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Mark W. Horn - Publications

Affiliations: 
Engineering Science and Mechanics Pennsylvania State University, State College, PA, United States 
Area:
Plasma etching, thin film deposition, lithography, planarization, MEMS, gas sensors, and engineered thin films
Website:
https://www.esm.psu.edu/department/directory-detail-g.aspx?q=mwh4
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93 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2018 Nasr JR, Schulman DS, Sebastian A, Horn MW, Das S. Mobility Deception in Nanoscale Transistors: An Untold Contact Story. Advanced Materials (Deerfield Beach, Fla.). e1806020. PMID 30430660 DOI: 10.1002/Adma.201806020  0.313
2018 Lee H, Huang YT, Horn MW, Feng SP. Engineered optical and electrical performance of rf-sputtered undoped nickel oxide thin films for inverted perovskite solar cells. Scientific Reports. 8: 5590. PMID 29615774 DOI: 10.1038/S41598-018-23907-0  0.544
2017 Hou H, Tang Y, Hamilton RF, Horn MW. Functional fatigue of submicrometer NiTi shape memory alloy thin films Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 040601. DOI: 10.1116/1.4983011  0.795
2017 Nasr JR, Cordell JJ, Gurunathan RL, Brownson JRS, Horn MW. Phase Control of RF Sputtered SnSx with Post-Deposition Annealing for a Pseudo-Homojunction Photovoltaic Device Journal of Electronic Materials. 46: 1215-1222. DOI: 10.1007/S11664-016-5096-Y  0.484
2016 Hou H, Hamilton RF, Horn MW. Crystallization of nanoscale NiTi alloy thin films using rapid thermal annealing Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34: 06KK01. DOI: 10.1116/1.4963375  0.783
2016 Hou H, Hamilton RF, Horn MW. Narrow thermal hysteresis of NiTi shape memory alloy thin films with submicrometer thickness Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 34: 050602. DOI: 10.1116/1.4959567  0.778
2016 Hou H, Hamilton RF, Horn MW. Crystallization and microstructure evolution of nanoscale NiTi thin films prepared by biased target ion beam deposition Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 34. DOI: 10.1116/1.4936392  0.817
2016 Billard MW, Basantani HA, Horn MW, Gluckman BJ. A flexible vanadium oxide thermistor array for localized temperature field measurements in brain Ieee Sensors Journal. 16: 2211-2212. DOI: 10.1109/Jsen.2016.2517161  0.433
2016 Banai RE, Horn MW, Brownson J. A review of tin (II) monosulfide and its potential as a photovoltaic absorber Solar Energy Materials and Solar Cells. 150: 112-129. DOI: 10.1016/J.Solmat.2015.12.001  0.473
2016 Hou H, Horn MW, Hamilton RF. Biased Target Ion Beam Deposition and Nanoskiving for Fabricating NiTi Alloy Nanowires Shape Memory and Superelasticity. 2: 330-336. DOI: 10.1007/s40830-016-0093-9  0.724
2016 Gurunathan RL, Nasr J, Cordell JJ, Banai RA, Abraham M, Cooley KA, Horn MW, Mohney SE. Pd and Au Contacts to SnS: Thermodynamic Predictions and Annealing Study Journal of Electronic Materials. 45: 6300-6304. DOI: 10.1007/S11664-016-5042-Z  0.497
2015 Jin YO, John DS, Podraza NJ, Jackson TN, Horn MW. High temperature coefficient of resistance molybdenum oxide and nickel oxide thin films for microbolometer applications Optical Engineering. 54. DOI: 10.1117/1.Oe.54.3.037101  0.726
2015 Hou H, Hamilton RF, Horn MW. Structure and interfacial analysis of nanoscale TiNi thin film prepared by biased target ion beam deposition Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 33. DOI: 10.1116/1.4919739  0.82
2015 Banai RE, Cordell JC, Lindwall G, Tanen NJ, Shang SL, Nasr JR, Liu ZK, Brownson JRS, Horn MW. Control of Phase in Tin Sulfide Thin Films Produced via RF-Sputtering of SnS2 Target with Post-deposition Annealing Journal of Electronic Materials. DOI: 10.1007/S11664-015-4137-2  0.614
2014 Basantani HA, John DBS, Podraza NJ, Jackson TN, Horn MW. Evaluation of 1/f noise in prospective IR imaging thin films Proceedings of Spie. 9070. DOI: 10.1117/12.2054652  0.71
2014 Jin Y, John DS, Jackson TN, Horn MW. Nickel oxide and molybdenum oxide thin films for infrared imaging prepared by biased target ion-beam deposition Proceedings of Spie - the International Society For Optical Engineering. 9070. DOI: 10.1117/12.2053174  0.558
2014 Ozcelik A, Horn MW, Jackson TN. Potential for reactive pulsed-dc magnetron sputtering of nanocomposite VOx microbolometer thin films Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 32: 061501. DOI: 10.1116/1.4894268  0.511
2014 Hou H, Hamilton RF, Horn MW, Jin Y. NiTi thin films prepared by biased target ion beam deposition co-sputtering from elemental Ni and Ti targets Thin Solid Films. 1-6. DOI: 10.1016/J.Tsf.2014.09.004  0.809
2014 Lee H, In S, Horn MW. Plasmonic enhancement of CO2 conversion to methane using sculptured copper thin films grown directly on TiO2 Thin Solid Films. 565: 105-110. DOI: 10.1016/J.Tsf.2014.06.035  0.396
2013 Basantani HA, Shin H, Jackson TN, Horn MW. Vertically integrated pixel microbolometers for IR imaging using high-resistivity VOx Proceedings of Spie. 8704. DOI: 10.1117/12.2016292  0.377
2013 Jin Y, Basantani HA, Ozcelik A, Jackson TN, Horn MW. High-resistivity and high-TCR vanadium oxide thin films for infrared imaging prepared by bias target ion-beam deposition Proceedings of Spie. 8704. DOI: 10.1117/12.2016277  0.59
2013 Lee H, Horn MW. Sculptured platinum nanowire counter electrodes for dye-sensitized solar cells Thin Solid Films. 540: 208-211. DOI: 10.1016/J.Tsf.2013.04.079  0.305
2013 Ozcelik A, Cabarcos O, Allara DL, Horn MW. Vanadium oxide thin films alloyed with TI, Zr, Nb, and Mo for uncooled infrared imaging applications Journal of Electronic Materials. 42: 901-905. DOI: 10.1007/S11664-012-2326-9  0.597
2012 Banai RE, Lee H, Lewinsohn M, Motyka MA, Chandrasekharan R, Podraza NJ, Brownson JRS, Horn MW. Investigation of the absorption properties of sputtered tin sulfide thin films for photovoltaic applications Conference Record of the Ieee Photovoltaic Specialists Conference. 164-169. DOI: 10.1109/PVSC.2012.6317592  0.82
2012 Motyka MA, Gauntt BD, Horn MW, Dickey EC, Podraza NJ. Microstructural evolution of thin film vanadium oxide prepared by pulsed-direct current magnetron sputtering Journal of Applied Physics. 112. DOI: 10.1063/1.4759255  0.813
2012 Basantani HA, Kozlowski S, Lee MY, Li J, Dickey EC, Jackson TN, Bharadwaja SSN, Horn M. Enhanced electrical and noise properties of nanocomposite vanadium oxide thin films by reactive pulsed-dc magnetron sputtering Applied Physics Letters. 100. DOI: 10.1063/1.4731240  0.536
2012 Podraza NJ, Gauntt BD, Motyka MA, Dickey EC, Horn MW. Electrical and optical properties of sputtered amorphous vanadium oxide thin films Journal of Applied Physics. 111. DOI: 10.1063/1.3702451  0.811
2011 Sethi G, Bontempo B, Furman E, Horn MW, Lanagan MT, Bharadwaja SSN, Li J. Impedance analysis of amorphous and polycrystalline tantalum oxide sputtered films Journal of Materials Research. 26: 745-753. DOI: 10.1557/Jmr.2010.77  0.6
2011 Cabarcos OM, Li J, Gauntt BD, Antrazi S, Dickey EC, Allara DL, Horn MW. Comparison of ion beam and magnetron sputtered vanadium oxide thin films for uncooled IR imaging Proceedings of Spie - the International Society For Optical Engineering. 8012. DOI: 10.1117/12.884377  0.614
2011 Gauntt BD, Li J, Cabarcos OM, Basantani HA, Venkatasubramanian C, Bharadwaja SSN, Podraza NJ, Jackson TN, Allara DL, Antrazi S, Horn MW, Dickey EC. Microstructure of vanadium oxide used in microbolometers Proceedings of Spie. 8012: 1. DOI: 10.1117/12.884161  0.72
2011 Venkatasubramanian C, Cabarcos OM, Drawl WR, Allara DL, Ashok S, Horn MW, Bharadwaja SSN. Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 29. DOI: 10.1116/1.3636372  0.474
2011 Fei ST, Lee SHA, Pursel SM, Basham J, Hess A, Grimes CA, Horn MW, Mallouk TE, Allcock HR. Electrolyte infiltration in phosphazene-based dye-sensitized solar cells Journal of Power Sources. 196: 5223-5230. DOI: 10.1016/J.Jpowsour.2011.01.052  0.337
2009 Gauntt BD, Dickey EC, Horn MW. Stoichiometry and microstructural effects on electrical conduction in pulsed dc sputtered vanadium oxide thin films Journal of Materials Research. 24: 1590-1599. DOI: 10.1557/Jmr.2009.0183  0.559
2009 Venkatasubramanian C, Cabarcos OM, Allara DL, Horn MW, Ashok S. Correlation of temperature response and structure of annealed v O x thin films for IR detector applications Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 27: 956-961. DOI: 10.1116/1.3143667  0.571
2009 Fieldhouse N, Pursel SM, Carey R, Horn MW, Bharadwaja SSN. Vanadium oxide thin films for bolometric applications deposited by reactive pulsed dc sputtering Journal of Vacuum Science and Technology. 27: 951-955. DOI: 10.1116/1.3119675  0.594
2009 Sethi G, Sunal P, Horn MW, Lanagan MT. Influence of reactive sputter deposition conditions on crystallization of zirconium oxide thin films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 27: 577-583. DOI: 10.1116/1.3119669  0.569
2009 Sethi G, Sahul R, Min C, Tewari P, Furman E, Horn MW, Lanagan MT. Dielectric Response of Tantalum Oxide Deposited on Polyethylene Terephthalate (PET) Film by Low-Temperature Pulsed-DC Sputtering for Wound Capacitors Ieee Transactions On Components and Packaging Technologies. 32: 915-925. DOI: 10.1109/Tcapt.2009.2025960  0.416
2009 Fieldhouse N, Pursel SM, Horn MW, Bharadwaja SSN. Electrical properties of vanadium oxide thin films for bolometer applications: processed by pulse dc sputtering Journal of Physics D. 42: 55408. DOI: 10.1088/0022-3727/42/5/055408  0.601
2009 Bharadwaja SSN, Venkatasubramanian C, Fieldhouse N, Ashok S, Horn MW, Jackson TN. Low temperature charge carrier hopping transport mechanism in vanadium oxide thin films grown using pulsed dc sputtering Applied Physics Letters. 94. DOI: 10.1063/1.3139864  0.482
2009 Venkatasubramanian C, Horn MW, Ashok S. Ion implantation studies on VOx films prepared by pulsed dc reactive sputtering Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms. 267: 1476-1479. DOI: 10.1016/J.Nimb.2009.01.152  0.564
2009 Tewari P, Sethi G, Horn MW, Lanagan MT. Enhanced polarization in zirconia-P(VDF-TrFE) laminar composite dielectrics Journal of Materials Science: Materials in Electronics. 20: 1001-1007. DOI: 10.1007/S10854-008-9823-X  0.303
2008 Podraza N, Li J, Wronski CR, Horn MW, Dickey EC, Collins RW. Analysis of Compositionally and Structurally Graded Si:H and Si1−xGex:H Thin Films by Real Time Spectroscopic Ellipsometry Mrs Proceedings. 1066. DOI: 10.1557/PROC-1066-A10-01  0.385
2008 Podraza NJ, Li J, Wronski CR, Horn MW, Dickey EC, Collins RW. Analysis of compositionally and structurally graded Si:H and Si 1-xGe x:H thin films by real time spectroscopic ellipsometry Materials Research Society Symposium Proceedings. 1066: 253-258. DOI: 10.1557/Proc-1066-A10-01  0.649
2008 Pursel SM, Petrilli JD, Horn MW, Shaw BA. Effect of alloy addition and growth conditions on the formation of Mg-based bioabsorbable thin films Proceedings of Spie - the International Society For Optical Engineering. 7041. DOI: 10.1117/12.796918  0.352
2008 Podraza NJ, Pursel SM, Chen C, Horn MW, Collins RW. Analysis of the optical properties and structure of serial bi-deposited TiO2 chiral sculptured thin films using Mueller matrix ellipsometry Journal of Nanophotonics. 2. DOI: 10.1117/1.3062210  0.639
2008 Srinivasan C, Hohman JN, Anderson ME, Weiss PS, Horn MW. Sub- 30-nm patterning on quartz for imprint lithography templates Applied Physics Letters. 93. DOI: 10.1063/1.2963982  0.469
2008 Mullen TJ, Zhang P, Srinivasan C, Horn MW, Weiss PS. Combining electrochemical desorption and metal deposition on patterned self-assembled monolayers Journal of Electroanalytical Chemistry. 621: 229-237. DOI: 10.1016/J.Jelechem.2007.11.038  0.419
2008 Podraza NJ, Li J, Wronski CR, Dickey EC, Horn MW, Collins RW. Analysis of Si 1-xGe x:H thin films with graded composition and structure by real time spectroscopic ellipsometry Physica Status Solidi (a) Applications and Materials Science. 205: 892-895. DOI: 10.1002/Pssa.200777876  0.705
2007 Podraza NJ, Wronski CR, Horn MW, Collins RW. Dielectric functions of a-Si1-xGex:H versus ge content, temperature, and processing: Advances in optical function parameterization Materials Research Society Symposium Proceedings. 910: 259-264. DOI: 10.1557/Proc-0910-A10-01  0.677
2007 Pursel SM, Horn MW, Lakhtakia A. Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching Optical Engineering. 46: 40507. DOI: 10.1117/1.2721543  0.513
2007 Srinivasan C, Hohman JN, Anderson ME, Weiss PS, Horn MW. Nanostructures using self-assembled multilayers as molecular rulers and etch resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1985-1988. DOI: 10.1116/1.2811712  0.368
2007 Pursel SM, Horn MW. Prospects for nanowire sculptured-thin-film devices Journal of Vacuum Science & Technology B. 25: 2611-2615. DOI: 10.1116/1.2787749  0.479
2007 Podraza NJ, Wronski CR, Horn MW, Collins RW. Roughness and phase evolution in Si1-xGex:H: Guidance for multijunction photovoltaics Conference Record of the 2006 Ieee 4th World Conference On Photovoltaic Energy Conversion, Wcpec-4. 2: 1657-1660. DOI: 10.1109/WCPEC.2006.279807  0.301
2007 Sethi G, Olszta M, Li J, Sloppy J, Horn MW, Dickey EC, Lanagan MT. Structure and dielectric properties of amorphous tantalum pentoxide thin film capacitors Annual Report - Conference On Electrical Insulation and Dielectric Phenomena, Ceidp. 815-818. DOI: 10.1109/CEIDP.2007.4451491  0.51
2007 RaviPrakash J, McDaniel AH, Horn M, Pilione L, Sunal P, Messier R, McGrath RT, Schweighardt FK. Hydrogen sensors: Role of palladium thin film morphology Sensors and Actuators, B: Chemical. 120: 439-446. DOI: 10.1016/J.Snb.2006.02.050  0.509
2007 Lakhtakia A, Demirel MC, Horn MW, Xu J. Six emerging directions in sulptured-thin-film research Advances in Solid State Physics. 46: 295-307. DOI: 10.1007/978-3-540-38235-5_22  0.409
2006 Pursel SM, Horn MW, Lakhtakia A. Blue-shifting of circular Bragg phenomenon by annealing of chiral sculptured thin films. Optics Express. 14: 8001-12. PMID 19529170 DOI: 10.1364/Oe.14.008001  0.651
2006 Tanaka H, Horn MW, Weiss PS. A method for the fabrication of sculptured thin films of periodic arrays of standing nanorods. Journal of Nanoscience and Nanotechnology. 6: 3799-802. PMID 17256333 DOI: 10.1166/Jnn.2006.616  0.467
2006 Tan H, Ezekoye OK, Van der Schalie J, Horn MW, Lakhtakia A, Xu J, Burgos WD. Biological reduction of nanoengineered iron(III) oxide sculptured thin films. Environmental Science & Technology. 40: 5490-5. PMID 16999129 DOI: 10.1021/Es060388J  0.61
2006 Sethi G, Lanagan MT, Furman E, Horn MW. Development of Structure-Property Relationships in Disordered Zirconia Thin Films for High Energy Density Mim Capacitors Mrs Proceedings. 969. DOI: 10.1557/Proc-0969-W03-14  0.531
2006 Podraza NJ, Wronski CR, Horn MW, Collins RW. Dielectric Functions of a-Si1-xGex:H versus Ge Content, Temperature, and Processing: Advances in Optical Function Parameterization Mrs Proceedings. 910. DOI: 10.1557/PROC-0910-A10-01  0.642
2006 Podraza NJ, Wronski CR, Horn MW, Collins RW. Surface Roughening Transition in Si 1-x Ge x :H Thin Films Mrs Proceedings. 910. DOI: 10.1557/Proc-0910-A03-02  0.657
2006 TANAKA H, WEISS PS, HORN MW. FABRICATION OF PERIODIC STANDING ROD ARRAYS BY THE SHADOW CONE METHOD International Journal of Nanoscience. 5: 815-819. DOI: 10.1142/S0219581X06005200  0.309
2006 Srinivasan C, Anderson ME, Carter EM, Hohman JN, Bharadwaja SSN, Trolier-Mckinstry S, Weiss PS, Horn MW. Extensions of molecular ruler technology for nanoscale patterning Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 3200-3204. DOI: 10.1116/1.2393252  0.319
2006 Sunal P, Messier R, Horn MW. Reactive co-deposition of TiNx/SiNx nanocomposites using pulsed direct current magnetron sputtering Thin Solid Films. 515: 2185-2191. DOI: 10.1016/J.Tsf.2006.07.006  0.576
2006 Srinivasan C, Anderson ME, Jayaraman R, Weiss PS, Horn MW. Electrically isolated nanostructures fabricated using self-assembled multilayers and a novel negative-tone bi-layer resist stack Microelectronic Engineering. 83: 1517-1520. DOI: 10.1016/J.Mee.2006.01.265  0.333
2006 Chen C, Horn MW, Pursel S, Ross C, Collins RW. The ultimate in real-time ellipsometry: Multichannel Mueller matrix spectroscopy Applied Surface Science. 253: 38-46. DOI: 10.1016/J.Apsusc.2006.05.069  0.415
2005 Podraza NJ, Chen C, Sainju D, Ezekoye O, Horn MW, Wronski CR, Collins RW. Transparent Conducting Oxide Sculptured Thin Films for Photovoltaic Applications Mrs Proceedings. 865. DOI: 10.1557/Proc-865-F7.1  0.693
2005 Pursel S, Horn MW, Demirel MC, Lakhtakia A. Growth of sculptured polymer submicronwire assemblies by vapor deposition Polymer. 46: 9544-9548. DOI: 10.1016/J.Polymer.2005.07.092  0.617
2005 Anderson ME, Srinivasan C, Jayaraman R, Weiss PS, Horn MW. Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps Microelectronic Engineering. 78: 248-252. DOI: 10.1016/J.Mee.2005.01.003  0.345
2004 TANAKA H, ANDERSON ME, TAN L, MIHOK M, HORN MW, WEISS PS. Super-Precise Nanolithography Using Multilayer of Self-Assembled Monolayers Hyomen Kagaku. 25: 650-655. DOI: 10.1380/Jsssj.25.650  0.37
2004 Tanaka H, Anderson ME, Horn MW, Weiss PS. Position-Selected Molecular Ruler Japanese Journal of Applied Physics. 43: L950-L953. DOI: 10.1143/Jjap.43.L950  0.309
2004 Horn MW, Pickett MD, Messier R, Lakhtakia A. Selective growth of sculptured nanowires on microlithographic lattices Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3426-3430. DOI: 10.1116/1.1824052  0.566
2004 Horn MW, Pickett MD, Messier R, Lakhtakia A. Blending of nanoscale and microscale in uniform large-area sculptured thin-film architectures Nanotechnology. 15: 303-310. DOI: 10.1088/0957-4484/15/3/013  0.567
2003 Dang H, Tan JL, Horn MW. Sub-150 nm, high-aspect-ratio features using near-field phase-shifting contact lithography Journal of Vacuum Science & Technology B. 21: 1143-1148. DOI: 10.1116/1.1577126  0.325
2003 Rangan S, Horn M, Ashok S, Mohapatra YN. Influence of hydrogen plasma treatment on boron implanted junctions in silicon Journal of Vacuum Science & Technology B. 21: 781-784. DOI: 10.1116/1.1560331  0.317
2003 Lakhtakia A, Horn MW. Bragg-regime engineering by columnar thinning of chiral sculptured thin films Optik. 114: 556-560. DOI: 10.1078/0030-4026-00308  0.519
2002 Anderson ME, Smith RK, Donhauser ZJ, Hatzor A, Lewis PA, Tan LP, Tanaka H, Horn MW, Weiss PS. Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2739-2744. DOI: 10.1116/1.1515301  0.394
2001 Lee DO, Roman P, Wu CT, Mahoney W, Horn M, Mumbauer P, Brubaker M, Grant R, Ruzyllo J. Studies of mist deposited high-k dielectrics for MOS gates Microelectronic Engineering. 59: 405-408. DOI: 10.1016/S0167-9317(01)00676-1  0.431
2000 Rangan S, Horn M, Ashok S. Boron implantation into silicon subject to hydrogen plasma Materials Research Society Symposium - Proceedings. 610. DOI: 10.1557/Proc-610-B5.7  0.313
1999 Horn MW, Goodman RB, Rothschild M. Plasma enhanced chemically vapor deposited thin films for microelectromechanical systems applications with tailored optical, thermal, and mechanical properties Journal of Vacuum Science & Technology B. 17: 1045-1049. DOI: 10.1116/1.590691  0.554
1997 Govorkov S, Ruderman W, Horn MW, Goodman RB, Rothschild M. A new method for measuring thermal conductivity of thin films Review of Scientific Instruments. 68: 3828-3834. DOI: 10.1063/1.1148035  0.371
1996 Horn MW, Maxwell BE, Goodman RB, Kunz RR, Eriksen LM. Plasma‐deposited silylation resist for 193 nm lithography Journal of Vacuum Science & Technology B. 14: 4207-4211. DOI: 10.1116/1.588576  0.46
1996 Horn MW, Maxwell BE, Goodman RB, Kunz RR, Eriksen LM. Plasma-deposited silylation resist for 193 nm lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 14: 4207-4211. DOI: 10.1063/1.116452  0.479
1995 Stern MB, Palmateer SC, Horn MW, Rothschild M, Maxwell BE, Curtin JE. Profile control in dry development of high‐aspect‐ratio resist structures Journal of Vacuum Science & Technology B. 13: 3017-3021. DOI: 10.1116/1.588313  0.301
1992 Kunz RR, Horn MW, Wallraff GM, Bianconi PA, Miller RD, Goodman RW, Smith DA, Eshelman JR, Ginsberg EJ. Surface-Imaged Silicon Polymers for 193-nm Excimer Laser Lithography Japanese Journal of Applied Physics. 31: 4327-4331. DOI: 10.1143/Jjap.31.4327  0.301
1991 Kunz RR, Horn MW, Bianconi PA, Smith A, Freed CA. Photo-oxidation of σ-conjugated Si-Si network polymers Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 9: 1447-1451. DOI: 10.1116/1.577643  0.403
1990 Kunz RR, Bianconi PA, Horn MW, Smith DA, Freed CA. Photoreactions in Polyalkylsilynes Induced by ArF-Laser Irradiation Mrs Proceedings. 204. DOI: 10.1557/Proc-204-501  0.427
1990 Heddleson JM, Fonash SJ, Horn MW. Evolution of Damage, Dopant Deactivation, and Hydrogen-Related Effects in Dry Etch Silicon as a Function of Annealing History Journal of the Electrochemical Society. 137: 1960-1964. DOI: 10.1149/1.2086839  0.488
1990 Kunz RR, Horn MW, Goodman RB, Bianconi PA, Smith DA, Freed CA. Polysilyne thin films as resists for deep ultraviolet lithography Journal of Vacuum Science & Technology B. 8: 1820-1825. DOI: 10.1116/1.585166  0.397
1990 Horn MW. Plasma-deposited organosilicon thin films as dry resists for deep ultraviolet lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8: 1493. DOI: 10.1116/1.585103  0.558
1990 Pang SW, Horn MW. Amorphous carbon films as planarization layers deposited by plasma-enhanced chemical vapor deposition Ieee Electron Device Letters. 11: 391-393. DOI: 10.1109/55.62966  0.422
1987 Horn MW, Heddleson JM, Fonash SJ. Permeation of hydrogen into silicon during low-energy hydrogen ion beam bombardment Applied Physics Letters. 51: 490-492. DOI: 10.1063/1.98376  0.482
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