Elsa Reichmanis - Publications

Affiliations: 
Georgia Institute of Technology, Atlanta, GA 
Area:
polymeric and nanostructured materials for advanced technologies
Website:
http://www.chemistry.gatech.edu/people/Reichmanis/Elsa

199 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Na R, Minnici K, Zhang G, Lu N, Gonzalez M, Wang G, Reichmanis E. Electrically conductive shell-protective layer capping on silicon surface as anode material for high performance Lithium-ion batteries. Acs Applied Materials & Interfaces. PMID 31580639 DOI: 10.1021/acsami.9b13941  1
2019 McBride M, Bacardi G, Morales C, Risteen B, Keane D, Reichmanis E, Grover MA. Control of Nucleation Density in Conjugated Polymers via Seed Nucleation. Acs Applied Materials & Interfaces. PMID 31522502 DOI: 10.1021/acsami.9b10967  1
2019 Risteen B, McBride M, Gonzalez M, Khau B, Zhang G, Reichmanis E. Functionalized Cellulose Nanocrystal-Mediated Conjugated Polymer Aggregation. Acs Applied Materials & Interfaces. PMID 31265224 DOI: 10.1021/acsami.9b06072  1
2018 Zhou H, Huang Z, Cai Z, Zhang R, Wang H, Song Y, Reichmanis E. Patterning Bubbles by the Stick-slip Motion of the Advancing Triple Phase Line on Nano-structures. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 30452276 DOI: 10.1021/acs.langmuir.8b03135  1
2018 McBride M, Persson NE, Keane D, Bacardi GE, Reichmanis E, Grover MA. A Polymer Blend Approach for Creation of Effective Conjugated Polymer Charge Transport Pathways. Acs Applied Materials & Interfaces. PMID 30273486 DOI: 10.1021/acsami.8b13255  1
2018 Risteen B, Delepierre G, Srinivasarao M, Weder C, Russo P, Reichmanis E, Zoppe J. Thermally Switchable Liquid Crystals Based on Cellulose Nanocrystals with Patchy Polymer Grafts. Small (Weinheim An Der Bergstrasse, Germany). e1802060. PMID 30198146 DOI: 10.1002/smll.201802060  1
2018 Xiong H, DeLuca G, Rui Y, Zhang B, Li Y, Zhang Q, Wang H, Reichmanis E. Modifying Perovskite Films with Polyvinylpyrrolidone for Ambient-Air-Stable Highly Bendable Solar Cells. Acs Applied Materials & Interfaces. PMID 30152674 DOI: 10.1021/acsami.8b04236  0.48
2018 Huang L, Wang G, Zhou W, Fu B, Cheng X, Zhang L, Yuan Z, Xiong S, Zhang L, Xie Y, Zhang A, Zhang Y, Ma W, Li W, Zhou Y, ... Reichmanis E, et al. Vertical Stratification Engineering for Organic Bulk-Heterojunction Devices. Acs Nano. PMID 29678114 DOI: 10.1021/acsnano.8b00439  1
2018 Kwon YH, Minnici K, Park JJ, Lee SR, Zhang G, Takeuchi ES, Takeuchi KJ, Marschilok AC, Reichmanis E. SWNT Anchored with Carboxylated Polythiophene 'Links' on High-Capacity Li-Ion Battery Anode Materials. Journal of the American Chemical Society. PMID 29526097 DOI: 10.1021/jacs.8b00693  0.52
2018 Mu J, Wang G, Yan H, Li H, Wang X, Gao E, Hou C, Pham ATC, Wu L, Zhang Q, Li Y, Xu Z, Guo Y, Reichmanis E, Wang H, et al. Molecular-channel driven actuator with considerations for multiple configurations and color switching. Nature Communications. 9: 590. PMID 29426842 DOI: 10.1038/s41467-018-03032-2  1
2018 Kwon YH, Park JJ, Housel LM, Minnici K, Zhang G, Lee SR, Lee SW, Chen Z, Noda S, Takeuchi ES, Takeuchi KJ, Marschilok AC, Reichmanis E. Carbon Nanotube Web with Carboxylated Polythiophene 'Assist' for High-Performance Battery Electrodes. Acs Nano. PMID 29337526 DOI: 10.1021/acsnano.7b08918  1
2017 Chang M, Lim GT, Park B, Reichmanis E. Control of Molecular Ordering, Alignment, and Charge Transport in Solution-Processed Conjugated Polymer Thin Films. Polymers. 9. PMID 30970891 DOI: 10.3390/polym9060212  0.72
2017 Schmatz B, Yuan Z, Lang AW, Hernandez JL, Reichmanis E, Reynolds JR. Aqueous Processing for Printed Organic Electronics: Conjugated Polymers with Multistage Cleavable Side Chains. Acs Central Science. 3: 961-967. PMID 28979937 DOI: 10.1021/acscentsci.7b00232  0.52
2017 Persson N, Rafshoon J, Naghshpour K, Fast T, Chu PH, McBride M, Risteen B, Grover MA, Reichmanis E. High-throughput Image Analysis of Fibrillar Materials: A Case Study on Polymer Nanofiber Packing, Alignment, and Defects in OFETs. Acs Applied Materials & Interfaces. PMID 28952712 DOI: 10.1021/acsami.7b10510  1
2017 Rosu C, Chu PH, Tassone CJ, Park K, Balding PL, Park JO, Srinivasarao M, Reichmanis E. Polypeptide Composite Particle-Assisted Organization of π-Conjugated Polymers into Highly Crystalline "Coffee Stains". Acs Applied Materials & Interfaces. PMID 28925677 DOI: 10.1021/acsami.7b10223  1
2017 Kang JH, Kim SH, Fernandez-Nieves A, Reichmanis E. Amplified Photon Upconversion by Photonic Shell of Cholesteric Liquid Crystals. Journal of the American Chemical Society. PMID 28402658 DOI: 10.1021/jacs.7b01981  0.76
2017 Kang JH, Lee SS, Guerrero J, Fernandez-Nieves A, Kim SH, Reichmanis E. Ultrathin Double-Shell Capsules for High Performance Photon Upconversion. Advanced Materials (Deerfield Beach, Fla.). PMID 28323354 DOI: 10.1002/adma.201606830  0.76
2017 Risteen BE, Blake A, McBride MA, Rosu C, Park JO, Srinivasarao M, Russo PS, Reichmanis E. Enhanced Alignment of Water-Soluble Polythiophene Using Cellulose Nanocrystals as a Liquid Crystal Template. Biomacromolecules. PMID 28296384 DOI: 10.1021/acs.biomac.7b00121  1
2017 Persson NE, Chu PH, McBride M, Grover M, Reichmanis E. Nucleation, Growth, and Alignment of Poly(3-hexylthiophene) Nanofibers for High-Performance OFETs. Accounts of Chemical Research. PMID 28234458 DOI: 10.1021/acs.accounts.6b00639  1
2016 Rosu C, Jacobeen S, Park K, Reichmanis E, Yunker P, Russo PS. Domed Silica Microcylinders Coated with Oleophilic Polypeptides and Their Behavior in Lyotropic Cholesteric Liquid Crystals of the Same Polypeptide. Langmuir : the Acs Journal of Surfaces and Colloids. 32: 13137-13148. PMID 27951711 DOI: 10.1021/acs.langmuir.6b03165  1
2016 Zhou H, Chang R, Reichmanis E, Song Y. Wetting of inkjet polymer droplets on porous alumina substrates. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 27936769 DOI: 10.1021/acs.langmuir.6b03820  0.4
2016 Wang G, Li K, Purcell FJ, Zhao, Zhang W, He Z, Tan S, Tang Z, Wang H, Reichmanis E. Three Dimensional Clustered Nanostructures for Microfluidic Surface Enhanced Raman Detection. Acs Applied Materials & Interfaces. PMID 27585300 DOI: 10.1021/acsami.6b10542  1
2016 Wang G, Chu PH, Fu B, He Z, Kleinhenz N, Yuan Z, Mao Y, Wang H, Reichmanis E. Conjugated Polymer Alignment: Synergisms Derived from Microfluidic Shear Design and UV Irradiation. Acs Applied Materials & Interfaces. PMID 27564549 DOI: 10.1021/acsami.6b07548  1
2016 Kwon YH, Huie M, Choi D, Chang M, Marschilok AC, Takeuchi KJ, Takeuchi ES, Reichmanis E. Towards Uniformly Dispersed Battery Electrode Composite Materials: Characteristics and Performance. Acs Applied Materials & Interfaces. PMID 26765041 DOI: 10.1021/acsami.5b11938  1
2016 Rosu C, Kleinhenz N, Choi D, Tassone CJ, Zhang X, Park JO, Srinivasarao M, Russo PS, Reichmanis E. Protein-Assisted Assembly of π-Conjugated Polymers Chemistry of Materials. 28: 573-582. DOI: 10.1021/acs.chemmater.5b04192  1
2015 Wang G, Yuan C, Fu B, He L, Reichmanis E, Wang H, Zhang Q, Li Y. Flow Effects on the Controlled Growth of Nanostructured Networks at Microcapillary Walls for Applications in Continuous Flow Reactions. Acs Applied Materials & Interfaces. PMID 26352859 DOI: 10.1021/acsami.5b06851  1
2015 Wang G, Persson N, Chu PH, Kleinhenz N, Fu B, Chang M, Deb N, Mao Y, Wang H, Grover MA, Reichmanis E. Microfluidic Crystal Engineering of π-Conjugated Polymers. Acs Nano. 9: 8220-30. PMID 26182171 DOI: 10.1021/acsnano.5b02582  1
2015 Chang M, Choi D, Wang G, Kleinhenz N, Persson N, Park B, Reichmanis E. Photoinduced Anisotropic Assembly of Conjugated Polymers in Insulating Polymer Blends. Acs Applied Materials & Interfaces. 7: 14095-103. PMID 26047367 DOI: 10.1021/acsami.5b03310  1
2015 Chu PH, Zhang L, Colella NS, Fu B, Park JO, Srinivasarao M, Briseño AL, Reichmanis E. Enhanced mobility and effective control of threshold voltage in P3HT-based field-effect transistors via inclusion of oligothiophenes. Acs Applied Materials & Interfaces. 7: 6652-60. PMID 25757100 DOI: 10.1021/am509090j  1
2015 Chu PH, Zhang L, Colella NS, Fu B, Park JO, Srinivasarao M, Briseño AL, Reichmanis E. Enhanced mobility and effective control of threshold voltage in P3HT-based field-effect transistors via inclusion of oligothiophenes Acs Applied Materials and Interfaces. 7: 6652-6660. DOI: 10.1021/am509090j  1
2015 Wang G, Persson N, Chu PH, Kleinhenz N, Fu B, Chang M, Deb N, Mao Y, Wang H, Grover MA, Reichmanis E. Microfluidic Crystal Engineering of π-Conjugated Polymers Acs Nano. 9: 8220-8230. DOI: 10.1021/acsnano.5b02582  1
2015 Choi D, Chu PH, McBride M, Reichmanis E. Best Practices for Reporting Organic Field Effect Transistor Device Performance Chemistry of Materials. 27: 4167-4168. DOI: 10.1021/acs.chemmater.5b01982  1
2015 Kleinhenz N, Rosu C, Chatterjee S, Chang M, Nayani K, Xue Z, Kim E, Middlebrooks J, Russo PS, Park JO, Srinivasarao M, Reichmanis E. Liquid crystalline poly(3-hexylthiophene) solutions revisited: Role of time-dependent self-assembly Chemistry of Materials. 27: 2687-2694. DOI: 10.1021/acs.chemmater.5b00635  1
2015 Fu B, Wang CY, Rose BD, Jiang Y, Chang M, Chu PH, Yuan Z, Fuentes-Hernandez C, Kippelen B, Brédas JL, Collard DM, Reichmanis E. Molecular engineering of nonhalogenated solution-processable bithiazole-based electron-transport polymeric semiconductors Chemistry of Materials. 27: 2928-2937. DOI: 10.1021/acs.chemmater.5b00173  1
2015 Hernandez JL, Reichmanis E, Reynolds JR. Probing film solidification dynamics in polymer photovoltaics Organic Electronics: Physics, Materials, Applications. 25: 57-65. DOI: 10.1016/j.orgel.2015.05.025  1
2015 Choi D, Chang M, Reichmanis E. Controlled assembly of poly(3-hexylthiophene): Managing the disorder to order transition on the nano- through meso-scales Advanced Functional Materials. 25: 920-927. DOI: 10.1002/adfm.201403708  1
2014 Chang M, Lee J, Chu PH, Choi D, Park B, Reichmanis E. Anisotropic assembly of conjugated polymer nanocrystallites for enhanced charge transport. Acs Applied Materials & Interfaces. 6: 21541-9. PMID 25347053 DOI: 10.1021/am506546k  1
2014 Kim Y, Lee JH, Cho S, Kwon Y, In I, Lee J, You NH, Reichmanis E, Ko H, Lee KT, Kwon HK, Ko DH, Yang H, Park B. Additive-free hollow-structured Co3O4 nanoparticle Li-ion battery: the origins of irreversible capacity loss. Acs Nano. 8: 6701-12. PMID 24895838 DOI: 10.1021/nn500218m  1
2014 Kim Y, Cho S, Jeong S, Ko DH, Ko H, You N, Chang M, Reichmanis E, Park JY, Park SY, Lee JS, Yang H, In I, Park B. Competition between charge transport and energy barrier in injection-limited metal/quantum dot nanocrystal contacts Chemistry of Materials. 26: 6393-6400. DOI: 10.1021/cm502763z  1
2014 Crivello JV, Reichmanis E. Photopolymer materials and processes for advanced technologies Chemistry of Materials. 26: 533-548. DOI: 10.1021/cm402262g  1
2014 Chang M, Lee J, Kleinhenz N, Fu B, Reichmanis E. Photoinduced anisotropic supramolecular assembly and enhanced charge transport of poly(3-hexylthiophene) thin films Advanced Functional Materials. 24: 4457-4465. DOI: 10.1002/adfm.201400523  1
2014 Fu B, Baltazar J, Sankar AR, Chu PH, Zhang S, Collard DM, Reichmanis E. Enhancing field-effect mobility of conjugated polymers through rational design of branched side chains Advanced Functional Materials. 24: 3734-3744. DOI: 10.1002/adfm.201304231  1
2013 Park B, Cho SE, Kim Y, Lee WJ, You NH, In I, Reichmanis E. Simultaneous study of exciton diffusion/dissociation and charge transport in a donor-acceptor bilayer: pentacene on a C60 -terminated self-assembled monolayer. Advanced Materials (Deerfield Beach, Fla.). 25: 6453-8. PMID 23999897 DOI: 10.1002/adma.201302934  0.56
2013 Chang M, Choi D, Fu B, Reichmanis E. Solvent based hydrogen bonding: Impact on poly(3-hexylthiophene) nanoscale morphology and charge transport characteristics Acs Nano. 7: 5402-5413. PMID 23651389 DOI: 10.1021/nn401323f  1
2013 Aiyar AR, Hong JI, Izumi J, Choi D, Kleinhenz N, Reichmanis E. Ultrasound-induced ordering in poly(3-hexylthiophene): role of molecular and process parameters on morphology and charge transport. Acs Applied Materials & Interfaces. 5: 2368-77. PMID 23474078 DOI: 10.1021/am3027822  1
2013 Park B, Cho SE, Kim Y, Lee WJ, You NH, In I, Reichmanis E. Simultaneous study of exciton diffusion/dissociation and charge transport in a donor-acceptor bilayer: Pentacene on a C60-terminated self-assembled monolayer Advanced Materials. 25: 6453-6458. DOI: 10.1002/adma.201302934  1
2012 Park B, Whitham K, Cho J, Reichmanis E. Creating and optimizing interfaces for electric-field and photon-induced charge transfer Acs Nano. 6: 9466-9474. PMID 23078364 DOI: 10.1021/nn302175f  1
2012 Kang JH, Reichmanis E. Low-threshold photon upconversion capsules obtained by photoinduced interfacial polymerization. Angewandte Chemie (International Ed. in English). 51: 11841-4. PMID 23076809 DOI: 10.1002/anie.201205540  0.76
2012 Chang M, Kim T, Park HW, Kang M, Reichmanis E, Yoon H. Imparting chemical stability in nanoparticulate silver via a conjugated polymer casing approach Acs Applied Materials and Interfaces. 4: 4357-4365. PMID 22860984 DOI: 10.1021/am3009967  1
2012 Park B, You NH, Reichmanis E. Exciton dissociation and charge trapping at poly(3-hexylthiophene)/phenyl- C61-butyric acid methyl ester bulk heterojunction interfaces: Photo-induced threshold voltage shifts in organic field-effect transistors and solar cells Journal of Applied Physics. 111. DOI: 10.1063/1.4705277  1
2012 Park B, Choi S, Graham S, Reichmanis E. Memory and photovoltaic elements in organic field effect transistors with donor/acceptor planar-hetero junction interfaces Journal of Physical Chemistry C. 116: 9390-9397. DOI: 10.1021/jp300708z  1
2012 Park B, Lee JH, Chang M, Reichmanis E. Exciton dissociation and charge transport properties at a modified donor/acceptor interface: Poly(3-hexylthiophene)/Thiol-ZnO bulk heterojunction interfaces Journal of Physical Chemistry C. 116: 4252-4258. DOI: 10.1021/jp208932v  1
2012 Fu B, Baltazar J, Hu Z, Chien AT, Kumar S, Henderson CL, Collard DM, Reichmanis E. High charge carrier mobility, low band gap donor-acceptor benzothiadiazole-oligothiophene based polymeric semiconductors Chemistry of Materials. 24: 4123-4133. DOI: 10.1021/cm3021929  1
2012 Aiyar AR, Hong JI, Reichmanis E. Regioregularity and intrachain ordering: Impact on the nanostructure and charge transport in two-dimensional assemblies of poly(3-hexylthiophene) Chemistry of Materials. 24: 2845-2853. DOI: 10.1021/cm202700k  1
2012 Chang M, Reichmanis E. An approach to core-shell nanostructured materials with high colloidal and chemical stability: Synthesis, characterization and mechanistic evaluation Colloid and Polymer Science. 290: 1913-1926. DOI: 10.1007/s00396-012-2731-x  1
2012 Hu Z, Fu B, Aiyar A, Reichmanis E. Synthesis and characterization of graft polymethacrylates containing conducting diphenyldithiophene for organic thin-film transistors Journal of Polymer Science, Part a: Polymer Chemistry. 50: 199-206. DOI: 10.1002/pola.24957  1
2012 Kang JH, Reichmanis E. Low-threshold photon upconversion capsules obtained by photoinduced interfacial polymerization Angewandte Chemie - International Edition. 51: 11841-11844. DOI: 10.1002/anie.201205540  1
2011 Park B, Kim YJ, Graham S, Reichmanis E. Change in electronic states in the accumulation layer at interfaces in a poly(3-hexylthiophene) field-effect transistor and the impact of encapsulation Acs Applied Materials and Interfaces. 3: 3545-3551. PMID 21863841 DOI: 10.1021/am200760m  1
2011 Park B, Aiyar A, Hong JI, Reichmanis E. Electrical contact properties between the accumulation layer and metal electrodes in ultrathin poly(3-hexylthiophene)(P3HT) field effect transistors. Acs Applied Materials & Interfaces. 3: 1574-80. PMID 21517039 DOI: 10.1021/am200143g  1
2011 Park MS, Aiyar A, Park JO, Reichmanis E, Srinivasarao M. Solvent evaporation induced liquid crystalline phase in poly(3-hexylthiophene). Journal of the American Chemical Society. 133: 7244-7. PMID 21510698 DOI: 10.1021/ja110060m  1
2011 Park B, Aiyar A, Park MS, Srinivasarao M, Reichmanis E. Conducting channel formation in poly(3-hexylthiophene) field effect transistors: Bulk to interface Journal of Physical Chemistry C. 115: 11719-11726. DOI: 10.1021/jp111677x  1
2011 Park MS, Aiyar A, Park JO, Reichmanis E, Srinivasarao M. Solvent evaporation induced liquid crystalline phase in poly(3-hexylthiophene) Journal of the American Chemical Society. 133: 7244-7247. DOI: 10.1021/ja110060m  1
2011 Bredas JL, Marder SR, Reichmanis E. Preface to the chemistry of materials special issue on π-functional materials Chemistry of Materials. 23: 309. DOI: 10.1021/cm1034694  1
2011 Hu Z, Reichmanis E. Synthesis of electroactive polystyrene derivatives para-substituted with π-conjugated oligothiophene via postgrafting functionalization Journal of Polymer Science, Part a: Polymer Chemistry. 49: 1155-1162. DOI: 10.1002/pola.24531  1
2011 Aiyar AR, Hong JI, Nambiar R, Collard DM, Reichmanis E. Tunable crystallinity in regioregular poly(3-Hexylthiophene) thin films and its impact on field effect mobility Advanced Functional Materials. 21: 2652-2659. DOI: 10.1002/adfm.201002729  1
2010 Park MS, Aiyar A, Park JO, Reichmanis E, Srinivasarao M. The evolution study of thin film structure during the film formation Aip Conference Proceedings. 1267: 704-705. DOI: 10.1063/1.3482763  1
2009 Ober CK, Cheng SZD, Hammond PT, Muthukumar M, Reichmanis E, Wooley KL, Lodge TP. Research in macromolecular science: Challenges and opportunities for the next decade Macromolecules. 42: 465-471. DOI: 10.1021/ma802463z  1
2007 Vaidyanathan S, Dötz F, Katz HE, Lawrentz U, Granstrom J, Reichmanis E. Investigation of solubility-field effect mobility orthogonality in substituted phenylene-thiophene co-oligomers Chemistry of Materials. 19: 4676-4681. DOI: 10.1021/cm070330j  1
2007 Huebler AC, Doetz F, Kempa H, Katz HE, Bartzsch M, Brandt N, Hennig I, Fuegmann U, Vaidyanathan S, Granstrom J, Liu S, Sydorenko A, Zillger T, Schmidt G, Preissler K, ... Reichmanis E, et al. Ring oscillator fabricated completely by means of mass-printing technologies Organic Electronics: Physics, Materials, Applications. 8: 480-486. DOI: 10.1016/j.orgel.2007.02.009  1
2007 Reichmanis E. Materials chemistry for printed electronics applications Annual Technical Conference - Antec, Conference Proceedings. 3: 1700.  1
2005 Reichmanis E, Katz H, Kloc C, Maliakal A. Plastic electronic devices: From materials design to device applications Bell System Technical Journal. 10: 87-105. DOI: 10.1002/bltj.20106  1
2005 Interrante LV, Reichmanis E. Ethics of scientific publication Chemical and Engineering News. 83: 4-5.  1
2003 Houlihan FM, Nalamasu O, Reichmanis E. Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators Journal of Fluorine Chemistry. 122: 47-55. DOI: 10.1016/S0022-1139(03)00079-4  1
2003 Reichmanis E. Networking for all chemists Chemical and Engineering News. 81: 53.  1
2003 Reichmanis E. Scheduling symposia needs new approach Chemical and Engineering News. 81: 38.  1
2003 Beuermann S, Buback M, Davis T, Hutchinson R, Klumperman B, Kajiiwara A, Abe A, Ando I, Barón M, Berek D, Chan H, Chen JYF, Costa G, Economy J, Fuller G, ... ... Reichmanis E, et al. Critically evaluated propagation rate coefficients in free-radical polymerizations: Part III. Methacrylates with cyclic ester groups: (IUPAC technical report) Pure and Applied Chemistry. 75: 1091-1096.  1
2003 Reichmanis E. Of members and Muggles: Let's communicate! Chemical and Engineering News. 81: 2-4.  1
2002 Reichmanis E, Nalamasu O. Testing the limits for resists Science. 297: 349-350. DOI: 10.1126/science.1073842  1
2002 Yang S, Mirau PA, Pai CS, Nalamasu O, Reichmanis E, Pai JC, Obeng YS, Seputro J, Lin EK, Lee HJ, Sun J, Gidley DW. Nanoporous ultralow dielectric constant organosilicates templated by triblock copolymers Chemistry of Materials. 14: 369-374. DOI: 10.1021/cm010690l  1
2001 Bao Z, Dodabalapur A, Schon H, Rogers J, Katz H, Lovinger A, Kloc C, Batlogg B, Crone B, Baldwin K, Kuck V, Reddy Raju V, Wiltzius P, Reichmanis E, Chandross E, et al. Novel organic and polymeric semiconductors for plastic electronics Proceedings of Spie - the International Society For Optical Engineering. 4466: 31-34. DOI: 10.1117/12.451475  1
2001 Houlihan FM, Person D, Rushkin I, Dimov O, Reichmanis E, Nalamasu O. Study of base additives for use in a single layer 193 nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate) Journal of Photopolymer Science and Technology. 14: 373-384. DOI: 10.1117/12.436912  1
2001 Houlihan FM, Yan Z, Reichmanis E, Dabbagh G, Bolan K, Nalamasu O, Rushkin I, Dimov O. Lithographic behavior of carboxylate based dissolution inhibitors and the effect of blending Proceedings of Spie - the International Society For Optical Engineering. 4345: 703-711. DOI: 10.1117/12.436904  1
2001 Yang S, Pai JCH, Pai CS, Dabbagh G, Nalamasu O, Reichmanis E, Seputro J, Obeng YS. Processing and characterization of ultralow-dielectric constant organosilicate Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2155-2161. DOI: 10.1116/1.1417542  1
2001 Yang S, Mirau PA, Pai CS, Naiamasu O, Reichmanis E, Lin EK, Lee HJ, Gidley DW, Sun J. Molecular templating of nanoporous ultralow dielectric constant (≈1.5) organosilicates by tailoring the microphase separation of triblock copolymers Chemistry of Materials. 13: 2762-2764. DOI: 10.1021/cm0102786  1
2001 Houlihan FM, Dabbagh G, Rushkin I, Hutton R, Bolan K, Reichmanis E, Nalamasu O, Yan Z, Reiser A. Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins Radiation Physics and Chemistry. 62: 69-76. DOI: 10.1016/S0969-806X(01)00414-5  1
2001 Reichmanis E, Nalamasu O, Houlihan FM. Polymers for microlithographic applications: New directions and challenges Macromolecular Symposia. 175: 185-196. DOI: 10.1002/1521-3900(200110)175:1<185::AID-MASY185>3.0.CO;2-H  1
2001 Reichmanis E, Nalamasu O, Houlihan FM. Materials challenges and alternatives for advanced photolithographic patterning: From 193 to 157 nm and beyond Materials Research Society Symposium - Proceedings. 636: D521-D5212.  1
2000 Houlihan FM, Dabbagh G, Rushkin I, Hutton R, Osei D, Sousa J, Bolan K, Nalamasu O, Reichmanis E. Fundamental studies of molecular interactions and dissolution inhibition in poly(norbornene-alt-maleic anhydride)-based resins Chemistry of Materials. 12: 3516-3524. DOI: 10.1021/cm000385k  1
2000 Houlihan FM, Dabbagh G, Rushkin I, Hutton R, Osei D, Sousa J, Bolan K, Nalamasu O, Reichmanis E, Yan Z, Reiser A. Fundamental studies of dissolution inhibitors in poly(norbornene-alt-maleic anhydride) based resins Journal of Photopolymer Science and Technology. 13: 569-578.  1
2000 Yang S, Pai CS, Pai JCH, Nalamasu O, Reichmanis E, Seputro J, Obeng YS. Novel nanoporous ultra low-dielectric constant poly(methyl silsesquioxane) Advanced Metallization Conference (Amc). 587-593.  1
2000 Dabbagh G, Houlihan FM, Rushkin I, Hutton RS, Nalamasu O, Reichmanis E, Yan Z, Reiser A. Model study by FT-IR and 13C NMR of the interaction of poly(norbornene-alt-maleic anhydride) and its derivatives with select cholate dissolution inhibitors or with select iodonium and sulfonium photo-acid generators Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  1
2000 Rushkin IL, Houlihan FM, Kometani JM, Hutton RS, Nalamasu O, Reichmanis E, Dimov O, Medina AN, Varlemann U, Gabor AH, Sarrubi TR, Bowden M. Study of dissolution properties of cycloolefin-maleic anhydride based resist resins Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  1
2000 Reichmanis E, Nalamasu O, Houlihan FM, Gabor AH, Neisser MO, Bowden MJ. Lithographic materials technologies: 193 nm imaging and beyond Materials Research Society Symposium - Proceedings. 584: 23-32.  1
2000 Yan Z, Houlihan FM, Reichmanis E, Nalamasu O, Reiser A, Dabbagh G, Hutton RS, Osei D, Sousa J, Bolan KJ. Mechanism of a single layer 193 nm dissolution inhibition resist Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  1
1999 Reichmanis E, Nalamasu O, Houlihan FM. Organic materials challenges for 193 nm imaging Accounts of Chemical Research. 32: 659-667. DOI: 10.1021/ar970150n  1
1999 Houlihan FM, Rushkin IL, Hutton RS, Timko AG, Reichmanis E, Nalamasu O, Gabor AH, Medina AN, Malik S, Neiser M, Kunz RR, Downs DK. Fundamental studies of the effects of photo-additive structure on resist outgassing Journal of Photopolymer Science and Technology. 12: 525-536.  1
1999 Bowden MJ, Gabor AH, Dimov O, Medina AN, Foster P, Steinhäusler T, Biafore JJ, Spaziano G, Slater SG, Blakeney AJ, Neisser MO, Houlihan FM, Cirelli RA, Dabbagh G, Button RS, ... ... Reichmanis E, et al. Advances in resist materials for 193 nm lithography Journal of Photopolymer Science and Technology. 12: 423-432.  1
1999 Reichmanis E, Nalamasu O, Houlihan FM, Novembre AE. Radiation chemistry of polymeric materials: Novel chemistry and applications for microlithography Polymer International. 48: 1053-1059.  1
1999 Nalamasu O, Houlihan FM, Cirelli RA, Watson GP, Reichmanis E. Single-layer resist design for 193nm lithography Solid State Technology. 42: 29-38.  1
1999 Rushkin IL, Houlihan FM, Kometani JM, Hutton RS, Timko AG, Reichmanis E, Nalamasu O, Gabor AH, Medina AN, Slater SG, Neisser M. New polymers for 193 nm single layer resists based on substituted cycloolefins/maleic anhydride resins Proceedings of Spie - the International Society For Optical Engineering. 3678: 44-50.  1
1999 Houlihan FM, Rushkin IL, Hutton RS, Timko AG, Nalamasu O, Reichmanis E, Gabor AH, Medina AN, Malik S, Neiser M, Kunz RR, Downs DK. Study of resist outgassing as a function of differing photoadditives Proceedings of Spie - the International Society For Optical Engineering. 3678: 264-274.  1
1999 Dabbagh G, Houlihan FM, Rushkin I, Hutton RS, Nalamasu O, Reichmanis E, Gabor AH, Medina AN. Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives Proceedings of Spie - the International Society For Optical Engineering. 3678: 86-93.  1
1999 Gabor AH, Dimov O, Medina AN, Neisser MO, Slater SG, Wang RH, Houlihan FM, Cirelli RA, Dabbagh G, Hutton RS, Rushkin IL, Sweeney JR, Timko AG, Nalamasu O, Reichmanis E. Optimization of 193 nm single layer resists through statistical design Proceedings of Spie - the International Society For Optical Engineering. 3678: 221-229.  1
1998 Kometani JM, Houlihan FM, Timko AG, Nalamasu O, Reichmanis E, Heffner SA, Galvin-Donoghue ME. Recent advances in increasing the thermal flow resistance of acetal-derivatized polyhydroxystyrene deep-UV matrix resins Proceedings of Spie - the International Society For Optical Engineering. 3333: 672-679. DOI: 10.1117/12.312466  1
1998 Houlihan FM, Kometani JM, Timko AG, Hutton RS, Cirelli RA, Reichmanis E, Nalamasu O, Gabor AH, Medina AN, Biafore JJ, Slater SG. 193-nm single-layer photoresists based on alternating copolymers of cycloolefins: The use of photogenerators of sulfamic acids Proceedings of Spie - the International Society For Optical Engineering. 3333: 73-82. DOI: 10.1117/12.312462  1
1998 Dabbagh G, Hutton RS, Cirelli RA, Reichmanis E, Novembre AE, Nalamasu O. Positive tone processing of plasma polymerized methylsilane (PPMS) Proceedings of Spie - the International Society For Optical Engineering. 3333: 394-400. DOI: 10.1117/12.312398  1
1998 Dabbagh G, Hutton RS, Cirelli RA, Novembre AE, Reichmanis E, Nalamasu O. Capabilities and limitations of plasma polymerized methylsilane (PPMS) all-dry lithography Journal of Photopolymer Science and Technology. 11: 651-662.  1
1998 Houlihan FM, Kometani JM, Timko AG, Hutton RS, Cirelli RA, Reichmanis E, Nalamasu O, Gabor AH, Medina AN, Biafore JJ, Slater SG. Photogenerators of sulfamic acids; use in chemically amplified single layer resists Journal of Photopolymer Science and Technology. 11: 419-430.  1
1998 Houlihan FM, Timko A, Hutton R, Cirelli R, Kometani JM, Reichmanis E, Nalamasu O. 193 nm Single Layer Resist Based on Poly(norbornenealt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties Acs Symposium Series. 706: 191-207.  1
1998 Nalamasu O, Houlihan FM, Cirelli RA, Timko AG, Watson GP, Hutton RS, Kometani JM, Reichmanis E, Gabor A, Medina A, Slater S. 193 nm single layer resist strategies, concepts, and recent results Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 3716-3721.  1
1997 Houlihan FM, Wallow T, Timko A, Neria E, Hutton R, Cirelli R, Kometani JM, Nalamasu O, Reichmanis E. A commercially viable 193 nm single layer resist platform Journal of Photopolymer Science and Technology. 10: 511-520.  1
1997 Reichmanis E, Nalamasu O, Houlihan FM, Wallow TI, Timko AG, Cirelli R, Dabbagh G, Hutton RS, Novembre AE, Smith BW. Resist design concepts for 193 nm lithography: Opportunities for innovation and invention Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 2528-2533.  1
1997 Houlihan FM, Wallow TI, Nalamasu O, Reichmanis E. Synthesis of cycloolefin-maleic anhydride alternating copolymers for 193 nm imaging Macromolecules. 30: 6517-6524.  1
1997 Nalamasu O, Wallow TI, Reichmanis E, Novembre AE, Houlihan FM, Dabbagh G, Mixon DA, Hutton RS, Timko AG, Wood OR, Cirelli RA. Revolutionary and evolutionary resist design concepts for 193 nm lithography Microelectronic Engineering. 35: 133-136.  1
1997 Reichmanis E, Nalamasu O, Wallow TI, Houlihan FM, Novembre AE. Design concepts for solution developed 193 nm lithographic materials Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 76: 198-199.  1
1997 Houlihan FM, Nalamasu O, Kometani JM, Reichmanis E. A retrospective on 2-nitrobenzyl sulfonate photoacid generators Journal of Imaging Science and Technology. 41: 35-40.  1
1996 Houlihan FM, Nalamasu O, Kometani JM, Reichmanis E. Retrospective on 2-nitrobenzylsulfonate photogenerators of acids Proceedings of the Is&T Annual Conference. 512-515.  1
1996 Reichmanis E, Blakeney A. Chemically amplified deep-ultraviolet photoresist Advanced Materials and Processes. 150: 41-42.  1
1996 Wallow TI, Houlihan FM, Nalamasu O, Chandross EA, Neenan TX, Reichmanis E. Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography Proceedings of Spie - the International Society For Optical Engineering. 2724: 355-364.  1
1995 Nalamasu O, Reichmanis E, Timko AG, Tarascon R, Novembre AE, Slater S, Holzwarth H, Falcigno P, Münzel N. A unified approach to resists materials design for the advanced lithographic technologies Microelectronic Engineering. 27: 367-370. DOI: 10.1016/0167-9317(94)00125-E  1
1994 Uhrich KE, Reichmanis E, Baiocchi FA. Influence of polymer structure on the miscibility of photoacid generators Chemistry of Materials. 6: 295-301.  1
1994 Uhrich KE, Reichmanis E, Heffner SA, Kometani JM, Nalamasu O. Novel photoresists incorporating [(trimethylsilyl)oxy]styrene Chemistry of Materials. 6: 287-294.  1
1994 Uhrich KE, Reichmanis E, Heffner SA, Kometani JM. Formation of polymers containing 4-hydroxystyrene via hydrolysis of 4-((trimethylsilyl)oxy)styrene Macromolecules. 27: 4936-4940.  1
1994 Reichmanis E, Houlihan FM, Nalamasu O, Neenan TX. Chemically amplified resists: chemistry and processes Advanced Materials For Optics and Electronics. 4: 83-93.  1
1993 Kometani JM, Galvin ME, Heffner SA, Houlihan FM, Nalamasu O, Chin E, Reichmanis E. A novel approach to inducing aqueous base solubility in substituted styrene-sulfone polymers Macromolecules. 26: 2165-2170.  1
1993 Reichmanis E, Novembre AE. Lithographic resist materials chemistry Annual Review of Materials Science. 23: 11-43.  1
1993 Reichmanis E. New directions in the design of lithographic resist materials: a case study Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 68: 61.  1
1992 Novembre AE, Hanson JE, Kometani JM, Tai WW, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF, Tomes DN. Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2) Microelectronic Engineering. 17: 257-260. DOI: 10.1016/0167-9317(92)90051-R  1
1992 Reichmanis E. Chemical amplification mechanism for microlithography Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 66: 36-37.  1
1992 Novembre AE, Tai WW, Kometani JM, Hanson JE, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF. Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide) Chemistry of Materials. 4: 278-284.  1
1992 Hanson JE, Reichmanis E, Houlihan FM, Neenan TX. Synthesis and evaluation of copolymers of (tert-butoxycarbonyloxy)styrene and (2-nitrobenzyl)styrene sulfonates: Single-component chemically amplified deep-UV imaging materials Chemistry of Materials. 4: 837-842.  1
1991 Reichmanis E, Thompson LF. Chemistry and processes for deep-UV resists Microelectronic Engineering. 13: 3-10. DOI: 10.1016/0167-9317(91)90037-E  1
1991 Reichmanis E, Thompson LF. Chemistry and process for deep-UV resists Microelectronic Engineering. 14: 215-226. DOI: 10.1016/0167-9317(91)90007-Z  1
1991 Reichmanis E, Houlihan FM, Nalamasu O, Neenan TX. Chemical amplification mechanisms for microlithography Chemistry of Materials. 3: 394-407.  1
1991 Houlihan FM, Neenan TX, Reichmanis E, Kometani JM, Chin T. Design, synthesis, characterization, and use of all-organic nonionic photogenerators of acid Chemistry of Materials. 3: 462-471.  1
1991 Kanga RS, Kometani JM, Reichmanis E, Hanson JE, Nalamasu O, Thompson LF, Heffner SA, Tai WW, Trevor P. Synthesis and characterization of poly[4-((tert -butoxycarbonyl)oxy)styrene-sulfone] Chemistry of Materials. 3: 660-667.  1
1991 Novembre AE, Hanson JE, Kometani JM, Tai WW, Reichmanis E, Thompson LF, West RJ. Arylmethyl sulfones. A new class of photoacid generators Photopolymers: Principles - Processes and Materials. 41-50.  1
1991 Houlihan FM, Neenan TX, Chin E, Reichmanis E, Kometani JM. Synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generator of acid Photopolymers: Principles - Processes and Materials. 113-120.  1
1991 Nalamasu O, Reichmanis E, Hanson JE, Kanga RS, Heimbrook LA, Emerson AB, Baiocchi FA, Vaidya S. Effect of post-exposure delay in positive acting chemically amplified resist. An analytical study Photopolymers: Principles - Processes and Materials. 225-234.  1
1991 Reichmanis E, Kometani JM, Houlihan FM, Neenan TX, Nalamasu O. TBSS based chemically amplified resist for for sub-0.5 μm lithography Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 64: 21-22.  1
1991 Novembre AE, Tai WW, Kometani JM, Hanson JE, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF. Single component-chemically amplified resist materials for electron-beam and x-ray lithography Proceedings of Spie - the International Society For Optical Engineering. 1466: 89-99.  1
1990 Novembre AE, Tai WW, Nalamasu O, Kometani JM, Houlihan FM, Neenan TX, Reichmanis E. Study of the affects of X-ray and electron-beam radiation on poly (4-t-butoxycarbonyloxystyrene-sulfone) American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 31: 379.  1
1990 Neenan TX, Houlihan FM, Reichmanis E, Kometani JM, Bachman BJ, Thompson LF. Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices. Studies pertaining to chemical amplification and imaging Macromolecules. 23: 145-150.  1
1989 Neenan TX, Houlihan FM, Reichmanis E, Kometani JM, Bachman BJ, Thompson LF. Chemically Amplified Resists: A Lithographic Comparison of Acid Generating Species Proceedings of Spie - the International Society For Optical Engineering. 1086: 2-10. DOI: 10.1117/12.953012  1
1989 Jurek MJ, Tarascon RG, Reichmanis E. Synthesis and oxygen reactive ion etching of novolac-siloxane block copolymers Chemistry of Materials. 1: 319-324.  1
1989 Jurek MJ, Novembre AE, Heyward IP, Gooden R, Reichmanis E. Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl) methyl methacrylate-(chloromethyl)styrene) copolymers Chemistry of Materials. 1: 509-514.  1
1989 Jurek MJ, Novembre AE, Reichmanis E. Organosilicon containing copolymers for bilevel resist applications International Sampe Symposium and Exhibition (Proceedings). 3: 884-893.  1
1989 Reichmanis E, Thompson LF. Polymer materials for microlithography Chemical Reviews. 89: 1273-1289.  1
1989 Jurek MJ, Tarascon RG, Reichmanis E. Synthesis and oxygen reactive ion etching of novel siloxane block copolymers Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 60: 376-380.  1
1989 Houlihan FM, Neenan TX, Reichmanis E, Kometani JM, Thompson LF. Photo and thermo chemistry of select 2,6-dinitrobenzyl esters in polymer matrices. Studies pertaining to chemical amplification and imaging Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 61: 296-301.  1
1989 Houlihan FM, Reichmanis E, Tarascon RG, Taylor GN, Hellman MY, Thompson LF. Thermolysis and acidolysis of selected poly(t-BOC-styrene) derivatives Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Materials Science and Engineering. 60: 40-44.  1
1989 Houlihan FM, Reichmanis E, Tarascon RG, Taylor GN, Hellman MY, Thompson LF. GC/MS study of the thermolysis and acidolysis of poly(t-BOC-α-methylstyrene), poly(t-BOC-styrene), and poly(t-BOC-styrene sulfone) Macromolecules. 22: 2999-3004.  1
1989 Novembre AE, Jurek MJ, Kornblit A, Reichmanis E. Sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist P(Sl-CMS) Polymer Engineering and Science. 29: 920-927.  1
1989 Tarascon RG, Reichmanis E, Houlihan FM, Shugard A, Thompson LF. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography Polymer Engineering and Science. 29: 850-855.  1
1988 Jurgensen CW, Shugard A, Dudash N, Reichmanis E, Vasile MJ. Experimental tests of the steady state model for oxygen reactive ion etching of silicon containing polymers Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 6: 2938-2944. DOI: 10.1116/1.575455  1
1988 Houlihan FM, Shugard A, Gooden R, Reichmanis E. Nitrobenzyl ester chemistry for polymer processes involving chemical amplification Macromolecules. 21: 2001-2006.  1
1988 Novembre AE, Jurek MJ, Heyward IP, Reichmanis E. Sub-0.5μm bilevel lithographic process using the deep-UV resist P(SI-CMS) Technical Papers, Regional Technical Conference - Society of Plastics Engineers. 247-257.  1
1988 Tarascon RG, Reichmanis E, Houlihan F, Shugard A, Thompson LF. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deel-UV lithography Technical Papers, Regional Technical Conference - Society of Plastics Engineers. 11-26.  1
1987 Frackoviak J, Tarascon RG, Vaidya S, Reichmanis E. Process Parameters for Submicron Electron Beam Lithography of NPR Proceedings of Spie - the International Society For Optical Engineering. 771: 120-127. DOI: 10.1117/12.940316  1
1987 Tarascon RG, Frackoviak J, Reichmanis E, Thompson LF. Chemical factors affecting npr performance Proceedings of Spie - the International Society For Optical Engineering. 771: 54-60. DOI: 10.1117/12.940308  1
1987 Tarascon RG, Shugard A, Reichmanis E. REACTIVE ION ETCHING AND LITHOGRAPHIC CHARACTERIZATION OF A NEW ORGANOSILICON RESIST Materials Research Society Symposia Proceedings. 76: 347-351.  1
1987 Reichmanis E, Smith BC, Smolinsky G, Wilkins CW. P(SI-MA)/2-NITROBENZYL CHOLATE: A TWO-LEVEL, SOLUTION-INHIBITION, DEEP-UV RESIST SYSTEM Journal of the Electrochemical Society. 134: 653-657.  1
1986 Tarascon RG, Shugard A, Reichmanis E. Synthesis and lithographic characterization of a novel organosilicon novolac resin Proceedings of Spie - the International Society For Optical Engineering. 631: 40-47. DOI: 10.1117/12.963624  1
1986 Novembre AE, Reichmanis E, Davis M. Preparation and lithographic properties of poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) Proceedings of Spie - the International Society For Optical Engineering. 631: 14-21. DOI: 10.1117/12.963620  1
1986 Reichmanis E, Novembre AE, Tarascon RG, Shugard A. NEW SILICON CONTAINING ELECTRON-BEAM RESIST SYSTEMS Polymeric Materials Science and Engineering, Proceedings of the Acs Division of Polymeric Material. 55: 294-297.  1
1985 Smolinsky G, Reichmanis E, Wilkins CW. APPROACHES TO TWO-LEVEL RESIST SYSTEMS Technical Papers, Regional Technical Conference - Society of Plastics Engineers. 167-176.  1
1985 Reichmanis E, Smolinsky G, Wilkins CW. RESISTS FOR USE IN TWO-LEVEL, RIE, PATTERN-TRANSFER APPLICATIONS American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 26: 341-342.  1
1985 Reichmanis E, Smolinsky G, Wilkins CW. APPROACHES TO RESISTS FOR TWO-LEVEL RIE PATTERN TRANSFER APPLICATIONS Solid State Technology. 28: 130-135.  1
1985 Reichmanis E, Smolinsky G. OXYGEN RIE-RESISTANT DEEP-UV POSITIVE RESISTS: POLY (TRIMETHYLSILYLMETHYL METHACRYLATE) AND POLY (TRIMETHYLSILYLMETHYL METHACRYLATE-CO-3-OXIMO-2-BUTANONE METHACRYLATE) Journal of the Electrochemical Society. 132: 1178-1182.  1
1985 Reichmanis E, Smith BC, Gooden R. omicron -NITROBENZYL PHOTOCHEMISTRY: SOLUTION VS. SOLID-STATE BEHAVIOR Journal of Polymer Science. Part a-1, Polymer Chemistry. 23: 1-8.  1
1984 Reichmanis E, Smolinsky G. Deep uv positive resists for two-level photoresist processes Proceedings of Spie - the International Society For Optical Engineering. 469: 38-44. DOI: 10.1117/12.941775  1
1984 Wilkins CW, Reichmanis E, Wolf TM, Smith BC. ORGANOSILICON NOVALAC RESIN FOR MULTILEVEL RESIST APPLICATIONS Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. 3: 306-309. DOI: 10.1116/1.583251  1
1983 Reichmanis E, Wilkins CW, Ong E. MATERIALS FOR MULTILEVEL RESIST SCHEMES Polymer Engineering and Science. 23: 1039-1042.  1
1983 Wilkins CW, Reichmanis E, Chandross EA, Hartless RL. DEEP UV PHOTOLITHOGRAPHIC SYSTEMS AND PROCESSES Polymer Engineering and Science. 23: 1025-1028.  1
1983 Reichmanis E, Wilkins CW, Price DA, Chandross EA. EFFECT OF SUBSTITUENTS ON THE PHOTOSENSITIVITY OF 2-NITROBENZYL ESTER DEEP U. V. RESISTS Journal of the Electrochemical Society. 130: 1433-1437.  1
1983 Reichmanis E, Gooden R, Wilkins CW, Schonhorn H. STUDY OF THE PHOTOCHEMICAL RESPONSE OF o-NITROBENZYL CHOLATE DERIVATIVES IN P(MMA-MAA) MATRICES Journal of Polymer Science. Part a-1, Polymer Chemistry. 21: 1075-1083.  1
1983 Chandross EA, Reichmanis E, Wilkins CW, Hartless RL. DESIGN OF NEW PHOTORESISTS FOR DEEP UV (300 nm) LITHOGRAPHY Organic Coatings and Applied Polymer Science Proceedings. 48: 46-47.  1
1982 Wilkins CW, Reichmanis E, Chandross EA, Hartless RL. DEEP UV PHOTOGRAPHIC SYSTEMS AND PROCESSES . 8.  1
1982 WILKINS CWJ, REICHMANIS E, CHANDROSS EA. LITHOGRAPHIC EVALUATION OF AN 0-NITROBENZYL ESTER BASED DEEP U. V. RESIST SYSTEM J Electrochem Soc. 2552-2555.  1
1982 Bowmer TN, Reichmanis E, Wilkins CW, Hellman MY. RADIATION DEGRADATION OF COPOLYMERS OF METHYL METHACRYLATE AND 3-OXIMINO-2-BUTANONE METHACRYLATE Journal of Polymer Science. Part a-1, Polymer Chemistry. 20: 2661-2668.  1
1982 Purcell FJ, Russavage E, Reichmanis E, Wilkins CW. COMPOSITIONAL ANALYSIS OF A TERPOLYMER PHOTORESIST BY RAMAN SPECTROSCOPY Acs Symposium Series. 45-59.  1
1982 Reichmanis E, Wilkins CW. POLY(METHYL METHACRYLATE-co-3-OXIMINO-2-BUTANONE METHACRYLATE-co-METHACRYLONITRILE): A DEEP-UV PHOTORESIST Acs Symposium Series. 29-43.  1
1981 Reichmanis E, Wilkins CW, Chandross EA. NOVEL APPROACH TO O-NITROBENZYL PHOTOCHEMISTRY FOR RESISTS Journal of Vacuum Science & Technology. 19: 1338-1342. DOI: 10.1116/1.571272  1
1980 Reichmanis E, Wilkins CW. POLY (METHYL METHACRYLATE-CO-3-OXIMINO-2-BUTANONE METHACRYLATE-CO-METHACRYLONITRILE) - A ″DEEP UV″ PHOTORESIST American Chemical Society, Division of Organic Coatings and Plastics Chemistry, Preprints. 43: 2 43-251.  1
1980 Reichmanis E, Wilkins CW, Chandross EA. EFFECT OF SENSITIZERS ON THE PHOTODEGRADATION OF POLY(METHYL METHACRYLATE-co-3-OXIMINO-2-BUTANONE METHACRYLATE Journal of the Electrochemical Society. 127: 2514-2517.  1
1980 Wilkins CW, Reichmanis E, Chandross EA. PRELIMINARY EVALUATION OF COPOLYMERS OF METHYL METHACRYLATE AND ACYLOXIMINO METHACRYLATE AS DEEP U. V. RESISTS Journal of the Electrochemical Society. 127: 2510-2513.  1
1980 Reichmanis E, Wilkins CW, Chandross EA. ON THE PHOTODEGRADATION OF POLY (METHYL METHACRYLATE-CO-3-OXIMINO-2-BUTANONE METHACRYLATE) American Chemical Society, Division of Organic Coatings and Plastics Chemistry, Preprints. 42: 772-778.  1
1978 Anastassiou AG, Reichmanis E, Girgenti SJ, Schaefer-Ridder M. Pericyclic synthesis and exploratory photochemistry of potentially direct progenitors of the unrestricted hetero[11]annulene system Journal of Organic Chemistry. 43: 315-322.  1
1977 Anastassiou AG, Reichmanis E, Girgenti SJ. Development of aromaticity in the 1-pyrindine system. A surprising insensitivity to N-substitution [29] Journal of the American Chemical Society. 99: 7392-7393.  1
1977 Anastassiou AG, Girgenti SJ, Griffith RC, Reichmanis E. 1,2- and 1,4-Oxides of azonine. A unique synthetic entry into N-substituted 1-pyrindines Journal of Organic Chemistry. 42: 2651-2653.  1
1976 Anastassiou AG, Reichmanis E. Cycloadditive coupling between 3,6-diphenyl-s-tetrazine and bicyclo[6.1.0]nona-2,4,6-trienes; pericyclic synthesis of pyridazinocyclononene and pyridazinoazonine frameworks Journal of the Chemical Society, Chemical Communications. 313-314. DOI: 10.1039/C39760000313  1
1976 Anastassiou AG, Reichmanis E. An examination of the heteronins by 13C nuclear magnetic resonance [5] Journal of the American Chemical Society. 98: 8266-8267.  1
1976 Anastassiou AG, Reichmanis E. An examination of the 9-heterobicyclo[4.2.1]nona-2,4,7-trienes by 13C nuclear magnetic resonance [6] Journal of the American Chemical Society. 98: 8267-8268.  1
1975 Anastassiou AG, Reichmanis E. A stable trans-benzazoninyl anion Journal of the Chemical Society, Chemical Communications. 149-151. DOI: 10.1039/C39750000149  1
1975 Anastassiou AG, Reichmanis E, Wetzel JC. The fluctional behavior of 9-heterobarbaralanes Tetrahedron Letters. 16: 1651-1654. DOI: 10.1016/S0040-4039(00)72223-4  1
1974 Anastassiou AG, Elliott RL, Reichmanis E. Effect of heteroatom electronegativity on the development of diatropic character in cis, trans, cis, trans, cis, trans- aza[13]annulenes [12] Journal of the American Chemical Society. 96: 7823-7825.  1
1973 Anastassiou AG, Winston AE, Reichmanis E. The 9-azabarbaralane (9-azatricyclo[3,3,1,02,8]nona-3,6-diene) system Journal of the Chemical Society, Chemical Communications. 779-780. DOI: 10.1039/C39730000779  1
1973 Anastassiou AG, Reichmanis E. Dioxa and trioxa derivatives of C8H8 Journal of Organic Chemistry. 38: 2421-2422.  1
1972 Anastassiou AG, Reichmanis E, Griffith RC. 9-(7-Cycloheptatrienyl)-cis,cis,cis,cis-cyclonona-1,3,5, 7-tetraene;synthesis and bond-relocation Journal of the Chemical Society, Chemical Communications. 913-914. DOI: 10.1039/C39720000913  1
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