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Steven McClellan George - Publications

Affiliations: 
University of Colorado, Boulder, Boulder, CO, United States 
Area:
surface chemistry, thin film growth and nanostructure engineering
Website:
http://www.colorado.edu/che/faculty/george.html

269 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Young MJ, Yanguas-Gil A, Letourneau S, Coile M, Mandia D, Bedford NM, Aoun B, Cavanagh AS, George SM, Elam JW. Probing the atomic-scale structure of amorphous aluminum oxide grown by atomic layer deposition. Acs Applied Materials & Interfaces. PMID 32309922 DOI: 10.1021/Acsami.0C01905  0.795
2020 Welch BC, McIntee OM, Ode AB, McKenzie BB, Greenberg AR, Bright VM, George SM. Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition Journal of Vacuum Science and Technology. 38: 52409. DOI: 10.1116/6.0000271  0.536
2020 Parsons GN, Elam JW, George SM, Haukka S, Jeon H, (Erwin) Kessels WMM, Leskelä M, Poodt P, Ritala M, Rossnagel SM. Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)] Journal of Vacuum Science & Technology A. 38: 037001. DOI: 10.1116/6.0000143  0.596
2020 Abdulagatov AI, George SM. Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism Journal of Vacuum Science & Technology A. 38: 022607. DOI: 10.1116/1.5140481  0.756
2020 Murdzek JA, George SM. Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide Journal of Vacuum Science & Technology A. 38: 022608. DOI: 10.1116/1.5135317@Jva.2020.Ale2020.Issue-1  0.486
2020 Mahuli N, Cavanagh AS, George SM. Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry Journal of Vacuum Science & Technology A. 38: 022407. DOI: 10.1116/1.5135014  0.769
2019 Lu W, Lee Y, Gertsch JC, Murdzek J, Cavanagh AS, Kong L, Del Alamo J, George SM. In situ Thermal Atomic Layer Etching for Sub-5 nm InGaAs Multi-gate MOSFETs. Nano Letters. PMID 31251069 DOI: 10.1021/Acs.Nanolett.9B01525  0.701
2019 Sobell ZC, Cavanagh AS, George SM. Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons Journal of Vacuum Science & Technology A. 37: 060906. DOI: 10.1116/1.5113711  0.718
2019 Johnson NR, Hite JK, Mastro MA, Eddy CR, George SM. Thermal atomic layer etching of crystalline GaN using sequential exposures of XeF2 and BCl3 Applied Physics Letters. 114: 243103. DOI: 10.1063/1.5095938  0.392
2019 Hirschberg C, Jensen NS, Boetker J, Madsen AØ, Kääriäinen TO, Kääriäinen M, Hoppu P, George SM, Murtomaa M, Sun CC, Risbo J, Rantanen J. Improving Powder Characteristics by Surface Modification Using Atomic Layer Deposition Organic Process Research & Development. 23: 2362-2368. DOI: 10.1021/Acs.Oprd.9B00247  0.417
2019 Clancey JW, Cavanagh AS, Smith JET, Sharma S, George SM. Volatile Etch Species Produced during Thermal Al2O3 Atomic Layer Etching The Journal of Physical Chemistry C. 124: 287-299. DOI: 10.1021/Acs.Jpcc.9B06104  0.675
2019 Gertsch JC, Cano AM, Bright VM, George SM. SF4 as the Fluorination Reactant for Al2O3 and VO2 Thermal Atomic Layer Etching Chemistry of Materials. 31: 3624-3635. DOI: 10.1021/Acs.Chemmater.8B05294  0.38
2018 Sprenger JK, Sun H, Cavanagh AS, Roshko A, Blanchard PT, George SM. Electron-Enhanced Atomic Layer Deposition of Boron Nitride Thin Films at Room Temperature and 100 °C. The Journal of Physical Chemistry. C, Nanomaterials and Interfaces. 122. PMID 33101567 DOI: 10.1021/Acs.Jpcc.8B00796  0.77
2018 Wallas JM, Young MJ, Sun H, George SM. Efficient Capacitive Deionization Using Thin Film Sodium Manganese Oxide Journal of the Electrochemical Society. 165: A2330-A2339. DOI: 10.1149/2.0751810Jes  0.411
2018 Lee Y, George SM. Thermal atomic layer etching of HfO2 using HF for fluorination and TiCl4 for ligand-exchange Journal of Vacuum Science and Technology. 36: 61504. DOI: 10.1116/1.5045130  0.403
2018 Zywotko DR, Faguet J, George SM. Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging Journal of Vacuum Science and Technology. 36: 61508. DOI: 10.1116/1.5043488  0.41
2018 Sprenger JK, Sun H, Cavanagh AS, George SM. Electron-enhanced atomic layer deposition of silicon thin films at room temperature Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 36: 01A118. DOI: 10.1116/1.5006696  0.756
2018 Yersak AS, Sharma K, Wallas JM, Dameron AA, Li X, Yang Y, Hurst KE, Ban C, Tenent RC, George SM. Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 36: 01A123. DOI: 10.1116/1.5006670  0.369
2018 Higgs DJ, DuMont JW, Sharma K, George SM. Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor Journal of Vacuum Science and Technology. 36. DOI: 10.1116/1.5004041  0.787
2018 Abdulagatov AI, George SM. Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants Chemistry of Materials. 30: 8465-8475. DOI: 10.1021/Acs.Chemmater.8B02745  0.761
2017 Johnson N, George SM. WO3 and W Thermal Atomic Layer Etching Using "Conversion-Fluorination" and "Oxidation-Conversion-Fluorination" Mechanisms. Acs Applied Materials & Interfaces. PMID 28876892 DOI: 10.1021/Acsami.7B09161  0.451
2017 Hautala J, Kääriäinen T, Hoppu P, Kemell M, Heinämäki J, Cameron D, George S, Juppo AM. Atomic Layer Deposition - A Novel Method for the Ultrathin Coating of Minitablets. International Journal of Pharmaceutics. PMID 28802795 DOI: 10.1016/J.Ijpharm.2017.08.010  0.378
2017 Kääriäinen TO, Kemell M, Vehkamäki M, Kääriäinen ML, Correia A, Santos HA, Bimbo LM, Hirvonen J, Hoppu P, George SM, Cameron DC, Ritala M, Leskelä M. Surface Modification of Acetaminophen Particles by Atomic Layer Deposition. International Journal of Pharmaceutics. PMID 28432020 DOI: 10.1016/J.Ijpharm.2017.04.031  0.372
2017 Zhou Y, Lee Y, Sun H, Wallas JM, George SM, Xie M. Coating Solution for High-Voltage Cathode: AlF3 Atomic Layer Deposition for Free-standing LiCoO2 Electrodes with High Energy Density and Excellent Flexibility. Acs Applied Materials & Interfaces. PMID 28244725 DOI: 10.1021/Acsami.6B15628  0.331
2017 DuMont JW, Marquardt A, Cano A, George SM. Thermal Atomic Layer Etching of SiO2 by a "Conversion-Etch" Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride. Acs Applied Materials & Interfaces. PMID 28240864 DOI: 10.1021/Acsami.7B01259  0.38
2017 DuMont JW, George SM. Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride. The Journal of Chemical Physics. 146: 052819. PMID 28178819 DOI: 10.1063/1.4973310  0.376
2017 Lancaster DK, Sun H, George SM. Atomic Layer Deposition of Zn(O,S) Alloys Using Diethylzinc with H2O and H2S: Effect of Exchange Reactions The Journal of Physical Chemistry C. 121: 18643-18652. DOI: 10.1021/Acs.Jpcc.7B05361  0.435
2017 Lee Y, George SM. Thermal Atomic Layer Etching of Titanium Nitride Using Sequential, Self-Limiting Reactions: Oxidation to TiO2 and Fluorination to Volatile TiF4 Chemistry of Materials. 29: 8202-8210. DOI: 10.1021/Acs.Chemmater.7B02286  0.457
2017 Zywotko DR, George SM. Thermal Atomic Layer Etching of ZnO by a “Conversion-Etch” Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum Chemistry of Materials. 29: 1183-1191. DOI: 10.1021/Acs.Chemmater.6B04529  0.503
2016 Sprenger JK, Cavanagh AS, Sun H, Wahl KJ, Roshko A, George SM. Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100 °C Using Sequential Surface Reactions. Chemistry of Materials : a Publication of the American Chemical Society. 28. PMID 31092972 DOI: 10.1021/Acs.Chemmater.6B00676  0.756
2016 Young MJ, Hare CD, Cavanagh AS, Musgrave CB, George SM. Rapid Growth of Crystalline Mn5O8 by Self-Limited Multilayer Deposition using Mn(EtCp)2 and O3. Acs Applied Materials & Interfaces. PMID 27351207 DOI: 10.1021/Acsami.6B04529  0.75
2016 George SM, Lee Y. Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions. Acs Nano. 10: 4889-94. PMID 27216115 DOI: 10.1021/Acsnano.6B02991  0.41
2016 Wang Y, Clancey J, Lu G, Liu J, Liu L, Chaudhuri J, George S, Xie M, Wei S, Guo Z. Enhanced methanol oxidation with annealed atomic layer deposited platinum nanoparticles on carbon nanotubes Journal of the Electrochemical Society. 163: F1-F10. DOI: 10.1149/2.1001514Jes  0.386
2016 Johnson NR, Sun H, Sharma K, George SM. Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34. DOI: 10.1116/1.4959779  0.489
2016 Sharma K, Routkevitch D, Varaksa N, George SM. Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34. DOI: 10.1116/1.4937728  0.51
2016 Sprenger JK, Cavanagh AS, Sun H, Wahl KJ, Roshko A, George SM. Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100 °c Using Sequential Surface Reactions Chemistry of Materials. 28: 5282-5294. DOI: 10.1021/acs.chemmater.6b00676  0.736
2016 Lee Y, Dumont JW, George SM. Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions Chemistry of Materials. 28: 2994-3003. DOI: 10.1021/Acs.Chemmater.6B00111  0.416
2016 Lee Y, Sun H, Young MJ, George SM. Atomic Layer Deposition of Metal Fluorides Using HF-Pyridine as the Fluorine Precursor Chemistry of Materials. 28: 2022-2032. DOI: 10.1021/Acs.Chemmater.5B04360  0.452
2016 Molina Piper D, Lee Y, Son SB, Evans T, Lin F, Nordlund D, Xiao X, George SM, Lee SH, Ban C. Cross-linked aluminum dioxybenzene coating for stabilization of silicon electrodes Nano Energy. 22: 202-210. DOI: 10.1016/J.Nanoen.2016.02.021  0.381
2016 Ban C, George SM. Molecular Layer Deposition for Surface Modification of Lithium-Ion Battery Electrodes Advanced Materials Interfaces. 3: 1600762. DOI: 10.1002/Admi.201600762  0.32
2016 Young MJ, Schnabel H, Holder AM, George SM, Musgrave CB. Band Diagram and Rate Analysis of Thin Film Spinel LiMn2O4Formed by Electrochemical Conversion of ALD-Grown MnO Advanced Functional Materials. 26: 7895-7907. DOI: 10.1002/Adfm.201602773  0.397
2015 Xie M, Sun X, George SM, Zhou C, Lian J, Zhou Y. Amorphous Ultrathin SnO2 Films by Atomic Layer Deposition on Graphene Network as Highly Stable Anodes for Lithium Ion Batteries. Acs Applied Materials & Interfaces. PMID 26606590 DOI: 10.1021/Acsami.5B08719  0.427
2015 Eigenfeld NT, Gertsch JC, Skidmore GD, George SM, Bright VM. Electrical and thermal conduction in ultra-thin freestanding atomic layer deposited W nanobridges. Nanoscale. 7: 17923-8. PMID 26463738 DOI: 10.1039/C5Nr04885K  0.494
2015 Xie M, Piper DM, Tian M, Clancey J, George SM, Lee SH, Zhou Y. Doped Si nanoparticles with conformal carbon coating and cyclized-polyacrylonitrile network as high-capacity and high-rate lithium-ion battery anodes. Nanotechnology. 26: 365401. PMID 26289444 DOI: 10.1088/0957-4484/26/36/365401  0.363
2015 Ma Y, Martinez de la Hoz JM, Angarita I, Berrio-Sanchez JM, Benitez L, Seminario JM, Son SB, Lee SH, George SM, Ban C, Balbuena PB. Structure and Reactivity of Alucone-Coated Films on Si and LixSiy Surfaces. Acs Applied Materials & Interfaces. 7: 11948-55. PMID 25985821 DOI: 10.1021/Acsami.5B01917  0.505
2015 Young MJ, Musgrave CB, George SM. Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment. Acs Applied Materials & Interfaces. 7: 12030-7. PMID 25965097 DOI: 10.1021/Acsami.5B02167  0.552
2015 Luo L, Yang H, Yan P, Travis JJ, Lee Y, Liu N, Molina Piper D, Lee SH, Zhao P, George SM, Zhang JG, Cui Y, Zhang S, Ban C, Wang CM. Surface-coating regulated lithiation kinetics and degradation in silicon nanowires for lithium ion battery. Acs Nano. 9: 5559-66. PMID 25893684 DOI: 10.1021/Acsnano.5B01681  0.369
2015 Lee Y, George SM. Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluoride. Acs Nano. 9: 2061-70. PMID 25604976 DOI: 10.1021/Nn507277F  0.453
2015 Young MJ, Neuber M, Cavanagh AC, Sun H, Musgrave CB, George SM. Sodium charge storage in thin films of MnO2 derived by electrochemical oxidation of MnO atomic layer deposition films Journal of the Electrochemical Society. 162: A2753-A2761. DOI: 10.1149/2.0671514Jes  0.507
2015 Xie M, Sun X, Zhou C, Cavanagh AS, Sun H, Hu T, Wang G, Lian J, George SM. Amorphous ultrathin TiO2 atomic layer deposition films on carbon nanotubes as anodes for lithium ion batteries Journal of the Electrochemical Society. 162: A974-A981. DOI: 10.1149/2.0501506Jes  0.741
2015 Woo JH, Travis JJ, George SM, Lee SH. Utilization of Al2O3 atomic layer deposition for Li ion pathways in solid state Li batteries Journal of the Electrochemical Society. 162: A344-A349. DOI: 10.1149/2.0441503Jes  0.395
2015 Lee Y, Dumont JW, George SM. Atomic layer etching of HfO2 using sequential, self-limiting thermal reactions with Sn(acac)2 and HF Ecs Journal of Solid State Science and Technology. 4: N5013-N5022. DOI: 10.1149/2.0041506Jss  0.397
2015 Lee Y, DuMont JW, George SM. Atomic layer etching using thermal reactions: Atomic layer deposition in reverse Ecs Transactions. 69: 233-241. DOI: 10.1149/06907.0233ecst  0.304
2015 Sharma K, Hall RA, George SM. Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 33. DOI: 10.1116/1.4902086  0.436
2015 Clancey JW, Cavanagh AS, Kukreja RS, Kongkanand A, George SM. Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 33. DOI: 10.1116/1.4901459  0.756
2015 Xie M, Sun X, Sun H, Porcelli T, George SM, Zhou Y, Lian J. Stabilizing an amorphous V2O5/carbon nanotube paper electrode with conformal TiO2 coating by atomic layer deposition for lithium ion batteries Journal of Materials Chemistry A. 4: 537-544. DOI: 10.1039/C5Ta01949D  0.43
2015 Dumont JW, George SM. Pyrolysis of Alucone Molecular Layer Deposition Films Studied Using in Situ Transmission Fourier Transform Infrared Spectroscopy Journal of Physical Chemistry C. 119: 14603-14612. DOI: 10.1021/Jp512074N  0.479
2015 Lee Y, Dumont JW, Cavanagh AS, George SM. Atomic layer deposition of AlF3 using trimethylaluminum and hydrogen fluoride Journal of Physical Chemistry C. 119: 14185-14194. DOI: 10.1021/Acs.Jpcc.5B02625  0.766
2015 Wise AM, Ban C, Weker JN, Misra S, Cavanagh AS, Wu Z, Li Z, Whittingham MS, Xu K, George SM, Toney MF. Effect of Al2O3 Coating on Stabilizing LiNi0.4Mn0.4Co0.2O2 Cathodes Chemistry of Materials. 27: 6146-6154. DOI: 10.1021/Acs.Chemmater.5B02952  0.706
2015 Lee W, Jeon W, An CH, Chung MJ, Kim HJ, Eom T, George SM, Park BK, Han JH, Kim CG, Chung TM, Lee SW, Hwang CS. Improved Initial Growth Behavior of SrO and SrTiO3 Films Grown by Atomic Layer Deposition Using {Sr(demamp)(tmhd)}2 as Sr-Precursor Chemistry of Materials. 27: 3881-3891. DOI: 10.1021/acs.chemmater.5b00843  0.416
2015 Lee Y, Dumont JW, George SM. Mechanism of thermal Al2O3 atomic layer etching using sequential reactions with Sn(acac)2 and HF Chemistry of Materials. 27: 3648-3657. DOI: 10.1021/Acs.Chemmater.5B00300  0.38
2015 Molina Piper D, Son SB, Travis JJ, Lee Y, Han SS, Kim SC, Oh KH, George SM, Lee SH, Ban C. Mitigating irreversible capacity losses from carbon agents via surface modification Journal of Power Sources. 275: 605-611. DOI: 10.1016/J.Jpowsour.2014.11.032  0.405
2015 Biserni E, Xie M, Brescia R, Scarpellini A, Hashempour M, Movahed P, George SM, Bestetti M, Li Bassi A, Bruno P. Silicon algae with carbon topping as thin-film anodes for lithium-ion microbatteries by a two-step facile method Journal of Power Sources. 274: 252-259. DOI: 10.1016/J.Jpowsour.2014.09.140  0.427
2014 He Y, Piper DM, Gu M, Travis JJ, George SM, Lee SH, Genc A, Pullan L, Liu J, Mao SX, Zhang JG, Ban C, Wang C. In situ transmission electron microscopy probing of native oxide and artificial layers on silicon nanoparticles for lithium ion batteries. Acs Nano. 8: 11816-23. PMID 25347792 DOI: 10.1021/Nn505523C  0.396
2014 Weber JC, Blanchard PT, Sanders AW, Gertsch JC, George SM, Berweger S, Imtiaz A, Coakley KJ, Wallis TM, Bertness KA, Kabos P, Sanford NA, Bright VM. GaN nanowire coated with atomic layer deposition of tungsten: a probe for near-field scanning microwave microscopy. Nanotechnology. 25: 415502. PMID 25258349 DOI: 10.1088/0957-4484/25/41/415502  0.411
2014 Lee BH, Anderson VR, George SM. Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques. Acs Applied Materials & Interfaces. 6: 16880-7. PMID 25203487 DOI: 10.1021/Am504341R  0.549
2014 Sun X, Zhou C, Xie M, Hu T, Sun H, Xin G, Wang G, George SM, Lian J. Amorphous vanadium oxide coating on graphene by atomic layer deposition for stable high energy lithium ion anodes. Chemical Communications (Cambridge, England). 50: 10703-6. PMID 25079002 DOI: 10.1039/C4Cc04580G  0.426
2014 Eigenfeld NT, Gray JM, Brown JJ, Skidmore GD, George SM, Bright VM. Ultra-thin 3D nano-devices from atomic layer deposition on polyimide. Advanced Materials (Deerfield Beach, Fla.). 26: 3962-7. PMID 24692235 DOI: 10.1002/Adma.201400410  0.388
2014 Piper DM, Travis JJ, Young M, Son SB, Kim SC, Oh KH, George SM, Ban C, Lee SH. Reversible high-capacity Si nanocomposite anodes for lithium-ion batteries enabled by molecular layer deposition. Advanced Materials (Deerfield Beach, Fla.). 26: 1596-601. PMID 24353043 DOI: 10.1002/Adma.201304714  0.403
2014 Anderson VR, Cavanagh AS, Abdulagatov AI, Gibbs ZM, George SM. Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 32. DOI: 10.1116/1.4839015  0.822
2014 Gray JM, Houlton JP, Gertsch JC, Brown JJ, Rogers CT, George SM, Bright VM. Hemispherical micro-resonators from atomic layer deposition Journal of Micromechanics and Microengineering. 24. DOI: 10.1088/0960-1317/24/12/125028  0.373
2014 Sun X, Zhou C, Xie M, Sun H, Hu T, Lu F, Scott SM, George SM, Lian J. Synthesis of ZnO quantum dot/graphene nanocomposites by atomic layer deposition with high lithium storage capacity Journal of Materials Chemistry A. 2: 7319-7326. DOI: 10.1039/C4Ta00589A  0.345
2014 Higgs DJ, Young MJ, Bertrand JA, George SM. Oxidation kinetics of calcium films by water vapor and their effect on water vapor transmission rate measurements Journal of Physical Chemistry C. 118: 29322-29332. DOI: 10.1021/Jp505508C  0.802
2014 Anderson VR, Leick N, Clancey JW, Hurst KE, Jones KM, Dillon AC, George SM. Atomic layer deposition of platinum nanoparticles on titanium oxide and tungsten oxide using platinum(II) hexafluoroacetylacetonate and formalin as the reactants Journal of Physical Chemistry C. 118: 8960-8970. DOI: 10.1021/Jp412539Y  0.318
2014 Kim JW, Travis JJ, Hu E, Nam KW, Kim SC, Kang CS, Woo JH, Yang XQ, George SM, Oh KH, Cho SJ, Lee SH. Unexpected high power performance of atomic layer deposition coated Li[Ni1/3Mn1/3Co1/3]O2 cathodes Journal of Power Sources. 254: 190-197. DOI: 10.1016/J.Jpowsour.2013.12.119  0.416
2014 Hall RA, George SM, Kim Y, Hwang W, Samberg ME, Monteiro-Riviere NA, Narayan RJ. Growth of zircone on nanoporous alumina using molecular layer deposition Jom. 66: 649-653. DOI: 10.1007/S11837-014-0933-Z  0.484
2013 Liu J, Yoon B, Kuhlmann E, Tian M, Zhu J, George SM, Lee YC, Yang R. Ultralow thermal conductivity of atomic/molecular layer-deposited hybrid organic-inorganic zincone thin films. Nano Letters. 13: 5594-9. PMID 24164650 DOI: 10.1021/Nl403244S  0.475
2013 Ban C, Xie M, Sun X, Travis JJ, Wang G, Sun H, Dillon AC, Lian J, George SM. Atomic layer deposition of amorphous TiO2 on graphene as an anode for Li-ion batteries. Nanotechnology. 24: 424002. PMID 24067324 DOI: 10.1088/0957-4484/24/42/424002  0.454
2013 Brown JJ, Hall RA, Kladitis PE, George SM, Bright VM. Molecular layer deposition on carbon nanotubes. Acs Nano. 7: 7812-23. PMID 23941544 DOI: 10.1021/Nn402733G  0.45
2013 Bertrand JA, Higgs DJ, Young MJ, George SM. H2O vapor transmission rate through polyethylene naphthalate polymer using the electrical Ca test. The Journal of Physical Chemistry. A. 117: 12026-34. PMID 23898915 DOI: 10.1021/Jp4043057  0.807
2013 Periasamy P, Guthrey HL, Abdulagatov AI, Ndione PF, Berry JJ, Ginley DS, George SM, Parilla PA, O'Hayre RP. Metal-insulator-metal diodes: role of the insulator layer on the rectification performance. Advanced Materials (Deerfield Beach, Fla.). 25: 1301-8. PMID 23288580 DOI: 10.1002/Adma.201203075  0.686
2013 Jen SH, George SM, McLean RS, Carcia PF. Alucone interlayers to minimize stress caused by thermal expansion mismatch between Al₂O₃ films and Teflon substrates. Acs Applied Materials & Interfaces. 5: 1165-73. PMID 23272996 DOI: 10.1021/Am303077X  0.487
2013 Cavanagh AS, Baker L, Clancey JW, Yin J, Kongkanand A, Wagner FT, George SM. In situ characterization of plasma-assisted Pt ALD on W ALD adhesion layers with spectroscopic ellipsometry Ecs Transactions. 58: 19-26. DOI: 10.1149/05810.0019ecst  0.656
2013 Parsons GN, Elam JW, George SM, Haukka S, Jeon H, Kessels WMM, Leskelä M, Poodt P, Ritala M, Rossnagel SM. History of atomic layer deposition and its relationship with the American Vacuum Society Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4816548  0.598
2013 Bertrand JA, George SM. Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4763360  0.827
2013 Dai X, Famouri M, Abdulagatov AI, Yang R, Lee YC, George SM, Li C. Capillary evaporation on micromembrane-enhanced microchannel wicks with atomic layer deposited silica Applied Physics Letters. 103. DOI: 10.1063/1.4824439  0.776
2013 Sun X, Xie M, Travis JJ, Wang G, Sun H, Lian J, George SM. Pseudocapacitance of amorphous TiO2 thin films anchored to graphene and carbon nanotubes using atomic layer deposition Journal of Physical Chemistry C. 117: 22497-22508. DOI: 10.1021/Jp4066955  0.475
2013 Abdulagatov AI, Terauds KE, Travis JJ, Cavanagh AS, Raj R, George SM. Pyrolysis of titanicone molecular layer deposition films as precursors for conducting TiO2/carbon composite films Journal of Physical Chemistry C. 117: 17442-17450. DOI: 10.1021/Jp4051947  0.839
2013 Bertrand JA, Higgs DJ, Young MJ, George SM. H2O vapor transmission rate through polyethylene naphthalate polymer using the electrical Ca test Journal of Physical Chemistry A. 117: 12026-12034. DOI: 10.1021/jp4043057  0.671
2013 Warburton WK, Hennig W, Bertrand JA, George SM, Biegalski S. Atomic layer deposition α-Al2O3 diffusion barriers to eliminate the memory effect in beta-gamma radioxenon detectors Journal of Radioanalytical and Nuclear Chemistry. 296: 541-549. DOI: 10.1007/S10967-012-2061-Y  0.815
2013 Lee BH, Anderson VR, George SM. Molecular layer deposition of zircone and ZrO2/zircone alloy films: Growth and properties Chemical Vapor Deposition. 19: 204-212. DOI: 10.1002/Cvde.201207045  0.542
2013 Jung YS, Lu P, Cavanagh AS, Ban C, Kim GH, Lee SH, George SM, Harris SJ, Dillon AC. Unexpected improved performance of ALD coated LiCoO2/graphite li-ion batteries Advanced Energy Materials. 3: 213-219. DOI: 10.1002/Aenm.201200370  0.677
2013 Lee BH, Yoon B, Abdulagatov AI, Hall RA, George SM. Growth and properties of hybrid organic-inorganic metalcone films using molecular layer deposition techniques Advanced Functional Materials. 23: 532-546. DOI: 10.1002/Adfm.201200370  0.74
2012 Wang L, Travis JJ, Cavanagh AS, Liu X, Koenig SP, Huang PY, George SM, Bunch JS. Ultrathin oxide films by atomic layer deposition on graphene. Nano Letters. 12: 3706-10. PMID 22716769 DOI: 10.1021/Nl3014956  0.756
2012 Wang W, Tian M, Abdulagatov A, George SM, Lee YC, Yang R. Three-dimensional Ni/TiO2 nanowire network for high areal capacity lithium ion microbattery applications. Nano Letters. 12: 655-60. PMID 22208851 DOI: 10.1021/Nl203434G  0.706
2012 Woo JH, Trevey JE, Cavanagh AS, Choi YS, Kim SC, George SM, Oh KH, Lee SH. Nanoscale interface Modification of LiCoO2 by Al 2O3 atomic layer deposition for solid-state Li batteries Journal of the Electrochemical Society. 159: A1120-A1124. DOI: 10.1149/2.085207Jes  0.719
2012 Sun X, Xie M, Wang G, Sun H, Cavanagh AS, Travis JJ, George SM, Lian J. Atomic layer deposition of TiO 2 on graphene for supercapacitors Journal of the Electrochemical Society. 159. DOI: 10.1149/2.025204Jes  0.686
2012 Poodt P, Cameron DC, Dickey E, George SM, Kuznetsov V, Parsons GN, Roozeboom F, Sundaram G, Vermeer A. Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 30. DOI: 10.1116/1.3670745  0.449
2012 Blanchard PT, Bertness KA, Harvey TE, Sanders AW, Sanford NA, George SM, Seghete D. MOSFETs made from GaN nanowires with fully conformal cylindrical gates Ieee Transactions On Nanotechnology. 11: 479-482. DOI: 10.1109/Tnano.2011.2177993  0.757
2012 Jen SH, Lee BH, George SM, McLean RS, Carcia PF. Critical tensile strain and water vapor transmission rate for nanolaminate films grown using Al2O3 atomic layer deposition and alucone molecular layer deposition Applied Physics Letters. 101. DOI: 10.1063/1.4766731  0.543
2012 Baker L, Cavanagh AS, Yin J, George SM, Kongkanand A, Wagner FT. Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques Applied Physics Letters. 101. DOI: 10.1063/1.4749819  0.776
2012 Yoon B, Lee BH, George SM. Highly conductive and transparent hybrid organic-inorganic zincone thin films using atomic and molecular layer deposition Journal of Physical Chemistry C. 116: 24784-24791. DOI: 10.1021/Jp3057477  0.528
2012 Lee BH, Yoon B, Anderson VR, George SM. Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al2O3 Atomic Layer Deposition Journal of Physical Chemistry C. 116: 3250-3257. DOI: 10.1021/Jp209003H  0.497
2012 Abdulagatov AI, Hall RA, Sutherland JL, Lee BH, Cavanagh AS, George SM. Molecular layer deposition of titanicone films using TiCl 4 and ethylene glycol or glycerol: Growth and properties Chemistry of Materials. 24: 2854-2863. DOI: 10.1021/Cm300162V  0.849
2012 Jung YS, Cavanagh AS, Gedvilas L, Widjonarko NE, Scott ID, Lee SH, Kim GH, George SM, Dillon AC. Improved functionality of lithium-ion batteries enabled by atomic layer deposition on the porous microstructure of polymer separators and coating electrodes Advanced Energy Materials. 2: 1022-1027. DOI: 10.1002/Aenm.201100750  0.715
2011 George SM, Lee BH, Yoon B, Abdulagatov AI, Hall RA. Metalcones: hybrid organic-inorganic films fabricated using atomic and molecular layer deposition techniques. Journal of Nanoscience and Nanotechnology. 11: 7948-55. PMID 22097511 DOI: 10.1166/Jnn.2011.5034  0.774
2011 Abdulagatov AI, Yan Y, Cooper JR, Zhang Y, Gibbs ZM, Cavanagh AS, Yang RG, Lee YC, George SM. Al2O3 and TiO2 atomic layer deposition on copper for water corrosion resistance. Acs Applied Materials & Interfaces. 3: 4593-601. PMID 22032254 DOI: 10.1021/Am2009579  0.826
2011 Lee Y, Yoon B, Cavanagh AS, George SM. Molecular layer deposition of aluminum alkoxide polymer films using trimethylaluminum and glycidol. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 15155-64. PMID 22029704 DOI: 10.1021/La202391H  0.758
2011 Leung K, Qi Y, Zavadil KR, Jung YS, Dillon AC, Cavanagh AS, Lee SH, George SM. Using atomic layer deposition to hinder solvent decomposition in lithium ion batteries: first-principles modeling and experimental studies. Journal of the American Chemical Society. 133: 14741-54. PMID 21797223 DOI: 10.1021/Ja205119G  0.705
2011 Scott ID, Jung YS, Cavanagh AS, Yan Y, Dillon AC, George SM, Lee SH. Ultrathin coatings on nano-LiCoO2 for Li-ion vehicular applications. Nano Letters. 11: 414-8. PMID 21166425 DOI: 10.1021/Nl1030198  0.684
2011 Parsons GN, George SM, Knez M. Progress and future directions for atomic layer deposition and ALD-based chemistry Mrs Bulletin. 36: 865-871. DOI: 10.1557/Mrs.2011.238  0.432
2011 Seok Jung Y, Cavanagh AS, Yan Y, George SM, Manthiram A. Effects of atomic layer deposition of Al2O3 on the LiLi0.20Mn0.54Ni0.13Co0.13O 2 cathode for lithium-ion batteries Journal of the Electrochemical Society. 158. DOI: 10.1149/2.030112Jes  0.732
2011 Riley LA, Cavanagh AS, George SM, Lee SH, Dillon AC. Improved mechanical integrity of ALD-coated composite electrodes for Li-Ion batteries Electrochemical and Solid-State Letters. 14: A29-A31. DOI: 10.1149/1.3529367  0.692
2011 Jen S, Bertrand JA, George SM. Critical tensile and compressive strains for cracking of Al2O3 films grown by atomic layer deposition Journal of Applied Physics. 109: 84305. DOI: 10.1063/1.3567912  0.823
2011 Baker L, Cavanagh AS, Seghete D, George SM, MacKus AJM, Kessels WMM, Liu ZY, Wagner FT. Nucleation and growth of Pt atomic layer deposition on Al2O 3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma Journal of Applied Physics. 109. DOI: 10.1063/1.3555091  0.813
2011 Seghete D, Rayner GB, Cavanagh AS, Anderson VR, George SM. Molybdenum atomic layer deposition using MoF6 and Si 2H6 as the reactants Chemistry of Materials. 23: 1668-1678. DOI: 10.1021/Cm101673U  0.823
2011 Zhang Y, Yang R, George SM, Lee Y. In-situ inspection of cracking in atomic-layer-deposited barrier films on surface and in buried structures Thin Solid Films. 520: 251-257. DOI: 10.1016/J.Tsf.2011.07.056  0.468
2011 Dillon AC, Riley LA, Jung YS, Ban C, Molina D, Mahan AH, Cavanagh AS, George SM, Lee SH. HWCVD MoO3 nanoparticles and a-Si for next generation Li-ion anodes Thin Solid Films. 519: 4495-4497. DOI: 10.1016/J.Tsf.2011.01.337  0.698
2011 Seghete D, Fabreguette FH, George SM. Using a slit doser to probe gas dynamics during Al2O3 atomic layer deposition and to fabricate laterally graded Al2O3 layers Thin Solid Films. 519: 3612-3618. DOI: 10.1016/J.Tsf.2011.01.285  0.805
2011 Zhang Y, Seghete D, Abdulagatov A, Gibbs Z, Cavanagh A, Yang R, George S, Lee Y. Investigation of the defect density in ultra-thin Al2O3 films grown using atomic layer deposition Surface and Coatings Technology. 205: 3334-3339. DOI: 10.1016/J.Surfcoat.2010.12.001  0.833
2011 Montague JR, Dalberth M, Gray JM, Seghete D, Bertness KA, George SM, Bright VM, Rogers CT, Sanford NA. Analysis of high-Q, gallium nitride nanowire resonators in response to deposited thin films Sensors and Actuators, a: Physical. 165: 59-65. DOI: 10.1016/J.Sna.2010.03.014  0.799
2011 Davidson BD, Seghete D, George SM, Bright VM. ALD tungsten NEMS switches and tunneling devices Sensors and Actuators, a: Physical. 166: 269-276. DOI: 10.1016/J.Sna.2009.07.022  0.729
2011 Riley LA, Van Atta S, Cavanagh AS, Yan Y, George SM, Liu P, Dillon AC, Lee SH. Electrochemical effects of ALD surface modification on combustion synthesized LiNi1/3Mn1/3Co1/3O2 as a layered-cathode material Journal of Power Sources. 196: 3317-3324. DOI: 10.1016/J.Jpowsour.2010.11.124  0.724
2011 Kang E, Jung YS, Cavanagh AS, Kim GH, George SM, Dillon AC, Kim JK, Lee J. Fe3O4 nanoparticles confined in mesocellular carbon foam for high performance anode materials for lithium-ion batteries Advanced Functional Materials. 21: 2430-2438. DOI: 10.1002/Adfm.201002576  0.672
2010 Seghete D, Hall RA, Yoon B, George SM. Importance of trimethylaluminum diffusion in three-step ABC molecular layer deposition using trimethylaluminum, ethanolamine, and maleic anhydride. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 19045-51. PMID 21117634 DOI: 10.1021/La102649X  0.808
2010 Guo DJ, Abdulagatov AI, Rourke DM, Bertness KA, George SM, Lee YC, Tan W. GaN nanowire functionalized with atomic layer deposition techniques for enhanced immobilization of biomolecules. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 18382-91. PMID 21033757 DOI: 10.1021/La103337A  0.759
2010 Minton TK, Wu B, Zhang J, Lindholm NF, Abdulagatov AI, O'Patchen J, George SM, Groner MD. Protecting polymers in space with atomic layer deposition coatings Acs Applied Materials and Interfaces. 2: 2515-2520. PMID 20738090 DOI: 10.1021/Am100217M  0.762
2010 Riley LA, Cavanagh AS, George SM, Jung YS, Yan Y, Lee SH, Dillon AC. Conformal surface coatings to enable high volume expansion Li-ion anode materials. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry. 11: 2124-30. PMID 20449864 DOI: 10.1002/Cphc.201000158  0.694
2010 Jung YS, Cavanagh AS, Riley LA, Kang SH, Dillon AC, Groner MD, George SM, Lee SH. Ultrathin direct atomic layer deposition on composite electrodes for highly durable and safe Li-ion batteries. Advanced Materials (Deerfield Beach, Fla.). 22: 2172-6. PMID 20376820 DOI: 10.1002/Adma.200903951  0.7
2010 Wind RA, George SM. Quartz crystal microbalance studies of Al2O3 atomic layer deposition using trimethylaluminum and water at 125 degrees C. The Journal of Physical Chemistry. A. 114: 1281-9. PMID 19757806 DOI: 10.1021/Jp9049268  0.304
2010 Jung YS, Cavanagh AS, Dillon AC, Groner MD, George SM, Lee S. Enhanced Stability of LiCoO 2 Cathodes in Lithium-ion Batteries Using Surface Modification by Atomic Layer Deposition Journal of the Korean Ceramic Society. 47: 61-65. DOI: 10.4191/Kcers.2010.47.1.061  0.757
2010 Jung YS, Cavanagh AS, Dillon AC, Groner MD, George SM, Lee SH. Enhanced stability of LiCoO2 cathodes in lithium-ion batteries using surface modification by atomic layer deposition Journal of the Electrochemical Society. 157. DOI: 10.1149/1.3258274  0.766
2010 Sanford NA, Blanchard PT, Bertness KA, Mansfield L, Schlager JB, Sanders AW, Roshko A, Burton BB, George SM. Steady-state and transient photoconductivity in c -axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy Journal of Applied Physics. 107. DOI: 10.1063/1.3275888  0.789
2010 Kim JY, George SM. Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide Journal of Physical Chemistry C. 114: 17597-17603. DOI: 10.1021/Jp9120244  0.533
2010 Sarkar SK, Kim JY, Goldstein DN, Neale NR, Zhu K, Elliott CM, Frank AJ, George SM. In2S3 atomic layer deposition and its application as a sensitizer on TiO2 nanotube arrays for solar energy conversion Acs National Meeting Book of Abstracts. DOI: 10.1021/Jp9086943  0.45
2010 Miller DC, Foster RR, Jen SH, Bertrand JA, Cunningham SJ, Morris AS, Lee YC, George SM, Dunn ML. Thermo-mechanical properties of alumina films created using the atomic layer deposition technique Sensors and Actuators, a: Physical. 164: 58-67. DOI: 10.1016/J.Sna.2010.09.018  0.837
2009 Cavanagh AS, Wilson CA, Weimer AW, George SM. Atomic layer deposition on gram quantities of multi-walled carbon nanotubes. Nanotechnology. 20: 255602. PMID 19491468 DOI: 10.1088/0957-4484/20/25/255602  0.744
2009 George SM, Yoon B, Dameron AA. Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers. Accounts of Chemical Research. 42: 498-508. PMID 19249861 DOI: 10.1021/Ar800105Q  0.471
2009 Lee M, Cheng JH, Bertness K, Sanford N, Seghete D, George S, Lee YC. Atomic layer deposition enabled interconnect technology for vertical nanowire array devices Transducers 2009 - 15th International Conference On Solid-State Sensors, Actuators and Microsystems. 2054-2057. DOI: 10.1109/Sensor.2009.5285638  0.78
2009 Carcia PF, McLean RS, Groner MD, Dameron AA, George SM. Gas diffusion ultrabarriers on polymer substrates using Al2 O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition Journal of Applied Physics. 106. DOI: 10.1063/1.3159639  0.534
2009 Miller DC, Foster RR, Zhang Y, Jen SH, Bertrand JA, Lu Z, Seghete D, O'Patchen JL, Yang R, Lee YC, George SM, Dunn ML. The mechanical robustness of atomic-layer- and molecular-layer-deposited coatings on polymer substrates Journal of Applied Physics. 105. DOI: 10.1063/1.3124642  0.831
2009 Wind RW, Fabreguette FH, Sechrist ZA, George SM. Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3 Journal of Applied Physics. 105: 074309. DOI: 10.1063/1.3103254  0.821
2009 Burton BB, Kang SW, Rhee SW, George SM. SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy Journal of Physical Chemistry C. 113: 8249-8257. DOI: 10.1021/Jp806638E  0.807
2009 Burton BB, Goldstein DN, George SM. Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O Journal of Physical Chemistry C. 113: 1939-1946. DOI: 10.1021/Jp806088M  0.856
2009 Yoon B, Seghete D, Cavanagh AS, George SM. Molecular layer deposition of hybrid organic - Inorganic alucone polymer films using a three-step abc reaction sequence Chemistry of Materials. 21: 5365-5374. DOI: 10.1021/Cm9013267  0.846
2009 Zhang Y, Zhang Y, Miller DC, Bertrand JA, Jen S, Yang R, Dunn ML, George SM, Lee Y. Fluorescent tags to visualize defects in Al2O3 thin films grown using atomic layer deposition Thin Solid Films. 517: 6794-6797. DOI: 10.1016/J.Tsf.2009.05.037  0.832
2009 Burton BB, Fabreguette FH, George SM. Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O Thin Solid Films. 517: 5658-5665. DOI: 10.1016/J.Tsf.2009.02.050  0.851
2009 Zhang Y, Bertrand JA, Yang R, George SM, Lee Y. Electroplating to visualize defects in Al2O3 thin films grown using atomic layer deposition Thin Solid Films. 517: 3269-3272. DOI: 10.1016/J.Tsf.2008.12.052  0.847
2009 Scheffe JR, Francés A, King DM, Liang X, Branch BA, Cavanagh AS, George SM, Weimer AW. Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen Thin Solid Films. 517: 1874-1879. DOI: 10.1016/J.Tsf.2008.09.086  0.759
2009 Seghete D, Davidson BD, Hall RA, Chang YJ, Bright VM, George SM. Sacrificial layers for air gaps in NEMS using alucone molecular layer deposition Sensors and Actuators, a: Physical. 155: 8-15. DOI: 10.1016/J.Sna.2008.12.016  0.815
2009 Chang YJ, Gray JM, Imtiaz A, Seghete D, Mitch Wallis T, George SM, Kabos P, Rogers CT, Bright VM. Micromachined resonators of high Q-factor based on atomic layer deposited alumina Sensors and Actuators, a: Physical. 154: 229-237. DOI: 10.1016/J.Sna.2008.11.015  0.764
2009 Miller DC, Foster RR, Jen SH, Bertrand JA, Seghete D, Yoon B, Lee YC, George SM, Dunn ML. Thermomechanical properties of aluminum alkoxide (alucone) films created using molecular layer deposition Acta Materialia. 57: 5083-5092. DOI: 10.1016/J.Actamat.2009.07.015  0.834
2009 Yoon B, O'Patchen JL, Seghete D, Cavanagh AS, George SM. Molecular layer deposition of hybrid organic-inorganic polymer films using diethylzinc and ethylene glycol Chemical Vapor Deposition. 15: 112-121. DOI: 10.1002/Cvde.200806756  0.843
2009 Liang X, King DM, Li P, George SM, Weimer AW. Nanocoating hybrid polymer films on large quantities of cohesive nanoparticles by molecular layer deposition Aiche Journal. 55: 1030-1039. DOI: 10.1002/Aic.11757  0.499
2008 Du X, Du Y, George SM. CO gas sensing by ultrathin tin oxide films grown by atomic layer deposition using transmission FTIR spectroscopy. Journal of Physical Chemistry A. 112: 9211-9219. PMID 18710189 DOI: 10.1021/Jp800518V  0.741
2008 Finch DS, Oreskovic T, Ramadurai K, Herrmann CF, George SM, Mahajan RL. Biocompatibility of atomic layer-deposited alumina thin films. Journal of Biomedical Materials Research. Part A. 87: 100-6. PMID 18085647 DOI: 10.1002/Jbm.A.31732  0.443
2008 Burton BB, Lavoie AR, George SM. Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine Journal of the Electrochemical Society. 155. DOI: 10.1149/1.2908741  0.822
2008 Wilson CA, Goldstein DN, McCormick JA, Weimer AW, George SM. Tungsten atomic layer deposition on cobalt nanoparticles Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 430-437. DOI: 10.1116/1.2902956  0.728
2008 Weimer MA, Hakim LF, King DM, Liang X, Weimer AW, George SM, Li P, Groner MD. Ultrafast metal-insulator varistors based on tunable Al2 O3 tunnel junctions Applied Physics Letters. 92. DOI: 10.1063/1.2913763  0.401
2008 Goldstein DN, McCormick JA, George SM. Al 2O 3 Atomic layer deposition with trimethylaluminum and ozone studied by in situ transmission FTIR spectroscopy and quadrupole mass spectrometry Journal of Physical Chemistry C. 112: 19530-19539. DOI: 10.1021/Jp804296A  0.688
2008 Dameron AA, Davidson SD, Burton BB, Carcia PF, Scott McLean R, George SM. Gas diffusion barriers on polymers using multilayers fabricated by Al 2O3 and rapid SiO2 atomic layer deposition Journal of Physical Chemistry C. 112: 4573-4580. DOI: 10.1021/Jp076866+  0.848
2008 Burton BB, Boleslawski MP, Desombre AT, George SM. Rapid SiO2 Atomic Layer Deposition Using Tris(tert-pentoxy)silanol Chemistry of Materials. 20: 7031-7043. DOI: 10.1021/Cm801738Z  0.852
2008 Dameron AA, Seghete D, Burton BB, Davidson SD, Cavanagh AS, Bertrand JA, George SM. Molecular layer deposition of alucone polymer films using trimethylaluminum and ethylene glycol Chemistry of Materials. 20: 3315-3326. DOI: 10.1021/Cm7032977  0.816
2008 Wilson CA, McCormick JA, Cavanagh AS, Goldstein DN, Weimer AW, George SM. Tungsten atomic layer deposition on polymers Thin Solid Films. 516: 6175-6185. DOI: 10.1016/J.Tsf.2007.11.086  0.817
2008 Cooper R, Upadhyaya HP, Minton TK, Berman MR, Du X, George SM. Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings Thin Solid Films. 516: 4036-4039. DOI: 10.1016/J.Tsf.2007.07.150  0.75
2008 Du X, George SM. Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition Sensors and Actuators B-Chemical. 135: 152-160. DOI: 10.1016/J.Snb.2008.08.015  0.746
2008 Liang X, King DM, Groner MD, Blackson JH, Harris JD, George SM, Weimer AW. Barrier properties of polymer/alumina nanocomposite membranes fabricated by atomic layer deposition Journal of Membrane Science. 322: 105-112. DOI: 10.1016/J.Memsci.2008.05.037  0.395
2008 Liang X, Zhan GD, King DM, McCormick JA, Zhang J, George SM, Weimer AW. Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor Diamond and Related Materials. 17: 185-189. DOI: 10.1016/J.Diamond.2007.12.003  0.747
2007 Cavanagh AS, Wilson CA, Weimer AW, George SM. Atomic Layer Deposition on Quantities of Multiwalled Carbon Nanotubes Mrs Proceedings. 1054. DOI: 10.1557/Proc-1054-Ff03-10  0.699
2007 McCormick JA, Cloutier BL, Weimer AW, George SM. Rotary reactor for atomic layer deposition on large quantities of nanoparticles Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 25: 67-74. DOI: 10.1116/1.2393299  0.684
2007 Liang X, Hakim LF, Zhan GD, McCormick JA, George SM, Weimer AW, Spencer JA, Buechler KJ, Blackson J, Wood CJ, Dorgan JR. Novel processing to produce polymer/ceramic nanocomposites by atomic layer deposition Journal of the American Ceramic Society. 90: 57-63. DOI: 10.1111/J.1551-2916.2006.01359.X  0.68
2007 and YD, George SM. Molecular Layer Deposition of Nylon 66 Films Examined Using in Situ FTIR Spectroscopy Journal of Physical Chemistry C. 111: 8509-8517. DOI: 10.1021/Jp067041N  0.522
2007 Miller DC, Herrmann CF, Maier HJ, George SM, Stoldt CR, Gall K. Thermo-mechanical evolution of multilayer thin films: Part I. Mechanical behavior of Au/Cr/Si microcantilevers Thin Solid Films. 515: 3208-3223. DOI: 10.1016/J.Tsf.2006.01.046  0.408
2007 Miller DC, Herrmann CF, Maier HJ, George SM, Stoldt CR, Gall K. Thermo-mechanical evolution of multilayer thin films: Part II. Microstructure evolution in Au/Cr/Si microcantilevers Thin Solid Films. 515: 3224-3240. DOI: 10.1016/J.Tsf.2006.01.045  0.44
2007 Herrmann CF, DelRio FW, Miller DC, George SM, Bright VM, Ebel JL, Strawser RE, Cortez R, Leedy KD. Alternative dielectric films for rf MEMS capacitive switches deposited using atomic layer deposited Al2O3/ZnO alloys Sensors and Actuators, a: Physical. 135: 262-272. DOI: 10.1016/J.Sna.2006.07.002  0.533
2007 McCormick JA, Rice KP, Paul DF, Weimer AW, George SM. Analysis of Al2O3 atomic layer deposition on ZrO 2 nanoparticles in a rotary reactor Chemical Vapor Deposition. 13: 491-498. DOI: 10.1002/Cvde.200606563  0.686
2007 Hakim LF, King DM, Zhou Y, Gump CJ, George SM, Weimer AW. Nanoparticle coating for advanced optical, mechanical and rheological properties Advanced Functional Materials. 17: 3175-3181. DOI: 10.1002/Adfm.200600877  0.467
2006 Hakim LF, McCormick JA, Zhan GD, Weimer AW, Li P, George SM. Surface modification of titania nanoparticles using ultrathin ceramic films Journal of the American Ceramic Society. 89: 3070-3075. DOI: 10.1111/J.1551-2916.2006.01216.X  0.738
2006 Carcia PF, McLean RS, Reilly MH, Groner MD, George SM. Ca test of Al 2O 3 gas diffusion barriers grown by atomic layer deposition on polymers Applied Physics Letters. 89. DOI: 10.1063/1.2221912  0.4
2006 Groner MD, George SM, McLean RS, Carcia PF. Gas diffusion barriers on polymers using Al 2 O 3 atomic layer deposition Applied Physics Letters. 88: 1-3. DOI: 10.1063/1.2168489  0.465
2006 Fabreguette FH, Wind RA, George SM. Ultrahigh x-ray reflectivity from W/Al 2O 3 multilayers fabricated using atomic layer deposition Applied Physics Letters. 88. DOI: 10.1063/1.2161117  0.453
2006 Sechrist ZA, Schwartz BT, Lee JH, McCormick JA, Piestun R, Park W, George SM. Modification of opal photonic crystals using Al 2O 3 atomic layer deposition Chemistry of Materials. 18: 3562-3570. DOI: 10.1021/Cm060263D  0.832
2005 Hakim LF, George SM, Weimer AW. Conformal nanocoating of zirconia nanoparticles by atomic layer deposition in a fluidized bed reactor. Nanotechnology. 16: S375-81. PMID 21727455 DOI: 10.1088/0957-4484/16/7/010  0.37
2005 Du X, Du Y, George SM. In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques Journal of Vacuum Science and Technology. 23: 581-588. DOI: 10.1116/1.1914810  0.752
2005 Ferguson JD, Weimer AW, George SM. Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO 2 and BaTiO 3 particles Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 118-125. DOI: 10.1116/1.1821585  0.481
2005 Herrmann CF, DelRio FW, Bright VM, George SM. Conformal hydrophobic coatings prepared using atomic layer deposition seed layers and non-chlorinated hydrophobic precursors Journal of Micromechanics and Microengineering. 15: 984-992. DOI: 10.1088/0960-1317/15/5/013  0.524
2005 Wilson CA, Grubbs RK, George SM. Nucleation and Growth during Al2O3 Atomic Layer Deposition on Polymers Chemistry of Materials. 17: 5625-5634. DOI: 10.1021/Cm050704D  0.477
2005 Sechrist ZA, Fabreguette FH, Heintz O, Phung TM, Johnson DC, George SM. Optimization and structural characterization of W/Al 2O 3 nanolaminates grown using atomic layer deposition techniques Chemistry of Materials. 17: 3475-3485. DOI: 10.1021/Cm050470Y  0.827
2005 Du Y, Du X, George SM. SiO2 film growth at low temperatures by catalyzed atomic layer deposition in a viscous flow reactor Thin Solid Films. 491: 43-53. DOI: 10.1016/J.Tsf.2005.05.051  0.768
2005 Fabreguette F, Sechrist Z, Elam J, George S. Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6 Thin Solid Films. 488: 103-110. DOI: 10.1016/J.Tsf.2005.04.114  0.829
2005 Ferguson JD, Buechler KJ, Weimer AW, George SM. SnO2 atomic layer deposition on ZrO2 and Al nanoparticles: Pathway to enhanced thermite materials Powder Technology. 156: 154-163. DOI: 10.1016/J.Powtec.2005.04.009  0.361
2005 Pellin MJ, Stair PC, Xiong G, Elam JW, Birrell J, Curtiss L, George SM, Han CY, Iton L, Kung H, Kung M, Wang HH. Mesoporous catalytic membranes: Synthetic control of pore size and wall composition Catalysis Letters. 102: 127-130. DOI: 10.1007/S10562-005-5843-9  0.538
2005 Hakim LF, Blackson J, George SM, Weimer AW. Nanocoating individual silica nanoparticles by atomic layer deposition in a fluidized bed reactor Chemical Vapor Deposition. 11: 420-425. DOI: 10.1002/Cvde.200506392  0.51
2004 Costescu RM, Cahill DG, Fabreguette FH, Sechrist ZA, George SM. Ultra-low thermal conductivity in W/Al2O3 nanolaminates. Science (New York, N.Y.). 303: 989-90. PMID 14963323 DOI: 10.1126/Science.1093711  0.823
2004 Ferguson JD, Smith ER, Weimer AW, George SM. ALD of SiO2 at room temperature using TEOS and H2O with NH3 as the catalyst Journal of the Electrochemical Society. 151. DOI: 10.1149/1.1768548  0.473
2004 Kang S, Rhee S, George SM. Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using HfCl2[N(SiMe3)(2)](2) and H2O Journal of Vacuum Science and Technology. 22: 2392-2397. DOI: 10.1116/1.1806442  0.539
2004 Wank JR, George SM, Weimer AW. Coating Fine Nickel Particles with Al2O3Utilizing an Atomic Layer Deposition-Fluidized Bed Reactor (ALD-FBR) Journal of the American Ceramic Society. 87: 762-765. DOI: 10.1111/J.1551-2916.2004.00762.X  0.437
2004 Zhang Y, Dunn ML, Gall K, Elam JW, George SM. Suppression of inelastic deformation of nanocoated thin film microstructures Journal of Applied Physics. 95: 8216-8225. DOI: 10.1063/1.1736329  0.548
2004 Ferguson JD, Weimer AW, George SM. Atomic layer deposition of Al2O3 films on polyethylene particles Chemistry of Materials. 16: 5602-5609. DOI: 10.1021/Cm040008Y  0.432
2004 Groner MD, Fabreguette FH, Elam JW, George SM. Low-Temperature Al2O3 Atomic Layer Deposition Chemistry of Materials. 16: 639-645. DOI: 10.1021/Cm0304546  0.537
2004 Grubbs RK, Nelson CE, Steinmetz NJ, George SM. Nucleation and growth during the atomic layer deposition of W on Al 2O3 and Al2O3 on W Thin Solid Films. 467: 16-27. DOI: 10.1016/J.Tsf.2004.02.099  0.502
2004 Wank JR, George SM, Weimer AW. Nanocoating individual cohesive boron nitride particles in a fluidized bed by ALD Powder Technology. 142: 59-69. DOI: 10.1016/J.Powtec.2004.03.010  0.376
2004 Ferguson JD, Yoder AR, Weimer AW, George SM. TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O Applied Surface Science. 226: 393-404. DOI: 10.1016/J.Apsusc.2003.10.053  0.445
2003 Gall K, Hulse M, Dunn ML, Finch D, George SM, Corff BA. Thermomechanical response of bare and Al2O3-nanocoated Au/Si bilayer beams for microelectromechanical systems Journal of Materials Research. 18: 1575-1587. DOI: 10.1557/Jmr.2003.0217  0.326
2003 Elam JW, Routkevitch D, George SM. Properties of ZnO/Al[sub 2]O[sub 3] Alloy Films Grown Using Atomic Layer Deposition Techniques Journal of the Electrochemical Society. 150: G339. DOI: 10.1149/1.1569481  0.439
2003 Elam JW, Wilson CA, Schuisky M, Sechrist ZA, George SM. Improved nucleation of TiN atomic layer deposition films on SiLK low-k polymer dielectric using an Al[sub 2]O[sub 3] atomic layer deposition adhesion layer Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 1099. DOI: 10.1116/1.1577568  0.845
2003 Mayer TM, Elam JW, George SM, Kotula PG, Goeke RS. Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices Applied Physics Letters. 82: 2883-2885. DOI: 10.1063/1.1570926  0.438
2003 Smith JA, Livingston aFE, George SM. Isothermal desorption kinetics of crystalline H2O, H218O, and D2O ice multilayers Journal of Physical Chemistry B. 107: 3871-3877. DOI: 10.1021/Jp022503S  0.585
2003 Elam JW, Routkevitch D, Mardilovich PP, George SM. Conformal coating on ultrahigh-aspect-ratio nanopores of anodic alumina by atomic layer deposition Chemistry of Materials. 15: 3507-3517. DOI: 10.1021/Cm0303080  0.498
2003 Elam JW, George SM. Growth of ZnO/Al2O3 Alloy Films Using Atomic Layer Deposition Techniques Chemistry of Materials. 15: 1020-1028. DOI: 10.1021/Cm020607+  0.528
2003 Hoivik ND, Elam JW, Linderman RJ, Bright VM, George SM, Lee YC. Atomic layer deposited protective coatings for micro-electromechanical systems Sensors and Actuators, a: Physical. 103: 100-108. DOI: 10.1016/S0924-4247(02)00319-9  0.496
2003 Elam JW, Schuisky M, Ferguson JD, George SM. Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3 Thin Solid Films. 436: 145-156. DOI: 10.1016/S0040-6090(03)00533-9  0.542
2002 Schuisky M, Elam JW, George SM. In situ resistivity measurements during the atomic layer deposition of ZnO and W thin films Applied Physics Letters. 81: 180-182. DOI: 10.1063/1.1490413  0.594
2002 Elam JW, Groner MD, George SM. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition Review of Scientific Instruments. 73: 2981. DOI: 10.1063/1.1490410  0.496
2002 Livingston FE, Smith JA, George SM. General Trends for Bulk Diffusion in Ice and Surface Diffusion on Ice Journal of Physical Chemistry A. 106: 6309-6318. DOI: 10.1021/Jp014438C  0.567
2002 Groner MD, Elam JW, Fabreguette FH, George SM. Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates Thin Solid Films. 413: 186-197. DOI: 10.1016/S0040-6090(02)00438-8  0.543
2002 Ferguson JD, Weimer AW, George SM. Atomic layer deposition of boron nitride using sequential exposures of BCl3 and NH3 Thin Solid Films. 413: 16-25. DOI: 10.1016/S0040-6090(02)00431-5  0.413
2002 Elam J, Sechrist Z, George S. ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements Thin Solid Films. 414: 43-55. DOI: 10.1016/S0040-6090(02)00427-3  0.853
2001 Elam JW, Nelson CE, Grubbs RK, George SM. Nucleation and growth during tungsten atomic layer deposition on SiO2 surfaces Thin Solid Films. 386: 41-52. DOI: 10.1016/S0040-6090(01)00762-3  0.485
2000 Livingston FE, Smith JA, George SM. Depth-profiling and diffusion measurements in ice films using infrared laser resonant desorption. Analytical Chemistry. 72: 5590-5599. PMID 11101236 DOI: 10.1021/Ac000724T  0.609
2000 Klaus JW, Ferro SJ, George SM. Atomic Layer Deposition of Tungsten Nitride Films Using Sequential Surface Reactions Journal of the Electrochemical Society. 147: 1175-1181. DOI: 10.1149/1.1393332  0.548
2000 Cameron MA, Gartland IP, Smith JA, Diaz aSF, George SM. Atomic Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes: Pore Reduction and Effect of Surface Species on Gas Transport Langmuir. 16: 7435-7444. DOI: 10.1021/La9916981  0.664
2000 Ferguson JD, Weimer AW, George SM. Atomic layer deposition of SiO2 films on BN particles using sequential surface reactions Chemistry of Materials. 12: 3472-3480. DOI: 10.1021/Cm000313T  0.44
2000 Klaus JW, Ferro SJ, George SM. Atomically controlled growth of tungsten and tungsten nitride using sequential surface reactions Applied Surface Science. 479-491. DOI: 10.1016/S0169-4332(00)00237-3  0.52
2000 Ferguson JD, Weimer AW, George SM. Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions Applied Surface Science. 162: 280-292. DOI: 10.1016/S0169-4332(00)00205-1  0.4
2000 Klaus JW, Ferro SJ, George SM. Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction Thin Solid Films. 360: 145-153. DOI: 10.1016/S0040-6090(99)01076-7  0.538
2000 Ferguson JD, Weimer AW, George SM. Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles Thin Solid Films. 371: 95-104. DOI: 10.1016/S0040-6090(00)00973-1  0.438
2000 Klaus JW, George SM. Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions Surface Science. 447: 81-90. DOI: 10.1016/S0039-6028(99)01119-X  0.489
1999 Klaus JW, Sneh O, Ott AW, George SM. ATOMIC LAYER DEPOSITION OF SiO2 USING CATALYZED AND UNCATALYZED SELF-LIMITING SURFACE REACTIONS Surface Review and Letters. 6: 435-448. DOI: 10.1142/S0218625X99000433  0.473
1999 Cameron MA, George SM. ZrO2 film growth by chemical vapor deposition using zirconium tetra-tert-butoxide Thin Solid Films. 348: 90-98. DOI: 10.1016/S0040-6090(99)00022-X  0.474
1999 Livingston FE, Smith JA, George SM. Origin of non-zero-order H2O desorption kinetics from crystalline ice multilayers on Ru(001) Surface Science. 423: 145-159. DOI: 10.1016/S0039-6028(98)00842-5  0.62
1997 Klaus JW, Ott AW, Johnson JM, George SM. Atomic Layer Controlled Growth Of Sio2 Films Using Binary Reaction Sequence Chemistry Applied Physics Letters. 70: 1092-1094. DOI: 10.1063/1.118494  0.487
1997 Foster KL, Tolbert MA, George SM. Interaction of HCl with Ice: Investigation of the Predicted Trihydrate, Hexahydrate, and Monolayer Regimes Journal of Physical Chemistry A. 101: 4979-4986. DOI: 10.1021/Jp970772Q  0.34
1997 Ott AW, Klaus JW, Johnson JM, George SM, McCarley KC, Way JD. Modification of Porous Alumina Membranes Using Al2O3 Atomic Layer Controlled Deposition Chemistry of Materials. 9: 707-714. DOI: 10.1021/Cm960377X  0.422
1997 Ott AW, Klaus JW, Johnson JM, George SM. Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry Thin Solid Films. 292: 135-144. DOI: 10.1016/S0040-6090(96)08934-1  0.465
1996 Berland BS, Foster KL, Tolbert MA, George SM. UV absorption spectra of H2O/HNO3 films Geophysical Research Letters. 23: 2757-2760. DOI: 10.1029/96Gl02610  0.408
1996 George SM, Ott aAW, Klaus JW. Surface Chemistry for Atomic Layer Growth The Journal of Physical Chemistry. 100: 13121-13131. DOI: 10.1021/Jp9536763  0.505
1996 and DEB, George SM, Huang C, Wong EKL, Rider KB, Smith aRS, Kay BD. H2O Condensation Coefficient and Refractive Index for Vapor-Deposited Ice from Molecular Beam and Optical Interference Measurements The Journal of Physical Chemistry. 100: 4988-4995. DOI: 10.1021/Jp952547J  0.315
1996 Ott AW, McCarley KC, Klaus JW, Way JD, George SM. Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry Applied Surface Science. 107: 128-136. DOI: 10.1016/S0169-4332(96)00503-X  0.48
1996 Sneh O, Cameron MA, George SM. Adsorption and desorption kinetics of H2O on a fully hydroxylated SiO2 surface Surface Science. 364: 61-78. DOI: 10.1016/0039-6028(96)00592-4  0.332
1995 Robinson MB, Dillon AC, George SM. Adsorption and decomposition of dichlorosilane on porous silicon surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 35-41. DOI: 10.1116/1.579440  0.342
1995 Dillon AC, Wise ML, Robinson MB, George SM. Adsorption and decomposition of trichlorosilane and trichlorogermane on porous silicon and Si(100)2 × 1 surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 1-10. DOI: 10.1116/1.579436  0.325
1995 Berland BS, Brown DE, Tolbert MA, George SM. Refractive index and density of vapor-deposited ice Geophysical Research Letters. 22: 3493-3496. DOI: 10.1029/95Gl03504  0.384
1995 Dillon AC, Ott AW, Way JD, George SM. Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence Surface Science. 322: 230-242. DOI: 10.1016/0039-6028(95)90033-0  0.351
1995 Sneh O, Wise ML, Ott AW, Okada LA, George SM. Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence Surface Science. 334: 135-152. DOI: 10.1016/0039-6028(95)00471-8  0.48
1994 Middlebrook AM, Berland BS, George SM, Tolbert MA, Toon OB. Real refractive indices of infrared-characterized nitric-acid/ice films: Implications for optical measurements of polar stratospheric clouds Journal of Geophysical Research. 99: 25655-25666. DOI: 10.1029/94Jd02391  0.402
1994 Berland BS, Haynes DR, Foster KL, Tolbert MA, George SM, Toon OB. Refractive Indices of Amorphous and Crystalline HNO3/H2O Films Representative of Polar Stratospheric Clouds The Journal of Physical Chemistry. 98: 4358-4364. DOI: 10.1021/J100067A024  0.463
1994 George SM, Sneh O, Dillon AC, Wise ML, Ott AW, Okada LA, Way JD. Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB... binary reaction sequence chemistry Applied Surface Science. 82: 460-467. DOI: 10.1016/0169-4332(94)90259-3  0.426
1993 Wise ML, Sneh O, Okada LA, Dillon AC, George SM. Diethyldiethoxysilane as a New Precursor for SiO2 Growth on Silicon Mrs Proceedings. 334. DOI: 10.1557/Proc-334-37  0.44
1993 Sneh O, Wise ML, Okada LA, Ott AW, George SM. Atomic layer growth of SiO 2 on Si(100) using the sequential deposition of SiCl 4 and H 2 O Mrs Proceedings. 334: 25-30. DOI: 10.1557/Proc-334-25  0.503
1993 Robinson MB, Dillon AC, George SM. Porous silicon photoluminescence versus HF etching: No correlation with surface hydrogen species Applied Physics Letters. 62: 1493-1495. DOI: 10.1063/1.108669  0.321
1993 Dillon AC, Robinson MB, George SM, Roberts DA. Adsorption and decomposition of diethylgermane on porous silicon surfaces Surface Science. 286. DOI: 10.1016/0167-2584(93)90605-I  0.313
1993 Coon PA, Wise ML, George SM. Modeling silicon epitaxial growth with SiH2Cl2 Journal of Crystal Growth. 130: 162-172. DOI: 10.1016/0022-0248(93)90848-Q  0.352
1992 Coon PA, Wise ML, Dillon AC, George SM. Germanium Deposition on Silicon: Surface Chemistry of (CH3CH2)2GeH2 and GeC14 Mrs Proceedings. 282. DOI: 10.1557/Proc-282-413  0.326
1992 Dillon A, Robinson M, George S, Gupta P. Effects of Hydrogen Coverage on Silicon Surface Reactivity Mrs Proceedings. 259. DOI: 10.1557/Proc-259-99  0.337
1992 Robinson MB, Dillon AC, Haynes DR, George SM. Effect of thermal annealing and surface coverage on porous silicon photoluminescence Applied Physics Letters. 61: 1414-1416. DOI: 10.1063/1.107555  0.326
1992 Coon PA, Wise ML, Walker ZH, George SM, Roberts DA. Adsorption and decomposition of diethylgermane on Si(111) 7×7 Applied Physics Letters. 60: 2002-2004. DOI: 10.1063/1.107124  0.368
1992 Coon PA, Wise ML, George SM. Reaction kinetics of GeCl4 on Si(111)7 × 7 Surface Science. 278: 383-396. DOI: 10.1016/0039-6028(92)90674-U  0.363
1991 Dillon AC, Gupta P, Robinson MBR, Bracker AS, George SM. Ammonia decomposition on silicon surfaces studied using transmission Fourier transform infrared spectroscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 9: 2222-2230. DOI: 10.1116/1.577299  0.313
1991 Gupta P, Dillon AC, Bracker AS, George SM. FTIR studies of H2O and D2O decomposition on porous silicon surfaces Surface Science. 245: 360-372. DOI: 10.1016/0039-6028(91)90038-T  0.329
1991 Gupta P, Dillon AC, Coon PA, George SM. FTIR studies reveal that silicon-containing laser-induced desorption products are surface reaction intermediates Chemical Physics Letters. 176: 128-134. DOI: 10.1016/0009-2614(91)90022-2  0.312
1990 Coon P, Wise M, Dillon A, Robinson M, George S. Adsorption and Decomposition of Diethylsilane on Silicon Surfaces Mrs Proceedings. 204. DOI: 10.1557/Proc-204-303  0.314
1984 George SM, Harris AL, Berg M, Harris CB. Picosecond studies of the temperature dependence of homogeneous and inhomogeneous vibrational linewidth broadening in liquid acetonitrile The Journal of Chemical Physics. 80: 83-94. DOI: 10.1063/1.446410  0.608
1983 George SM, Harris CB. Theory for selective-vibrational-dephasing experiments with the use of transient stimulated Raman scattering in high laser depletion Physical Review A. 28: 863-878. DOI: 10.1103/Physreva.28.863  0.454
1983 Ben-Amotz D, George SM, Harris CB. Transient stimulated raman scattering in high laser depletion and its effects on vibrational dynamics experiments Chemical Physics Letters. 97: 533-537. DOI: 10.1016/0009-2614(83)80466-7  0.612
1982 George SM, Harris CB. Dependence of inhomogeneous vibrational linewidth broadening on attractive forces from local liquid number densities The Journal of Chemical Physics. 77: 4781-4783. DOI: 10.1063/1.444385  0.467
1981 George SM, Harris CB. Passively mode-locked Nd:glass laser oscillator optimized for TEM 00 selectivity and long term stability and reliability Review of Scientific Instruments. 52: 852-857. DOI: 10.1063/1.1136681  0.451
1980 Harris CB, Auweter H, George SM. Critical test of vibrational dephasing theories in liquids by use of selective, coherent, picosecond stokes scattering Physical Review Letters. 44: 737-740. DOI: 10.1103/Physrevlett.44.737  0.458
1980 George SM, Auweter H, Harris CB. Inhomogeneous broadening of vibrational linewidths in polyatomic liquids The Journal of Chemical Physics. 73: 5573-5583. DOI: 10.1002/Chin.198115050  0.439
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