| Year |
Citation |
Score |
| 2021 |
Ashurbekova K, Ashurbekova K, Saric I, Modin E, Petravic M, Abdulagatov I, Abdulagatov A, Knez M. Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films. Chemical Communications (Cambridge, England). 57: 2160-2163. PMID 33523070 DOI: 10.1039/d0cc07858a |
0.425 |
|
| 2020 |
Ashurbekova K, Ashurbekova K, Saric I, Modin E, Petravić M, Abdulagatov I, Abdulagatov A, Knez M. Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (VD) and azasilane. Chemical Communications (Cambridge, England). 56: 8778-8781. PMID 32618293 DOI: 10.1039/D0Cc04195E |
0.484 |
|
| 2020 |
Abdulagatov AI, George SM. Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism Journal of Vacuum Science & Technology A. 38: 022607. DOI: 10.1116/1.5140481 |
0.575 |
|
| 2019 |
Abdulagatov AI, Amashaev RR, Ashurbekova KN, Ramazanov SM, Palchaev DK, Maksumova AM, Rabadanov MK, Abdulagatov IM. Atomic Layer Deposition of Y2O3 Using Tris(butylcyclopentadienyl)yttrium and Water Russian Microelectronics. 48: 1-12. DOI: 10.1134/S1063739719010025 |
0.587 |
|
| 2018 |
Abdulagatov AI, Ashurbekova KN, Ashurbekova KN, Amashaev RR, Rabadanov MK, Abdulagatov IM. Molecular Layer Deposition and Thermal Transformations of Titanium(Aluminum)-Vanadium Hybrid Organic-Inorganic Films Russian Journal of Applied Chemistry. 91: 347-359. DOI: 10.1134/S1070427218030011 |
0.576 |
|
| 2018 |
Abdulagatov AI, Amashaev RR, Ashurbekova KN, Ashurbekova KN, Rabadanov MK, Abdulagatov IM. Atomic Layer Deposition of Aluminum Nitride and Oxynitride on Silicon Using Tris(dimethylamido)aluminum, Ammonia, and Water Russian Journal of General Chemistry. 88: 1699-1706. DOI: 10.1134/S1070363218080236 |
0.577 |
|
| 2018 |
Abdulagatov AI, Ramazanov SM, Dallaev RS, Murliev EK, Palchaev DK, Rabadanov MK, Abdulagatov IM. Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia Russian Microelectronics. 47: 118-130. DOI: 10.1134/S1063739718020026 |
0.565 |
|
| 2018 |
Abdulagatov AI, George SM. Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants Chemistry of Materials. 30: 8465-8475. DOI: 10.1021/Acs.Chemmater.8B02745 |
0.584 |
|
| 2016 |
Abdulagatov AI, Orudzhev FF, Rabadanov MK, Abdulagatov IM. Copper nanowire arrays surface wettability control using atomic layer deposition of TiO2 Russian Journal of Applied Chemistry. 89: 1265-1273. DOI: 10.1134/S1070427216080085 |
0.463 |
|
| 2014 |
Anderson VR, Cavanagh AS, Abdulagatov AI, Gibbs ZM, George SM. Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 32. DOI: 10.1116/1.4839015 |
0.698 |
|
| 2013 |
Periasamy P, Guthrey HL, Abdulagatov AI, Ndione PF, Berry JJ, Ginley DS, George SM, Parilla PA, O'Hayre RP. Metal-insulator-metal diodes: role of the insulator layer on the rectification performance. Advanced Materials (Deerfield Beach, Fla.). 25: 1301-8. PMID 23288580 DOI: 10.1002/Adma.201203075 |
0.452 |
|
| 2013 |
Dai X, Famouri M, Abdulagatov AI, Yang R, Lee YC, George SM, Li C. Capillary evaporation on micromembrane-enhanced microchannel wicks with atomic layer deposited silica Applied Physics Letters. 103. DOI: 10.1063/1.4824439 |
0.609 |
|
| 2013 |
Abdulagatov AI, Terauds KE, Travis JJ, Cavanagh AS, Raj R, George SM. Pyrolysis of titanicone molecular layer deposition films as precursors for conducting TiO2/carbon composite films Journal of Physical Chemistry C. 117: 17442-17450. DOI: 10.1021/Jp4051947 |
0.724 |
|
| 2013 |
Lee BH, Yoon B, Abdulagatov AI, Hall RA, George SM. Growth and properties of hybrid organic-inorganic metalcone films using molecular layer deposition techniques Advanced Functional Materials. 23: 532-546. DOI: 10.1002/Adfm.201200370 |
0.546 |
|
| 2012 |
Wang W, Tian M, Abdulagatov A, George SM, Lee YC, Yang R. Three-dimensional Ni/TiO2 nanowire network for high areal capacity lithium ion microbattery applications. Nano Letters. 12: 655-60. PMID 22208851 DOI: 10.1021/Nl203434G |
0.482 |
|
| 2012 |
Abdulagatov AI, Hall RA, Sutherland JL, Lee BH, Cavanagh AS, George SM. Molecular layer deposition of titanicone films using TiCl 4 and ethylene glycol or glycerol: Growth and properties Chemistry of Materials. 24: 2854-2863. DOI: 10.1021/Cm300162V |
0.729 |
|
| 2011 |
George SM, Lee BH, Yoon B, Abdulagatov AI, Hall RA. Metalcones: hybrid organic-inorganic films fabricated using atomic and molecular layer deposition techniques. Journal of Nanoscience and Nanotechnology. 11: 7948-55. PMID 22097511 DOI: 10.1166/Jnn.2011.5034 |
0.612 |
|
| 2011 |
Abdulagatov AI, Yan Y, Cooper JR, Zhang Y, Gibbs ZM, Cavanagh AS, Yang RG, Lee YC, George SM. Al2O3 and TiO2 atomic layer deposition on copper for water corrosion resistance. Acs Applied Materials & Interfaces. 3: 4593-601. PMID 22032254 DOI: 10.1021/Am2009579 |
0.713 |
|
| 2011 |
Zhang Y, Seghete D, Abdulagatov A, Gibbs Z, Cavanagh A, Yang R, George S, Lee Y. Investigation of the defect density in ultra-thin Al2O3 films grown using atomic layer deposition Surface and Coatings Technology. 205: 3334-3339. DOI: 10.1016/J.Surfcoat.2010.12.001 |
0.681 |
|
| 2010 |
Guo DJ, Abdulagatov AI, Rourke DM, Bertness KA, George SM, Lee YC, Tan W. GaN nanowire functionalized with atomic layer deposition techniques for enhanced immobilization of biomolecules. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 18382-91. PMID 21033757 DOI: 10.1021/La103337A |
0.575 |
|
| 2010 |
Minton TK, Wu B, Zhang J, Lindholm NF, Abdulagatov AI, O'Patchen J, George SM, Groner MD. Protecting polymers in space with atomic layer deposition coatings Acs Applied Materials and Interfaces. 2: 2515-2520. PMID 20738090 DOI: 10.1021/Am100217M |
0.561 |
|
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