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Yuansheng Ma, Ph.D. - Publications

Affiliations: 
2006 University of Wisconsin, Madison, Madison, WI 
Area:
Electronics and Electrical Engineering
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6 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2007 Ma Y, Cheng YC, Cerrina F, Barwicz T, Smith HI. Local line edge roughness in microphotonic devices: An electron-beam lithography study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 235-241. DOI: 10.1116/1.2426978  0.676
2005 Ma Y, Cerrina F. Effect of a surface inhibition layer on line edge roughness Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1096-1101. DOI: 10.1116/1.1926292  0.709
2005 Junarsa I, Stoykovich MP, Nealey PF, Ma Y, Cerrina F, Solak HH. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 138-143. DOI: 10.1116/1.1849213  0.648
2003 Ma Y, Tsvid G, Cerrina F. Line edge roughness of sub-100 nm dense and isolated features: Experimental study Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3124. DOI: 10.1116/1.1624254  0.716
2003 Ma Y, Shin J, Cerrina F. Line edge roughness and photoresist percolation development model Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 112-117. DOI: 10.1116/1.1534572  0.65
2001 Shin J, Han G, Ma Y, Moloni K, Cerrina F. Resist line edge roughness and aerial image contrast Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2890-2895. DOI: 10.1116/1.1418413  0.503
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