| Year |
Citation |
Score |
| 2022 |
Moisan M, Ganachev IP, Nowakowska H. Concept of power absorbed and lost per electron in surface-wave plasma columns and its contribution to the advanced understanding and modeling of microwave discharges. Physical Review. E. 106: 045202. PMID 36397503 DOI: 10.1103/PhysRevE.106.045202 |
0.343 |
|
| 2020 |
Nowakowska H, Lackowski M, Moisan M. Radiation Losses From a Microwave Surface-Wave Sustained Plasma Source (Surfatron) Ieee Transactions On Plasma Science. 48: 2106-2114. DOI: 10.1109/Tps.2020.2995475 |
0.552 |
|
| 2018 |
Moisan M, Nowakowska H. Contribution of surface-wave (SW) sustained plasma columns to the modeling of RF and microwave discharges with new insight into some of their features. A survey of other types of SW discharges Plasma Sources Science and Technology. 27: 073001. DOI: 10.1088/1361-6595/Aac528 |
0.497 |
|
| 2015 |
Moisan M, Nowakowska H. Achieving an intense enough maintenance electric field in a low-pressure discharge sustained by a microwave field under ambipolar diffusion regime such that periodic parametric instabilities are generated Journal of Physics D: Applied Physics. 48. DOI: 10.1088/0022-3727/48/45/455201 |
0.492 |
|
| 2014 |
Moisan M, Levif P, Séguin J, Barbeau J. Sterilization/disinfection using reduced-pressure plasmas: Some differences between direct exposure of bacterial spores to a discharge and their exposure to a flowing afterglow Journal of Physics D: Applied Physics. 47. DOI: 10.1088/0022-3727/47/28/285404 |
0.402 |
|
| 2014 |
Kilicaslan A, Levasseur O, Roy-Garofano V, Profili J, Moisan M, Côté C, Sarkissian A, Stafford L. Optical emission spectroscopy of microwave-plasmas at atmospheric pressure applied to the growth of organosilicon and organotitanium nanopowders Journal of Applied Physics. 115: 113301. DOI: 10.1063/1.4868899 |
0.323 |
|
| 2014 |
Levif P, Séguin J, Moisan M, Barbeau J. Depyrogenation by the flowing afterglow of a reduced-pressure N 2-O2 discharge (gaseous plasma treatment) Plasma Processes and Polymers. 11: 559-570. DOI: 10.1002/Ppap.201300155 |
0.362 |
|
| 2013 |
Moisan M, Boudam K, Carignan D, Kéroack D, Levif P, Barbeau J, Séguin J, Kutasi K, Elmoualij B, Thellin O, Zorzi W. Sterilization/disinfection of medical devices using plasma: the flowing afterglow of the reduced-pressure N2-O2discharge as the inactivating medium The European Physical Journal Applied Physics. 63: 10001. DOI: 10.1051/Epjap/2013120510 |
0.387 |
|
| 2012 |
Boudreault O, Mattei S, Stafford L, Margot J, Moisan M, Khare R, Donnelly VM. Nonlocal effect of plasma resonances on the electron energy-distribution function in microwave plasma columns. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 86: 015402. PMID 23005484 DOI: 10.1103/Physreve.86.015402 |
0.391 |
|
| 2012 |
Rossi F, Moisan M, Kong M, Laroussi M. Special issue on plasma sterilization and decontamination Plasma Processes and Polymers. 9: 559-560. DOI: 10.1002/Ppap.201200034 |
0.429 |
|
| 2012 |
Elmoualij B, Thellin O, Gofflot S, Heinen E, Levif P, Séguin J, Moisan M, Leduc A, Barbeau J, Zorzi W. Decontamination of prions by the flowing afterglow of a reduced-pressure N 2-O 2 cold-plasma Plasma Processes and Polymers. 9: 612-618. DOI: 10.1002/Ppap.201100194 |
0.363 |
|
| 2011 |
Castanos-Martinez E, Moisan M. Expansion/homogenization of contracted/filamentary microwave discharges at atmospheric pressure Ieee Transactions On Plasma Science. 39: 2192-2193. DOI: 10.1109/TPS.2011.2132150 |
0.422 |
|
| 2011 |
Levif P, Séguin J, Moisan M, Soum-Glaude A, Barbeau J. Packaging materials for plasma sterilization with the flowing afterglow of an N2-O2 discharge: Damage assessment and inactivation efficiency of enclosed bacterial spores Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/40/405201 |
0.418 |
|
| 2011 |
Levif P, Séguin J, Moisan M, Barbeau J. Influence of substrate materials on inactivation of B. atrophaeus endospores in a reduced-pressure argon plasma Plasma Processes and Polymers. 8: 617-630. DOI: 10.1002/Ppap.201000212 |
0.463 |
|
| 2010 |
Mahfoudh A, Moisan M, Séguin J, Barbeau J, Kabouzi Y, Ḱroack D. Inactivation of vegetative and sporulated bacteria by dry gaseous ozone Ozone: Science and Engineering. 32: 180-198. DOI: 10.1080/01919511003791971 |
0.73 |
|
| 2010 |
Castaños-Martínez E, Moisan M. Absorption spectroscopy measurements of resonant and metastable atom densities in atmospheric-pressure discharges using a low-pressure lamp as a spectral-line source and comparison with a collisional-radiative model Spectrochimica Acta - Part B Atomic Spectroscopy. 65: 199-209. DOI: 10.1016/J.Sab.2009.12.003 |
0.466 |
|
| 2009 |
Castãos-Martínez E, Moisan M, Kabouzi Y. Achieving non-contracted and non-filamentary rare-gas tubular discharges at atmospheric pressure Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/1/012003 |
0.802 |
|
| 2009 |
Stafford L, Khare R, Donnelly VM, Margot J, Moisan M. Electron energy distribution functions in low-pressure oxygen plasma columns sustained by propagating surface waves Applied Physics Letters. 94. DOI: 10.1063/1.3072364 |
0.308 |
|
| 2008 |
Pollak J, Moisan M, Kéroack D, Boudam MK. Low-temperature low-damage sterilization based on UV radiation through plasma immersion Journal of Physics D: Applied Physics. 41. DOI: 10.1088/0022-3727/41/13/135212 |
0.486 |
|
| 2008 |
Christova M, Christov L, Castaños-Martinez E, Dimitrijević MS, Moisan M. Using line broadening to determine the electron density in an argon surface-wave discharge at atmospheric pressure Aip Conference Proceedings. 1058: 3-5. DOI: 10.1063/1.3026487 |
0.363 |
|
| 2008 |
Kutasi K, Saoudi B, Pintassilgo CD, Loureiro J, Moisan M. Plasma Process. Polym. 9/2008 Plasma Processes and Polymers. 5: NA-NA. DOI: 10.1002/Ppap.200890015 |
0.347 |
|
| 2008 |
Kutasi K, Saoudi B, Pintassilgo CD, Loureiro J, Moisan M. Modelling the low-pressure N2-O2 plasma afterglow to determine the kinetic mechanisms controlling the UV emission intensity and its spatial distribution for achieving an efficient sterilization process Plasma Processes and Polymers. 5: 840-852. DOI: 10.1002/Ppap.200800085 |
0.366 |
|
| 2008 |
Pollak J, Moisan M, Kéroack D, Séguin J, Barbeau J. Plasma Process. Polym. 1/2008 Plasma Processes and Polymers. 5: 1-1. DOI: 10.1002/Ppap.200790019 |
0.347 |
|
| 2008 |
Pollak J, Moisan M, Kéroack D, Séguin J, Barbeau J. Plasma sterilisation within long and narrow bore dielectric tubes contaminated with stacked bacterial spores Plasma Processes and Polymers. 5: 14-25. DOI: 10.1002/Ppap.200700110 |
0.498 |
|
| 2007 |
Kabouzi Y, Graves DB, Castaños-Martínez E, Moisan M. Modeling of atmospheric-pressure plasma columns sustained by surface waves. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 75: 016402. PMID 17358263 DOI: 10.1103/Physreve.75.016402 |
0.825 |
|
| 2007 |
Pollak J, Moisan M, Zakrzewski Z, Pelletier J, Arnal YA, Lacoste A, Lagarde T. Compact waveguide-based power divider feeding independently any number of coaxial lines Ieee Transactions On Microwave Theory and Techniques. 55: 951-957. DOI: 10.1109/Tmtt.2007.895643 |
0.412 |
|
| 2007 |
Pollak J, Moisan M, Zakrzewski Z. Long and uniform plasma columns generated by linear field-applicators based on stripline technology Plasma Sources Science and Technology. 16: 310-323. DOI: 10.1088/0963-0252/16/2/014 |
0.537 |
|
| 2007 |
Fleisch T, Kabouzi Y, Moisan M, Pollak J, Castãos-MartÃnez E, Nowakowska H, Zakrzewski Z. Designing an efficient microwave-plasma source, independent of operating conditions, at atmospheric pressure Plasma Sources Science and Technology. 16: 173-182. DOI: 10.1088/0963-0252/16/1/022 |
0.814 |
|
| 2007 |
Boudam MK, Saoudi B, Moisan M, Ricard A. Characterization of the flowing afterglows of an N2-O 2 reduced-pressure discharge: Setting the operating conditions to achieve a dominant late afterglow and correlating the NOβ UV intensity variation with the N and O atom densities Journal of Physics D: Applied Physics. 40: 1694-1711. DOI: 10.1088/0022-3727/40/6/019 |
0.318 |
|
| 2006 |
Nantel-Valiquette M, Kabouzi Y, Castaños-Martinez E, Makasheva K, Moisan M, Rostaing JC. Reduction of perfluorinated compound emissions using atmospheric pressure microwave plasmas: Mechanisms and energy efficiency Pure and Applied Chemistry. 78: 1173-1185. DOI: 10.1351/Pac200678061173 |
0.8 |
|
| 2006 |
Boudam MK, Moisan M, Saoudi B, Popovici C, Gherardi N, Massines F. Bacterial spore inactivation by atmospheric-pressure plasmas in the presence or absence of UV photons as obtained with the same gas mixture Journal of Physics D: Applied Physics. 39: 3494-3507. DOI: 10.1088/0022-3727/39/16/S07 |
0.466 |
|
| 2006 |
Nowakowska H, Jasiński M, Mizeraczyk J, Zakrzewski Z, Kabouzi Y, Castaños-Martinez E, Moisan M. Surface-wave sustained discharge in neon at atmospheric pressure: Model and experimental verification Czechoslovak Journal of Physics. 56. DOI: 10.1007/S10582-006-0311-3 |
0.812 |
|
| 2005 |
Kabouzi Y, Moisan M. Pulsed microwave discharges sustained at atmospheric pressure: Study of the contraction and filamentation phenomena Ieee Transactions On Plasma Science. 33: 292-293. DOI: 10.1109/TPS.2005.845039 |
0.785 |
|
| 2004 |
Castaños Martinez E, Kabouzi Y, Makasheva K, Moisan M. Modeling of microwave-sustained plasmas at atmospheric pressure with application to discharge contraction. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 70: 066405. PMID 15697512 DOI: 10.1103/PhysRevE.70.066405 |
0.819 |
|
| 2004 |
Christova M, Castaños-Martinez E, Calzada MD, Kabouzi Y, Luque JM, Moisan M. Electron density and gas temperature from line broadening in an argon surface-wave-sustained discharge at atmospheric pressure. Applied Spectroscopy. 58: 1032-7. PMID 15479518 DOI: 10.1366/0003702041959415 |
0.793 |
|
| 2003 |
Nowakowska H, Zakrzewski Z, Moisan M. Propagation of electromagnetic waves along an annular plasma column High Temperature Material Processes. 7: 155-161. DOI: 10.1615/Hightempmatproc.V7.I2.40 |
0.49 |
|
| 2003 |
Kabouzi Y, Moisan M, Rostaing JC, Trassy C, Guérin D, Kéroack D, Zakrzewski Z. Abatement of perfluorinated compounds using microwave plasmas at atmospheric pressure Journal of Applied Physics. 93: 9483-9496. DOI: 10.1063/1.1574595 |
0.796 |
|
| 2002 |
Moisan M, Barbeau J, Crevier MC, Pelletier J, Philip N, Saoudi B. Plasma sterilization. Methods and mechanisms Pure and Applied Chemistry. 74: 349-358. DOI: 10.1351/Pac200274030349 |
0.465 |
|
| 2002 |
Philip N, Saoudi B, Crevier MC, Moisan M, Barbeau J, Pelletier J. The respective roles of UV photons and oxygen atoms in plasma sterilization at reduced gas pressure: The case of N2-O2 mixtures Ieee Transactions On Plasma Science. 30: 1429-1436. DOI: 10.1109/Tps.2002.804203 |
0.384 |
|
| 2002 |
Kabouzi Y, Calzada MD, Moisan M, Tran KC, Trassy C. Radial contraction of microwave-sustained plasma columns at atmospheric pressure Journal of Applied Physics. 91: 1008-1019. DOI: 10.1063/1.1425078 |
0.823 |
|
| 2002 |
Moisan M, Saoudi B, Pelletier J, Barbeau J. Understanding the respective roles of UV photons and radicals in cold plasma sterilization Ieee International Conference On Plasma Science. 254. |
0.388 |
|
| 2002 |
Moisan M, Barbeau J, Pelletier J, Saoudi B. Sterilization in a cold plasma at a pressure much lower than atmospheric Vide: Science, Technique Et Applications. 1: 71-84+9+210. |
0.423 |
|
| 2001 |
Moisan M, Barbeau J, Moreau S, Pelletier J, Tabrizian M, Yahia LH. Low-temperature sterilization using gas plasmas: a review of the experiments and an analysis of the inactivation mechanisms. International Journal of Pharmaceutics. 226: 1-21. PMID 11532565 DOI: 10.1016/S0378-5173(01)00752-9 |
0.346 |
|
| 2001 |
Stańco J, Nowakowska H, Zakrzewski Z, Moisan M. Modeling microwave discharge plasmas at atmospheric pressure: Results and perspectives High Temperature Material Processes. 5: 265-275. DOI: 10.1615/Hightempmatproc.V5.I2.110 |
0.586 |
|
| 2001 |
Moisan M, Zakrzewski Z, Rostaing JC. Waveguide-based single and multiple nozzle plasma torches: The TIAGO concept Plasma Sources Science and Technology. 10: 387-394. DOI: 10.1088/0963-0252/10/3/301 |
0.501 |
|
| 2001 |
Nowakowska H, Zakrzewski Z, Moisan M. Propagation characteristics of electromagnetic waves along a dense plasma filament Journal of Physics D: Applied Physics. 34: 1474-1478. DOI: 10.1088/0022-3727/34/10/307 |
0.497 |
|
| 2001 |
Moisan M, Barbeau J, Pelletier J. La stérilisation par plasma : Méthodes et mécanismes Vide: Science, Technique Et Applications. 1: 15-28. |
0.395 |
|
| 2000 |
Moreau S, Moisan M, Tabrizian M, Barbeau J, Pelletier J, Ricard A, Yahia L. Using the flowing afterglow of a plasma to inactivateBacillus subtilisspores: Influence of the operating conditions Journal of Applied Physics. 88: 1166-1174. DOI: 10.1063/1.373792 |
0.41 |
|
| 2000 |
Fozza AC, Moisan M, Wertheimer MR. Vacuum ultraviolet to visible emission from hydrogen plasma: Effect of excitation frequency Journal of Applied Physics. 88: 20-33. DOI: 10.1063/1.373618 |
0.485 |
|
| 2000 |
Ilias S, Campillo C, Borges CFM, Moisan M. Diamond coatings deposited on tool materials with a 915 MHz scaled up surface-wave-sustained plasma Diamond and Related Materials. 9: 1120-1124. DOI: 10.1016/S0925-9635(99)00255-1 |
0.385 |
|
| 1999 |
Kabouzi Y, Calzada MD, Moisan M, Santiago I, Tran KC, Trassy C. Radial contraction of atmospheric pressure discharges sustained by a surface wave at 915 and 2450 MHz Vide: Science, Technique Et Applications. 197-201. |
0.792 |
|
| 1998 |
Bounasri F, Pelletier J, Moisan M, Chaker M. Surface diffusion model accounting for the temperature dependence of tungsten etching characteristics in a SF6 magnetoplasma Journal of Vacuum Science & Technology B. 16: 1068-1076. DOI: 10.1116/1.590010 |
0.439 |
|
| 1998 |
Mérel P, Tabbal M, Chaker M, Moisan M, Ricard A. Influence of the field frequency on the nitrogen atom yield in the remote plasma of an N2 high frequency discharge Plasma Sources Science and Technology. 7: 550-556. DOI: 10.1088/0963-0252/7/4/012 |
0.374 |
|
| 1998 |
Nowakowska H, Zakrzewski Z, Moisan M, Lubanski M. Propagation characteristics of surface waves sustaining atmospheric pressure discharges: the influence of the discharge processes Journal of Physics D: Applied Physics. 31: 1422-1432. DOI: 10.1088/0022-3727/31/12/005 |
0.556 |
|
| 1998 |
Moisan M, Zakrzewski Z, Etemadi R, Rostaing JC. Multitube surface-wave discharges for increased gas throughput at atmospheric pressure Journal of Applied Physics. 83: 5691-5701. DOI: 10.1063/1.367423 |
0.543 |
|
| 1998 |
Zakrzewski Z, Moisan M. Linear field applicators Journal De Physique. Iv : Jp. 8. DOI: 10.1051/Jp4:1998709 |
0.465 |
|
| 1998 |
Schelz S, Campillo C, Moisan M. Characterization of diamond films deposited with a 915-MHz scaled-up surface-wave-sustained plasma Diamond and Related Materials. 7: 1675-1683. DOI: 10.1016/S0925-9635(98)00243-X |
0.4 |
|
| 1998 |
Tabbal M, Mérel P, Moisa S, Chaker M, Gat E, Ricard A, Moisan M, Gujrathi S. XPS and FTIR analysis of nitrogen incorporation in CNx thin films Surface and Coatings Technology. 98: 1092-1096. DOI: 10.1016/S0257-8972(97)00229-6 |
0.417 |
|
| 1998 |
Bounasri F, Pelletier J, Moisan M, Chaker M. Surface diffusion model accounting for the temperature dependence of tungsten etching characteristics in a SF6 magnetoplasma Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 1068-1076. |
0.328 |
|
| 1997 |
Schelz S, Borges CFM, Martinu L, Moisan M. Chemical vapor deposition of diamond films on hydrofluoric acid etched silicon substrates Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 2743-2749. DOI: 10.1116/1.580938 |
0.362 |
|
| 1996 |
Hubert J, Bordeleau S, Tran KC, Michaud S, Milette B, Sing R, Jalbert J, Boudreau D, Moisan M, Margot J. Atomic spectroscopy with surface wave plasmas. Analytical and Bioanalytical Chemistry. 355: 494-500. PMID 15045307 DOI: 10.1007/S0021663550494 |
0.517 |
|
| 1996 |
Borges CFM, Airoldi VT, Corat EJ, Moisan M, Schelz S, Guay D. Very low‐roughness diamond film deposition using a surface‐wave‐ sustained plasma Journal of Applied Physics. 80: 6013-6020. DOI: 10.1063/1.363600 |
0.357 |
|
| 1996 |
Calzada MD, Moisan M, Gamero A, Sola A. Experimental investigation and characterization of the departure from local thermodynamic equilibrium along a surface-wave-sustained discharge at atmospheric pressure Journal of Applied Physics. 80: 46-55. DOI: 10.1063/1.362748 |
0.607 |
|
| 1996 |
Borges CFM, Schelz S, St.-Onge L, Moisan M, Martinu L. Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors Journal of Applied Physics. 79: 3290-3298. DOI: 10.1063/1.361228 |
0.328 |
|
| 1996 |
Tabbal M, Mérel P, Moisa S, Chaker M, Ricard A, Moisan M. X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge Applied Physics Letters. 69: 1698-1700. DOI: 10.1063/1.118000 |
0.341 |
|
| 1996 |
Arnó J, Bevan JW, Moisan M. Detoxification of trichloroethylene in a low-pressure surface wave plasma reactor Environmental Science and Technology. 30: 2427-2431. DOI: 10.1021/Es950343A |
0.458 |
|
| 1996 |
Gat E, Bounasri F, Chaker M, Ravet MF, Moisan M, Margot J. Temperature effects on tungsten etching Microelectronic Engineering. 30: 337-340. DOI: 10.1016/0167-9317(95)00258-8 |
0.398 |
|
| 1996 |
Borges CFM, St-Onge L, Moisan M, Gicquel A. Influence of process parameters on diamond film CVD in a surface-wave driven microwave plasma reactor Thin Solid Films. 274: 3-17. DOI: 10.1016/0040-6090(95)06967-4 |
0.5 |
|
| 1995 |
Margot J, Moisan M, Fortin M. Power required to maintain an electron in a discharge: Its use as a reference parameter in magnetized high frequency plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 2890-2899. DOI: 10.1116/1.579611 |
0.396 |
|
| 1995 |
Sauve G, Zakrzewski Z, Bishop CA, Moisan M. Sustaining Long Linear Uniform Plasmas with Microwaves Using a Leaky-Wave (Troughguide) Field Applicator Ieee Transactions On Antennas and Propagation. 43: 248-256. DOI: 10.1109/8.371993 |
0.461 |
|
| 1995 |
Zakrzewski Z, Moisan M. Plasma sources using long linear microwave field applicators: Main features, classification and modelling Plasma Sources Science and Technology. 4: 379-397. DOI: 10.1088/0963-0252/4/3/008 |
0.36 |
|
| 1995 |
Bounasri F, Gat E, Chaker M, Moisan M, Margot J, Ravet MF. Highly anisotropic etching of submicrometer features on tungsten Journal of Applied Physics. 78: 6780-6783. DOI: 10.1063/1.360503 |
0.328 |
|
| 1995 |
Bounasri F, Moisan M, St‐Onge L, Margot J, Chaker M, Pelletier J, Khakani MAE, Gat E. Etching Characteristics Of Thin Films Of Tungsten, Amorphous Silicon Carbide, And Sal-603 Resist Submitted To A Surface-Wave Driven Sf6 Magnetoplasma Near Electron Cyclotron Resonance Conditions Journal of Applied Physics. 77: 4030-4038. DOI: 10.1063/1.359484 |
0.448 |
|
| 1995 |
Arno J, Bevan JW, Moisan M. Acetone conversion in a low-pressure oxygen surface wave plasma Environmental Science and Technology. 29: 1961-1965. DOI: 10.1021/Es00008A013 |
0.468 |
|
| 1995 |
Borges CFM, Moisan M, Gicquel A. A novel technique for diamond film deposition using surface wave discharges Diamond and Related Materials. 4: 149-154. DOI: 10.1016/0925-9635(94)00237-1 |
0.487 |
|
| 1995 |
Moisan M, Grenier R, Zakrzewski Z. The electromagnetic performance of a surfatron-based coaxial microwave plasma torch Spectrochimica Acta Part B: Atomic Spectroscopy. 50: 781-789. DOI: 10.1016/0584-8547(94)00162-O |
0.472 |
|
| 1995 |
Moisan M, Zakrzewski Z, Grenier R, Sauve G. Large diameter plasma generation using a waveguide-based field applicator at 2.45 GHz Journal of Microwave Power and Electromagnetic Energy. 30: 58-65. |
0.355 |
|
| 1994 |
Wertheimer MR, Moisan M. Processing of electronic materials by microwave plasma Pure and Applied Chemistry. 66: 1343-1352. DOI: 10.1351/Pac199466061343 |
0.485 |
|
| 1994 |
Moisan M, Sauve G, Zakrzewski Z, Hubert J. An atmospheric pressure waveguide-fed microwave plasma torch: The TIA design Plasma Sources Science and Technology. 3: 584-592. DOI: 10.1088/0963-0252/3/4/016 |
0.481 |
|
| 1994 |
St-Onge L, Moisan M. Hydrogen atom yield in RF and microwave hydrogen discharges Plasma Chemistry and Plasma Processing. 14: 87-116. DOI: 10.1007/Bf01465741 |
0.311 |
|
| 1993 |
Aliev YM, Ivanova KM, Moisan M, Shivarova AP. Analytical expressions for the axial structure of surface wave sustained plasmas under various regimes of charged particle loss Plasma Sources Science and Technology. 2: 145-152. DOI: 10.1088/0963-0252/2/3/003 |
0.341 |
|
| 1993 |
Margot J, Moisan M. Characteristics of surface-wave propagation in dissipative cylindrical plasma columns Journal of Plasma Physics. 49: 357-374. DOI: 10.1017/S0022377800017062 |
0.312 |
|
| 1993 |
Moisan M, Wertheimer MR. Comparison of microwave and r.f. plasmas: fundamentals and applications Surface and Coatings Technology. 59: 1-13. DOI: 10.1016/0257-8972(93)90047-R |
0.493 |
|
| 1992 |
Zakrzewski Z, Moisan M, Margot J, Sauve G. Spatial distributions of electron density and electric field in discharges sustained within microwave circuits Plasma Sources Science and Technology. 1: 28-35. DOI: 10.1088/0963-0252/1/1/005 |
0.392 |
|
| 1991 |
Margot J, Moisan M, Ricard A. Optical Radiation Efficiency of Surface-Wave-Produced Plasmas as Compared to DC Positive Columns Applied Spectroscopy. 45: 260-271. DOI: 10.1366/0003702914337443 |
0.5 |
|
| 1991 |
Moisan M. Radio frequency or microwave plasma reactors? Factors determining the optimum frequency of operation Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9: 8. DOI: 10.1116/1.585795 |
0.464 |
|
| 1991 |
Moisan M, Zakrzewski Z. Plasma sources based on the propagation of electromagnetic surface waves Journal of Physics D: Applied Physics. 24: 1025-1048. DOI: 10.1088/0022-3727/24/7/001 |
0.548 |
|
| 1991 |
Margot J, Moisan M. Electromagnetic surface waves for a new approach to the investigation of plasmas produced at electron cyclotron resonance (Ecr) Journal of Physics D: Applied Physics. 24: 1765-1788. DOI: 10.1088/0022-3727/24/10/011 |
0.431 |
|
| 1991 |
Hajlaoui Y, Pomathiod L, Margot J, Moisan M. Characteristics of a surfatron driven ion source Review of Scientific Instruments. 62: 2671-2678. DOI: 10.1063/1.1142198 |
0.397 |
|
| 1990 |
Nowakowska H, Zakrzewski Z, Moisan M. Modelling of atmospheric pressure, RF and microwave discharges sustained by travelling waves Journal of Physics D: Applied Physics. 23: 789-798. DOI: 10.1088/0022-3727/23/7/007 |
0.486 |
|
| 1990 |
Claude R, Moisan M, Ricard A, Wertheimer MR. Quenching rate of argon metastable state atoms in high frequency Ar-C4F8 discharges Chemical Physics Letters. 166: 480-484. DOI: 10.1016/0009-2614(90)87137-G |
0.301 |
|
| 1990 |
Moisan M, Pantel R, Hubert J. Propagation of a Surface Wave Sustaining a Plasma Column at Atmospheric Pressure Contributions to Plasma Physics. 30: 293-314. DOI: 10.1002/Ctpp.2150300213 |
0.525 |
|
| 1989 |
Ricard A, Barbeau C, Besner A, Hubert J, Margot-Chaker J, Moisan M, Sauvé G. Erratum: Production of metastable and resonant atoms in rare-gas (He, Ne, Ar) radio-frequency and microwave-sustained discharges Canadian Journal of Physics. 67: 543-543. DOI: 10.1139/P89-099 |
0.358 |
|
| 1989 |
Durandet A, Arnal Y, Margot Chaker J, Moisan M. Investigation of a plasma source sustained by an electromagnetic surface wave at 2.45 ghz under free-fall regime Journal of Physics D: Applied Physics. 22: 1288-1299. DOI: 10.1088/0022-3727/22/9/008 |
0.515 |
|
| 1989 |
Margot‐Chaker J, Moisan M, Chaker M, Glaude VMM, Lauque P, Paraszczak J, Sauvé G. Tube diameter and wave frequency limitations when using the electro magnetic surface wave in the m=1 (dipolar) mode to sustain a plasma column Journal of Applied Physics. 66: 4134-4148. DOI: 10.1063/1.343998 |
0.496 |
|
| 1989 |
Sauvé G, Moisan M, Paraszczak J, Arnal Y, Heindenreich J, Ricard A. Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas Microelectronic Engineering. 9: 471-474. DOI: 10.1016/0167-9317(89)90103-2 |
0.512 |
|
| 1989 |
Margot-Chaker J, Moisan M, Barbeau C. Critical review based on experiments of the self-consistent modelling leading to the power balance equation of surface waves produced plasmas . 34. |
0.337 |
|
| 1989 |
Grenier R, Moisan M, Zakrzewski Z. Compact surface wave launchers and their matching network for sustaining plasma columns at radio frequencies . 101. |
0.352 |
|
| 1989 |
Levesque S, Moisan M, Hubert J. Experimental properties of surface wave sustained plasma columns close to and above the atmospheric pressure . 76-77. |
0.517 |
|
| 1989 |
Sauve G, Arnal Y, Grenier R, Moisan M. Influence of the wafer biasing frequency upon etching of polyimide . 156. |
0.325 |
|
| 1989 |
Margot-Chaker J, Moisan M, Ricard A, Ferreira CM, Sa AB. Experimental study of the influence of the gas pressure and of the wave frequency on the spatial distributions of excited atoms in a surface wave produced plasma . 90. |
0.446 |
|
| 1988 |
Wertheimer MR, Moisan M, Klemberg-Sapieha JE, Claude R. Effect of frequency from ‘low frequency’ to microwave on the plasma deposition of thin films Pure and Applied Chemistry. 60: 815-820. DOI: 10.1351/Pac198860050815 |
0.461 |
|
| 1988 |
Ricard A, Barbeau C, Besner A, Hubert J, Margot-Chaker J, Moisan M, Sauvé G. Production of metastable and resonant atoms in rare-gas (He, Ne, Ar) radio-frequency and microwave-sustained discharges Canadian Journal of Physics. 66: 740-748. DOI: 10.1139/P88-122 |
0.472 |
|
| 1988 |
Ferreira CM, Moisan M. The similarity laws for the maintenance field and the absorbed power per electron in low-pressure surface wave produced plasmas and their extension to hf plasmas in general Physica Scripta. 38: 382-399. DOI: 10.1088/0031-8949/38/3/008 |
0.483 |
|
| 1988 |
Sauvé G, Moisan M, Paraszczak J, Heidenreich J. Influence of the applied field frequency (27-2450 MHz) in high-frequency sustained plasmas used to etch polyimide Applied Physics Letters. 53: 470-472. DOI: 10.1063/1.99872 |
0.466 |
|
| 1988 |
Besner A, Moisan M, Hubert J. Fundamental properties of radiofrequency and microwave surface-wave induced plasmas Journal of Analytical Atomic Spectrometry. 3: 863-866. DOI: 10.1039/Ja9880300863 |
0.522 |
|
| 1988 |
Margot‐Chaker J, Moisan M, Zakrzewski Z, Glaude VM, Sauvé G. Phase sensitive methods to determine the wavelength of electromagnetic waves in lossy nonuniform media: The case of surface waves along plasma columns Radio Science. 23: 1120-1132. DOI: 10.1029/Rs023I006P01120 |
0.402 |
|
| 1987 |
Moisan M, Chaker M, Zakrzewski Z, Paraszczak J. The waveguide surfatron: A high power surface-wave launcher to sustain large-diameter dense plasma columns Journal of Physics E: Scientific Instruments. 20: 1356-1361. DOI: 10.1088/0022-3735/20/11/009 |
0.501 |
|
| 1987 |
Claude R, Moisan M, Wertheimer MR, Zakrzewski Z. COMPARISON OF MICROWAVE AND LOWER FREQUENCY DISCHARGES FOR PLASMA POLYMERIZATION Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Material. 56: 134-140. DOI: 10.1063/1.97700 |
0.515 |
|
| 1987 |
Claude R, Moisan M, Wertheimer MR, Zakrzewski Z. COMPARISON OF MICROWAVE AND LOWER FREQUENCY DISCHARGES FOR PLASMA POLYMERIZATION Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Material. 56: 134-140. DOI: 10.1063/1.97700 |
0.422 |
|
| 1987 |
Moisan M, Zakrzewski Z. New surface wave launchers for sustaining plasma columns at submicrowave frequencies (1-300 MHz) Review of Scientific Instruments. 58: 1895-1900. DOI: 10.1063/1.1139539 |
0.48 |
|
| 1987 |
Claude R, Moisan M, Wertheimer MR, Zakrzewski Z. Comparison of microwave and lower-frequency discharges for plasma polymerization Plasma Chemistry and Plasma Processing. 7: 451-464. DOI: 10.1007/BF01030489 |
0.349 |
|
| 1986 |
Claude R, Moisan M, Wertheimer MR. RF and Microwave Plasma Deposition of Polymer Films: Effect of Frequency Mrs Proceedings. 68. DOI: 10.1557/Proc-68-85 |
0.457 |
|
| 1986 |
Hubert J, Moisan M, Zakrzewski Z. On the supply and measurement of power in microwave induced plasmas Spectrochimica Acta Part B: Atomic Spectroscopy. 41: 205-215. DOI: 10.1016/0584-8547(86)80160-4 |
0.407 |
|
| 1986 |
Heidenreich JE, Paraszczak JR, Moisan M, Sauve G. Ion energy and anisotropy in microwave plasma etching of polymers Microelectronic Engineering. 5: 363-374. DOI: 10.1016/0167-9317(86)90065-1 |
0.4 |
|
| 1986 |
Chaker M, Moisan M, Zakrzewski Z. Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing Plasma Chemistry and Plasma Processing. 6: 79-96. DOI: 10.1007/Bf00573823 |
0.547 |
|
| 1986 |
Beauchemin D, Hubert J, Moisan M. SPECTRAL AND NOISE CHARACTERISTICS OF A XENON MICROWAVE-INDUCED PLASMA LAMP Applied Spectroscopy. 40: 379-385. |
0.315 |
|
| 1986 |
Pavy D, Moisan M, Saada S, Chollet P, Leprince P, Marec J. FABRICATION OF OPTICAL FIBER PREFORMS BY A NEW SURFACE-PLASMA CVD PROCESS . 1: 19-22. |
0.347 |
|
| 1985 |
Wertheimer MR, Moisan M. Comparison of microwave and lower frequency plasmas for thin film deposition and etching Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 3: 2643-2649. DOI: 10.1116/1.572805 |
0.494 |
|
| 1985 |
Moutoulas C, Moisan M, Bertrand L, Hubert J, Lachambre JL, Ricard A. A high-frequency surface wave pumped He-Ne laser Applied Physics Letters. 46: 323-325. DOI: 10.1063/1.95618 |
0.433 |
|
| 1985 |
Chaker M, Moisan M. Large-diameter plasma columns produced by surface waves at radio and microwave frequencies Journal of Applied Physics. 57: 91-95. DOI: 10.1063/1.335401 |
0.427 |
|
| 1985 |
Paraszczak J, Heidenreich J, Hatzakis M, Moisan M. Methods of creation and effect of microwave plasmas upon the etching of polymers and silicon Microelectronic Engineering. 3: 397-410. DOI: 10.1016/0167-9317(85)90050-4 |
0.383 |
|
| 1985 |
Moutoulas C, Moisan M, Zakrzewski Z. EFFECTS OF EXCITATION FREQUENCY ON THE GAIN OF A SURFACE-WAVE-PUMPED He-Ne LASER . 114-115. |
0.401 |
|
| 1984 |
Paquin L, Masson D, Wertheimer MR, Moisan M. AMORPHOUS SILICON FOR PHOTOVOLTAICS PRODUCED BY NEW MICROWAVE PLAMA-DEPOSITION TECHNIQUES Canadian Journal of Physics. 63: 831-837. DOI: 10.1139/P85-134 |
0.374 |
|
| 1984 |
Moisan M, Zakrzewski Z, Pantel R, Leprince L. A Waveguide-Based Launcher to Sustain Long Plasma Columns Through the Propagation of an Electromagnetic Surface Wave Ieee Transactions On Plasma Science. 12: 203-214. DOI: 10.1109/Tps.1984.4316320 |
0.513 |
|
| 1982 |
Moisan M, Pantel R, Ricard A. RADIAL VARIATION OF EXCITED ATOM DENSITIES IN AN ARGON PLASMA COLUMN PRODUCED BY A MICROWAVE SURFACE WAVE Canadian Journal of Physics. 60: 379-382. DOI: 10.1139/P82-053 |
0.532 |
|
| 1982 |
Moisan M, Shivarova A, Trivelpiece AW. Experimental investigations of the propagation of surface waves along a plasma column Plasma Physics. 24: 1331-1400. DOI: 10.1088/0032-1028/24/11/001 |
0.415 |
|
| 1982 |
Moisan M, Ferreira C, Hajlaoui Y, Henry D, Hubert J, Pantel R, Ricard A, Zakrzewski Z. Properties and applications of surface wave produced plasmas Revue De Physique AppliquéE. 17: 707-727. DOI: 10.1051/rphysap:019820017011070700 |
0.354 |
|
| 1980 |
Glaude VMM, Moisan M, Pantel R, Leprince P, Marec J. Axial electron density and wave power distributions along a plasma column sustained by the propagation of a surface microwave Journal of Applied Physics. 51: 5693-5698. DOI: 10.1063/1.327568 |
0.484 |
|
| 1979 |
Moisan M, Zakrzewski Z, Pantel R. The theory and characteristics of an efficient surface wave launcher (surfatron) producing long plasma columns Journal of Physics D: Applied Physics. 12: 219-237. DOI: 10.1088/0022-3727/12/2/008 |
0.481 |
|
| 1979 |
Moisan M, Pantel R, Hubert J, Bloyet E, Leprince P, Marec J, Ricard A. Production and Applications of Microwave Surface Wave Plasma at Atmospheric Pressure* Journal of Microwave Power. 14: 57-61. DOI: 10.1080/16070658.1979.11689129 |
0.427 |
|
| 1979 |
Hubert J, Moisan M, Ricard A. A new microwave plasma at atmospheric pressure Spectrochimica Acta Part B: Atomic Spectroscopy. 34: 1-10. DOI: 10.1016/0584-8547(79)80016-6 |
0.577 |
|
| 1978 |
Bertrand L, GagnÉ JM, Bosisio RG, Moisan M. Comparison of Two New Microwave Plasma Sources for HF Chemical Lasers Ieee Journal of Quantum Electronics. 14: 8-11. DOI: 10.1109/JQE.1978.1069660 |
0.332 |
|
| 1977 |
Moisan M, Ricard A. Density of metastable atoms in an argon plasma produced by an RF surface wave Canadian Journal of Physics. 55: 1010-1012. DOI: 10.1139/p77-135 |
0.415 |
|
| 1977 |
Zakrzewski Z, Moisan M, Glaude VMM, Beaudry C, Leprince P. Attenuation of a surface wave in an unmagnetized RF plasma column Plasma Physics. 19: 77-83. DOI: 10.1088/0032-1028/19/2/001 |
0.497 |
|
| 1977 |
Bloyet E, Leprince P, Marec J, Moisan M. Plasma créé en impulsion par une onde de plasma Revue De Physique AppliquéE. 12: 1719-1722. DOI: 10.1051/rphysap:0197700120100171900 |
0.327 |
|
| 1975 |
Moisan M, Beaudry C, Leprince P. A small microwave plasma source for long column production without magnetic field Ieee Transactions On Plasma Science. 3: 55-59. DOI: 10.1109/Tps.1975.4316875 |
0.511 |
|
| 1975 |
Moisan M, Leprince P. Experimental Evidence of Parametric Instabilities in an Unmagnetized Plasma Subjected to a Strong H.F. Electric Field BeiträGe Aus Der Plasmaphysik. 15: 83-104. DOI: 10.1002/Ctpp.19750150302 |
0.456 |
|
| 1974 |
Moisan M, Beaudry C, Lepprince P. A new HF device for the production of long plasma columns at a high electron density Physics Letters A. 50: 125-126. DOI: 10.1016/0375-9601(74)90903-7 |
0.406 |
|
| 1971 |
Leprince P, Moisan M. Coupling between three electron waves in a plasma column Plasma Physics. 13: 659-666. DOI: 10.1088/0032-1028/13/8/004 |
0.381 |
|
| Show low-probability matches. |