| Year |
Citation |
Score |
| 2006 |
Schmid GM, Stewart MD, Wetzel J, Palmieri F, Hao J, Nishimura Y, Jen K, Kim EK, Resnick DJ, Liddle JA, Willson CG. Implementation of an imprint damascene process for interconnect fabrication Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1283-1291. DOI: 10.1116/1.2197508 |
0.719 |
|
| 2006 |
Dickey DA, Dickey MD, Stewart MD, Willson CG. An Automated Statistical Process Control Study of Inline Mixing Using Spectrophotometric Detection Journal of Chemical Education. 83: 110-113. DOI: 10.1021/Ed083P110 |
0.62 |
|
| 2005 |
Gates BD, Xu Q, Stewart M, Ryan D, Willson CG, Whitesides GM. New approaches to nanofabrication: molding, printing, and other techniques. Chemical Reviews. 105: 1171-96. PMID 15826012 DOI: 10.1021/Cr030076O |
0.479 |
|
| 2005 |
Nishimura Y, Michaelson TB, Meiring JE, Stewart MD, Willson CG. Line edge roughness in chemically amplified resist: Speculation, simulation and application Journal of Photopolymer Science and Technology. 18: 457-465. DOI: 10.2494/Photopolymer.18.457 |
0.686 |
|
| 2005 |
Stewart MD, Willson CG. Imprint Materials for Nanoscale Devices Mrs Bulletin. 30: 947-951. DOI: 10.1557/Mrs2005.248 |
0.583 |
|
| 2005 |
Stewart MD, Johnson SC, Sreenivasan SV, Resnick DJ, Willson CG. Nanofabrication with step and flash imprint lithography Journal of Micro-Nanolithography Mems and Moems. 4: 11002. DOI: 10.1117/1.1862650 |
0.704 |
|
| 2005 |
Kim EK, Stewart MD, Wu K, Palmieri FL, Dickey MD, Ekerdt JG, Willson CG. Vinyl ether formulations for step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2967-2971. DOI: 10.1116/1.2131881 |
0.728 |
|
| 2005 |
Tsiartas PC, Schmid GM, Johnson HF, Stewart MD, Willson CG. Quantifying acid generation efficiency for photoresist applications Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 224-228. DOI: 10.1116/1.1851537 |
0.675 |
|
| 2004 |
Schmid GM, Stewart MD, Burns SD, Willson CG. Mesoscale Monte Carlo Simulation of Photoresist Processing Journal of the Electrochemical Society. 151: G155-G161. DOI: 10.1149/1.1637359 |
0.746 |
|
| 2004 |
Jones RL, Hu T, Lin EK, Wu WL, Goldfarb DL, Angelopoulos M, Trinque BC, Schmid GM, Stewart MD, Willson CG. Formation of deprotected fuzzy blobs in chemically amplified resists Journal of Polymer Science, Part B: Polymer Physics. 42: 3063-3069. DOI: 10.1002/Polb.20168 |
0.727 |
|
| 2002 |
Stewart MD, Tran HV, Schmid GM, Stachowiak TB, Becker DJ, Willson CG. Acid catalyst mobility in resist resins Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2946-2952. DOI: 10.1116/1.1523027 |
0.726 |
|
| 2002 |
Schmid GM, Stewart MD, Singh VK, Willson CG. Spatial distribution of reaction products in positive tone chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 185-190. DOI: 10.1116/1.1431954 |
0.689 |
|
| 2000 |
Stewart MD, Patterson K, Somervell MH, Willson CG. Organic imaging materials: a view of the future Journal of Physical Organic Chemistry. 13: 767-774. DOI: 10.1002/1099-1395(200012)13:12<767::Aid-Poc323>3.0.Co;2-A |
0.715 |
|
| 1999 |
Postnikov SV, Stewart MD, Tran HV, Nierode MA, Medeiros DR, Cao T, Byers J, Webber SE, Wilson CG. Study of resolution limits due to intrinsic bias in chemically amplified photoresists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 3335-3338. DOI: 10.1116/1.591007 |
0.637 |
|
| 1999 |
Ruchhoeft P, Colburn M, Choi B, Nounu H, Johnson S, Bailey T, Damle S, Stewart M, Ekerdt J, Sreenivasan SV, Wolfe JC, Willson CG. Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography Journal of Vacuum Science & Technology B. 17: 2965-2969. DOI: 10.1116/1.590935 |
0.686 |
|
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