Elliot A. J. Bartis - Publications
Affiliations: | 2015 | Materials Science and Engineering | University of Maryland, College Park, College Park, MD |
Year | Citation | Score | |||
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2015 | Bartis EA, Luan P, Knoll AJ, Hart C, Seog J, Oehrlein GS. Polystyrene as a model system to probe the impact of ambient gas chemistry on polymer surface modifications using remote atmospheric pressure plasma under well-controlled conditions. Biointerphases. 10: 029512. PMID 25930012 DOI: 10.1116/1.4919410 | 0.504 | |||
2013 | Chung TY, Ning N, Chu JW, Graves DB, Bartis E, Joonil Seog, Oehrlein GS. Plasma deactivation of endotoxic biomolecules: Vacuum ultraviolet photon and radical beam effects on lipid A Plasma Processes and Polymers. 10: 167-180. DOI: 10.1002/Ppap.201200087 | 0.623 | |||
2012 | Vogli E, Hoffmann F, Bartis E, Oehrlein GS, Tillmann W. Correlation between tribological properties, sp 2/sp 3-ratio and H-content of low-wear diamond-like carbon (DLC) layers Materials Science Forum. 706: 2596-2601. DOI: 10.4028/www.scientific.net/MSF.706-709.2596 | 0.517 | |||
2012 | Weilnboeck F, Bartis E, Shachar S, Oehrlein GS, Farber D, Lii T, Lenox C. Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4736979 | 0.662 | |||
2012 | Weilnboeck F, Bartis E, Shachar S, Oehrlein GS, Farber D, Lii T, Lenox C. Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.3690643 | 0.664 | |||
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