Atashi B Mukhopadhyay - Publications
Affiliations: | 2004-2006 | Chemical Engineering | Stanford University, Palo Alto, CA |
Year | Citation | Score | |||
---|---|---|---|---|---|
2011 | Somani S, Mukhopadhyay A, Musgrave C. Atomic layer deposition of tantalum nitride using a novel precursor Journal of Physical Chemistry C. 115: 11507-11513. DOI: 10.1021/Jp1059374 | 0.609 | |||
2010 | Mukhopadhyay AB, Sanz JF, Musgrave CB. Effect of interface structure on the Ru on HfO2 work function Journal of Materials Science. 45: 4924-4928. DOI: 10.1007/S10853-010-4274-1 | 0.534 | |||
2008 | Mukhopadhyay AB, Musgrave CB, Fdez Sanz J. Atomic layer deposition of hafnium oxide from hafnium chloride and water. Journal of the American Chemical Society. 130: 11996-2006. PMID 18698777 DOI: 10.1021/Ja801616U | 0.583 | |||
2007 | Mukhopadhyay AB, Musgrave CB. The role of ammonia in atomic layer deposition of tungsten nitride Applied Physics Letters. 90. DOI: 10.1063/1.2721118 | 0.574 | |||
2007 | Mukhopadhyay AB, Sanz JF, Musgrave CB. First-principles investigation of the structure, energetics, and electronic properties of Ru/HfO 2 interfaces Journal of Physical Chemistry C. 111: 9203-9210. DOI: 10.1021/Jp0684325 | 0.59 | |||
2006 | Mukhopadhyay AB, Sanz JF, Musgrave CB. First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces Physical Review B - Condensed Matter and Materials Physics. 73. DOI: 10.1103/Physrevb.73.115330 | 0.506 | |||
2006 | Mukhopadhyay AB, Sanz JF, Musgrave CB. First-principles investigation of hydroxylated monoclinic HfO 2 surfaces Chemistry of Materials. 18: 3397-3403. DOI: 10.1021/Cm060679R | 0.538 | |||
2006 | Mukhopadhyay AB, Musgrave CB. Non-growth ligand exchange reactions in atomic layer deposition of HfO 2 Chemical Physics Letters. 421: 215-220. DOI: 10.1016/J.Cplett.2006.01.057 | 0.574 | |||
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