Year |
Citation |
Score |
2020 |
Kim M, Nabeya S, Han SM, Kim MS, Lee S, Kim HM, Cho SY, Lee DJ, Kim SH, Kim KB. Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application. Acs Applied Materials & Interfaces. PMID 32017528 DOI: 10.1021/Acsami.9B23261 |
0.693 |
|
2020 |
Mehmood T, Kim JH, Lee D, Dizhur S, Odessey R, Hirst ES, Osgood RM, Sayyad MH, Munawar MA, Xu J. Facile chemical tuning of thermoelectric power factor of graphene oxide Materials Chemistry and Physics. 254: 123488. DOI: 10.1016/J.Matchemphys.2020.123488 |
0.571 |
|
2020 |
Mehmood T, Kim JH, Lee D, Dizhur S, Hirst ES, Osgood RM, Sayyad MH, Munawar MA, Xu J. A flexible, printable, thin-film thermoelectric generator based on reduced graphene oxide–carbon nanotubes composites Journal of Materials Science. 55: 10572-10581. DOI: 10.1007/S10853-020-04750-Z |
0.565 |
|
2019 |
Lee S, Kim M, Cho SY, Lee DJ, Kim HM, Kim KB. Electrical properties of graphene/In2O3 bilayer with remarkable uniformity as transparent conducting electrode. Nanotechnology. PMID 31747645 DOI: 10.1088/1361-6528/Ab599C |
0.698 |
|
2019 |
Mehmood T, Kim JH, Lee D, Dizhur S, Odessey R, Hirst ES, Osgood RM, Sayyad MH, Munawar MA, Xu J. A microstructuring route to enhanced thermoelectric efficiency of reduced graphene oxide films Materials Research Express. 6: 075614. DOI: 10.1088/2053-1591/AB18D7 |
0.337 |
|
2016 |
Liu C, Xu J, Lee DJ, Yu D, Liu L. Denitrifying sulfide removal process on high-tetracycline wastewater. Bioresource Technology. PMID 26810146 DOI: 10.1016/j.biortech.2016.01.026 |
0.38 |
|
2016 |
Kim JB, Kim S, Han WS, Lee D. Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 34: 041504. DOI: 10.1116/1.4951691 |
0.44 |
|
2016 |
Lee SJ, Kim SH, Saito M, Suzuki K, Nabeya S, Lee J, Kim S, Yeom S, Lee DJ. Plasma-free atomic layer deposition of Ru thin films using H2 molecules as a nonoxidizing reactant Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 34. DOI: 10.1116/1.4946755 |
0.427 |
|
2016 |
Kim JB, Jang B, Lee HJ, Han WS, Lee DJ, Lee HBR, Hong TE, Kim SH. A controlled growth of WNx and WCx thin films prepared by atomic layer deposition Materials Letters. 168: 218-222. DOI: 10.1016/J.Matlet.2016.01.071 |
0.403 |
|
2016 |
Jang Y, Kim JB, Hong TE, Yeo SJ, Lee S, Jung EA, Park BK, Chung TM, Kim CG, Lee DJ, Lee HBR, Kim SH. Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu Journal of Alloys and Compounds. 663: 651-658. DOI: 10.1016/J.Jallcom.2015.12.148 |
0.436 |
|
2015 |
Cho SY, Kim MS, Kim M, Kim KJ, Kim HM, Lee DJ, Lee SH, Kim KB. Self-assembly and continuous growth of hexagonal graphene flakes on liquid Cu. Nanoscale. PMID 26172584 DOI: 10.1039/C5Nr03352G |
0.682 |
|
2015 |
Hong TE, Jung J, Yeo S, Cheon T, Bae SI, Kim S, Yeo SJ, Kim H, Chung T, Park BK, Kim CG, Lee D. Highly Conformal Amorphous W–Si–N Thin Films by Plasma-Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization The Journal of Physical Chemistry C. 119: 1548-1556. DOI: 10.1021/Jp510226G |
0.46 |
|
2015 |
Yeo S, Park J, Lee S, Lee D, Seo JH, Kim S. Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen Microelectronic Engineering. 137: 16-22. DOI: 10.1016/J.Mee.2015.02.026 |
0.447 |
|
2014 |
Park J, Yeo S, Cheon T, Kim S, Kim M, Kim H, Hong TE, Lee D. Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition Journal of Alloys and Compounds. 610: 529-539. DOI: 10.1016/J.JALLCOM.2014.04.186 |
0.337 |
|
2013 |
Cho S, Kim K, Kim H, Lee D, Lee M, Kim K. Gas transport controlled synthesis of graphene by employing a micro-meter scale gap jig Rsc Advances. 3: 26376. DOI: 10.1039/C3Ra43066A |
0.735 |
|
2012 |
Cho SY, Kim HM, Lee MH, Lee DJ, Kim KB. Single-step formation of a graphene-metal hybrid transparent and electrically conductive film. Nanotechnology. 23: 115301. PMID 22383433 DOI: 10.1088/0957-4484/23/11/115301 |
0.747 |
|
2012 |
Kim BJ, Lee DJ, Kim YR, Lim SY, Bae JH, Kim KB, Chung TD. Gold microshell tip for in situ electrochemical Raman spectroscopy. Advanced Materials (Deerfield Beach, Fla.). 24: 421-4. PMID 22174102 DOI: 10.1002/Adma.201103644 |
0.537 |
|
2012 |
Yoo JW, Hu Q, Baek Y, Choi YJ, Kang CJ, Lee HH, Lee D, Kim H, Kim K, Yoon T. Resistive switching characteristics of maghemite nanoparticle assembly on Al and Pt electrodes on a flexible substrate Journal of Physics D: Applied Physics. 45: 225304. DOI: 10.1088/0022-3727/45/22/225304 |
0.525 |
|
2012 |
Cho S, Kim H, Lee M, Lee D, Kim K. Direct formation of graphene layers on top of SiC during the carburization of Si substrate Current Applied Physics. 12: 1088-1091. DOI: 10.1016/J.Cap.2012.01.013 |
0.752 |
|
2012 |
Fernandes GE, Lee D, Kim JH, Kim K, Xu J. Infrared and microwave shielding of transparent Al-doped ZnO superlattice grown via atomic layer deposition Journal of Materials Science. 48: 2536-2542. DOI: 10.1007/S10853-012-7043-5 |
0.584 |
|
2011 |
Lee DJ, Yim SS, Kim KS, Kim SH, Kim KB. Controlling spatial density and size of nanocrystals by two-step atomic layer deposition. Nanotechnology. 22: 095305. PMID 21270488 DOI: 10.1088/0957-4484/22/9/095305 |
0.567 |
|
2011 |
Lee DJ, Kwon JY, Lee JI, Kim KB. Self-limiting film growth of transparent conducting In2O 3 by atomic layer deposition using trimethylindium and water vapor Journal of Physical Chemistry C. 115: 15384-15389. DOI: 10.1021/jp2024389 |
0.321 |
|
2010 |
Nam SW, Lee MH, Lee SH, Lee DJ, Rossnagel SM, Kim KB. Sub-10-nm nanochannels by self-sealing and self-limiting atomic layer deposition. Nano Letters. 10: 3324-9. PMID 20687522 DOI: 10.1021/Nl100999E |
0.726 |
|
2010 |
Lee D, Yim S, Kim K, Kim S, Kim K. Nonvolatile memory characteristics of atomic layer deposited Ru nanocrystals with a SiO2/Al2O3 bilayered tunnel barrier Journal of Applied Physics. 107: 013707. DOI: 10.1063/1.3275346 |
0.424 |
|
2010 |
Lee D, Kim H, Kwon J, Choi H, Kim S, Kim K. Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films Advanced Functional Materials. 21: 448-455. DOI: 10.1002/Adfm.201001342 |
0.629 |
|
2009 |
Kim KB, Lee DJ, Yeo CW, Shin JG, Bae SK. Simultaneous quantification of rosiglitazone and its two major metabolites, N-desmethyl and p-hydroxy rosiglitazone in human plasma by liquid chromatography/tandem mass spectrometry: application to a pharmacokinetic study. Journal of Chromatography. B, Analytical Technologies in the Biomedical and Life Sciences. 877: 1951-6. PMID 19477697 DOI: 10.1016/j.jchromb.2009.05.001 |
0.405 |
|
2009 |
Eom T, Sari W, Choi K, Shin W, Kim JH, Lee D, Kim K, Sohn H, Kim S. Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O[sub 2] Electrochemical and Solid-State Letters. 12: D85. DOI: 10.1149/1.3207867 |
0.443 |
|
2009 |
Park S, Kim S, Lee D, Yun S, Khim ZG, Kim K. Selective Wet-Chemical Etching of the Barrier Layer during Formation of Porous Anodic Aluminum Oxide Template Journal of the Electrochemical Society. 156. DOI: 10.1149/1.3207011 |
0.408 |
|
2008 |
Yim S, Lee D, Kim K, Lee M, Kim S, Kim K. Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application Electrochemical and Solid-State Letters. 11: K89. DOI: 10.1149/1.2952432 |
0.565 |
|
2008 |
Kim S, Kim HT, Yim S, Lee D, Kim K, Kim H, Kim K, Sohn H. A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu Journal of the Electrochemical Society. 155: H589. DOI: 10.1149/1.2940447 |
0.571 |
|
2008 |
Lee D, Yim S, Kim K, Kim S, Kim K. Formation of Ru Nanotubes by Atomic Layer Deposition onto an Anodized Aluminum Oxide Template Electrochemical and Solid-State Letters. 11: K61. DOI: 10.1149/1.2901542 |
0.608 |
|
2008 |
Kim S, Yim S, Lee D, Kim K, Kim H, Kim K, Sohn H. Diffusion Barriers Between Al and Cu for the Cu Interconnect of Memory Devices Electrochemical and Solid-State Letters. 11: H127. DOI: 10.1149/1.2890092 |
0.565 |
|
2008 |
Yim S, Lee D, Kim K, Kim S, Yoon T, Kim K. Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition Journal of Applied Physics. 103: 113509. DOI: 10.1063/1.2938052 |
0.613 |
|
2006 |
Lee YI, Cho JY, Kim MH, Kim KB, Lee DJ, Lee KS. Effects of exercise training on pathological cardiac hypertrophy related gene expression and apoptosis. European Journal of Applied Physiology. 97: 216-24. PMID 16583233 DOI: 10.1007/s00421-006-0161-5 |
0.396 |
|
2004 |
Kim KB, Kim MH, Lee DJ. The effect of exercise in cool, control and hot environments on cardioprotective HSP70 induction. Journal of Physiological Anthropology and Applied Human Science. 23: 225-30. PMID 15599066 DOI: JST.JSTAGE/jpa/23.225 |
0.412 |
|
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