Clifford L. Henderson - Publications

Affiliations: 
Georgia Institute of Technology, Atlanta, GA 
Area:
Chemical Engineering, Polymer Chemistry

176 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Nation BD, Ludovice PJ, Henderson CL. Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers Proceedings of Spie - the International Society For Optical Engineering. 9777. DOI: 10.1117/12.2219255  1
2016 Peters AJ, Lawson RA, Nation BD, Ludovice PJ, Henderson CL. Calculations of the free energy of dislocation defects in lamellae forming diblock copolymers using thermodynamic integration Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.JMM.15.2.023505  1
2016 Peters AJ, Lawson RA, Nation BD, Ludovice PJ, Henderson CL. Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.JMM.15.1.013508  1
2015 Peters AJ, Lawson RA, Nation BD, Ludovice PJ, Henderson CL. Simulation study of the effect of molar mass dispersity on domain interfacial roughness in lamellae forming block copolymers for directed self-assembly. Nanotechnology. 26: 385301. PMID 26335174 DOI: 10.1088/0957-4484/26/38/385301  1
2015 Lawson RA, Henderson CL. Investigating SEM metrology effects using a detailed SEM simulation and stochastic resist model Proceedings of Spie - the International Society For Optical Engineering. 9424. DOI: 10.1117/12.2086051  1
2015 Lawson RA, Peters AJ, Nation BD, Ludovice PJ, Henderson CL. Effect of χn and underlayer composition on self-assembly of thin films of block copolymers with energy asymmetric block Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086047  1
2015 Sharp B, Lawson RA, Fralick A, Narcross H, Chun JS, Neisser M, Tolbert LM, Henderson CL. Base developable negative tone molecular resist based on epoxide cross-linking Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2086039  1
2015 Narcross H, Lawson RA, Sharp B, Chun JS, Neisser M, Tolbert LM, Henderson CL. Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2086027  1
2015 Lawson RA, Narcross H, Sharp B, Chun JS, Neisser M, Tolbert LM, Henderson CL. Optimizing performance in cross-linking negative-tone molecular resists Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2086007  1
2015 Nation BD, Peters A, Lawson RA, Ludovice PJ, Henderson CL. Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2085526  1
2015 Peters AJ, Lawson RA, Nation BD, Ludovice PJ, Henderson CL. Coarse-grained molecular dynamics modeling of the kinetics of lamellar BCP defect annealing Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2085518  1
2015 Peters AJ, Lawson RA, Nation BD, Ludovice PJ, Henderson CL. Free energy difference of pitch variation and calculation of the order-disorder transition in block copolymer systems using thermodynamic integration Materials Research Express. 2. DOI: 10.1088/2053-1591/2/7/075301  1
2014 Peters AJ, Lawson RA, Nation BD, Ludovice PJ, Henderson CL. Understanding defects in DSA: Calculation of free energies of block copolymer DSA systems via thermodynamic integration of a mesoscale block-copolymer model Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046664  1
2014 Nation BD, Peters A, Lawson RA, Ludovice PJ, Henderson CL. Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046629  1
2014 Nation BD, Peters A, Lawson RA, Ludovice PJ, Henderson CL. Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046626  1
2014 Lawson RA, Chun JS, Neisser M, Tolbert LM, Henderson CL. Positive tone cross-linked resists based on photoacid inhibition of cross linking Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046619  1
2014 Lawson RA, Chun JS, Neisser M, Tolbert LM, Henderson CL. Methods of controlling cross-linking in negative-tone resists Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046616  1
2014 Lawson RA, Peters AJ, Nation B, Ludovice PJ, Henderson CL. Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers Journal of Micro/Nanolithography, Mems, and Moems. 13. DOI: 10.1117/1.JMM.13.3.031308  1
2014 Paniagua SA, Baltazar J, Sojoudi H, Mohapatra SK, Zhang S, Henderson CL, Graham S, Barlow S, Marder SR. Production of heavily n- and p-doped CVD graphene with solution-processed redox-active metal-organic species Materials Horizons. 1: 111-115. DOI: 10.1039/c3mh00035d  1
2014 Bhuwania N, Labreche Y, Achoundong CSK, Baltazar J, Burgess SK, Karwa S, Xu L, Henderson CL, Jason Williams P, Koros WJ. Engineering substructure morphology of asymmetric carbon molecular sieve hollow fiber membranes Carbon. 76: 417-434. DOI: 10.1016/j.carbon.2014.05.008  1
2014 Altun-Ciftçioǧlu GA, Ersoy-Meriçboyu A, Henderson CL. Simulation of models for multifunctional photopolymerization kinetics Polymer Engineering and Science. 54: 1737-1746. DOI: 10.1002/pen.23713  1
2014 Baltazar J, Sojoudi H, Paniagua SA, Zhang S, Lawson RA, Marder SR, Graham S, Tolbert LM, Henderson CL. Photochemical doping and tuning of the work function and dirac point in graphene using photoacid and photobase generators Advanced Functional Materials. 24: 5147-5156. DOI: 10.1002/adfm.201303796  1
2014 Lawson RA, Peters A, Ludovice PJ, Henderson CL. Tuning the domain size of block copolymers for directed self-assembly using polymer blending Nanoscale Science and Engineering Forum 2013 - Core Programming Area At the 2013 Aiche Annual Meeting: Global Challenges For Engineering a Sustainable Future. 460.  1
2014 Baltazar J, Sojoudi H, Paniagua S, Lawson RA, Graham S, Tolbert LM, Henderson CL. Photo-chemical tuning of the dirac point in CVD-grown graphene Nanoscale Science and Engineering Forum 2013 - Core Programming Area At the 2013 Aiche Annual Meeting: Global Challenges For Engineering a Sustainable Future. 397.  1
2013 Peters AJ, Lawson RA, Ludovice PJ, Henderson CL. Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2021443  1
2013 Lawson RA, Cheng J, Cheshmehkani A, Tolbert LM, Henderson CL. Positive tone resists based on network depolymerization of molecular resists Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2021141  1
2013 Peters AJ, Lawson RA, Ludovice PJ, Henderson CL. Detailed molecular dynamics studies of block copolymer directed self-assembly: Effect of guiding layer properties Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 31. DOI: 10.1116/1.4821652  1
2012 Sojoudi H, Baltazar J, Tolbert LM, Henderson CL, Graham S. Creating graphene p-n junctions using self-assembled monolayers. Acs Applied Materials & Interfaces. 4: 4781-6. PMID 22909428 DOI: 10.1021/am301138v  1
2012 Yeh WM, Lawson RA, Tolbert LM, Henderson CL. Application of aziridine reactive rinses in a post-development process to reduce photoresist pattern collapse Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.928877  1
2012 Yeh WM, Lawson RA, Tolbert LM, Henderson CL. Resist surface crosslinking using amine-based reactive rinses to mitigate pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.928876  1
2012 Jarnagin ND, Cheng J, Peters A, Yeh WM, Lawson RA, Tolbert LM, Henderson CL. Investigation of high χ block copolymers for directed self-asssembly: Synthesis and characterization of PS-b-PHOST Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.918081  1
2012 Peters AJ, Lawson RA, Ludovice PJ, Henderson CL. Detailed mesoscale dynamic simulation of block copolymer directed self-assembly processes: Application of protracted colored noise dynamics Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.918077  1
2012 Cheng J, Lawson RA, Yeh WM, Jarnagin ND, Peters A, Tolbert LM, Henderson CL. Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.918073  1
2012 Baltazar J, Sojoudi H, Paniagua SA, Kowalik J, Marder SR, Tolbert LM, Graham S, Henderson CL. Facile formation of graphene P-N junctions using self-assembled monolayers Journal of Physical Chemistry C. 116: 19095-19103. DOI: 10.1021/jp3045737  1
2012 Fu B, Baltazar J, Hu Z, Chien AT, Kumar S, Henderson CL, Collard DM, Reichmanis E. High charge carrier mobility, low band gap donor-acceptor benzothiadiazole-oligothiophene based polymeric semiconductors Chemistry of Materials. 24: 4123-4133. DOI: 10.1021/cm3021929  1
2012 Henderson CL. Photoresists and Advanced Patterning Polymer Science: a Comprehensive Reference, 10 Volume Set. 8: 37-76. DOI: 10.1016/B978-0-444-53349-4.00201-6  1
2011 Yeh WM, Lawson RA, Tolbert LM, Henderson CL. The effect of drying rate on pattern collapse performance in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.895114  1
2011 Yeh WM, Lawson RA, Henderson CL. A comprehensive model and method for model parameterization for predicting pattern collapse behavior in photoresist nanostructures Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.895112  1
2011 Yeh WM, Lawson RA, Tolbert LM, Henderson CL. A study of reactive adhesion promoters and their ability to mitigate pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.894705  1
2011 Jing C, Lawson RA, Yeh WM, Tolbert LM, Henderson CL. Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.894702  1
2011 Lawson RA, Ludovice PJ, Henderson CL. Development of realistic potentials for the simulation of directed self-assembly of PS-PMMA di-block copolymers Proceedings of Spie - the International Society For Optical Engineering. 7970. DOI: 10.1117/12.879578  1
2011 Jariwala AS, Ding F, Boddapati A, Breedveld V, Grover MA, Henderson CL, Rosen DW. Modeling effects of oxygen inhibition in mask-based stereolithography Rapid Prototyping Journal. 17: 168-175. DOI: 10.1108/13552541111124734  1
2011 Boddapati A, Rahane SB, Slopek RP, Breedveld V, Henderson CL, Grover MA. Gel time prediction of multifunctional acrylates using a kinetics model Polymer. 52: 866-873. DOI: 10.1016/j.polymer.2010.12.024  1
2011 Altun-Ciftcioglu GA, Ersoy-Meriçboyu A, Henderson CL. Stochastic modeling and simulation of photopolymerization process Polymer Engineering and Science. 51: 1710-1719. DOI: 10.1002/pen.21907  1
2010 Yeh WM, Noga DE, Lawson RA, Tolbert LM, Henderson CL. Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.862009  1
2010 Noga DE, Yeh WM, Lawson RA, Tolbert LM, Henderson CL. The use of surface modifiers to mitigate pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.862008  1
2010 Noga DE, Yeh WM, Lawson RA, Tolbert LM, Henderson CL. Methods to explore and prevent pattern collapse in thin film lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848423  1
2010 Lawson RA, Noga DE, Cheng J, Tolbert LM, Henderson CL. Non-traditional resist designs using molecular resists: Positive tone cross-linked and non-chemically amplified molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848419  1
2010 Lawson RA, Henderson CL. Three-dimensional mesoscale model for the simulation of LER in photoresists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848415  1
2010 Lawson RA, Cheng J, Noga DE, Younkin TR, Tolbert LM, Henderson CL. Aqueous and solvent developed negative-tone molecular resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848414  1
2010 Lawson RA, Henderson CL. Mesoscale kinetic Monte Carlo simulations of molecular resists: Effects of photoacid homogeneity on resolution, line-edge roughness, and sensitivity Journal of Micro/Nanolithography, Mems, and Moems. 9. DOI: 10.1117/1.3358383  1
2010 Yeh WM, Noga DE, Lawson RA, Tolbert LM, Henderson CL. Comparison of positive tone versus negative tone resist pattern collapse behavior Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28. DOI: 10.1116/1.3518136  1
2010 Lawson RA, Henderson CL. Understanding the relationship between true and measured resist feature critical dimension and line edge roughness using a detailed scanning electron microscopy simulator Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28. DOI: 10.1116/1.3517717  1
2010 Lawson RA, Tolbert LM, Henderson CL. High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28. DOI: 10.1116/1.3511790  1
2010 Chung WJ, Henderson CL, Ludovice PJ. RIS model of the helix-kink conformation of erythro diisotactic polynobornene Macromolecular Theory and Simulations. 19: 421-431. DOI: 10.1002/mats.201000003  1
2010 Lawson RA, Tolbert LM, Henderson CL. Single-component molecular resists containing bound photoacid generator functionality Journal of Micro/Nanolithography, Mems, and Moems. 9.  1
2010 Jariwala AS, Ding F, Boddapati A, Breedveld V, Grover M, Henderson CL, Rosen DW. Modeling effects of oxygen inhibition in mask based stereolithography 21st Annual International Solid Freeform Fabrication Symposium - An Additive Manufacturing Conference, Sff 2010. 513-523.  1
2009 Noga DE, Lawson RA, Lee CT, Tolbert LM, Henderson CL. Understanding pattern collapse in high-resolution lithography: Impact of feature width on critical stress Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.829142  1
2009 Lawson RA, Noga DE, Tolbert LM, Henderson CL. Non-ionic PAG behavior under high energy exposure sources Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814459  1
2009 Lawson RA, Henderson CL. Mesoscale kinetic monte carlo simulations of molecular resists: The effect on PAG homogeneity on resolution, LER, and sensitivity Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814447  1
2009 Lawson RA, Tolbert LM, Henderson CL. Single component molecular resists containing bound photoacid generator functionality Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814426  1
2009 Sundaramoorthi A, Younkin TR, Henderson CL. Elucidating the physiochemical and lithographic behavior of ultraThin photoresist films Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814410  1
2009 Lawson RA, Noga DE, Tolbert LM, Henderson CL. Nonionic photoacid generator behavior under high-energy exposure sources Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3259205  1
2009 Lawson RA, Noga DE, Younkin TR, Tolbert LM, Henderson CL. Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2998-3003. DOI: 10.1116/1.3264672  1
2009 Lawson RA, Yeh WM, Henderson CL. Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3004-3009. DOI: 10.1116/1.3250264  1
2009 Wang D, Kim S, Underwood WD, Giordano AJ, Henderson CL, Dai Z, King WP, Marder SR, Riedo E. Direct writing and characterization of poly(p -phenylene vinylene) nanostructures Applied Physics Letters. 95. DOI: 10.1063/1.3271178  1
2009 Gonsalves KE, Wang M, Lee CT, Yueh W, Tapia-Tapia M, Batina N, Henderson CL. Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography Journal of Materials Chemistry. 19: 2797-2802. DOI: 10.1039/b818612j  1
2009 Lawson RA, Henderson CL. Mesoscale simulation of molecular resists: The effect of PAG distribution homogeneity on LER Microelectronic Engineering. 86: 741-744. DOI: 10.1016/j.mee.2008.12.042  1
2009 Lawson RA, Lee CT, Tolbert LM, Younkin TR, Henderson CL. High resolution negative tone molecular resist based on di-functional epoxide polymerization Microelectronic Engineering. 86: 734-737. DOI: 10.1016/j.mee.2008.11.097  1
2009 Lawson RA, Lee CT, Tolbert LM, Henderson CL. Effect of acid anion on the behavior of single component molecular resists incorporating ionic photoacid generators Microelectronic Engineering. 86: 738-740. DOI: 10.1016/j.mee.2008.11.043  1
2008 Wang M, Lee CT, Henderson CL, Gonsalves KE. Fullerene grafted photoacid generator(PAG) bound polymer resists Journal of Photopolymer Science and Technology. 21: 747-751. DOI: 10.2494/photopolymer.21.747  1
2008 Lee CT, Wang M, Gonsalves KE, Yueh W, Roberts JM, Younkin TR, Henderson CL. Effect of PAG and matrix structure on PAG acid generation behavior under UV and high-energy radiation exposure Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.782634  1
2008 Lawson RA, Lee CT, Yueh W, Tolbert L, Henderson CL. Mesoscale simulation of molecular glass photoresists: Effect of PAG loading and acid diffusion coefficient Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.774619  1
2008 Lawson RA, Lee CT, Yueh W, Tolbert L, Henderson CL. Single molecule chemically amplified resists based on ionic and non-ionic PAGs Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773570  1
2008 Lee CT, Yueh W, Roberts JM, Younkin TR, Henderson CL. A new technique for studying photoacid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773393  1
2008 Lawson RA, Lee CT, Yueh W, Tolbert L, Henderson CL. Water developable negative tone single molecule resists: High sensitivity non-chemically amplified resists Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773188  1
2008 Wang M, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.769004  1
2008 Lee CT, Lawson RA, Henderson CL. Understanding the effects of photoacid distribution homogeneity and diffusivity on critical dimension control and line edge roughness in chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 2276-2280. DOI: 10.1116/1.2976601  1
2008 Wang M, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning Journal of Materials Chemistry. 18: 2704-2708. DOI: 10.1039/b801517a  1
2008 Hua Y, King WP, Henderson CL. Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography Microelectronic Engineering. 85: 934-936. DOI: 10.1016/j.mee.2008.01.105  1
2008 Lawson RA, Lee CT, Yueh W, Tolbert L, Henderson CL. Epoxide functionalized molecular resists for high resolution electron-beam lithography Microelectronic Engineering. 85: 959-962. DOI: 10.1016/j.mee.2008.01.080  1
2008 Lee CT, Henderson CL, Wang M, Gonsalves KE, Yueh W, Roberts JM. The effect of direct PAG incorporation into the polymer main chain on reactive ion etch resistance of 193 nm and EUV chemically amplified resists Microelectronic Engineering. 85: 963-965. DOI: 10.1016/j.mee.2008.01.009  1
2008 Lawson R, Henderson CL, Tolbert LM. Single molecule chemically amplified photoresists for nanolithography Aiche Annual Meeting, Conference Proceedings 1
2008 Lawson R, Ludovice PJ, Henderson CL. Diffusion, mass uptake, and free volume behavior of polymer thin and ultra-thin films Aiche Annual Meeting, Conference Proceedings 1
2007 Lee CT, Yueh W, Roberts J, Henderson CL. A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films Electrochemical and Solid-State Letters. 10: 273-277. DOI: 10.1149/1.2751835  1
2007 Sinha A, Henderson CL, Hess DW. Area selective atomic layer deposition of titanium dioxide Ecs Transactions. 3: 233-241. DOI: 10.1149/1.2721492  1
2007 Hua Y, Saxena S, Lee JC, King WP, Henderson CL. Direct three dimensional nanoscale thermal lithography at high speeds using heated atomic force microscope cantilevers Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.713374  1
2007 Lee CT, Wang M, Jarnagin ND, Gonsalves KE, Roberts JM, Yueh W, Henderson CL. Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.713369  1
2007 Romeo M, Yamanaka K, Maeda K, Henderson CL. Novel photodefinable low-k dielectric polymers based on polybenzoxazines Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.713011  1
2007 Lawson RA, Lee CT, Whetsell R, Yueh W, Roberts J, Tolbert L, Henderson CL. Molecular glass photoresists containing photoacid generator functionality: A route to a single molecule photoresist Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712928  1
2007 Sinha A, Hess DW, Henderson CL. A novel top surface imaging approach utilizing direct area selective atomic layer deposition of hard masks Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712458  1
2007 Wang M, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Novel anionic photoacid generator (PAGs) and photoresist for sub-50 nm patterning by EUVL and EBL Proceedings of Spie - the International Society For Optical Engineering. 6519. DOI: 10.1117/12.712143  1
2007 Hua Y, Saxena S, Henderson CL, King WP. Nanoscale thermal lithography by local polymer decomposition using a heated atomic force microscope cantilever tip Journal of Micro/Nanolithography, Mems, and Moems. 6. DOI: 10.1117/1.2743374  1
2007 Lawson RA, Lee CT, Henderson CL, Whetsell R, Tolbert L, Yueh W. Influence of solubility switching mechanism on resist performance in molecular glass resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2140-2144. DOI: 10.1116/1.2801885  1
2007 Lee CT, Henderson CL, Wang M, Gonsalves KE, Yueh W. Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2136-2139. DOI: 10.1116/1.2801868  1
2007 Sinha A, Hess DW, Henderson CL. Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1721-1728. DOI: 10.1116/1.2782546  1
2006 Lillie JJ, Thomas MA, Jokerst NM, Ralph SE, Dennis KA, Henderson CL. Multimode interferometric sensors on silicon optimized for fully integrated complementary-metal-oxide-semiconductor chemical-biological sensor systems Journal of the Optical Society of America B: Optical Physics. 23: 642-651. DOI: 10.1364/JOSAB.23.000642  1
2006 Yueming H, Henderson CL. Photodefinable thermally sacrificial polycarbonate materials and methods for MEMS and microfluidic device fabrication Ecs Transactions. 3: 389-397. DOI: 10.1149/1.2357278  1
2006 Romeo M, Guoan W, Papapolymerou J, Henderson CL. MEMS capacitive switch fabrication using photodefinable metal oxide dielectrics Ecs Transactions. 3: 367-374. DOI: 10.1149/1.2357276  1
2006 Sinha A, Hess DW, Henderson CL. A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films Electrochemical and Solid-State Letters. 9. DOI: 10.1149/1.2335939  1
2006 Sinha A, Hess DW, Henderson CL. Area-selective ALD of titanium dioxide using lithographically defined poly(methyl methacrylate) films Journal of the Electrochemical Society. 153. DOI: 10.1149/1.2184068  1
2006 Lee CT, Jamagin ND, Wang M, Gonsalves KE, Roberts JM, Yueh W, Henderson CL. Fundamental studies of the properties of photoresists based on resins containing polymer-bound photoacid generators Proceedings of Spie - the International Society For Optical Engineering. 6153. DOI: 10.1117/12.663410  1
2006 Hua Y, Saxena S, King WP, Henderson CL. Nanolithography in thermally sacrificial polymers using nanoscale thermal probes Proceedings of Spie - the International Society For Optical Engineering. 6153. DOI: 10.1117/12.661803  1
2006 Yamanaka K, Romeo M, Maeda K, Henderson CL. Novel low-dielectric constant photodefinable polyimides for low-temperature polymer processing Proceedings of Spie - the International Society For Optical Engineering. 6153. DOI: 10.1117/12.655600  1
2006 Sinha A, Hess DW, Henderson CL. Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2523-2532. DOI: 10.1116/1.2359728  1
2006 Wang M, Jarnagin ND, Lee CT, Henderson CL, Yueh W, Roberts JM, Gonsalves KE. Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography Journal of Materials Chemistry. 16: 3701-3707. DOI: 10.1039/b607918k  1
2006 Slopek RP, McKinley HK, Henderson CL, Breedveld V. In situ monitoring of mechanical properties during photopolymerization with particle tracking microrheology Polymer. 47: 2263-2268. DOI: 10.1016/j.polymer.2006.01.095  1
2006 White CE, Balogun A, Henderson CL. Effects of the photoacid generator type on the imaging and thermal decomposition properties of photodefinable, thermally sacrificial poly(propylene carbonate) materials Journal of Applied Polymer Science. 102: 266-271. DOI: 10.1002/app.23724  1
2006 Yamanaka K, Romeo M, Narizuka S, Maeda K, Henderson CL. Preparation and properties of novel fluoro-containing aromatic polymers Polymer Preprints, Japan. 55: 2539-2540.  1
2006 Wang M, Lee CT, Henderson CL, Yuen W, Roberts JM, Gonsalves KE. Novel anionic photoacid generators (PAGs) and photoresists for sub 50 nm patterning by EUVL and EBL Materials Research Society Symposium Proceedings. 961: 1-7.  1
2006 Yueh W, Roberts JM, Wang M, Gonsalves KE, Lee CT, Henderson CL. Current novel materials for EUV photoresists Semiconductor Technology, Istc2007 - Proceedings of the 6th International Conference On Semiconductor Technology. 715-721.  1
2006 Cannon AH, Henderson CL, Hua Y, King WP. Self-assembly for three dimensional integration of functional electrical components Proceedings of the Asme/Pacific Rim Technical Conference and Exhibition On Integration and Packaging of Mems, Nems, and Electronic Systems: Advances in Electronic Packaging 2005. 1943-1948.  1
2005 Berger C, Henderson CL. Effect of film composition on the performance of interdigitated electrode methods used for chemically amplified photoresist characterization: Methods for analyzing photoresist materials containing base quencher Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 1076-1087. DOI: 10.1117/12.607437  1
2005 Singh L, Henderson CL, Ludovice PJ. Characterization of property variation in ultra-thin polymer films from molecular simulation Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 1202-1211. DOI: 10.1117/12.607435  1
2005 Hoskins T, Roman PJ, Ludovice PJ, Henderson CL. Equilibrium water uptake and diffusion behavior in model polynorbornene photoresist polymers Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 851-861. DOI: 10.1117/12.607434  1
2005 Singh L, Ludovice PJ, Henderson CL. The effect of film thickness on the dissolution rate and hydrogen bonding behavior of photoresist polymer thin films Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 319-328. DOI: 10.1117/12.600100  1
2005 Sinha A, Hess DW, Henderson CL. Area selective atomic layer deposition: Use of lithographically defined polymer masking layers for the deposition of titanium dioxide Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 476-486. DOI: 10.1117/12.598856  1
2005 Gonsalves KE, Thiyagarajan M, Dean K, Santiago P, Rendón L, Jeyakumar A, Henderson CL. Material design and evaluation of nanocomposite resist for next generation lithography Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 467-475. DOI: 10.1117/12.597308  1
2005 Kim DD, Thomas MA, Lillie JJ, Dennis KS, Comeau BM, Brooke MA, Jokerst NM, Ralph SE, Henderson CL. Integrated mixed-signal optoelectronic system-on-a-chip sensor Proceedings - Ieee International Symposium On Circuits and Systems. 1738-1741. DOI: 10.1109/ISCAS.2005.1464943  1
2005 Cannon AH, Hua Y, Henderson CL, King WP. Self-assembly for three-dimensional integration of functional electrical components Journal of Micromechanics and Microengineering. 15: 2172-2178. DOI: 10.1088/0960-1317/15/11/025  1
2005 Lee CT, Henderson CL. Photoacid diffusion in photoresist polymer thin films: Approaches for measurement and control of thin film acid diffusion Aiche Annual Meeting, Conference Proceedings. 4435.  1
2005 Henderson CL, Comeau B, Katz B. Material and process approaches to the fabrication of hierarchically structured tissue engineering Scaffolds Aiche Annual Meeting, Conference Proceedings. 4421.  1
2005 Henderson CL, Comeau B, Katz B. Protein adsorption behavior and control on photopolymerized scaffold materials for tissue engineering Aiche Annual Meeting, Conference Proceedings. 1313.  1
2005 Henderson CL, Hess DW, Sinha A. Area selective atomic layer deposition using photodefinable polymer masks Aiche Annual Meeting, Conference Proceedings. 5166.  1
2005 Henderson CL, Ludovice P, Singh L, Ordaz I. The diffusion behavior of polymer ultrathin films: Fundamental insights and molecular weight effects Aiche Annual Meeting, Conference Proceedings. 4976.  1
2005 Henderson CL, King WP, Hua Y, Saxena S. Materials and processes and high resolution patterning using thermal cantilever array lithography Aiche Annual Meeting, Conference Proceedings. 5015.  1
2005 Ordaz I, Singh L, Ludovice PJ, Henderson CL. Small molecule diffusion in polymer ultra-thin films Materials Research Society Symposium Proceedings. 899: 52-57.  1
2005 Comeau BM, Umar Y, Gonsalves KE, Henderson CL. New materials and methods for hierarchically structured tissue scaffolds Materials Research Society Symposium Proceedings. 845: 105-110.  1
2005 Romeo M, Finger I, Jeyakumar A, Wang G, Papapolymerou J, Henderson CL. Photodefinable metal oxide dielectrics II: Direct fabrication of patterned high-k dielectrics for low cost RF capacitive MEMS switches Materials Research Society Symposium Proceedings. 833: 217-222.  1
2004 Barstow SJ, Jeyakumar A, Roman PJ, Henderson CL. Direct photopatterning of metal oxide structures using photosensitive metallorganics Journal of the Electrochemical Society. 151. DOI: 10.1149/1.1792648  1
2004 Berger CM, Byers JD, Henderson CL. Using Interdigitated Electrodes for Measuring Photoacid Generator Kinetics in Chemically Amplified Resists Journal of the Electrochemical Society. 151: G119-G130. DOI: 10.1149/1.1638387  1
2004 White CE, Anderson T, Henderson CL, Rowland HD, King WP. Microsystems manufacturing via embossing of photodefinable thermally sacrificial materials Proceedings of Spie - the International Society For Optical Engineering. 5374: 361-370. DOI: 10.1117/12.536277  1
2004 Hoskins T, Berger CM, Ludovice PJ, Henderson CL, Seger LD, Chang C, Rhodes LF. Effect of photoacid generator additives on the dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornene Proceedings of Spie - the International Society For Optical Engineering. 5376: 1053-1063. DOI: 10.1117/12.536264  1
2004 Jeyakumar A, Henderson CL. Enhancing the electron beam sensitivity of hydrogen silsesquioxane (HSQ) Proceedings of Spie - the International Society For Optical Engineering. 5376: 490-501. DOI: 10.1117/12.536245  1
2004 Berger CM, Henderson CL. Chemically amplified photoresist characterization using interdigitated electrodes: An improved method for determining the Dill C parameter Proceedings of Spie - the International Society For Optical Engineering. 5376: 995-1006. DOI: 10.1117/12.536243  1
2004 Berger CM, Henderson CL. Improved chemically amplified photoresist characterization using interdigitated electrode sensors: Photoacid diffusivity measurements Proceedings of Spie - the International Society For Optical Engineering. 5376: 392-403. DOI: 10.1117/12.536218  1
2004 Singh L, Ludovice PJ, Henderson CL. Effect of film thickness on the dissolution rate behavior of photoresist polymer thin films Proceedings of Spie - the International Society For Optical Engineering. 5376: 1007-1016. DOI: 10.1117/12.536205  1
2004 Singh L, Ludovice PJ, Henderson CL. Effect of nanoscale confinement on the diffusion behavior of photoresist polymer thin films Proceedings of Spie - the International Society For Optical Engineering. 5376: 369-378. DOI: 10.1117/12.535333  1
2004 White CE, Henderson CL. Photosensitive co-polycarbonates for use as sacrificial materials in the fabrication of microfluidic and microelectromechanical devices Proceedings of Spie - the International Society For Optical Engineering. 5376: 850-860. DOI: 10.1117/12.534332  1
2004 McCoy K, Hess DW, Henderson CL, Tolbert LM. Patterning via surface monolayer initiated polymerization: A study of surface initiator photoreaction kinetics Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3503-3508. DOI: 10.1116/1.1824061  1
2004 Hoskins T, Chung WJ, Agrawal A, Ludovice PJ, Henderson CL, Seger LD, Rhodes LF, Shick RA. Bis(trifluoromethyl)carbinol-substituted polynorbornenes: Dissolution behavior Macromolecules. 37: 4512-4518. DOI: 10.1021/ma0347417  1
2004 Singh L, Ludovice PJ, Henderson CL. Influence of molecular weight and film thickness on the glass transition temperature and coefficient of thermal expansion of supported ultrathin polymer films Thin Solid Films. 449: 231-241. DOI: 10.1016/S0040-6090(03)01353-1  1
2004 Henderson CL, King WP, White CE, Rowland HR. Microsystems manufacturing via embossing of thermally sacrificial polymers Materials Research Society Symposium Proceedings. 17-20.  1
2004 Berger CM, Henderson CL. Improved method for measuring photoacid generator kinetics in polymer thin films using normalized interdigitated electrode capacitance data Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 1163-1173.  1
2004 Thomas MA, Lillie J, Kim DI, Ralph S, Jokerst NM, Brooke M, Dennis K, Comeau B, Henderson CL. An interferometric sensor for integration with Si CMOS signal processing circuitry: "Sensor on a Chip", Osa Trends in Optics and Photonics Series. 96: 579-580.  1
2003 Wu X, Reed HA, Wang Y, Rhodes LF, Elce E, Ravikiran R, Shick RA, Henderson CL, Bidstrup Allen SA, Kohl PA. Fabrication of Microchannels Using Polynorbornene Photosensitive Sacrificial Materials Journal of the Electrochemical Society. 150. DOI: 10.1149/1.1596955  1
2003 Hoskins T, Chung WJ, Ludovice PJ, Henderson CL, Seger LD, Rhodes LF, Shick RA. Dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornenes Proceedings of Spie - the International Society For Optical Engineering. 5039: 600-611. DOI: 10.1117/12.485145  1
2003 Agrawal A, Henderson CL. Investigation of surface inhibition and its effect on the lithographic performance of polysulfone-novolac electron beam resists Proceedings of Spie - the International Society For Optical Engineering. 5039: 1019-1030. DOI: 10.1117/12.485137  1
2003 Singh L, Ludovice PJ, Henderson CL. Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films Proceedings of Spie - the International Society For Optical Engineering. 5039: 1008-1018. DOI: 10.1117/12.485134  1
2003 Jeyakumar A, Henderson CL, Roman PJ, Suh S. Hybrid bilayer imaging approach using single component metal-organic precursors for high-resolution electron beam lithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 502-512. DOI: 10.1117/12.485133  1
2003 Jeyakumar A, Henderson CL. A comparative study between organic and inorganic resists in electron beam lithography using Monte Carlo simulations Proceedings of Spie - the International Society For Optical Engineering. 5039: 1192-1203. DOI: 10.1117/12.485129  1
2003 Berger CM, Henderson CL. Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques Proceedings of Spie - the International Society For Optical Engineering. 5039: 322-333. DOI: 10.1117/12.485081  1
2003 Berger CM, Henderson CL. Equilibrium sorption and rate of diffusion of water into photoresist thin films Proceedings of Spie - the International Society For Optical Engineering. 5039: 984-995. DOI: 10.1117/12.485079  1
2003 Agrawal A, Henderson CL. Monitoring the dissolution rate of photoresist thin films via multiwavelength interferometry Proceedings of Spie - the International Society For Optical Engineering. 5038: 1026-1037. DOI: 10.1117/12.485006  1
2003 Ali MA, Gonsalves KE, Agrawal A, Jeyakumar A, Henderson CL. Nanocomposite resist for low voltage electron beam lithography (LVEBL) Proceedings of Spie - the International Society For Optical Engineering. 5039: 442-452. DOI: 10.1117/12.483740  1
2003 Jayachandran JP, Reed HA, Zhen H, Rhodes LF, Henderson CL, Bidstrup SA, Kohl PA. Air-channel fabrication for microelectromechanical systems via sacrificial photosensitive polycarbonates Journal of Microelectromechanical Systems. 12: 147-159. DOI: 10.1109/JMEMS.2003.809963  1
2003 Ali MA, Gonsalves KE, Agrawal A, Jeyakumar A, Henderson CL. A new nanocomposite resist for low and high voltage electron beam lithography Microelectronic Engineering. 70: 19-29. DOI: 10.1016/S0167-9317(03)00363-0  1
2003 Berger CM, Henderson CL. The effect of humidity on water sorption in photoresist polymer thin films Polymer. 44: 2101-2108. DOI: 10.1016/S0032-3861(03)00079-X  1
2003 Liu T, Henderson CL, Samuels R. Quantitative characterization of the optical properties of absorbing polymer films: Comparative investigation of the internal reflection intensity analysis method Journal of Polymer Science, Part B: Polymer Physics. 41: 842-855. DOI: 10.1002/polb.10438  1
2003 Wu X, Reed HA, Rhodes LF, Elce E, Ravikiran R, Shick RA, Henderson CL, Bidstrup Allen SA, Kohl PA. Photoinitiation systems and thermal decomposition of photodefinable sacrificial materials Journal of Applied Polymer Science. 88: 1186-1195. DOI: 10.1002/app.11774  1
2003 Singh L, Ludovice PJ, Henderson CL. Effect of thin film confinement on the transport properties of ultra-thin polymer films Materials Research Society Symposium - Proceedings. 790: 203-208.  1
2003 Wang G, Jeyakumar A, Papapolymerou J, Henderson CL. Photodefinable metal oxide dielectrics: A novel method for fabricating low cost RF capacitive MEMS switches Materials Research Society Symposium - Proceedings. 783: 91-96.  1
2003 Mukherjee SP, Roman PJ, Madsen HO, Svendsen LG, Fury MA, Barstow SJ, Jeykumar A, Henderson CL. High dielectric constant metal oxide films via Photochemical Metal Organic Deposition (PMOD™) process Proceedings - Electrochemical Society. 28: 263-275.  1
2003 White CE, Henderson CL. Development of improved photosensitive polycarbonate systems for the fabrication of microfluidic devices Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2926-2930.  1
2003 Jeyakumar A, Henderson CL, Roman P, Suh S. Electron beam lithography process using radiation sensitive carboxylate metalorganic precursors Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 3157-3161.  1
2002 Wu X, Reed HA, Rhodes LF, Elce E, Ravikiran R, Shick RA, Henderson CL, Allen SAB, Kohl PA. Lithographic characteristics and thermal processing of photosensitive sacrificial materials Journal of the Electrochemical Society. 149. DOI: 10.1149/1.1503839  1
2002 Agrawal A, Henderson CL. A polysulfone-novolac resist for electron beam lithography - Part II: Effects of resist formulation and processing Proceedings of Spie - the International Society For Optical Engineering. 4690: 453-464. DOI: 10.1117/12.474244  1
2002 White CE, Henderson CL. Synthesis and characterization of photodefinable polycarbonates for use as sacrificial materials in the fabrication of microfluidic devices Proceedings of Spie - the International Society For Optical Engineering. 4690: 242-253. DOI: 10.1117/12.474222  1
2002 Agrawal A, Henderson CL. A polysulfone-novolac resist for electron beam lithography- Part I: Fundamental studies of resist properties Proceedings of Spie - the International Society For Optical Engineering. 4690: 1138-1149. DOI: 10.1117/12.474191  1
2002 Jeyakumar A, Barstow SJ, Henderson CL. A novel bilayer resist approach using radiation sensitive organometalics precursors Proceedings of Spie - the International Society For Optical Engineering. 4690: 1034-1042. DOI: 10.1117/12.474179  1
2002 McCoy K, Gumieny C, Hess DW, Tolbert LM, Henderson CL. Novel surface imaging method using surface monolayer initiated polymerization Proceedings of Spie - the International Society For Optical Engineering. 4690: 1025-1033. DOI: 10.1117/12.474178  1
2002 Barstow SJ, Jeyakumar A, Henderson CL. Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films Proceedings of Spie - the International Society For Optical Engineering. 4688: 421-430. DOI: 10.1117/12.472317  1
2002 Henderson CL, Barstow S, Jeyakumar A, McCoy K, Hess DW, Tolbert LM. Novel approaches to nanopatterning: From surface monolayer initiated polymerization to hybrid organometallic-organic bilayers Materials Research Society Symposium - Proceedings. 705: 3-14.  1
2001 Chen X, Tolbert LM, Henderson CL, Hess DW, Ruhe J. Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2013-2019. DOI: 10.1116/1.1409391  1
2001 Reed HA, White CE, Rao V, Allen SAB, Henderson CL, Kohl PA. Fabrication of microchannels using polycarbonates as sacrificial materials Journal of Micromechanics and Microengineering. 11: 733-737. DOI: 10.1088/0960-1317/11/6/317  1
2001 Erdmann A, Henderson CL, Willson CG. Impact of exposure induced refractive index changes of photoresists on the photolithographic process Journal of Applied Physics. 89: 8163-8168. DOI: 10.1063/1.1359165  1
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