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Monika K. Wiedmann, Ph.D. - Publications

Affiliations: 
2009 Chemistry Wayne State University, Detroit, MI, United States 
Area:
Inorganic Chemistry
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9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Wiedmann MK, Jackson DHK, Pagan-Torres YJ, Cho E, Dumesic JA, Kuech TF. Atomic layer deposition of titanium phosphate on silica nanoparticles Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3664097  0.425
2011 Wiedmann MK, Pagan-Torres YJ, Tucker MH, Dumesic JA, Kuech TF. Atomic layer deposition for improved stability of catalysts for the conversion of biomass to chemicals and fuels Materials Research Society Symposium Proceedings. 1366: 1-6. DOI: 10.1557/Opl.2011.1320  0.314
2011 Jha S, Wiedmann MK, Kuan TS, Song X, Babcock SE, Kuech TF. Growth behavior and defect reduction in heteroepitaxial InAs and GaSb on GaAs using block copolymer lithography Journal of Crystal Growth. 315: 91-95. DOI: 10.1016/J.Jcrysgro.2010.07.050  0.503
2011 Jha S, Wiedmann MK, Kuech TF. A comparative precursor study of the growth behavior of InSb using metal-organic vapor phase epitaxy Journal of Crystal Growth. 315: 87-90. DOI: 10.1016/J.Jcrysgro.2010.07.047  0.355
2010 Wiedmann MK, Karunarathne MC, Baird RJ, Winter CH. Growth of tantalum(V) oxide films by atomic layer deposition using the highly thermally stable precursor Ta(NtBu)(iPrNC(Me)NiPr)2(NMe 2) Chemistry of Materials. 22: 4400-4405. DOI: 10.1021/Cm100926R  0.445
2009 Kumar P, Wiedmann MK, Winter CH, Avrutsky I. Optical properties of Al2O3 thin films grown by atomic layer deposition. Applied Optics. 48: 5407-12. PMID 19798382 DOI: 10.1364/Ao.48.005407  0.757
2009 Wiedmann MK, Heeg MJ, Winter CH. Volatility and high thermal stability in tantalum complexes containing imido, amidinate, and halide or dialkylamide ligands. Inorganic Chemistry. 48: 5382-91. PMID 19499956 DOI: 10.1021/Ic900454G  0.585
2009 Kumar P, Wiedmann MK, Winter CH, Avrutsky I. Optical properties of Al<inf>2</inf>O<inf>3</inf> thin films grown by atomic layer deposition Applied Optics. 48: 5407-5412. DOI: 10.1364/AO.48.005407  0.738
2007 Dezelah CL, Wiedmann MK, Mizohata K, Baird RJ, Niinistö L, Winter CH. A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Journal of the American Chemical Society. 129: 12370-1. PMID 17894495 DOI: 10.1021/Ja074043S  0.692
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