron effects in x-ray mask replication Journal of Vacuum Science & Technology B. 9: 3270-3274. DOI: 10.1116/1.585302 |
0.389 |
|
| 1991 |
Wells GM, Nachman R, Welnak C, Singh S, Guo J, Khan M, Turner S, Cerrina F, Vladimirsky Y, Maldonado J. Effects of mirror surface roughness on exposure field uniformity in synchrotron x‐ray lithography Journal of Vacuum Science & Technology B. 9: 3227-3231. DOI: 10.1116/1.585292 |
0.614 |
|
| 1991 |
Cole RK, Cerrina F. Novel beamline optics for x-ray lithography Microelectronic Engineering. 13: 295-298. DOI: 10.1016/0167-9317(91)90097-W |
0.322 |
|
| 1990 |
Vladimirsky Y, Maldonado JR, Vladimirsky O, Cerrina F, Hansen M, Nachman R, Wells GM. Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation Microelectronic Engineering. 11: 287-293. DOI: 10.1016/0167-9317(90)90117-C |
0.309 |
|
| 1988 |
Cerrina F, Margaritondo G, Underwood JH, Hettrick M, Green MA, Brillson LJ, Franciosi A, Höchst H, Deluca PM, Gould MN. Maximum: A scanning photoelectron microscope at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 303-307. DOI: 10.1016/0168-9002(88)90401-9 |
0.339 |
|
| 1988 |
Wells GM, Lai B, So D, Redaelli R, Cerrina F. X-ray lithography beamlines at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 278-286. DOI: 10.1016/0168-9002(88)90397-X |
0.308 |
|
| 1987 |
So D, Lai B, Cerrina F. A model for optimal deamline design for synchrotron radiation X-ray lithography Proceedings of Spie - the International Society For Optical Engineering. 773: 30-36. DOI: 10.1117/12.940350 |
0.342 |
|
| 1985 |
Cerrina F. X-RAY IMAGING WITH SYNCHROTRON RADIATION American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 26: 361-362. |
0.326 |
|
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