Kyuhwan Chang, Ph.D. - Publications
Affiliations: | 2005 | Pennsylvania State University, State College, PA, United States |
Area:
Electronics and Electrical Engineering, Materials Science Engineering, Condensed Matter PhysicsYear | Citation | Score | |||
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2016 | Wu CH, Huang BW, Chang KM, Wang SJ, Lin JH, Hsu JM. The Performance Improvement of N2 Plasma Treatment on ZrO2 Gate Dielectric Thin-Film Transistors with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition IGZO Channel. Journal of Nanoscience and Nanotechnology. 16: 6044-8. PMID 27427669 | 0.378 | |||
2007 | Chang K, Shanmugasundaram K, Shallenberger J, Ruzyllo J. Studies of Hf(Si,O) dielectrics for metal-oxide-semiconductor applications Thin Solid Films. 515: 3802-3805. DOI: 10.1016/J.Tsf.2006.09.048 | 0.656 | |||
2007 | Shanmugasundaram K, Brubaker M, Chang K, Mumbauer P, Roman P, Ruzyllo J. Studies of solution processed metal oxides on silicon Microelectronic Engineering. 84: 2294-2297. DOI: 10.1016/J.Mee.2007.04.098 | 0.665 | |||
2006 | Chang K, Chang FM, Ruzyllo J. Charge trapping in HfO2 and HfSiO4 MOS gate dielectrics Solid-State Electronics. 50: 1670-1672. DOI: 10.1016/J.Sse.2006.08.010 | 0.627 | |||
2004 | Chang K, Shanmugasundaram K, Lee DO, Roman P, Wu CT, Wang J, Shallenberger J, Mumbauer P, Grant R, Ridley R, Dolny G, Ruzyllo J. Silicon surface treatments in advanced MOS gate processing Microelectronic Engineering. 72: 130-135. DOI: 10.1016/J.Mee.2003.12.028 | 0.665 | |||
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