Christopher K. Ober, Ph.D. - Publications

Affiliations: 
1986- Materials Science & Engineering Cornell University, Ithaca, NY, United States 
Area:
polymers, photoresists
Website:
https://cober.mse.cornell.edu

236 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Dong BX, Liu Z, Misra M, Strzalka J, Niklas J, Poluektov OG, Escobedo FA, Ober CK, Nealey PF, Patel SN. Structure Control of a π-Conjugated Oligothiophene-Based Liquid Crystal for Enhanced Mixed Ion/Electron Transport Characteristics. Acs Nano. PMID 31194507 DOI: 10.1021/acsnano.9b01055  1
2019 Leonardi AK, Ober CK. Polymer-Based Marine Antifouling and Fouling Release Surfaces: Strategies for Synthesis and Modification. Annual Review of Chemical and Biomolecular Engineering. 10: 241-264. PMID 31173523 DOI: 10.1146/annurev-chembioeng-060718-030401  0.76
2019 Sheng W, Amin I, Neumann C, Dong R, Zhang T, Wegener E, Chen WL, Förster P, Tran HQ, Löffler M, Winter A, Rodriguez RD, Zschech E, Ober CK, Feng X, et al. Polymer Brushes on Hexagonal Boron Nitride. Small (Weinheim An Der Bergstrasse, Germany). e1805228. PMID 30932320 DOI: 10.1002/smll.201805228  1
2018 Lin Z, Zhang Y, Ober CK, Goddard JM. Facile preparation of epoxide functionalized surfaces via photocurable copolymer coatings and subsequent immobilization of iminodiacetic acids. Acs Applied Materials & Interfaces. PMID 30398853 DOI: 10.1021/acsami.8b15716  1
2018 Newby C, Piachaud T, Vaynzof Y, Lee JK, Jung SH, Sadhanala A, Ober CK, Friend RH. Electroluminescence from solution-processed pinhole-free nm-thickness layers of conjugated polymers. Nano Letters. PMID 30070851 DOI: 10.1021/acs.nanolett.8b01084  1
2018 Shi C, Leonardi AK, Ohlendorf P, Zhang Y, Ruyack A, Lal A, Ober CK. UV-triggered Transient Electrospun Poly(propylene carbonate)/Poly(phthalaldehyde) Polymer Blends Fiber Mats. Acs Applied Materials & Interfaces. PMID 30044081 DOI: 10.1021/acsami.8b06051  1
2018 Lu Z, Chen Z, Guo Y, Ju Y, Liu Y, Feng R, Xiong C, Ober CK, Dong L. Flexible hydrophobic antifouling coating with oriented nanotopography and non-leaking capsaicin. Acs Applied Materials & Interfaces. PMID 29464942 DOI: 10.1021/acsami.7b19436  1
2018 Zhang Y, Park A, Cintora A, McMillan SR, Harmon NJ, Moehle A, Flatté ME, Fuchs GD, Ober CK. Impact of the Synthesis Method on the Solid-State Charge Transport of Radical Polymers. Journal of Materials Chemistry. C. 6: 111-118. PMID 29430302 DOI: 10.1039/C7TC04645F  1
2017 Liu HY, Chen WL, Ober CK, Daniel S. Biologically Complex Planar Cell Plasma Membranes Supported on Polyelectrolyte Cushions Enhance Transmembrane Protein Mobility and Retain Native Orientation. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29020444 DOI: 10.1021/acs.langmuir.7b02945  1
2017 Li L, Liu X, Pal S, Wang S, Ober CK, Giannelis EP. Extreme ultraviolet resist materials for sub-7 nm patterning. Chemical Society Reviews. PMID 28650497 DOI: 10.1039/c7cs00080d  1
2017 Ohlendorf P, Ruyack A, Leonardi AK, Shi C, Cuppoletti C, Bruce I, Lal A, Ober CK. Transient Fiber Mats of Electrospun Poly(Propylene Carbonate) Composites with Remarkable Mechanical Strength. Acs Applied Materials & Interfaces. PMID 28644611 DOI: 10.1021/acsami.7b04710  0.76
2017 Jiang J, Jacobs AG, Wenning B, Liedel C, Thompson MO, Ober CK. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing. Acs Applied Materials & Interfaces. PMID 28598156 DOI: 10.1021/acsami.7b00774  1
2017 Wenning BM, Martinelli E, Mieszkin S, Finlay JA, Fischer DA, Callow JA, Callow ME, Leonardi A, Ober CK, Galli G. Model Amphiphilic Block Copolymers with Tailored Molecular Weight and Composition in PDMS-Based Films to Limit Soft Biofouling. Acs Applied Materials & Interfaces. PMID 28429593 DOI: 10.1021/acsami.7b03168  1
2017 Ober CK. Directed self-assembly: A dress code for block copolymers. Nature Nanotechnology. PMID 28346459 DOI: 10.1038/nnano.2017.49  0.01
2017 Nakatani R, Takano H, Chandra A, Yoshimura Y, Wang L, Suzuki Y, Tanaka Y, Maeda R, Kihara N, Minegishi S, Miyagi K, Kasahara Y, Sato H, Seino Y, Azuma T, ... ... Ober CK, et al. Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing. Acs Applied Materials & Interfaces. PMID 28304153 DOI: 10.1021/acsami.6b16129  1
2017 Chen WL, Menzel M, Watanabe T, Prucker O, Rühe J, Ober CK. Reduced lateral confinement and its effect on stability in patterned strong polyelectrolyte brushes. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28266860 DOI: 10.1021/acs.langmuir.7b00165  1
2016 Giammaria TJ, Ferrarese Lupi F, Seguini G, Perego M, Vita F, Francescangeli O, Wenning B, Ober CK, Sparnacci K, Antonioli D, Gianotti V, Laus M. Micrometer Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High Temperature Thermal Treatments. Acs Applied Materials & Interfaces. PMID 27020526 DOI: 10.1021/acsami.6b02300  1
2016 Martinelli E, Gunes D, Wenning BM, Ober CK, Finlay JA, Callow ME, Callow JA, Di Fino A, Clare AS, Galli G. Effects of surface-active block copolymers with oxyethylene and fluoroalkyl side chains on the antifouling performance of silicone-based films. Biofouling. 32: 81-93. PMID 26769148 DOI: 10.1080/08927014.2015.1131822  1
2015 Chavis MA, Smilgies DM, Wiesner UB, Ober CK. Widely Tunable Morphologies in Block Copolymer Thin Films Through Solvent Vapor Annealing Using Mixtures of Selective Solvents. Advanced Functional Materials. 25: 3057-3065. PMID 26819574 DOI: 10.1002/adfm.201404053  1
2015 Camera KL, Gómez-Zayas J, Yokoyama D, Ediger MD, Ober CK. Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist. Acs Applied Materials & Interfaces. 7: 23398-401. PMID 26406303 DOI: 10.1021/acsami.5b05361  1
2015 Takano H, Wang L, Tanaka Y, Maeda R, Kihara N, Seino Y, Sato H, Kawamonzen Y, Miyagi K, Minegishi S, Azuma T, Ober CK, Hayakawa T. Vertical oriented lamellar formation of fluorine- and silicon-containing block copolymers without neutral layers Journal of Photopolymer Science and Technology. 28: 649-652. DOI: 10.2494/photopolymer.28.649  1
2015 Jiang J, Jacobs A, Thompson MO, Ober CK. Laser spike annealing of DSA photoresists Journal of Photopolymer Science and Technology. 28: 631-634. DOI: 10.2494/photopolymer.28.631  1
2015 Jiang J, Zhang B, Yu M, Li L, Neisser M, Chun JS, Giannelis EP, Ober CK. Oxide nanoparticle EUV (ONE) photoresists: Current understanding of the unusual patterning mechanism Journal of Photopolymer Science and Technology. 28: 515-518. DOI: 10.2494/photopolymer.28.515  1
2015 Liedel C, Moehle A, Fuchs GD, Ober CK. Block copolymers with stable radical and fluorinated groups by ATRP Mrs Communications. DOI: 10.1557/mrc.2015.50  1
2015 Jones RG, Ober CK, Hodge P, Kratochvíl P, Moad G, Vert M, Macan J. Terminology for aggregation and self-assembly in polymer science (IUPAC recommendations 2013) | Nazivlje za agregiranje i samoudruživanje u znanosti o polimerima (IUPAC-ove preporuke 2013.) Kemija U Industriji/Journal of Chemists and Chemical Engineers. 64: 611-632. DOI: 10.15255/KUI.2014.009KUI-36/2015  1
2015 Jones RG, Kitayama T, Wilks ES, Fox RB, Fradet A, Hellwich KH, Hess M, Hodge P, Horie K, Kahovec J, Kratochvíl P, Kubisa P, Maréchal E, Mormann W, Ober CK, et al. Nomenclature and graphic representations for chemically modified polymers (IUPAC Recommendations 2014) Pure and Applied Chemistry. 87: 307-319. DOI: 10.1515/pac-2014-0610  1
2015 Jacobs AG, Liedel C, Ober CK, Thompson MO. Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086057  1
2015 Jacobs AG, Jung B, Jiang J, Ober CK, Thompson MO. Control of polystyrene-block-poly(methyl methacrylate) directed self-Assembly by laser-induced millisecond thermal annealing Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.JMM.14.3.031205  1
2015 Wang W, Xu Y, Li A, Li T, Liu M, Von Klitzing R, Ober CK, Kayitmazer AB, Li L, Guo X. Zinc induced polyelectrolyte coacervate bioadhesive and its transition to a self-healing hydrogel Rsc Advances. 5: 66871-66878. DOI: 10.1039/c5ra11915d  1
2015 Xu Y, Chen L, Zhao Y, Cathles LM, Ober CK. Supercritical CO2-philic nanoparticles suitable for determining the viability of carbon sequestration in shale Environmental Science: Nano. 2: 288-296. DOI: 10.1039/c5en00003c  1
2015 Calabrese DR, Ditter D, Liedel C, Blumfield A, Zentel R, Ober CK. Design, Synthesis, and Use of Y-Shaped ATRP/NMP Surface Tethered Initiator Acs Macro Letters. 4: 606-610. DOI: 10.1021/acsmacrolett.5b00175  1
2015 Li L, Chakrabarty S, Spyrou K, Ober CK, Giannelis EP. Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning Chemistry of Materials. 27: 5027-5031. DOI: 10.1021/acs.chemmater.5b01506  1
2015 Calabrese D, Wenning B, Ober CK. Block copolymers as antifouling and fouling resistant coatings Anionic Polymerization: Principles, Practice, Strength, Consequences and Applications. 881-924. DOI: 10.1007/978-4-431-54186-8_20  1
2015 Pester CW, Poelma JE, Narupai B, Patel SN, Su GM, Mates TE, Luo Y, Ober CK, Hawker CJ, Kramer EJ. Ambiguous anti-fouling surfaces: Facile synthesis by light-mediated radical polymerization Journal of Polymer Science, Part a: Polymer Chemistry. DOI: 10.1002/pola.27748  1
2015 Welch ME, Doublet T, Bernard C, Malliaras GG, Ober CK. A glucose sensor via stable immobilization of the GOx enzyme on an organic transistor using a polymer brush Journal of Polymer Science, Part a: Polymer Chemistry. 53: 372-377. DOI: 10.1002/pola.27392  1
2015 Calabrese DR, Wenning B, Finlay JA, Callow ME, Callow JA, Fischer D, Ober CK. Amphiphilic oligopeptides grafted to PDMS-based diblock copolymers for use in antifouling and fouling release coatings Polymers For Advanced Technologies. 26: 829-836. DOI: 10.1002/pat.3515  1
2015 Chavis MA, Smilgies DM, Wiesner UB, Ober CK. Widely tunable morphologies in block copolymer thin films through solvent vapor annealing using mixtures of selective solvents Advanced Functional Materials. 25: 3057-3065. DOI: 10.1002/adfm.201404053  1
2014 Padmanabhan P, Chavis M, Ober CK, Escobedo FA. Phase behaviour of PMMA-b-PHEMA with solvents methanol and THF: modelling and comparison to the experiment. Soft Matter. 10: 6172-81. PMID 25011061 DOI: 10.1039/c4sm00856a  1
2014 Jung B, Satish P, Bunck DN, Dichtel WR, Ober CK, Thompson MO. Laser-induced sub-millisecond heating reveals distinct tertiary ester cleavage reaction pathways in a photolithographic resist polymer. Acs Nano. 8: 5746-56. PMID 24824380 DOI: 10.1021/nn500549w  1
2014 Zhou Z, Calabrese DR, Taylor W, Finlay JA, Callow ME, Callow JA, Fischer D, Kramer EJ, Ober CK. Amphiphilic triblock copolymers with PEGylated hydrocarbon structures as environmentally friendly marine antifouling and fouling-release coatings. Biofouling. 30: 589-604. PMID 24730510 DOI: 10.1080/08927014.2014.897335  1
2014 Welch ME, Ritzert NL, Chen H, Smith NL, Tague ME, Xu Y, Baird BA, Abruña HD, Ober CK. Generalized platform for antibody detection using the antibody catalyzed water oxidation pathway. Journal of the American Chemical Society. 136: 1879-83. PMID 24410628 DOI: 10.1021/ja409598c  1
2014 Jiang J, Chakrabarty S, Yu M, Ober CK. Metal oxide nanoparticle photoresists for EUV patterning Journal of Photopolymer Science and Technology. 27: 663-666. DOI: 10.2494/photopolymer.27.663  1
2014 Wieberger F, Kolb T, Neuber C, Ober CK, Schmidt HW. Nanopatterning with tailored molecules Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2047109  1
2014 Chakrabarty S, Sarma C, Li L, Giannelis EP, Ober CK. Increasing sensitivity of oxide nanoparticle photoresists Proceedings of Spie - the International Society For Optical Engineering. 9048. DOI: 10.1117/12.2046555  1
2014 Jacobs AG, Jung B, Ober CK, Thompson MO. Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2046513  1
2014 Jiang J, Thompson MO, Ober CK. Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bake Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046277  1
2014 Jung B, Ober CK, Thompson MO. Controlled roughness reduction of patterned resist polymers using laser-induced sub-millisecond heating Journal of Materials Chemistry C. 2: 9115-9121. DOI: 10.1039/c4tc01548g  1
2014 Ferrarese Lupi F, Giammaria TJ, Seguini G, Laus M, Enrico E, De Leo N, Boarino L, Ober CK, Perego M. Thermally induced orientational flipping of cylindrical phase diblock copolymers Journal of Materials Chemistry C. 2: 2175-2182. DOI: 10.1039/c3tc32283a  1
2014 Rahaman MS, Thérien-Aubin H, Ben-Sasson M, Ober CK, Nielsen M, Elimelech M. Control of biofouling on reverse osmosis polyamide membranes modified with biocidal nanoparticles and antifouling polymer brushes Journal of Materials Chemistry B. 2: 1724-1732. DOI: 10.1039/c3tb21681k  1
2014 Okamura H, Forman DC, Ober CK. C60-containing polymers for electron beam lithography Polymer Bulletin. 71: 2395-2405. DOI: 10.1007/s00289-014-1197-z  1
2013 Welch ME, Xu Y, Chen H, Smith N, Tague ME, Abruña HD, Baird B, Ober CK. Polymer Brushes as Functional, Patterned Surfaces for Nanobiotechnology. Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]. 25: 53-56. PMID 25484522 DOI: 10.2494/photopolymer.25.53  1
2013 Wan AM, Chandler EM, Madhavan M, Infanger DW, Ober CK, Gourdon D, Malliaras GG, Fischbach C. Fibronectin conformation regulates the proangiogenic capability of tumor-associated adipogenic stromal cells. Biochimica Et Biophysica Acta. 1830: 4314-20. PMID 23567798 DOI: 10.1016/j.bbagen.2013.03.033  1
2013 Wieberger F, Kolb T, Neuber C, Ober CK, Schmidt HW. Combinatorial techniques to efficiently investigate and optimize organic thin film processing and properties. Molecules (Basel, Switzerland). 18: 4120-39. PMID 23567361 DOI: 10.3390/molecules18044120  1
2013 Midthun KM, Taylor PG, Newby C, Chatzichristidi M, Petrou PS, Lee JK, Kakabakos SE, Baird BA, Ober CK. Orthogonal patterning of multiple biomolecules using an organic fluorinated resist and imprint lithography. Biomacromolecules. 14: 993-1002. PMID 23439033 DOI: 10.1021/bm301783t  1
2013 Zhou Z, Yu P, Geller HM, Ober CK. Biomimetic polymer brushes containing tethered acetylcholine analogs for protein and hippocampal neuronal cell patterning. Biomacromolecules. 14: 529-37. PMID 23336729 DOI: 10.1021/bm301785b  1
2013 Congdon RB, Feldberg AS, Ben-Yakar N, McGee D, Ober C, Sammakia B, Sadik OA. Early detection of Candida albicans biofilms at porous electrodes. Analytical Biochemistry. 433: 192-201. PMID 23107627 DOI: 10.1016/j.ab.2012.10.016  1
2013 Sun W, Gamez VM, Otero-Gonzalez L, Cho Y, Ober CK, Sierra-Alvarez R. Biodegradability, cytotoxicity, and physicochemical treatability of two novel perfluorooctane sulfonate-free photoacid generators. Archives of Environmental Contamination and Toxicology. 64: 187-97. PMID 23104522 DOI: 10.1007/s00244-012-9822-z  1
2013 Kryask M, Trikeriotis M, Ouyang C, Chakrabarty S, Giannelis EP, Ober CK. Nanoparticle photoresists: Ligand exchange as a new and sensitive EUV patterning mechanism Journal of Photopolymer Science and Technology. 26: 659-664. DOI: 10.2494/photopolymer.26.659  1
2013 Jones RG, Ober CK, Hodge P, Kratochvíl P, Moad G, Vert M. Terminology for aggregation and self-assembly in polymer science (IUPAC recommendations 2013) Pure and Applied Chemistry. 85: 463-492. DOI: 10.1351/PAC-REC-12-03-12  1
2013 Jiang J, Jung B, Thompson MO, Ober CK. Line edge roughness of high deprotection activation energy photoresist by using sub-millisecond post exposure bake Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2011667  1
2013 Chakrabarty S, Ouyang C, Krysak M, Trikeriotis M, Cho K, Giannelis EP, Ober CK. Oxide nanoparticle EUV resists: Toward understanding the mechanism of positive and negative tone patterning Proceedings of Spie - the International Society For Optical Engineering. 8679. DOI: 10.1117/12.2011490  1
2013 Ouyang CY, Chung YS, Li L, Neisser M, Cho K, Giannelis EP, Ober CK. Non-aqueous negative-tone development of inorganic metal oxide nanoparticle photoresists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2011282  1
2013 Newby C, Lee JK, Ober CK. Inkjet printing of fluorinated materials and their application to patterning organic semiconductors Journal of Materials Chemistry C. 1: 5647-5653. DOI: 10.1039/c3tc31118j  1
2013 Chen L, Thérien-Aubin H, Wong MCY, Hoek EMV, Ober CK. Improved antifouling properties of polymer membranes using a 'layer-by-layer' mediated method Journal of Materials Chemistry B. 1: 5651-5658. DOI: 10.1039/c3tb20916d  1
2013 Ohm C, Ober CK. From surface coatings to polymer nanofilms: Lifting off polymer brushes Rsc Advances. 3: 18482-18488. DOI: 10.1039/c3ra42290a  1
2013 McCluskey GE, Watkins SE, Holmes AB, Ober CK, Lee JK, Wong WWH. Semi-perfluoroalkyl polyfluorene with varying fluorine content: Synthesis and photophysical properties Polymer Chemistry. 4: 5291-5296. DOI: 10.1039/c3py00124e  1
2013 Welch ME, Ober CK. Characterization of polymer brush membranes via HF etch liftoff technique Acs Macro Letters. 2: 241-245. DOI: 10.1021/mz300656f  1
2013 Ober CK. ConfChem conference on a virtual colloquium to sustain and celebrate IYC 2011 initiatives in global chemical education - The continuing celebration of IYC 2011: What the IUPAC polymer division is doing to keep things going Journal of Chemical Education. 90: 1559-1560. DOI: 10.1021/ed3007988  1
2013 Hoshi Y, Xu Y, Ober CK. Photo-cleavable anti-fouling polymer brushes: A simple and versatile platform for multicomponent protein patterning Polymer (United Kingdom). 54: 1762-1767. DOI: 10.1016/j.polymer.2013.02.027  1
2013 Newby C, Lee JK, Ober CK. The solvent problem: Redissolution of macromolecules in solution-processed organic electronics Macromolecular Research. 21: 248-256. DOI: 10.1007/s13233-013-1129-z  1
2013 Hiorns RC, Boucher RJ, Duhlev R, Hellwich KH, Hodge P, Jenkins AD, Jones RG, Kahovec J, Moad G, Ober CK, Smith DW, Stepto RFT, Vairon JP, Vohlídal J. A brief guide to polymer nomenclature from IUPAC Colloid and Polymer Science. 291: 457-458. DOI: 10.1007/s00396-013-2890-4  1
2013 Welch ME, Ober CK. Responsive and patterned polymer brushes Journal of Polymer Science, Part B: Polymer Physics. 51: 1457-1472. DOI: 10.1002/polb.23356  1
2012 Wieberger F, Neuber C, Ober CK, Schmidt HW. Tailored star block copolymer architecture for high performance chemically amplified resists. Advanced Materials (Deerfield Beach, Fla.). 24: 5939-44. PMID 22961836 DOI: 10.1002/adma.201201547  1
2012 Jung B, Sha J, Paredes F, Chandhok M, Younkin TR, Wiesner U, Ober CK, Thompson MO. Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating. Acs Nano. 6: 5830-6. PMID 22725269 DOI: 10.1021/nn300008a  1
2012 Prabhu VM, Kang S, Sha J, Bonnesen PV, Satija S, Wu WL, Ober CK. Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 7665-78. PMID 22577835 DOI: 10.1021/la301311m  1
2012 Cho Y, Sundaram HS, Finlay JA, Dimitriou MD, Callow ME, Callow JA, Kramer EJ, Ober CK. Reconstruction of surfaces from mixed hydrocarbon and PEG components in water: responsive surfaces aid fouling release. Biomacromolecules. 13: 1864-74. PMID 22530840 DOI: 10.1021/bm300363g  1
2012 Wan AM, Schur RM, Ober CK, Fischbach C, Gourdon D, Malliaras GG. Electrical control of protein conformation. Advanced Materials (Deerfield Beach, Fla.). 24: 2501-5. PMID 22489011 DOI: 10.1002/adma.201200436  1
2012 Cho Y, Cho D, Park JH, Frey MW, Ober CK, Joo YL. Preparation and characterization of amphiphilic triblock terpolymer-based nanofibers as antifouling biomaterials. Biomacromolecules. 13: 1606-14. PMID 22471871 DOI: 10.1021/bm300327w  1
2012 Shayan G, Felix N, Cho Y, Chatzichristidi M, Shuler ML, Ober CK, Lee KH. Synthesis and characterization of high-throughput nanofabricated poly(4-hydroxy styrene) membranes for in vitro models of barrier tissue. Tissue Engineering. Part C, Methods. 18: 667-76. PMID 22435738 DOI: 10.1089/ten.TEC.2011.0598  1
2012 Zhou Z, Yu P, Geller HM, Ober CK. The role of hydrogels with tethered acetylcholine functionality on the adhesion and viability of hippocampal neurons and glial cells. Biomaterials. 33: 2473-81. PMID 22196899 DOI: 10.1016/j.biomaterials.2011.12.005  1
2012 Trikeriotis M, Krysaki M, Chung YS, Ouyang C, Cardineau B, Brainard R, Ober CK, Giannelis EP, Cho K. Nanoparticle photoresists from HfO 2 and ZrO 2 for EUV patterning Journal of Photopolymer Science and Technology. 25: 583-586. DOI: 10.2494/photopolymer.25.583  1
2012 Maeda R, Chavis M, You NH, Ober CK. Top-down meets bottom up: Block copolymers with photoreactive segments Journal of Photopolymer Science and Technology. 25: 17-20. DOI: 10.2494/photopolymer.25.17  1
2012 Cardineau B, Krysak M, Trikeriotis M, Giannelis E, Ober CK, Cho K, Brainard R. Tightly-bound ligands for hafnium nanoparticle EUV resists Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.917014  1
2012 Jung B, Ober CK, Thompson MO. Deprotection reaction kinetics in chemically amplified photoresists determined by sub-millisecond post exposure bake Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916605  1
2012 Maeda R, Chavis M, You NH, Ober CK. Synthesis and characterization of self-assembling block copolymers containing fluorine groups Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916418  1
2012 Trikeriotis M, Krysak M, Chung YS, Ouyang C, Cardineau B, Brainard R, Ober CK, Giannelis EP, Cho K. A new inorganic EUV resist with high-etch resistance Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916384  1
2012 Krysak M, Jung B, Thompson MO, Ober CK. Investigation of acid diffusion during laser spike annealing with systematically designed photoacid generators Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916318  1
2012 Ouyang CY, Lee JK, Ober CK. Negative-tone development of photoresists in environmentally friendly silicone fluids Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916297  1
2012 Ohm C, Welch ME, Ober CK. Materials for biosurfaces Journal of Materials Chemistry. 22: 19343-19347. DOI: 10.1039/c2jm90126a  1
2012 Ouyang CY, Lee JK, Krysak ME, Sha J, Ober CK. Environmentally friendly patterning of thin films in linear methyl siloxanes Journal of Materials Chemistry. 22: 5746-5750. DOI: 10.1039/c2jm16603h  1
2012 Gwinner MC, Brenner TJK, Lee JK, Newby C, Ober CK, McNeill CR, Sirringhaus H. Organic field-effect transistors and solar cells using novel high electron-affinity conjugated copolymers based on alkylbenzotriazole and benzothiadiazole Journal of Materials Chemistry. 22: 4436-4439. DOI: 10.1039/c2jm15715b  1
2012 Wieberger F, Forman DC, Neuber C, Gröschel AH, Böhm M, Müller AHE, Schmidt HW, Ober CK. Tailored star-shaped statistical teroligomers via ATRP for lithographic applications Journal of Materials Chemistry. 22: 73-79. DOI: 10.1039/c1jm11922b  1
2012 Maeda R, Hayakawa T, Ober CK. Dual mode patterning of fluorine-containing block copolymers through combined top-down and bottom-up lithography Chemistry of Materials. 24: 1454-1461. DOI: 10.1021/cm300093e  1
2012 Dimitriou MD, Sundaram HS, Cho Y, Paik MY, Kondo M, Schmidt K, Fischer DA, Ober CK, Kramer EJ. Amphiphilic block copolymer surface composition: Effects of spin coating versus spray coating Polymer. 53: 1321-1327. DOI: 10.1016/j.polymer.2011.12.055  1
2012 Bosworth JK, Ober CK. Top-Down versus Bottom-Up Patterning of Polymers Polymer Science: a Comprehensive Reference, 10 Volume Set. 8: 9-35. DOI: 10.1016/B978-0-444-53349-4.00200-4  1
2012 Ober CK, Müllen K. Introduction - Applications of Polymers Polymer Science: a Comprehensive Reference, 10 Volume Set. 8: 1-8. DOI: 10.1016/B978-0-444-53349-4.00199-0  1
2012 Kolb T, Neuber C, Krysak M, Ober CK, Schmidt HW. Multicomponent physical vapor deposited films with homogeneous molecular material distribution featuring improved resist sensitivity Advanced Functional Materials. 22: 3865-3873. DOI: 10.1002/adfm.201103130  1
2011 Bauer WA, Neuber C, Ober CK, Schmidt HW. Combinatorial optimization of a molecular glass photoresist system for electron beam lithography. Advanced Materials (Deerfield Beach, Fla.). 23: 5404-8. PMID 22009688 DOI: 10.1002/adma.201103107  1
2011 Sundaram HS, Cho Y, Dimitriou MD, Weinman CJ, Finlay JA, Cone G, Callow ME, Callow JA, Kramer EJ, Ober CK. Fluorine-free mixed amphiphilic polymers based on PDMS and PEG side chains for fouling release applications. Biofouling. 27: 589-602. PMID 21985292 DOI: 10.1080/08927014.2011.587662  1
2011 Dimitriou MD, Zhou Z, Yoo HS, Killops KL, Finlay JA, Cone G, Sundaram HS, Lynd NA, Barteau KP, Campos LM, Fischer DA, Callow ME, Callow JA, Ober CK, Hawker CJ, et al. A general approach to controlling the surface composition of poly(ethylene oxide)-based block copolymers for antifouling coatings. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 13762-72. PMID 21888355 DOI: 10.1021/la202509m  1
2011 Sundaram HS, Cho Y, Dimitriou MD, Finlay JA, Cone G, Williams S, Handlin D, Gatto J, Callow ME, Callow JA, Kramer EJ, Ober CK. Fluorinated amphiphilic polymers and their blends for fouling-release applications: the benefits of a triblock copolymer surface. Acs Applied Materials & Interfaces. 3: 3366-74. PMID 21830813 DOI: 10.1021/am200529u  1
2011 Lee JK, Gwinner MC, Berger R, Newby C, Zentel R, Friend RH, Sirringhaus H, Ober CK. High-performance electron-transporting polymers derived from a heteroaryl bis(trifluoroborate). Journal of the American Chemical Society. 133: 9949-51. PMID 21648485 DOI: 10.1021/ja201485p  1
2011 Chiang EN, Dong R, Ober CK, Baird BA. Cellular responses to patterned poly(acrylic acid) brushes. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 7016-23. PMID 21557546 DOI: 10.1021/la200093e  1
2011 Yang SY, Kim BN, Zakhidov AA, Taylor PG, Lee JK, Ober CK, Lindau M, Malliaras GG. Detection of transmitter release from single living cells using conducting polymer microelectrodes. Advanced Materials (Deerfield Beach, Fla.). 23: H184-8. PMID 21400618 DOI: 10.1002/adma.201100035  1
2011 Fong HH, Lee JK, Lim YF, Zakhidov AA, Wong WW, Holmes AB, Ober CK, Malliaras GG. Orthogonal processing and patterning enabled by highly fluorinated light-emitting polymers. Advanced Materials (Deerfield Beach, Fla.). 23: 735-9. PMID 21287633 DOI: 10.1002/adma.201002986  1
2011 Daga VK, Schwartz EL, Chandler CM, Lee JK, Lin Y, Ober CK, Watkins JJ. Photoinduced ordering of block copolymers. Nano Letters. 11: 1153-60. PMID 21280663 DOI: 10.1021/nl104080v  1
2011 Jung B, Chandhok M, Younkin TR, Ober CK, Thompson MO. Time dependent behavior of chemically amplified resist characterized under sub-millisecond post exposure bake Journal of Photopolymer Science and Technology. 24: 487-490. DOI: 10.2494/photopolymer.24.487  1
2011 Ouyang CY, Lee JK, Ober CK. Studies of environmentally friendly solvent-based developers Journal of Photopolymer Science and Technology. 24: 239-240. DOI: 10.2494/photopolymer.24.239  1
2011 Ober CK, Ouyang C, Lee JK, Krysak M. Solvent development processing of chemically amplified resists: Chemistry, physics, and polymer science considerations Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.882959  1
2011 Jung B, Ober CK, Thompson MO, Chandhok M. LWR reduction and flow of chemically amplified resist patterns during sub-millisecond heating Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.881675  1
2011 Cho Y, Ouyang CY, Krysak M, Sun W, Gamez V, Sierra-Alvarez R, Ober CK. Environmentally friendly natural materials based photoacid generators for next generation photolithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879816  1
2011 Krysak M, Trikeriotis M, Schwartz E, Lafferty N, Xie P, Smith B, Zimmerman P, Montgomery W, Giannelis E, Ober CK. Development of an inorganic nanoparticle photoresist for EUV, E-beam and 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879385  1
2011 Ouyang CY, Lee JK, Krysak M, Ober CK. Patterning conventional photoresists in environmentally friendly silicone fluids Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879294  1
2011 Jung B, Ober CK, Thompson MO, Younkin TR, Chandhok M. Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879288  1
2011 Prabhu VM, Kang S, Kline RJ, Delongchamp DM, Fischer DA, Wu WL, Satija SK, Bonnesen PV, Sha J, Ober CK. Characterization of the non-uniform reaction in chemically amplified calix[4]resorcinarene molecular resist thin films Australian Journal of Chemistry. 64: 1065-1073. DOI: 10.1071/CH11242  1
2011 Zakhidov AA, Fong HH, Defranco JA, Lee JK, Taylor PG, Ober CK, Malliaras GG, He M, Kane MG. Fabrication of polymer-based electronic circuits using photolithography Applied Physics Letters. 99. DOI: 10.1063/1.3650474  1
2011 Xu Y, Hoshi Y, Ober CK. Photo-switchable polyelectrolyte brush for dual protein patterning Journal of Materials Chemistry. 21: 13789-13792. DOI: 10.1039/c1jm12062j  1
2011 Martinelli E, Galli G, Krishnan S, Paik MY, Ober CK, Fischer DA. New poly(dimethylsiloxane)/poly(perfluorooctylethyl acrylate) block copolymers: Structure and order across multiple length scales in thin films Journal of Materials Chemistry. 21: 15357-15368. DOI: 10.1039/c1jm12044a  1
2011 Zakhidov AA, Lee JK, Defranco JA, Fong HH, Taylor PG, Chatzichristidi M, Ober CK, Malliaras GG. Orthogonal processing: A new strategy for organic electronics Chemical Science. 2: 1178-1182. DOI: 10.1039/c0sc00612b  1
2011 Cho Y, Sundaram HS, Weinman CJ, Paik MY, Dimitriou MD, Finlay JA, Callow ME, Callow JA, Kramer EJ, Ober CK. Triblock copolymers with grafted fluorine-free, amphiphilic, non-ionic side chains for antifouling and fouling-release applications Macromolecules. 44: 4783-4792. DOI: 10.1021/ma200269s  1
2011 Cho D, Bae WJ, Joo YL, Ober CK, Frey MW. Properties of PVA/HfO 2 hybrid electrospun fibers and calcined inorganic HfO 2 fibers Journal of Physical Chemistry C. 115: 5535-5544. DOI: 10.1021/jp111964f  1
2011 Thérien-Aubin H, Chen L, Ober CK. Fouling-resistant polymer brush coatings Polymer. 52: 5419-5425. DOI: 10.1016/j.polymer.2011.09.017  1
2011 Koerner H, Ober CK, Xu H. Probing electric field response of LC thermosets via time-resolved X-ray and dielectric spectroscopy Polymer. 52: 2206-2213. DOI: 10.1016/j.polymer.2011.03.039  1
2011 Politakos N, Weinman CJ, Paik MY, Sundaram HS, Ober CK, Avgeropoulos A. Synthesis, molecular, and morphological characterization of initial and modified diblock copolymers with organic acid chloride derivatives Journal of Polymer Science, Part a: Polymer Chemistry. 49: 4292-4305. DOI: 10.1002/pola.24873  1
2011 De Silva A, Ober CK. Patterning by Photolithography Functional Polymer Films. 1: 475-499. DOI: 10.1002/9783527638482.ch13  1
2011 Bratton D, Ayothi R, Felix N, Ober CK. Applications of Controlled Macromolecular Architectures to Lithography Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications. 4: 2295-2330. DOI: 10.1002/9783527631421.ch55  1
2011 Chavis MA, Schwartz EL, Ober CK. Block Copolymer Nanostructured Thin Films for Advanced Patterning Complex Macromolecular Architectures: Synthesis, Characterization, and Self-Assembly. 763-790. DOI: 10.1002/9780470825150.ch25  1
2010 Kim Y, Malliaras GG, Ober CK, Kim E. An electrochemical glucose sensor from an organically modified nanocomposite of viologen and TiO2. Journal of Nanoscience and Nanotechnology. 10: 6869-73. PMID 21137814 DOI: 10.1166/jnn.2010.2948  1
2010 Paik MY, Bosworth JK, Smilges DM, Schwartz EL, Andre X, Ober CK. Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study. Macromolecules. 43: 4253-4260. PMID 21116459 DOI: 10.1021/ma902646t  1
2010 Paik MY, Xu Y, Rastogi A, Tanaka M, Yi Y, Ober CK. Patterning of polymer brushes. A direct approach to complex, sub-surface structures. Nano Letters. 10: 3873-9. PMID 20815408 DOI: 10.1021/nl102910f  1
2010 Dong R, Molloy RP, Lindau M, Ober CK. Direct synthesis of quaternized polymer brushes and their application for guiding neuronal growth. Biomacromolecules. 11: 2027-32. PMID 20690711 DOI: 10.1021/bm1003702  1
2010 Kristalyn CB, Lu X, Weinman CJ, Ober CK, Kramer EJ, Chen Z. Surface structures of an amphiphilic tri-block copolymer in air and in water probed using sum frequency generation vibrational spectroscopy. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 11337-43. PMID 20465236 DOI: 10.1021/la100701b  1
2010 Park D, Weinman CJ, Finlay JA, Fletcher BR, Paik MY, Sundaram HS, Dimitriou MD, Sohn KE, Callow ME, Callow JA, Handlin DL, Willis CL, Fischer DA, Kramer EJ, Ober CK. Amphiphilic surface active triblock copolymers with mixed hydrophobic and hydrophilic side chains for tuned marine fouling-release properties. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 9772-81. PMID 20359178 DOI: 10.1021/la100032n  1
2010 Park D, Finlay JA, Ward RJ, Weinman CJ, Krishnan S, Paik M, Sohn KE, Callow ME, Callow JA, Handlin DL, Willis CL, Fischer DA, Angert ER, Kramer EJ, Ober CK. Antimicrobial behavior of semifluorinated-quaternized triblock copolymers against airborne and marine microorganisms. Acs Applied Materials & Interfaces. 2: 703-11. PMID 20356271 DOI: 10.1021/am900748v  1
2010 Rastogi A, Paik MY, Tanaka M, Ober CK. Direct patterning of intrinsically electron beam sensitive polymer brushes. Acs Nano. 4: 771-80. PMID 20121228 DOI: 10.1021/nn901344u  1
2010 Hyun BR, Bartnik AC, Lee JK, Imoto H, Sun L, Choi JJ, Chujo Y, Hanrath T, Ober CK, Wise FW. Role of solvent dielectric properties on charge transfer from PbS nanocrystals to molecules. Nano Letters. 10: 318-23. PMID 19968265 DOI: 10.1021/nl903623n  1
2010 Kim Y, Do J, Kim J, Yang SY, Malliaras GG, Ober CK, Kim E. A glucose sensor based on an organic electrochemical transistor structure using a vapor polymerized poly(3,4-ethylenedioxythiophene) layer Japanese Journal of Applied Physics. 49. DOI: 10.1143/JJAP.49.01AE10  1
2010 Jung B, Sha J, Paredes F, Ober CK, Thompson MO, Chandhok M, Younkin TR. Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848418  1
2010 Taylor PG, Lee JK, Zakhidov AA, Hwang HS, DeFranco JA, Fong HH, Chatzichristidi M, Murotani E, Malliaras GG, Ober CK. Orthogonal lithography for organic electronics Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848410  1
2010 Schwartz EL, Bosworth JK, Paik MY, Ober CK. New self-assembly strategies for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848409  1
2010 Krysak M, Kolb T, Neuber C, Schmidt HW, Ober CK. All-dry processible and PAG-attached molecular glasses for improved lithographic performance Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848385  1
2010 Forman DC, Wieberger F, Groeschel A, Müller AHE, Schmidt HW, Ober CK. Comparison of star and linear ArF resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848344  1
2010 Ouyang CY, Lee JK, Sha J, Ober CK. Environmentally friendly processing of photoresists in scCO2 and decamethyltetrasiloxane Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848336  1
2010 Trikeriotis M, Bae WJ, Schwartz E, Krysak M, Lafferty N, Xie P, Smith B, Zimmerman PA, Ober CK, Giannelis EP. Development of an inorganic photoresist for DUV, EUV, and electron beam imaging Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846672  1
2010 Bae WJ, Trikeriotis M, Sha J, Schwartz EL, Rodriguez R, Zimmerman P, Giannelis EP, Ober CK. High refractive index and high transparency HfO2 nanocomposites for next generation lithography Journal of Materials Chemistry. 20: 5186-5189. DOI: 10.1039/c0jm00679c  1
2010 Weinman CJ, Gunari N, Krishnan S, Dong R, Paik MY, Sohn KE, Walker GC, Kramer EJ, Fischer DA, Ober CK. Protein adsorption resistance of anti-biofouling block copolymers containing amphiphilic side chains Soft Matter. 6: 3237-3243. DOI: 10.1039/b925114f  1
2010 Krishnan S, Paik MY, Ober CK, Martinelli E, Galli G, Sohn KE, Kramer EJ, Fischer DA. NEXAFS depth profiling of surface segregation in block copolymer thin films Macromolecules. 43: 4733-4743. DOI: 10.1021/ma902866x  1
2010 Kang S, Wu WL, Choi KW, De Silva A, Ober CK, Prabhu VM. Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy Macromolecules. 43: 4275-4286. DOI: 10.1021/ma902548a  1
2010 Lee JK, Fong HH, Zakhidov AA, McCluskey GE, Taylor PG, Santiago-Berrios M, Abruña HD, Holmes AB, Malharas GG, Ober CK. Semiperfluoroalkyl polyfluorenes for orthogonal processing in fluorous solvents Macromolecules. 43: 1195-1198. DOI: 10.1021/ma902179s  1
2010 Sha J, Lee JK, Kang S, Prabhu VM, Soles CL, Bonnesen PV, Ober CK. Architectural effects on acid reaction-diffusion kinetics in molecular glass photoresists Chemistry of Materials. 22: 3093-3098. DOI: 10.1021/cm9038939  1
2010 Schwartz EL, Ober CK. Phase-Selective Chemistry in Block Copolymer Systems Advanced Nanomaterials. 1: 1-66. DOI: 10.1002/9783527628940.ch1  1
2009 Murotani E, Lee JK, Chatzichristidi M, Zakhidov AA, Taylor PG, Schwartz EL, Malliaras GG, Ober CK. Cross-linkable molecular glasses: low dielectric constant materials patternable in hydrofluoroethers. Acs Applied Materials & Interfaces. 1: 2363-70. PMID 20355874 DOI: 10.1021/am9004978  1
2009 Rastogi A, Paik MY, Ober CK. Development of a directly patterned low-surface-energy polymer brush in supercritical carbon dioxide. Acs Applied Materials & Interfaces. 1: 2013-20. PMID 20355827 DOI: 10.1021/am9003733  1
2009 Jhaveri SJ, McMullen JD, Sijbesma R, Tan LS, Zipfel W, Ober CK. Direct three-dimensional microfabrication of hydrogels via two-photon lithography in aqueous solution. Chemistry of Materials : a Publication of the American Chemical Society. 21: 2003-2006. PMID 20160917 DOI: 10.1021/cm803174e  1
2009 Weinman CJ, Finlay JA, Park D, Paik MY, Krishnan S, Sundaram HS, Dimitriou M, Sohn KE, Callow ME, Callow JA, Handlin DL, Willis CL, Kramer EJ, Ober CK. ABC triblock surface active block copolymer with grafted ethoxylated fluoroalkyl amphiphilic side chains for marine antifouling/fouling-release applications. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 12266-74. PMID 19821626 DOI: 10.1021/la901654q  1
2009 Rastogi A, Nad S, Tanaka M, Mota ND, Tague M, Baird BA, Abruña HD, Ober CK. Preventing nonspecific adsorption on polymer brush covered gold electrodes using a modified ATRP initiator. Biomacromolecules. 10: 2750-8. PMID 19743841 DOI: 10.1021/bm900564t  1
2009 Bosworth JK, Black CT, Ober CK. Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer. Acs Nano. 3: 1761-6. PMID 19534477 DOI: 10.1021/nn900343u  1
2009 Wallace WE, Flynn KM, Guttman CM, VanderHart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Quantitative measurement of the polydispersity in the extent of functionalization of glass-forming calix[4]resorcinarenes. Rapid Communications in Mass Spectrometry : Rcm. 23: 1957-62. PMID 19504485 DOI: 10.1002/rcm.4099  1
2009 Dong R, Lindau M, Ober CK. Dissociation behavior of weak polyelectrolyte brushes on a planar surface. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 4774-9. PMID 19243153 DOI: 10.1021/la8039384  1
2009 Jhaveri SJ, Hynd MR, Dowell-Mesfin N, Turner JN, Shain W, Ober CK. Release of nerve growth factor from HEMA hydrogel-coated substrates and its effect on the differentiation of neural cells. Biomacromolecules. 10: 174-83. PMID 19061335 DOI: 10.1021/bm801101e  1
2009 Lee JK, Taylor PG, Zakhidov AA, Fong HH, Hwang HS, Chatzichristidi M, Malliaras GG, Ober CK. Orthogonal processing: A novel photolithographic patterning method for organic electronics Journal of Photopolymer Science and Technology. 22: 565-569. DOI: 10.2494/photopolymer.22.565  1
2009 Trikeriotis M, Rodriguez R, Zettel MF, Bakandritsos A, Bae WJ, Zimmerman P, Ober CK, Giannelis EP. High-refractive index nanoparticle fluids for 193-nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814408  1
2009 Bae WJ, Trikeriotis M, Rodriguez R, Zettel MF, Piscani E, Ober CK, Giannelis EP, Zimmerman P. High index nanocomposite photoresist for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814154  1
2009 Krysak M, De Silva A, Sha J, Lee JK, Ober CK. Molecular glass resists for next generation lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814147  1
2009 Sha J, Lee JK, Ober CK. Molecular glass resists developable in supercritical carbon dioxide for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813956  1
2009 Rastogi A, Toepperwein GN, Tanaka M, Riggleman RA, De Pablo JJ, Ober CK. Contact analysis studies of an ESCAP resist with ScCO2 compatible additives Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813814  1
2009 Wallace WE, Flynn KM, Guttman CM, VanderHart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Quantitative measurement of the molecular-mass distribution in Calix[4]resorcinarene molecular glass resists by mass spectrometry Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813680  1
2009 Sha J, Jung B, Thompson MO, Ober CK, Chandhok M, Younkin TR. Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3020-3024. DOI: 10.1116/1.3263173  1
2009 Lim YF, Lee JK, Zakhidov AA, Defranco JA, Fong HH, Taylor PG, Ober CK, Malliaras GG. High voltage polymer solar cell patterned with photolithography Journal of Materials Chemistry. 19: 5394-5397. DOI: 10.1039/b822949j  1
2009 Tanaka M, Rastogi A, Kudo H, Watanabe D, Nishikubo T, Ober CK. Environmentally friendly patterning of molecular waterwheel (Noria) in supercritical carbon dioxide Journal of Materials Chemistry. 19: 4622-4626. DOI: 10.1039/b821475a  1
2009 Lee JK, Chatzichristidi M, Zakhidov AA, Hwang HS, Schwartz EL, Sha J, Taylor PG, Fong HH, Defranco JA, Murotani E, Wong WWH, Malliaras GG, Ober CK. Acid-diffusion behaviour in organic thin films and its effect on patterning Journal of Materials Chemistry. 19: 2986-2992. DOI: 10.1039/b817286b  1
2009 Steidl L, Jhaveri SJ, Ayothi R, Sha J, McMullen JD, Ng SYC, Zipfel WR, Zentel R, Ober CK. Non-ionic photo-acid generators for applications in two-photon lithography Journal of Materials Chemistry. 19: 505-513. DOI: 10.1039/b816434g  1
2009 Vanderhart DL, Prabhu VM, De Silva A, Felix NM, Ober CK. Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator Journal of Materials Chemistry. 19: 2683-2694. DOI: 10.1039/b816290e  1
2009 Ober CK, Cheng SZD, Hammond PT, Muthukumar M, Reichmanis E, Wooley KL, Lodge TP. Research in macromolecular science: Challenges and opportunities for the next decade Macromolecules. 42: 465-471. DOI: 10.1021/ma802463z  1
2009 Yi Y, Ayothi R, Wang Y, Li M, Barclay G, Sierra-Alvarez R, Ober CK. Sulfonium salts of alicyclic group functionalized semifluorinated alkyl ether sulfonates as photoacid generators Chemistry of Materials. 21: 4037-4046. DOI: 10.1021/cm901366r  1
2009 Tanaka M, Rastogi A, Toepperwein GN, Riggleman RA, Felix NM, De Pablo JJ, Ober CK. Fluorinated quaternary ammonium salts as dissolution aids for polar polymers in environmentally benign supercritical carbon dioxide Chemistry of Materials. 21: 3125-3135. DOI: 10.1021/cm900406c  1
2009 Martinelli E, Menghetti S, Galli G, Glisenti A, Krishnan S, Paik MY, Ober CK, Smilgies DM, Fischer DA. Surface engineering of styrene/PEGylated-fluoroalkyl styrene block copolymer thin films Journal of Polymer Science, Part a: Polymer Chemistry. 47: 267-284. DOI: 10.1002/pola.23151  1
2009 Sha J, Ober CK. Fluorine-and siloxane-containing polymers for supercritical carbon dioxide lithography Polymer International. 58: 302-306. DOI: 10.1002/pi.2533  1
2009 Taylor PG, Lee JK, Zakhidov AA, Chatzichristidi M, Fong HH, DeFranco JA, Malliaras GG, Ober CK. Orthogonal patterning of PEDOT:PSS for organic electronics using hydrofluoroether solvents Advanced Materials. 21: 2314-2317. DOI: 10.1002/adma.200803291  1
2009 McCluskey GE, Lee JK, Sha J, Ober CK, Watkins SE, Holmes AB. Synthesis and processing of organic materials in supercritical carbon dioxide Mrs Bulletin. 34: 108-115.  1
2008 Bosworth JK, Paik MY, Ruiz R, Schwartz EL, Huang JQ, Ko AW, Smilgies DM, Black CT, Ober CK. Control of self-assembly of lithographically patternable block copolymer films. Acs Nano. 2: 1396-402. PMID 19206307 DOI: 10.1021/nn8001505  1
2008 Lee JK, Chatzichristidi M, Zakhidov AA, Taylor PG, DeFranco JA, Hwang HS, Fong HH, Holmes AB, Malliaras GG, Ober CK. Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics. Journal of the American Chemical Society. 130: 11564-5. PMID 18686954 DOI: 10.1021/ja803493m  1
2008 Jang JH, Jhaveri SJ, Rasin B, Koh C, Ober CK, Thomas EL. Three-dimensionally-patterned submicrometer-scale hydrogel/air networks that offer a new platform for biomedical applications. Nano Letters. 8: 1456-60. PMID 18393470 DOI: 10.1021/nl080444+  1
2008 Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW. Towards environmentally friendly, dry deposited, water developable molecular glass photoresists. Physical Chemistry Chemical Physics : Pccp. 10: 1257-62. PMID 18292859 DOI: 10.1039/b715819j  1
2008 Finlay JA, Krishnan S, Callow ME, Callow JA, Dong R, Asgill N, Wong K, Kramer EJ, Ober CK. Settlement of Ulva zoospores on patterned fluorinated and PEGylated monolayer surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 503-10. PMID 18081330 DOI: 10.1021/la702275g  1
2008 Zimmerman PA, Rice B, Rodriguez R, Zettel MF, Trikeriotis M, Wang D, Yi Y, Woo JB, Ober CK, Giannelis EP. The use of nanocomposite materials for high refractive index immersion lithography Journal of Photopolymer Science and Technology. 21: 621-629. DOI: 10.2494/photopolymer.21.621  1
2008 Tanaka M, Rastogi A, Felix NM, Ober CK. Supercritical carbon dioxide compatible salts: Synthesis and application to next generation lithography Journal of Photopolymer Science and Technology. 21: 393-396. DOI: 10.2494/photopolymer.21.393  1
2008 Vanderhart DL, De Silva A, Felix N, Prabhu VM, Ober CK. The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773048  1
2008 Woodward JT, Choi KW, Prabhu VM, Kang S, Lavery K, Wu WL, Leeson M, De Silva A, Felix NM, Ober CK. Characterization of the latent image to developed image in model EUV photoresists Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773036  1
2008 Zimmerman PA, Byers J, Rice B, Ober CK, Giannelis EP, Rodriguez R, Wang D, O'Connor N, Lei X, Turro NJ, Liberman V, Palmacci S, Rothschild M, Lafferty N, Smith BW. Development and evaluation of a 193nm immersion generation-three fluid candidates Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772887  1
2008 Yi Y, Ayothi R, Ober CK, Yueh W, Cao H. Ionic photoacid generators containing functionalized semifluorinated sulfonates for high resolution lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772880  1
2008 Zimmerman PA, Byers J, Piscani E, Rice B, Ober CK, Giannelis EP, Rodriguez R, Wang D, Whittaker A, Blakey I, Chen L, Dargaville B, Liu H. Development of an operational high refractive index resist for 193nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772871  1
2008 De Silva A, Felix N, Forman D, Jing S, Ober CK. New architectures for high resolution patterning Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772667  1
2008 Felix NM, De Silva A, Sha J, Ober CK. Achieving small dimensions with an environmentally friendly solvent: Photoresist development using supercritical CO2 Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772635  1
2008 Hwang HS, Zakhidov A, Lee JK, DeFranco JA, Fong HH, Malliaras GG, Ober CK. Photolithographic patterning in supercritical carbon dioxide: Application to patterned light-emitting devices Proceedings of the Academic Track of the 2008 Flexible Electronics and Displays - Conference and Exhibition, Flex. DOI: 10.1109/FEDC.2008.4483878  1
2008 Kudo H, Watanabe D, Nishikubo T, Maruyama K, Shimizu D, Kai T, Shimokawa T, Ober CK. A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material Journal of Materials Chemistry. 18: 3588-3592. DOI: 10.1039/b805394d  1
2008 Hwang HS, Zakhidov AA, Lee JK, André X, Defranco JA, Fong HH, Holmes AB, Malliaras GG, Ober CK. Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent Journal of Materials Chemistry. 18: 3087-3090. DOI: 10.1039/b802713g  1
2008 Krishnan S, Weinman CJ, Ober CK. Advances in polymers for anti-biofouling surfaces Journal of Materials Chemistry. 18: 3405-3413. DOI: 10.1039/b801491d  1
2008 Ober CK, De Silva A. Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists Journal of Materials Chemistry. 18: 1903-1910. DOI: 10.1039/b719108a  1
2008 Sivaniah E, Genzer J, Hexemer A, Kramer EJ, Xiang ML, Li XF, Ober CK, Magonov S. Nonplanar surface organization of monodendrons in Side-Chain modified liquid crystalline block copolymers Macromolecules. 41: 9940-9945. DOI: 10.1021/ma8015097  1
2008 De Silva A, Sundberg LK, Ito H, Sooriyakumaran R, Allen RD, Ober CK. A fundamental study on dissolution behavior of high-resolution molecular glass photoresists Chemistry of Materials. 20: 7292-7300. DOI: 10.1021/cm802295y  1
2008 Felix N, Ober CK. Acid-labile, chain-scission polymer systems used as positive-tone photoresists developable in supercritical CO2 Chemistry of Materials. 20: 2932-2936. DOI: 10.1021/cm703580f  1
2008 De Silva A, Lee JK, André X, Felix NM, Cao HB, Deng H, Ober CK. Study of the structure - Properties relationship of phenolic molecular glass resists for next generation photolithography Chemistry of Materials. 20: 1606-1613. DOI: 10.1021/cm702613n  1
2008 Nagarajan S, Bosworth JK, Ober CK, Russell TP, Watkins JJ. Simple fabrication of micropatterned mesoporous silica films using photoacid generators in block copolymers Chemistry of Materials. 20: 604-606. DOI: 10.1021/cm702397b  1
2008 De Silva A, Felix NM, Ober CK. Molecular glass resists as high-resolution patterning materials Advanced Materials. 20: 3355-3361. DOI: 10.1002/adma.200800763  1
2008 Zakhidov AA, Lee JK, Fong HH, DeFranco JA, Chatzichristidi M, Taylor PG, Ober CK, Malliaras GG. Hydrofluoroethers as orthogonal solvents for the chemical processing of organic electronic materials Advanced Materials. 20: 3481-3484. DOI: 10.1002/adma.200800557  1
2008 Felix NM, De Silva A, Ober CK. Calix[4]resorcinarene derivatives as high-resolution resist materials for supercritical CO2 processing Advanced Materials. 20: 1303-1309. DOI: 10.1002/adma.200702772  1
2008 Nagarajan S, Li M, Pai RA, Bosworth JK, Busch P, Smilgies DM, Ober CK, Russell TP, Watkins JJ. An efficient route to mesoporous silica films with perpendicular nanochannels Advanced Materials. 20: 246-251. DOI: 10.1002/adma.200701766  1
2008 Nagarajan S, Bosworth JK, Ober CK, Russell TP, Watkins JJ. Directly patterned mesoporous dielectric films templated from chemically amplified block copolymers Advanced Metallization Conference (Amc). 495-499.  1
2007 Dong R, Krishnan S, Baird BA, Lindau M, Ober CK. Patterned biofunctional poly(acrylic acid) brushes on silicon surfaces. Biomacromolecules. 8: 3082-92. PMID 17880179 DOI: 10.1021/bm700493v  1
2007 Niamsiri N, Bergkvist M, Delamarre SC, Cady NC, Coates GW, Ober CK, Batt CA. Insight in the role of bovine serum albumin for promoting the in situ surface growth of polyhydroxybutyrate (PHB) on patterned surfaces via enzymatic surface-initiated polymerization. Colloids and Surfaces. B, Biointerfaces. 60: 68-79. PMID 17629682 DOI: 10.1016/j.colsurfb.2007.05.023  1
2007 Paik MY, Krishnan S, You F, Li X, Hexemer A, Ando Y, Kang SH, Fischer DA, Kramer EJ, Ober CK. Surface organization, light-driven surface changes, and stability of semifluorinated azobenzene polymers. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 5110-9. PMID 17397198 DOI: 10.1021/la0634138  1
2007 Bosworth JK, Andre X, Schwartz EL, Ruiz R, Black CT, Ober CK. Control of morphology orientation in lithographically patternable diblock copolymers Journal of Photopolymer Science and Technology. 20: 519-522. DOI: 10.2494/photopolymer.20.519  1
2007 Felix NM, De Silva A, Luk CMY, Ober CK. Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2 Journal of Materials Chemistry. 17: 4598-4604. DOI: 10.1039/b709649f  1
2006 Krishnan S, Ward RJ, Hexemer A, Sohn KE, Lee KL, Angert ER, Fischer DA, Kramer EJ, Ober CK. Surfaces of fluorinated pyridinium block copolymers with enhanced antibacterial activity. Langmuir : the Acs Journal of Surfaces and Colloids. 22: 11255-66. PMID 17154613 DOI: 10.1021/la061384v  1
2006 Krishnan S, Ayothi R, Hexemer A, Finlay JA, Sohn KE, Perry R, Ober CK, Kramer EJ, Callow ME, Callow JA, Fischer DA. Anti-biofouling properties of comblike block copolymers with amphiphilic side chains. Langmuir : the Acs Journal of Surfaces and Colloids. 22: 5075-86. PMID 16700597 DOI: 10.1021/la052978l  1
2006 Krishnan S, Wang N, Ober CK, Finlay JA, Callow ME, Callow JA, Hexemer A, Sohn KE, Kramer EJ, Fischer DA. Comparison of the fouling release properties of hydrophobic fluorinated and hydrophilic PEGylated block copolymer surfaces: attachment strength of the diatom Navicula and the green alga Ulva. Biomacromolecules. 7: 1449-62. PMID 16677026 DOI: 10.1021/bm0509826  1
2006 Senaratne W, Sengupta P, Jakubek V, Holowka D, Ober CK, Baird B. Functionalized surface arrays for spatial targeting of immune cell signaling. Journal of the American Chemical Society. 128: 5594-5. PMID 16637600 DOI: 10.1021/ja058701p  1
2006 Kim YR, Paik HJ, Ober CK, Coates GW, Mark SS, Ryan TE, Batt CA. Real-time analysis of enzymatic surface-initiated polymerization using surface plasmon resonance (SPR). Macromolecular Bioscience. 6: 145-52. PMID 16432845 DOI: 10.1002/mabi.200500213  1
2006 Senaratne W, Takada K, Das R, Cohen J, Baird B, Abruña HD, Ober CK. Dinitrophenyl ligand substrates and their application to immunosensors. Biosensors & Bioelectronics. 22: 63-70. PMID 16414258 DOI: 10.1016/j.bios.2005.12.003  1
2005 Senaratne W, Andruzzi L, Ober CK. Self-assembled monolayers and polymer brushes in biotechnology: current applications and future perspectives. Biomacromolecules. 6: 2427-48. PMID 16153077 DOI: 10.1021/bm050180a  1
2005 Paik HJ, Kim YR, Orth RN, Ober CK, Coates GW, Batt CA. End-functionalization of poly(3-hydroxybutyrate)via genetic engineering for solid surface modification. Chemical Communications (Cambridge, England). 1956-8. PMID 15834470 DOI: 10.1039/b415809a  1
2005 Andruzzi L, Senaratne W, Hexemer A, Sheets ED, Ilic B, Kramer EJ, Baird B, Ober CK. Oligo(ethylene glycol) containing polymer brushes as bioselective surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 21: 2495-504. PMID 15752045 DOI: 10.1021/la047574s  1
2004 Andruzzi L, Hexemer A, Li X, Ober CK, Kramer EJ, Galli G, Chiellini E, Fischer DA. Control of surface properties using fluorinated polymer brushes produced by surface-initiated controlled radical polymerization. Langmuir : the Acs Journal of Surfaces and Colloids. 20: 10498-506. PMID 15544378 DOI: 10.1021/la049264f  1
2004 Krishnan S, Kwark YJ, Ober CK. Fluorinated polymers: liquid crystalline properties and applications in lithography. Chemical Record (New York, N.Y.). 4: 315-30. PMID 15543605 DOI: 10.1002/tcr.20022  1
2004 Kim YR, Paik HJ, Ober CK, Coates GW, Batt CA. Enzymatic surface-initiated polymerization: a novel approach for the in situ solid-phase synthesis of biocompatible polymer poly(3-hydroxybutyrate). Biomacromolecules. 5: 889-94. PMID 15132678 DOI: 10.1021/bm0344147  1
2003 Youngblood JP, Andruzzi L, Ober CK, Hexemer A, Kramer EJ, Callow JA, Finlay JA, Callow ME. Coatings based on side-chain ether-linked poly(ethylene glycol) and fluorocarbon polymers for the control of marine biofouling. Biofouling. 19: 91-8. PMID 14618709 DOI: 10.1080/0892701021000053381  1
2003 Yu T, Ober CK. Methods for the topographical patterning and patterned surface modification of hydrogels based on hydroxyethyl methacrylate. Biomacromolecules. 4: 1126-31. PMID 12959574 DOI: 10.1021/bm034079m  1
2002 Zhou W, Kuebler SM, Braun KL, Yu T, Cammack JK, Ober CK, Perry JW, Marder SR. An efficient two-photon-generated photoacid applied to positive-tone 3D microfabrication. Science (New York, N.Y.). 296: 1106-9. PMID 12004126 DOI: 10.1126/science.296.5570.1106  1
2002 Ober CK. Self-assembly. Persistence pays off. Science (New York, N.Y.). 296: 859-61. PMID 11988559 DOI: 10.1126/science.1071399  1
2000 Dierking I, Glusen B, Lagerwall ST, Ober CK. Synchrotron x-ray study of the smectic layer directional instability Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics. 61: 1593-8. PMID 11046442  0.08
2000 Ober CK. Shape persistence of synthetic polymers. Science (New York, N.Y.). 288: 448-9. PMID 10798980 DOI: 10.1126/science.288.5465.448  1
1997 Barber DB, Pollock CR, Beecroft LL, Ober CK. Amplification by optical composites. Optics Letters. 22: 1247-9. PMID 18185809  1
1996 Chen JT, Thomas EL, Ober CK, Mao G. Self-Assembled Smectic Phases in Rod-Coil Block Copolymers Science (New York, N.Y.). 273: 343-6. PMID 8662518  1
1995 Dai CA, Dair BJ, Dai KH, Ober CK, Kramer EJ, Hui CY, Jelinski LW. Dai et al. Reply. Physical Review Letters. 74: 2837. PMID 10058031  1
1994 Dai CA, Dair BJ, Dai KH, Ober CK, Kramer EJ, Hui CY, Jelinski LW. Reinforcement of polymer interfaces with random copolymers. Physical Review Letters. 73: 2472-2475. PMID 10057068 DOI: 10.1103/PhysRevLett.73.2472  1
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