Elliot A. J. Bartis - Publications

Affiliations: 
2015 Materials Science and Engineering University of Maryland, College Park, College Park, MD 

5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2015 Bartis EA, Luan P, Knoll AJ, Hart C, Seog J, Oehrlein GS. Polystyrene as a model system to probe the impact of ambient gas chemistry on polymer surface modifications using remote atmospheric pressure plasma under well-controlled conditions. Biointerphases. 10: 029512. PMID 25930012 DOI: 10.1116/1.4919410  0.504
2013 Chung TY, Ning N, Chu JW, Graves DB, Bartis E, Joonil Seog, Oehrlein GS. Plasma deactivation of endotoxic biomolecules: Vacuum ultraviolet photon and radical beam effects on lipid A Plasma Processes and Polymers. 10: 167-180. DOI: 10.1002/Ppap.201200087  0.623
2012 Vogli E, Hoffmann F, Bartis E, Oehrlein GS, Tillmann W. Correlation between tribological properties, sp 2/sp 3-ratio and H-content of low-wear diamond-like carbon (DLC) layers Materials Science Forum. 706: 2596-2601. DOI: 10.4028/www.scientific.net/MSF.706-709.2596  0.517
2012 Weilnboeck F, Bartis E, Shachar S, Oehrlein GS, Farber D, Lii T, Lenox C. Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4736979  0.662
2012 Weilnboeck F, Bartis E, Shachar S, Oehrlein GS, Farber D, Lii T, Lenox C. Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.3690643  0.664
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