Year |
Citation |
Score |
2014 |
Cummins T, O'Gorman C, Dunne P, Sokell E, O'Sullivan G, Hayden P. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources Applied Physics Letters. 105. DOI: 10.1063/1.4891762 |
0.66 |
|
2013 |
O'Sullivan G, Cummins T, Dunne P, Endo A, Hayden P, Higashiguchi T, Kilbane D, Li B, O'Gorman C, Otsuka T, Sokell E, Yugami N. Recent progress in source development for lithography at 6.x nm Physica Scripta. DOI: 10.1088/0031-8949/2013/T156/014105 |
0.699 |
|
2012 |
Donnelly T, Mazoyer M, Lynch A, O'Sullivan G, O'Reilly F, Dunne P, Cummins T. CO2 laser pulse shortening by laser ablation of a metal target. The Review of Scientific Instruments. 83: 035102. PMID 22462955 DOI: 10.1063/1.3690066 |
0.656 |
|
2012 |
Otsuka T, Li B, O'Gorman C, Cummins T, Kilbane D, Higashiguchi T, Yugami N, Jiang W, Endo A, Dunne P, O'Sullivan G. A 6.7-nm beyond EUV source as a future lithography source Proceedings of Spie. 8322: 832214. DOI: 10.1117/12.916351 |
0.671 |
|
2012 |
Higashiguchi T, Otsuka T, Yugami N, Jiang W, Endo A, Li B, O'Gorman C, Cummins T, Kilbane D, Dunne P, O'Sullivan G. Laser-produced plasma UTA emission in 3-7nm spectral region Proceedings of Spie. 8322. DOI: 10.1117/12.916308 |
0.651 |
|
2012 |
O’Gorman C, Otsuka T, Yugami N, Jiang W, Endo A, Li B, Cummins T, Dunne P, Sokell E, O’Sullivan G, Higashiguchi T. The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm Applied Physics Letters. 100: 141108. DOI: 10.1063/1.3701593 |
0.671 |
|
2012 |
Cummins T, Otsuka T, Yugami N, Jiang W, Endo A, Li B, O’Gorman C, Dunne P, Sokell E, O’Sullivan G, Higashiguchi T. Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma Applied Physics Letters. 100: 061118. DOI: 10.1063/1.3684242 |
0.695 |
|
2011 |
Otsuka T, Kilbane D, Cummins T, O'Gorman C, Dunne P, O'Sullivan G, Jiang W, Endo A, Higashiguchi T, Yugami N. Shorter wavelength EUV source around 6.X nm by rare-earth plasma Proceedings of Spie. 8139. DOI: 10.1117/12.892897 |
0.701 |
|
2011 |
Li B, Endo A, Otsuka T, O'Gorman C, Cummins T, Donnelly T, Kilbane D, Jiang W, Higashiguchi T, Yugami N, Dunne P, O'Sullivan G. Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging Proceedings of Spie - the International Society For Optical Engineering. 8139. DOI: 10.1117/12.892513 |
0.641 |
|
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