Year |
Citation |
Score |
2019 |
Huang J, Xu H, Peretz E, Wu D, Ober CK, Hanrath T. Three-Dimensional Printing of Hierarchical Porous Architectures Chemistry of Materials. 31: 10017-10022. DOI: 10.1021/Acs.Chemmater.9B02761 |
0.421 |
|
2019 |
Menzel M, Chen W, Simancas K, Xu H, Prucker O, Ober CK, Rühe J. Entropic death of nonpatterned and nanopatterned polyelectrolyte brushes Journal of Polymer Science Part a: Polymer Chemistry. 57: 1283-1295. DOI: 10.1002/Pola.29384 |
0.485 |
|
2018 |
Ober CK, Kosma V, Xu H, Sakai K, Giannelis EP. The Challenges of Highly Sensitive EUV Photoresists Journal of Photopolymer Science and Technology. 31: 261-265. DOI: 10.2494/Photopolymer.31.261 |
0.433 |
|
2018 |
Xu H, Kosma V, Sakai K, Giannelis EP, Ober CK. EUV photolithography: resist progress in metal–organic complex photoresists Journal of Micro-Nanolithography Mems and Moems. 18: 11007. DOI: 10.1117/1.Jmm.18.1.011007 |
0.51 |
|
2018 |
Sakai K, Xu H, Kosma V, Giannelis EP, Ober CK. Progress in metal organic cluster EUV photoresists Journal of Vacuum Science & Technology B. 36: 06J504. DOI: 10.1116/1.5050942 |
0.463 |
|
2018 |
Xu H, Sakai K, Kasahara K, Kosma V, Yang K, Herbol HC, Odent J, Clancy P, Giannelis EP, Ober CK. Metal–Organic Framework-Inspired Metal-Containing Clusters for High-Resolution Patterning Chemistry of Materials. 30: 4124-4133. DOI: 10.1021/Acs.Chemmater.8B01573 |
0.452 |
|
2017 |
Kasahara K, Xu H, Kosma V, Odent J, Giannelis EP, Ober CK. Recent Progress in EUV Metal Oxide Photoresists Journal of Photopolymer Science and Technology. 30: 93-97. DOI: 10.2494/Photopolymer.30.93 |
0.439 |
|
2017 |
Kasahara K, Xu H, Kosma V, Odent J, Giannelis EP, Ober CK. Nanoparticle photoresist studies for EUV lithography Proceedings of Spie. 10143: 1014308. DOI: 10.1117/12.2258187 |
0.505 |
|
2017 |
Kosma V, Kasahara K, Xu H, Odent J, Ober CK. Elucidating the patterning mechanism of zirconium-based hybrid photoresists Journal of Micro/Nanolithography, Mems, and Moems. 16: 1. DOI: 10.1117/1.Jmm.16.4.041007 |
0.471 |
|
2017 |
Xu H, Kosma V, Giannelis EP, Ober CK. In pursuit of Moore’s Law: polymer chemistry in action Polymer Journal. 50: 45-55. DOI: 10.1038/Pj.2017.64 |
0.435 |
|
2016 |
Yu M, Xu H, Kosma V, Odent J, Kasahara K, Giannelis E, Ober C. Positive Tone Nanoparticle Photoresists: New Insight on the Patterning Mechanism Journal of Photopolymer Science and Technology. 29: 509-512. DOI: 10.2494/Photopolymer.29.509 |
0.441 |
|
2016 |
Kasahara K, Kosma V, Odent J, Xu H, Yu M, Giannelis EP, Ober CK. Recent progress in nanoparticle photoresists development for EUV lithography Proceedings of Spie. 9776: 977604. DOI: 10.1117/12.2218704 |
0.515 |
|
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