Larry F. Thompson, Ph.D. - Publications

Affiliations: 
University of Missouri-Rolla, Rolla, MO, United States 
 AT&T Bell Laboratories 
Area:
microlithography

8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
1992 Novembre AE, Tai WW, Kometani JM, Hanson JE, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF. Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide) Chemistry of Materials. 4: 278-284. DOI: 10.1021/Cm00020A012  0.96
1992 Novembre AE, Hanson JE, Kometani JM, Tai WW, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF, Tomes DN. Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2) Microelectronic Engineering. 17: 257-260. DOI: 10.1016/0167-9317(92)90051-R  0.96
1991 Kanga RS, Kometani JM, Reichmanis E, Hanson JE, Nalamasu O, Thompson LF, Heffner SA, Tai WW, Trevor P. Synthesis and characterization of poly[4-((tert -butoxycarbonyl)oxy)styrene-sulfone] Chemistry of Materials. 3: 660-667. DOI: 10.1021/Cm00016A019  0.96
1991 Reichmanis E, Thompson LF. Chemistry and processes for deep-UV resists Microelectronic Engineering. 13: 3-10. DOI: 10.1016/0167-9317(91)90007-Z  0.96
1991 Novembre AE, Hanson JE, Kometani JM, Tai WW, Reichmanis E, Thompson LF, West RJ. Arylmethyl sulfones. A new class of photoacid generators Photopolymers: Principles - Processes and Materials. 41-50. DOI: 10.1002/Pen.760322006  0.96
1990 Neenan TX, Houlihan FM, Reichmanis E, Kometani JM, Bachman BJ, Thompson LF. Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices. Studies pertaining to chemical amplification and imaging Macromolecules. 23: 145-150. DOI: 10.1021/Ma00203A025  0.96
1989 Reichmanis E, Thompson LF. Polymer materials for microlithography Chemical Reviews. 89: 1273-1289. DOI: 10.1146/Annurev.Ms.17.080187.001315  0.96
1989 Tarascon RG, Reichmanis E, Houlihan FM, Shugard A, Thompson LF. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography Polymer Engineering and Science. 29: 850-855. DOI: 10.1002/Pen.760291304  0.96
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