Samantha G. Rosenberg, Ph.D. - Publications

Affiliations: 
2013 Johns Hopkins University, Baltimore, MD 
Area:
General Chemistry, Materials Science Engineering, Physical Chemistry

20 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2023 Gilbert SJ, Meyerson ML, Kotula PG, Rosenberg SG, Kmieciak TG, McGarry MP, Siegal MP, Biedermann LB. Granular metals with SiNdielectrics. Nanotechnology. 34. PMID 37503937 DOI: 10.1088/1361-6528/ace4d2  0.335
2022 Gilbert SJ, Rosenberg SG, Kotula PG, Kmieciak TG, Biedermann LB, Siegal MP. The effect of metal-insulator interface interactions on electrical transport in granular metals. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 34. PMID 35289307 DOI: 10.1088/1361-648X/ac5706  0.345
2021 Rodriguez de Marcos LV, Boris DR, Gray E, del Hoyo JG, Kozen AC, Richardson JG, Rosenberg SG, Walton SG, Wheeler V, Wollack EJ, Woodward JM, Quijada MA. Room temperature plasma-etching and surface passivation of far-ultraviolet Al mirrors using electron beam generated plasmas Optical Materials Express. 11: 740. DOI: 10.1364/OME.417475  0.337
2021 Walton SG, Boris DR, Rosenberg SG, Miyazoe H, Joseph EA, Engelmann SU. Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films Journal of Vacuum Science & Technology A. 39: 033002. DOI: 10.1116/6.0000868  0.404
2019 Pennachio DJ, Ornelas-Skarin CC, Wilson NS, Rosenberg SG, Daniels KM, Myers-Ward RL, Gaskill DK, Eddy CR, Palmstrøm CJ. Tailoring commensurability of hBN/graphene heterostructures using substrate morphology and epitaxial growth conditions Journal of Vacuum Science & Technology A. 37: 051503. DOI: 10.1116/1.5110524  0.354
2019 Rosenberg SG, Wagenbach C, Anderson VR, Johnson SD, Nepal N, Kozen AC, Woodward JM, Robinson ZR, Munger M, Joress H, Ludwig KF, Eddy CR. In situ studies of low temperature atomic level processing of GaN surfaces for atomic layer epitaxial growth Journal of Vacuum Science & Technology A. 37: 020928. DOI: 10.1116/1.5080380  0.316
2019 Rosenberg SG, Pennachio DJ, Wagenbach C, Johnson SD, Nepal N, Kozen AC, Woodward JM, Robinson Z, Joress H, Ludwig KF, Palmstrøm CJ, Eddy CR. Low temperature surface preparation of GaN substrates for atomic layer epitaxial growth: Assessment of ex situ preparations Journal of Vacuum Science & Technology A. 37: 020908. DOI: 10.1116/1.5080090  0.414
2018 DeJarld M, Campbell PM, Friedman AL, Currie M, Myers-Ward RL, Boyd AK, Rosenberg SG, Pavunny SP, Daniels KM, Gaskill DK. Surface potential and thin film quality of low work function metals on epitaxial graphene. Scientific Reports. 8: 16487. PMID 30405192 DOI: 10.1038/S41598-018-34595-1  0.317
2016 Duncan DA, Mendelsberg R, Mezher M, Horsley K, Rosenberg SG, Blum M, Xiong G, Weinhardt L, Gloeckler M, Heske C. A New Look at the Electronic Structure of Transparent Conductive Oxides-A Case Study of the Interface between Zinc Magnesium Oxide and Cadmium Telluride Advanced Materials Interfaces. DOI: 10.1002/Admi.201600418  0.349
2014 Rosenberg SG, Barclay M, Fairbrother DH. Electron induced surface reactions of organometallic metal(hfac)₂ precursors and deposit purification. Acs Applied Materials & Interfaces. 6: 8590-601. PMID 24784352 DOI: 10.1021/Am501457H  0.652
2014 Spencer JA, Rosenberg SG, Barclay M, Wu YC, McElwee-White L, Howard Fairbrother D. Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition Applied Physics a: Materials Science and Processing. 117: 1631-1644. DOI: 10.1007/S00339-014-8570-5  0.685
2014 Spencer JA, Rosenberg SG, Barclay M, Wu Y, McElwee-White L, Howard Fairbrother D. ChemInform Abstract: Understanding the Electron-Stimulated Surface Reactions of Organometallic Complexes to Enable Design of Precursors for Electron Beam-Induced Deposition Cheminform. 46: no-no. DOI: 10.1002/CHIN.201503283  0.595
2013 Rosenberg SG, Barclay M, Fairbrother DH. Electron induced reactions of surface adsorbed tungsten hexacarbonyl (W(CO)6). Physical Chemistry Chemical Physics : Pccp. 15: 4002-15. PMID 23400276 DOI: 10.1039/C3Cp43902J  0.729
2013 Rosenberg SG, Barclay M, Fairbrother DH. Electron beam induced reactions of adsorbed cobalt tricarbonyl nitrosyl (Co(CO)3NO) molecules Journal of Physical Chemistry C. 117: 16053-16064. DOI: 10.1021/Jp404905T  0.706
2012 Rosenberg SG, Landheer K, Hagen CW, Fairbrother DH. Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4751281  0.662
2011 Landheer K, Rosenberg SG, Bernau L, Swiderek P, Utke I, Hagen CW, Fairbrother DH. Low-energy electron-induced decomposition and reactions of adsorbed tetrakis(trifluorophosphine)platinum [Pt(PF 3) 4] Journal of Physical Chemistry C. 115: 17452-17463. DOI: 10.1021/Jp204189K  0.635
2011 Wnuk JD, Rosenberg SG, Gorham JM, Van Dorp WF, Hagen CW, Fairbrother DH. Electron beam deposition for nanofabrication: Insights from surface science Surface Science. 605: 257-266. DOI: 10.1016/J.Susc.2010.10.035  0.686
2010 Wnuk JD, Gorham JM, Rosenberg SG, Madey TE, Hagen CW, Fairbrother DH. Atomic radical abatement of organic impurities from electron beam deposited metallic structures Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 527-537. DOI: 10.1116/1.3378142  0.679
2010 Wnuk JD, Gorham JM, Rosenberg SG, Van Dorp WF, Madey TE, Hagen CW, Fairbrother DH. Electron beam irradiation of dimethyl-(acetylacetonate) gold(III) adsorbed onto solid substrates Journal of Applied Physics. 107. DOI: 10.1063/1.3295918  0.707
2009 Wnuk JD, Gorham JM, Rosenberg SG, Van Dorp WF, Madey TE, Hagen CW, Fairbrother DH. Electron induced surface reactions of the organometallic precursor trimethyl(methylcyclopentadienyl)platinum(IV) Journal of Physical Chemistry C. 113: 2487-2496. DOI: 10.1021/Jp807824C  0.684
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