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Seth Kruger, Ph.D. - Publications

Affiliations: 
2011 Nanoscale Science and Engineering-Nanoscale Science State University of New York, Albany, Albany, NY, United States 
Area:
Nanotechnology, Nanoscience, Inorganic Chemistry
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16 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Hosoi K, Cardineau B, Kruger S, Miyauchi K, Brainard R. Fluorine-Stabilized acid amplifiers for use in EUV Lithography Journal of Photopolymer Science and Technology. 25: 575-581. DOI: 10.2494/Photopolymer.25.575  0.791
2012 Hosoi K, Cardineau B, Earley W, Kruger S, Miyauchi K, Brainard R. Synthesis of stable acid amplifiers that produce strong, highly fluorinated polymer bound acid Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.917018  0.794
2012 Kruger S, Hosoi K, Cardineau B, Miyauchi K, Brainard R. Stable, fluorinated acid amplifiers for use in EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.917015  0.79
2011 Kruger S, Higgins C, Gallatin C, Brainard R. Lithography and Chemical Modeling of Acid Amplifiers for Use in EUV Photoresists Journal of Photopolymer Science and Technology. 24: 143-152. DOI: 10.2494/Photopolymer.24.143  0.794
2011 Mbanaso C, Kruger S, Higgins C, Khopkar Y, Antohe A, Cardineau B, Denbeaux G. Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879507  0.78
2010 Higgins C, Kruger S, Kamineni V, Matyi R, Georger J, Brainard R. Understanding Ultra-Thin Film Resist and Underlayer Performance through Physical Characterization Journal of Photopolymer Science and Technology. 23: 699-707. DOI: 10.2494/Photopolymer.23.699  0.721
2010 Cardineau B, Kruger S, Earley W, Higgins C, Revuru S, Georger J, Brainard R. Chain-scission polyesters for EUV lithography Journal of Photopolymer Science and Technology. 23: 665-671. DOI: 10.2494/photopolymer.23.665  0.78
2010 Kruger S, Higgins C, Revuru S, Gibbons S, Freedman D, Brainard RL. Can acid amplifiers help beat the resolution, line edge roughness, and sensitivity trade-off? Japanese Journal of Applied Physics. 49: 0416021-0416025. DOI: 10.1143/Jjap.49.041602  0.784
2010 Kruger SA, Higgins C, Cardineau B, Younkin TR, Brainard RL. Catalytic and autocatalytic mechanisms of acid amplifiers for use in EUV photoresists Chemistry of Materials. 22: 5609-5616. DOI: 10.1021/Cm101867G  0.763
2009 Kruger S, Revuru S, Higgins C, Gibbons S, Freedman DA, Yueh W, Younkin TR, Brainard RL. Fluorinated acid amplifiers for EUV lithography. Journal of the American Chemical Society. 131: 9862-3. PMID 19569650 DOI: 10.1021/Ja901448D  0.786
2009 Brainard R, Kruger S, Higgins C, Revuru S, Gibbons S, Freedman D, Yueh W, Younkin T. Kinetics, chemical modeling and lithography of novel acid amplifiers for use in EUV photoresists Journal of Photopolymer Science and Technology. 22: 43-50. DOI: 10.2494/Photopolymer.22.43  0.754
2009 Brainard R, Higgins C, Kruger S, Revuru S, Cardineau B, Gibbons S, Freedman D, Solak H, Yueh W, Younkin T. Lithographie evaluation and chemical modeling of acid amplifiers used in EUV photoresists Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814308  0.781
2009 Higgins C, Antohe A, Denbeaux G, Kruger S, Georger J, Brainard R. RLS tradeoff vs. quantum yield of high PAG EUV resists Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814307  0.771
2008 Kruger S, Revuru S, Zhang SZ, Vaughn DD, Block E, Zimmerman P, Brainard RL. Options for high index fluids for third generation 193i lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772994  0.679
2008 Mbanaso C, Denbeaux G, Dean K, Brainard R, Kruger S, Hassanein E. Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772695  0.636
2007 Brainard RL, Kruger S, Block E. Models for predicting the index of refraction of compounds 193 and 589 nm Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712431  0.635
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