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Thomas J. Knisley, Ph.D. - Publications

Affiliations: 
2012 Chemistry Wayne State University, Detroit, MI, United States 
Area:
Inorganic Chemistry, Chemical Engineering, Materials Science Engineering
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5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2021 Cwik S, Woods KN, Perera SS, Saly MJ, Knisley TJ, Winter CH. Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium. Dalton Transactions (Cambridge, England : 2003). 50: 18202-18211. PMID 34860223 DOI: 10.1039/d1dt03454e  0.651
2013 Karunarathne MC, Knisley TJ, Tunstull GS, Heeg MJ, Winter CH. Exceptional thermal stability and high volatility in mid to late first row transition metal complexes containing carbohydrazide ligands Polyhedron. 52: 820-830. DOI: 10.1016/J.Poly.2012.07.034  0.567
2013 Knisley TJ, Kalutarage LC, Winter CH. Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films Coordination Chemistry Reviews. 257: 3222-3231. DOI: 10.1016/J.Ccr.2013.03.019  0.676
2011 Knisley TJ, Saly MJ, Heeg MJ, Roberts JL, Winter CH. Volatility and high thermal stability in mid- to late-first-row transition-metal diazadienyl complexes Organometallics. 30: 5010-5017. DOI: 10.1021/Om200626W  0.718
2011 Knisley TJ, Ariyasena TC, Sajavaara T, Saly MJ, Winter CH. Low temperature growth of high purity, low resistivity copper films by atomic layer deposition Chemistry of Materials. 23: 4417-4419. DOI: 10.1021/Cm202475E  0.748
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