David E. Noga, Ph.D. - Publications

Affiliations: 
2008 Georgia Institute of Technology, Atlanta, GA 
Area:
Polymer Chemistry, Organic Chemistry, Biochemistry

14 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2010 Yeh WM, Noga DE, Lawson RA, Tolbert LM, Henderson CL. Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.862009  0.32
2010 Noga DE, Yeh WM, Lawson RA, Tolbert LM, Henderson CL. The use of surface modifiers to mitigate pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.862008  0.32
2010 Noga DE, Yeh WM, Lawson RA, Tolbert LM, Henderson CL. Methods to explore and prevent pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848423  0.32
2010 Lawson RA, Noga DE, Cheng J, Tolbert LM, Henderson CL. Non-traditional resist designs using molecular resists: Positive tone cross-linked and non-chemically amplified molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848419  0.32
2010 Lawson RA, Cheng J, Noga DE, Younkin TR, Tolbert LM, Henderson CL. Aqueous and solvent developed negative-tone molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848414  0.32
2010 Yeh WM, Noga DE, Lawson RA, Tolbert LM, Henderson CL. Comparison of positive tone versus negative tone resist pattern collapse behavior Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28. DOI: 10.1116/1.3518136  0.32
2009 Noga DE, Lawson RA, Lee CT, Tolbert LM, Henderson CL. Understanding pattern collapse in high-resolution lithography: Impact of feature width on critical stress Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.829142  0.32
2009 Lawson RA, Noga DE, Tolbert LM, Henderson CL. Non-ionic PAG behavior under high energy exposure sources Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814459  0.32
2009 Lawson RA, Noga DE, Tolbert LM, Henderson CL. Nonionic photoacid generator behavior under high-energy exposure sources Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3259205  0.32
2009 Lawson RA, Noga DE, Younkin TR, Tolbert LM, Henderson CL. Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2998-3003. DOI: 10.1116/1.3264672  0.32
2008 Noga DE, Petrie TA, Kumar A, Weck M, García AJ, Collard DM. Synthesis and modification of functional poly(lactide) copolymers: toward biofunctional materials. Biomacromolecules. 9: 2056-62. PMID 18576683 DOI: 10.1021/bm800292z  0.32
2008 Wang Y, Noga DE, Yoon K, Wojtowicz AM, Lin ASP, García AJ, Collard DM, Weck M. Highly porous crosslinkable PLA-PNB block copolymer scaffolds Advanced Functional Materials. 18: 3638-3644. DOI: 10.1002/adfm.200800385  0.32
2008 Noga DE, Petrie TA, Weck M, García A, Collard DM. Functional poly(lactide) synthesis for use in biomedical applications American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 49: 844.  0.32
2006 Gerhardt WW, Noga DE, Hardcastle KI, García AJ, Collard DM, Weck M. Functional lactide monomers: methodology and polymerization. Biomacromolecules. 7: 1735-42. PMID 16768392 DOI: 10.1021/bm060024j  0.32
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