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Larry F. Thompson, Ph.D. - Publications

Affiliations: 
University of Missouri-Rolla, Rolla, MO, United States 
 AT&T Bell Laboratories 
Area:
microlithography
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18 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
1992 Novembre AE, Kometani JM, Tai WW, Reichmanis E, Thompson LF, Hanson JE. Sensitivity enhancement of t-BOC based chemically amplified resists through optimization of process prebake conditions. Journal of Photopolymer Science and Technology. 5: 9-15. DOI: 10.2494/Photopolymer.5.9  0.681
1992 Novembre AE, Tai WW, Kometani JM, Hanson JE, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF. Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide) Chemistry of Materials. 4: 278-284. DOI: 10.1021/Cm00020A012  0.647
1992 Novembre AE, Hanson JE, Kometani JM, Tai WW, Nalamasu O, Taylor GN, Reichmanis E, Thompson LF, Tomes DN. Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2) Microelectronic Engineering. 17: 257-260. DOI: 10.1016/0167-9317(92)90051-R  0.62
1991 NALAMASU O, CHENG M, TIMKO AG, POL V, REICHMANIS E, THOMPSON LF. An overview of resist processing for deep-UV lithography. Journal of Photopolymer Science and Technology. 4: 299-318. DOI: 10.2494/Photopolymer.4.299  0.596
1991 Kanga RS, Kometani JM, Reichmanis E, Hanson JE, Nalamasu O, Thompson LF, Heffner SA, Tai WW, Trevor P. Synthesis and characterization of poly[4-((tert -butoxycarbonyl)oxy)styrene-sulfone] Chemistry of Materials. 3: 660-667. DOI: 10.1021/Cm00016A019  0.653
1991 Reichmanis E, Thompson LF. Chemistry and processes for deep-UV resists Microelectronic Engineering. 13: 3-10. DOI: 10.1016/0167-9317(91)90007-Z  0.593
1991 Novembre AE, Hanson JE, Kometani JM, Tai WW, Reichmanis E, Thompson LF, West RJ. Arylmethyl sulfones. A new class of photoacid generators Photopolymers: Principles - Processes and Materials. 41-50. DOI: 10.1002/Pen.760322006  0.615
1990 Houlihan FM, Neenan TX, Reichmanis E, Kometani JM, Thompson LF, Chin T, Nalamasu O. Chemically amplified resists: The chemistry and lithographic characteristics of nitrobenzyl benzenesulfonate derivatives. Journal of Photopolymer Science and Technology. 3: 259-273. DOI: 10.2494/Photopolymer.3.259  0.603
1990 Neenan TX, Houlihan FM, Reichmanis E, Kometani JM, Bachman BJ, Thompson LF. Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices. Studies pertaining to chemical amplification and imaging Macromolecules. 23: 145-150. DOI: 10.1021/Ma00203A025  0.541
1990 Reichmanis E, Thompson LF. Challenges in Lithographic Materials and Processes At&T Technical Journal. 69: 32-45. DOI: 10.1002/J.1538-7305.1990.Tb00485.X  0.553
1989 Reichmanis E, Thompson LF. Polymer materials for microlithography Chemical Reviews. 89: 1273-1289. DOI: 10.1146/Annurev.Ms.17.080187.001315  0.54
1989 Houlihan FM, Reichmanis E, Tarascon RG, Taylor GN, Hellman MY, Thompson LF. Gas chromatography/mass spectroscopy study of the thermolysis and acidolysis of poly[4-(tert-butyloxycarbonyloxy)-.alpha.-methylstyrene], poly[4-(tert-butoxycarbonyloxy)styrene], and poly[4-(tert-butyloxycarbonyloxy)styrene sulfone] Macromolecules. 22: 2999-3004. DOI: 10.1021/Ma00197A021  0.487
1989 Tarascon RG, Reichmanis E, Houlihan FM, Shugard A, Thompson LF. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography Polymer Engineering and Science. 29: 850-855. DOI: 10.1002/Pen.760291304  0.62
1977 Bowden MJ, Thompson LF. Effect of olefin structure on the vapor‐development of poly (olefin sulfones) under electron irradiation Polymer Engineering and Science. 17: 269-273. DOI: 10.1002/Pen.760170411  0.327
1974 Thompson LF, Feit ED, Heidenreich RD. Lithography and radiation chemistry of epoxy containing negative electron resists Polymer Engineering and Science. 14: 529-533. DOI: 10.1002/Pen.760140713  0.386
1974 Bowden MJ, Thompson LF. Vapor development of poly(olefin sulfone) resists Polymer Engineering and Science. 14: 525-528. DOI: 10.1002/Pen.760140712  0.357
1973 Thompson LF, Feit ED, Melliar‐Smith CM, Heidenreich RD. Fundamental aspects of electron beam lithography. II. Low‐voltage exposure of negative resists Journal of Applied Physics. 44: 4048-4051. DOI: 10.1063/1.1662893  0.394
1973 Heidenreich RD, Thompson LF, Feit ED, Melliar‐Smith CM. Fundamental aspects of electron beam lithography. I. Depth‐dose response of polymeric electron beam resists Journal of Applied Physics. 44: 4039-4047. DOI: 10.1063/1.1662892  0.361
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