| Year |
Citation |
Score |
| 2025 |
Vazquez Arce JLL, Amoroso A, Perez N, Charvot J, Naglav-Hansen D, Zhao P, Yang J, Lehmann S, Wrzesińska-Lashkova A, Pieck F, Tonner-Zech R, Bureš F, Acquesta A, Vaynzof Y, Devi A, et al. Low Temperature Atomic Layer Deposition of (00l)-Oriented Elemental Bismuth. Angewandte Chemie (International Ed. in English). e202422578. PMID 39875330 DOI: 10.1002/anie.202422578 |
0.415 |
|
| 2024 |
Glauber JP, Lorenz J, Liu J, Müller B, Bragulla S, Kostka A, Rogalla D, Wark M, Nolan M, Harms C, Devi A. A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction. Dalton Transactions (Cambridge, England : 2003). PMID 39037344 DOI: 10.1039/d4dt01252f |
0.365 |
|
| 2024 |
Philip A, Jussila T, Obenlüneschloß J, Zanders D, Preischel F, Kinnunen J, Devi A, Karppinen M. Conformal Zn-Benzene Dithiol Thin Films for Temperature-Sensitive Electronics Grown via Industry-Feasible Atomic/Molecular Layer Deposition Technique. Small (Weinheim An Der Bergstrasse, Germany). e2402608. PMID 38853133 DOI: 10.1002/smll.202402608 |
0.491 |
|
| 2024 |
Wilken M, Muriqi A, Krusenbaum A, Nolan M, Devi A. Targeting Manganese Amidinates and ß-Ketoiminates Complexes as Precursors for Mn-Based Thin Film Vapor Deposition. Chemistry (Weinheim An Der Bergstrasse, Germany). e202401275. PMID 38656605 DOI: 10.1002/chem.202401275 |
0.352 |
|
| 2024 |
Huster N, Mullins R, Nolan M, Devi A. Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition. Dalton Transactions (Cambridge, England : 2003). PMID 38619887 DOI: 10.1039/d4dt00709c |
0.464 |
|
| 2023 |
Backus EHG, Hosseinpour S, Ramanan C, Sun S, Schlegel SJ, Zelenka M, Jia X, Gebhard M, Devi A, Wang HI, Bonn M. Ultrafast Surface-Specific Spectroscopy of Water at a Photoexcited TiO2 Model Water-Splitting Photocatalyst. Angewandte Chemie (International Ed. in English). e202312123. PMID 38010868 DOI: 10.1002/anie.202312123 |
0.542 |
|
| 2023 |
Stefanovic S, Gheshlaghi N, Zanders D, Kundrata I, Zhao B, Barr MKS, Halik M, Devi A, Bachmann J. Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor. Small (Weinheim An Der Bergstrasse, Germany). e2301774. PMID 37127863 DOI: 10.1002/smll.202301774 |
0.484 |
|
| 2023 |
Wree JL, Rogalla D, Ostendorf A, Schierbaum KD, Devi A. Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing. Acs Applied Materials & Interfaces. PMID 36888913 DOI: 10.1021/acsami.2c19827 |
0.542 |
|
| 2022 |
Boysen N, Devi A. Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal-organic complexes. European Journal of Mass Spectrometry (Chichester, England). 29: 12-20. PMID 36579795 DOI: 10.1177/14690667221146687 |
0.28 |
|
| 2022 |
Dementyev P, Khayya N, Zanders D, Ennen I, Devi A, Altman EI. Size and Shape Exclusion in 2D Silicon Dioxide Membranes. Small (Weinheim An Der Bergstrasse, Germany). e2205602. PMID 36521931 DOI: 10.1002/smll.202205602 |
0.245 |
|
| 2022 |
Wilken M, Ciftyürek E, Cwik S, Mai L, Mallick B, Rogalla D, Schierbaum K, Devi A. CVD Grown Tungsten Oxide for Low Temperature Hydrogen Sensing: Tuning Surface Characteristics via Materials Processing for Sensing Applications. Small (Weinheim An Der Bergstrasse, Germany). e2204636. PMID 36354167 DOI: 10.1002/smll.202204636 |
0.799 |
|
| 2022 |
Boysen N, Wree JL, Zanders D, Rogalla D, Öhl D, Schuhmann W, Devi A. High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors. Acs Applied Materials & Interfaces. PMID 36351209 DOI: 10.1021/acsami.2c13865 |
0.562 |
|
| 2022 |
Zhu LY, Miao XY, Ou LX, Mao LW, Yuan K, Sun S, Devi A, Lu HL. Heterostructured α-Fe O @ZnO@ZIF-8 Core-Shell Nanowires for a Highly Selective MEMS-Based ppb-Level H S Gas Sensor System. Small (Weinheim An Der Bergstrasse, Germany). e2204828. PMID 36310138 DOI: 10.1002/smll.202204828 |
0.317 |
|
| 2022 |
Huster N, Ghiyasi R, Zanders D, Rogalla D, Karppinen M, Devi A. SnO deposition water based ALD employing tin(II) formamidinate: precursor characterization and process development. Dalton Transactions (Cambridge, England : 2003). PMID 36111964 DOI: 10.1039/d2dt02562k |
0.564 |
|
| 2022 |
Philip A, Mai L, Ghiyasi R, Devi A, Karppinen M. Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors. Dalton Transactions (Cambridge, England : 2003). PMID 36069813 DOI: 10.1039/d2dt02279f |
0.569 |
|
| 2022 |
Zhu LY, Yuan K, Li ZC, Miao XY, Wang JC, Sun S, Devi A, Lu HL. Highly sensitive and stable MEMS acetone sensors based on well-designed α-FeO/C mesoporous nanorods. Journal of Colloid and Interface Science. 622: 156-168. PMID 35490619 DOI: 10.1016/j.jcis.2022.04.081 |
0.279 |
|
| 2022 |
Kaur P, Muriqi A, Wree JL, Ghiyasi R, Safdar M, Nolan M, Karppinen M, Devi A. Atomic/molecular layer deposition of cerium(III) hybrid thin films using rigid organic precursors. Dalton Transactions (Cambridge, England : 2003). PMID 35315479 DOI: 10.1039/d2dt00353h |
0.593 |
|
| 2022 |
Salles P, Guzmán R, Zanders D, Quintana A, Fina I, Sánchez F, Zhou W, Devi A, Coll M. Bendable Polycrystalline and Magnetic CoFeO Membranes by Chemical Methods. Acs Applied Materials & Interfaces. 14: 12845-12854. PMID 35232015 DOI: 10.1021/acsami.1c24450 |
0.547 |
|
| 2022 |
Naberezhnyi D, Mai L, Doudin N, Ennen I, Hütten A, Altman EI, Devi A, Dementyev P. Molecular Permeation in Freestanding Bilayer Silica. Nano Letters. PMID 35044780 DOI: 10.1021/acs.nanolett.1c04535 |
0.386 |
|
| 2022 |
Boysen N, Philip A, Rogalla D, Karppinen M, Devi A. Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition. Chemistry (Weinheim An Der Bergstrasse, Germany). 28: e202103798. PMID 35044704 DOI: 10.1002/chem.202103798 |
0.414 |
|
| 2022 |
Mai L, Maniar D, Zysk F, Schöbel J, Kühne TD, Loos K, Devi A. Influence of different ester side groups in polymers on the vapor phase infiltration with trimethyl aluminum. Dalton Transactions (Cambridge, England : 2003). PMID 34989363 DOI: 10.1039/d1dt03753f |
0.284 |
|
| 2021 |
Boysen N, Zanders D, Berning T, Beer SMJ, Rogalla D, Bock C, Devi A. Atomic layer deposition of dielectric YO thin films from a homoleptic yttrium formamidinate precursor and water. Rsc Advances. 11: 2565-2574. PMID 35424225 DOI: 10.1039/d0ra09876k |
0.581 |
|
| 2021 |
Zywitzki D, Mitoraj D, Vilk Y, Mendoza Reyes O, Schleuning M, Friedrich D, Sadlo A, Rogalla D, Eichberger R, Beranek R, Devi A. CVD grown GaSbN films as visible-light active photoanodes. Dalton Transactions (Cambridge, England : 2003). 50: 14832-14841. PMID 34596651 DOI: 10.1039/d1dt02455h |
0.496 |
|
| 2021 |
Beer SMJ, Boysen N, Muriqi A, Zanders D, Berning T, Rogalla D, Bock C, Nolan M, Devi A. A study on the influence of ligand variation on formamidinate complexes of yttrium: new precursors for atomic layer deposition of yttrium oxide. Dalton Transactions (Cambridge, England : 2003). 50: 12944-12956. PMID 34581336 DOI: 10.1039/d1dt01634b |
0.54 |
|
| 2021 |
Kaur P, Mai L, Muriqi A, Zanders D, Ghiyasi R, Safdar M, Boysen N, Winter M, Nolan M, Karppinen M, Devi A. Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application. Chemistry (Weinheim An Der Bergstrasse, Germany). PMID 33470473 DOI: 10.1002/chem.202003907 |
0.525 |
|
| 2021 |
Griffiths MBE, Zanders D, Land MA, Masuda JD, Devi A, Barry ST. (tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors Journal of Vacuum Science & Technology A. 39: 032409. DOI: 10.1116/6.0000795 |
0.366 |
|
| 2021 |
Boysen N, Zanders D, Berning T, Beer SMJ, Rogalla D, Bock C, Devi A. Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water Rsc Advances. 11: 2565-2574. DOI: 10.1039/D0RA09876K |
0.517 |
|
| 2021 |
Yu P, Beer SMJ, Devi A, Coll M. Fabrication of GdxFeyOz films using an atomic layer deposition-type approach Crystengcomm. 23: 730-740. DOI: 10.1039/d0ce01252a |
0.535 |
|
| 2021 |
Kaur P, Mai L, Muriqi A, Zanders D, Ghiyasi R, Safdar M, Boysen N, Winter M, Nolan M, Karppinen M, Devi A. Cover Feature: Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application (Chem. Eur. J. 15/2021) Chemistry – a European Journal. 27: 4758-4758. DOI: 10.1002/CHEM.202005268 |
0.359 |
|
| 2020 |
Zhu LY, Yuan KP, Yang JH, Hang CZ, Ma HP, Ji XM, Devi A, Lu HL, Zhang DW. Hierarchical highly ordered SnO nanobowl branched ZnO nanowires for ultrasensitive and selective hydrogen sulfide gas sensing. Microsystems & Nanoengineering. 6: 30. PMID 34567644 DOI: 10.1038/s41378-020-0142-6 |
0.319 |
|
| 2020 |
Boysen N, Misimi B, Muriqi A, Wree JL, Hasselmann T, Rogalla D, Haeger T, Theirich D, Nolan M, Riedl T, Devi A. A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films. Chemical Communications (Cambridge, England). 56: 13752-13755. PMID 33063069 DOI: 10.1039/d0cc05781a |
0.503 |
|
| 2020 |
Wree JL, Ciftyurek E, Zanders D, Boysen N, Kostka A, Rogalla D, Kasischke M, Ostendorf A, Schierbaum K, Devi A. A new metalorganic chemical vapor deposition process for MoS with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur. Dalton Transactions (Cambridge, England : 2003). 49: 13462-13474. PMID 32966456 DOI: 10.1039/D0Dt02471F |
0.647 |
|
| 2020 |
Zywitzki D, Taffa DH, Lamkowski L, Winter M, Rogalla D, Wark M, Devi A. Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts. Inorganic Chemistry. PMID 32589409 DOI: 10.1021/Acs.Inorgchem.0C01204 |
0.575 |
|
| 2020 |
Huster N, Zanders D, Karle S, Rogalla D, Devi A. Additive-free spin coating of tin oxide thin films: synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes. Dalton Transactions (Cambridge, England : 2003). 49: 10755-10764. PMID 32530011 DOI: 10.1039/D0Dt01463J |
0.582 |
|
| 2020 |
Zanders D, Bačić G, Leckie D, Odegbesan DO, Rawson J, Masuda JD, Devi A, Barry ST. A Rare Low-Spin Co(IV) Bis(β-silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration. Angewandte Chemie (International Ed. in English). PMID 32369235 DOI: 10.1002/Anie.202001518 |
0.42 |
|
| 2020 |
Mai L, Mitschker F, Bock C, Niesen A, Ciftyurek E, Rogalla D, Mickler J, Erig M, Li Z, Awakowicz P, Schierbaum K, Devi A. From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications. Small (Weinheim An Der Bergstrasse, Germany). e1907506. PMID 32346997 DOI: 10.1002/Smll.201907506 |
0.591 |
|
| 2020 |
Hirst J, Müller S, Peeters D, Sadlo A, Mai L, Reyes OM, Friedrich D, Mitoraj D, Devi A, Beranek R, Eichberger R. Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis Zeitschrift FüR Physikalische Chemie. 234: 699-717. DOI: 10.1515/Zpch-2019-1485 |
0.591 |
|
| 2020 |
Zhu L, Yuan K, Yang J, Hang C, Ma H, Ji X, Devi A, Lu H, Zhang DW. Hierarchical highly ordered SnO2 nanobowl branched ZnO nanowires for ultrasensitive and selective hydrogen sulfide gas sensing Microsystems & Nanoengineering. 6: 1-13. DOI: 10.1038/S41378-020-0142-6 |
0.467 |
|
| 2020 |
Mai L, Mitschker F, Bock C, Niesen A, Ciftyurek E, Rogalla D, Mickler J, Erig M, Li Z, Awakowicz P, Schierbaum K, Devi A. Zinc Oxide: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications (Small 22/2020) Small. 16: 2070122. DOI: 10.1002/Smll.202070122 |
0.431 |
|
| 2020 |
Beer SMJ, Krusenbaum A, Winter M, Vahlas C, Devi A. Study on structural and thermal characteristics of heteroleptic yttrium complexes as potential precursors for vapor phase deposition European Journal of Inorganic Chemistry. DOI: 10.1002/Ejic.202000436 |
0.476 |
|
| 2020 |
Zanders D, Bačić G, Leckie D, Odegbesan O, Rawson J, Masuda JD, Devi A, Barry ST. Ein seltenes Low‐Spin‐CoIV‐Bis(β‐silyldiamid) mit hoher thermischer Stabilität: Sterische Erzwingung einer Dublettkonfiguration Angewandte Chemie. 132: 14242-14246. DOI: 10.1002/Ange.202001518 |
0.291 |
|
| 2019 |
Cwik S, Beer SMJ, Schmidt M, Gerhardt NC, de Los Arcos T, Rogalla D, Weßing J, Giner I, Hofmann M, Grundmeier G, Wieck AD, Devi A. Correction: Luminescent NdS thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Transactions (Cambridge, England : 2003). 48: 16812. PMID 31670361 DOI: 10.1039/C9Dt90217A |
0.832 |
|
| 2019 |
Zanders D, Ciftyurek E, Subaşı E, Huster N, Bock C, Kostka A, Rogalla D, Schierbaum K, Devi A. PEALD of HfO Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases. Acs Applied Materials & Interfaces. PMID 31339290 DOI: 10.1021/Acsami.9B07090 |
0.617 |
|
| 2019 |
Schlegel SJ, Hosseinpour S, Gebhard M, Devi A, Bonn M, Backus EHG. How water flips at charged titanium dioxide: an SFG-study on the water-TiO interface. Physical Chemistry Chemical Physics : Pccp. PMID 30989163 DOI: 10.1039/C9Cp01131E |
0.343 |
|
| 2019 |
Mai L, Boysen N, Zanders D, de Los Arcos T, Mitschker F, Mallick B, Grundmeier G, Awakowicz P, Devi A. Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide. Chemistry (Weinheim An Der Bergstrasse, Germany). PMID 30870572 DOI: 10.1002/Chem.201900475 |
0.529 |
|
| 2019 |
Mai L, Zanders D, Subaşı E, Ciftyurek E, Hoppe C, Rogalla D, Gilbert W, Arcos TL, Schierbaum K, Grundmeier G, Bock C, Devi A. Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO-Based Thin-Film Transistor Devices. Acs Applied Materials & Interfaces. PMID 30624887 DOI: 10.1021/Acsami.8B16443 |
0.635 |
|
| 2019 |
Cwik S, Beer SMJ, Schmidt M, Gerhardt NC, de Los Arcos T, Rogalla D, Weßing J, Giner I, Hofmann M, Grundmeier G, Wieck AD, Devi A. Luminescent NdS thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Transactions (Cambridge, England : 2003). 48: 2926-2938. PMID 30542684 DOI: 10.1039/C8Dt04317E |
0.85 |
|
| 2019 |
Sadlo A, Peeters D, Albert R, Rogalla D, Becker HW, Schmechel R, Devi A. Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films. Journal of Nanoscience and Nanotechnology. 19: 867-876. PMID 30360164 DOI: 10.1166/Jnn.2019.15739 |
0.652 |
|
| 2019 |
Cwik S, Milanov AP, Gwildies V, Thiede T, Vidyarthi V, Savan A, Meyer R, Becker H, Rogalla D, Ludwig A, Fischer R, Devi A. Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD Ecs Transactions. 28: 159-165. DOI: 10.1149/1.3490695 |
0.804 |
|
| 2019 |
Thomas R, Ehrhart P, Waser R, Schubert J, Devi A, Katiyar R. Liquid Injection MOCVD Grown Binary Oxides and Ternary Rare-Earth Oxide as Alternate Gate-Oxides for Logic Devices Ecs Transactions. 33: 211-219. DOI: 10.1149/1.3481608 |
0.249 |
|
| 2019 |
Xu K, Milanov AP, Devi A. Tuning the Thermal Properties of Hafnium Precursors by Tailoring the Ligands Ecs Transactions. 25: 625-631. DOI: 10.1149/1.3207649 |
0.279 |
|
| 2019 |
Bekermann D, Pilard D, Fischer R, Devi A. Zinc Malonate Based Precursors for MOCVD of ZnO Ecs Transactions. 25: 601-608. DOI: 10.1149/1.3207646 |
0.372 |
|
| 2019 |
Gasparotto A, Barreca D, Devi A, Fischer R, Fois E, Gamba A, Maccato C, Seraglia R, Tabacchi G, Tondello E. Innovative M(Hfa)2•TMEDA (M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: an Integrated Theoretical and Experimental Approach Ecs Transactions. 25: 549-556. DOI: 10.1149/1.3207638 |
0.245 |
|
| 2019 |
Bekermann D, Barreca D, Devi A, Gasparotto A, Fischer R. MOCVD of Niobium Nitrides and Oxy-Nitrides using an All-Nitrogen-Coordinated Precursor: Thin-film Deposition and Mechanistic Study Ecs Transactions. 16: 235-242. DOI: 10.1149/1.2981606 |
0.582 |
|
| 2019 |
Zhu L, Yuan K, Yang J, Ma H, Wang T, Ji X, Feng J, Devi A, Lu H. Fabrication of heterostructured p-CuO/n-SnO2 core-shell nanowires for enhanced sensitive and selective formaldehyde detection Sensors and Actuators B-Chemical. 290: 233-241. DOI: 10.1016/J.Snb.2019.03.092 |
0.41 |
|
| 2019 |
Tuomisto M, Giedraityte Z, Mai L, Devi A, Boiko V, Grzeszkiewicz K, Hreniak D, Karppinen M, Lastusaari M. Up-converting ALD/MLD thin films with Yb3+, Er3+ in amorphous organic framework Journal of Luminescence. 213: 310-315. DOI: 10.1016/J.Jlumin.2019.05.028 |
0.606 |
|
| 2019 |
Mai L, Boysen N, Zanders D, Arcos Tdl, Mitschker F, Mallick B, Grundmeier G, Awakowicz P, Devi A. Cover Feature: Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide (Chem. Eur. J. 31/2019) Chemistry: a European Journal. 25: 7406-7406. DOI: 10.1002/Chem.201901358 |
0.452 |
|
| 2019 |
Zanders D, Ciftyurek E, Hoppe C, Arcos Tdl, Kostka A, Rogalla D, Grundmeier G, Schierbaum KD, Devi A. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties Advanced Materials Interfaces. 6: 1801540. DOI: 10.1002/Admi.201801540 |
0.607 |
|
| 2018 |
Mai L, Boysen N, Subaşı E, Arcos TL, Rogalla D, Grundmeier G, Bock C, Lu HL, Devi A. Water assisted atomic layer deposition of yttrium oxide using tris(,'-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. Rsc Advances. 8: 4987-4994. PMID 35539551 DOI: 10.1039/c7ra13417g |
0.55 |
|
| 2018 |
Hagen DJ, Mai L, Devi A, Sainio J, Karppinen M. Atomic/molecular layer deposition of Cu-organic thin films. Dalton Transactions (Cambridge, England : 2003). PMID 30357190 DOI: 10.1039/C8Dt03735C |
0.578 |
|
| 2018 |
Boysen N, Hasselmann T, Karle S, Rogalla D, Theirich D, Winter M, Riedl T, Devi A. A new N-heterocyclic carbene-based silver precursor and its validation in atmospheric pressure plasma enhanced spatial atomic layer deposition of silver thin films. Angewandte Chemie (International Ed. in English). PMID 30260065 DOI: 10.1002/Anie.201808586 |
0.596 |
|
| 2018 |
Siebels M, Mai L, Schmolke L, Schütte K, Barthel J, Yue J, Thomas J, Smarsly BM, Devi A, Fischer RA, Janiak C. Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate. Beilstein Journal of Nanotechnology. 9: 1881-1894. PMID 30013882 DOI: 10.3762/Bjnano.9.180 |
0.508 |
|
| 2018 |
Bačić G, Zanders D, Mallick B, Devi A, Barry ST. Designing Stability into Thermally Reactive Plumbylenes. Inorganic Chemistry. PMID 29943579 DOI: 10.1021/Acs.Inorgchem.8B00719 |
0.503 |
|
| 2018 |
Medishetty R, Zhang Z, Sadlo A, Cwik S, Peeters D, Henke S, Mangayarkarasi N, Devi A. Fabrication of zinc-dicarboxylate- and zinc-pyrazolate-carboxylate-framework thin films through vapour-solid deposition. Dalton Transactions (Cambridge, England : 2003). PMID 29770823 DOI: 10.1039/C8Dt00352A |
0.836 |
|
| 2018 |
Junge Puring K, Zywitzki D, Taffa DH, Rogalla D, Winter M, Wark M, Devi A. Rational Development of Cobalt β-Ketoiminate Complexes: Alternative Precursors for Vapor-Phase Deposition of Spinel Cobalt Oxide Photoelectrodes. Inorganic Chemistry. PMID 29664288 DOI: 10.1021/Acs.Inorgchem.8B00204 |
0.601 |
|
| 2018 |
Gebhard M, Mai L, Banko L, Mitschker F, Hoppe C, Jaritz M, Kirchheim D, Zekorn C, de Los Arcos T, Grochla D, Dahlmann R, Grundmeier G, Awakowicz P, Ludwig A, Devi A. PEALD of SiO2 and Al2O3 thin films on polypropylene: Investigations of the film growth at the interface, stress and gas barrier properties of dyads. Acs Applied Materials & Interfaces. PMID 29338170 DOI: 10.1021/Acsami.7B14916 |
0.611 |
|
| 2018 |
Wiesing M, Arcos Tdl, Gebhard M, Devi A, Grundmeier G. Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy Physical Chemistry Chemical Physics. 20: 180-190. PMID 29181468 DOI: 10.1039/C7Cp05373H |
0.393 |
|
| 2018 |
Peeters D, Reyes OM, Mai L, Sadlo A, Cwik S, Rogalla D, Becker H-, Schütz HM, Hirst J, Müller S, Friedrich D, Mitoraj D, Nagli M, Toroker MC, Eichberger R, ... ... Devi A, et al. CVD-grown copper tungstate thin films for solar water splitting Journal of Materials Chemistry. 6: 10206-10216. DOI: 10.1039/C7Ta10759E |
0.838 |
|
| 2018 |
Mai L, Boysen N, Subaşı E, Arcos Tdl, Rogalla D, Grundmeier G, Bock C, Lu H, Devi A. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): process development, film characterization and functional properties Rsc Advances. 8: 4987-4994. DOI: 10.1039/C7Ra13417G |
0.622 |
|
| 2018 |
O’Donoghue R, Rahman S, Mallick B, Winter M, Rogalla D, Becker H, Devi A. Molecular engineering of Ga-ketoiminates: synthesis, structure and evaluation as precursors for the additive-free spin-coated deposition of gallium oxide thin films New Journal of Chemistry. 42: 3196-3210. DOI: 10.1039/C7Nj04334A |
0.576 |
|
| 2018 |
Barreca D, Carraro G, Fois E, Gasparotto A, Gri F, Seraglia R, Wilken M, Venzo A, Devi A, Tabacchi G, Maccato C. Manganese(II) Molecular Sources for Plasma-Assisted CVD of Mn Oxides and Fluorides: From Precursors to Growth Process Journal of Physical Chemistry C. 122: 1367-1375. DOI: 10.1021/Acs.Jpcc.7B10277 |
0.475 |
|
| 2018 |
Mattinen M, Wree J, Stegmann N, Ciftyurek E, Achhab ME, King PJ, Mizohata K, Räisänen J, Schierbaum KD, Devi A, Ritala M, Leskelä M. Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties Chemistry of Materials. 30: 8690-8701. DOI: 10.1021/Acs.Chemmater.8B04129 |
0.661 |
|
| 2018 |
Liu C, Böke F, Gebhard M, Devi A, Fischer H, Keller A, Grundmeier G. Ultrasound-mediated deposition and cytocompatibility of apatite-like coatings on magnesium alloys Surface & Coatings Technology. 345: 167-176. DOI: 10.1016/J.Surfcoat.2018.03.100 |
0.447 |
|
| 2018 |
Gebhard M, Mitschker F, Hoppe C, Aghaee M, Rogalla D, Creatore M, Grundmeier G, Awakowicz P, Devi A. A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD Plasma Processes and Polymers. 15: 1700209. DOI: 10.1002/Ppap.201700209 |
0.585 |
|
| 2018 |
Sadlo A, Beer SMJ, Rahman S, Grafen M, Rogalla D, Winter M, Ostendorf A, Devi A. Tailored β‐Ketoiminato Complexes of Iron: Synthesis, Characterization, and Evaluation towards Solution‐Based Deposition of Iron Oxide Thin Films European Journal of Inorganic Chemistry. 2018: 1824-1833. DOI: 10.1002/Ejic.201800094 |
0.488 |
|
| 2018 |
Boysen N, Hasselmann T, Karle S, Rogalla D, Theirich D, Winter M, Riedl T, Devi A. Ein N‐heterocyclischer Carbenkomplex des Silbers für die plasmaunterstützte räumlich getrennte Atomlagenabscheidung dünner Silberschichten bei Atmosphärendruck Angewandte Chemie. 130: 16458-16462. DOI: 10.1002/Ange.201808586 |
0.278 |
|
| 2018 |
Cwik S, Mitoraj D, Reyes OM, Rogalla D, Peeters D, Kim J, Schütz HM, Bock C, Beranek R, Devi A. Direct Growth of MoS2 and WS2 Layers by Metal Organic Chemical Vapor Deposition Advanced Materials Interfaces. 5: 1800140. DOI: 10.1002/Admi.201800140 |
0.796 |
|
| 2017 |
Ren QH, Zhang Y, Lu HL, Wang YP, Liu WJ, Ji XM, Devi A, Jiang AQ, Zhang DW. Atomic Layer Deposited of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors. Acs Applied Materials & Interfaces. PMID 29211442 DOI: 10.1021/Acsami.7B13392 |
0.464 |
|
| 2017 |
Maccato C, Bigiani L, Carraro G, Gasparotto A, Seraglia R, Kim J, Devi A, Tabacchi G, Fois E, Pace G, Di Noto V, Barreca D. Molecular Engineering of Mn(II) Diamine Diketonate Precursors for the Vapor Deposition of Manganese Oxide Nanostructures. Chemistry (Weinheim An Der Bergstrasse, Germany). PMID 29164705 DOI: 10.1002/Chem.201703423 |
0.529 |
|
| 2017 |
O'Donoghue R, Rechmann J, Aghaee M, Rogalla D, Becker HW, Creatore M, Wieck AD, Devi A. Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition. Dalton Transactions (Cambridge, England : 2003). 46: 16551-16561. PMID 29160880 DOI: 10.1039/C7Dt03427J |
0.617 |
|
| 2017 |
Cwik S, Beer SMJ, Hoffmann S, Krasnopolski M, Rogalla D, Becker HW, Peeters D, Ney A, Devi A. Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN. Acs Applied Materials & Interfaces. PMID 28782941 DOI: 10.1021/Acsami.7B08221 |
0.843 |
|
| 2017 |
Mai L, Gebhard M, de Los Arcos T, Giner I, Mischker F, Winter M, Parala H, Awakowicz P, Grundmeier G, Devi A. Unearthing [3-(dimethylamino)propyl] aluminium(III) complexes as novel ALD precursors for Al2O3: Synthesis, characterization and ALD process development. Chemistry (Weinheim An Der Bergstrasse, Germany). PMID 28665519 DOI: 10.1002/Chem.201702939 |
0.562 |
|
| 2017 |
Gebhard M, Hellwig M, Kroll A, Rogalla D, Winter M, Mallick B, Ludwig A, Wiesing M, Wieck AD, Grundmeier G, Devi A. New amidinate complexes of indium(iii): promising CVD precursors for transparent and conductive InOthin films. Dalton Transactions (Cambridge, England : 2003). 46: 10220-10231. PMID 28594015 DOI: 10.1039/C7Dt01280B |
0.647 |
|
| 2017 |
Sun L, Lu HL, Chen HY, Wang T, Ji XM, Liu WJ, Zhao D, Devi A, Ding SJ, Zhang DW. Effects of Post Annealing Treatments on the Interfacial Chemical Properties and Band Alignment of AlN/Si Structure Prepared by Atomic Layer Deposition. Nanoscale Research Letters. 12: 102. PMID 28181165 DOI: 10.1186/S11671-016-1822-X |
0.558 |
|
| 2017 |
Karle S, Rogalla D, Ludwig A, Becker HW, Wieck AD, Grafen M, Ostendorf A, Devi A. Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films. Dalton Transactions (Cambridge, England : 2003). 46: 2670-2679. PMID 28170011 DOI: 10.1039/C6Dt04399B |
0.563 |
|
| 2017 |
Ahvenniemi E, Akbashev AR, Ali S, Bechelany M, Berdova M, Boyadjiev S, Cameron DC, Chen R, Chubarov M, Cremers V, Devi A, Drozd V, Elnikova L, Gottardi G, Grigoras K, et al. Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD” Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 010801. DOI: 10.1116/1.4971389 |
0.335 |
|
| 2017 |
Kirchheim D, Wilski S, Jaritz M, Mitschker F, Gebhard M, Brochhagen M, Böke M, Benedikt J, Awakowicz P, Devi A, Hopmann C, Dahlmann R. Temperature-dependent transport mechanisms through PE-CVD coatings: comparison of oxygen and water vapour Journal of Physics D. 50: 395302. DOI: 10.1088/1361-6463/Aa80Fd |
0.422 |
|
| 2017 |
Mitschker F, Steves S, Gebhard M, Rudolph M, Schücke L, Kirchheim D, Jaritz M, Brochhagen M, Hoppe C, Dahlmann R, Böke M, Benedikt J, Giner I, Arcos Tdl, Hopmann C, ... ... Devi A, et al. Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence Journal of Physics D. 50: 235201. DOI: 10.1088/1361-6463/Aa6E28 |
0.556 |
|
| 2017 |
Kirchheim D, Jaritz M, Mitschker F, Gebhard M, Brochhagen M, Hopmann C, Böke M, Devi A, Awakowicz P, Dahlmann R. Transport mechanisms through PE-CVD coatings: influence of temperature, coating properties and defects on permeation of water vapour Journal of Physics D. 50: 85203. DOI: 10.1088/1361-6463/Aa511C |
0.481 |
|
| 2017 |
Peeters D, Taffa DH, Kerrigan MM, Ney A, Jöns N, Rogalla D, Cwik S, Becker H, Grafen M, Ostendorf A, Winter CH, Chakraborty S, Wark M, Devi A. Photoactive Zinc Ferrites Fabricated via Conventional CVD Approach Acs Sustainable Chemistry & Engineering. 5: 2917-2926. DOI: 10.1021/Acssuschemeng.6B02233 |
0.826 |
|
| 2017 |
Väyrynen K, Mizohata K, Räisänen J, Peeters D, Devi A, Ritala M, Leskelä M. Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine Chemistry of Materials. 29: 6502-6510. DOI: 10.1021/Acs.Chemmater.7B02098 |
0.561 |
|
| 2017 |
Kim J, Iivonen T, Hämäläinen J, Kemell M, Meinander K, Mizohata K, Wang L, Räisänen J, Beranek R, Leskelä M, Devi A. Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices Chemistry of Materials. 29: 5796-5805. DOI: 10.1021/Acs.Chemmater.6B05346 |
0.649 |
|
| 2017 |
Mai L, Giedraityte Z, Schmidt M, Rogalla D, Scholz S, Wieck AD, Devi A, Karppinen M. Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor Journal of Materials Science. 52: 6216-6224. DOI: 10.1007/S10853-017-0855-6 |
0.62 |
|
| 2017 |
Peeters D, Sadlo A, Lowjaga K, Reyes OM, Wang L, Mai L, Gebhard M, Rogalla D, Becker H, Giner I, Grundmeier G, Mitoraj D, Grafen M, Ostendorf A, Beranek R, ... Devi A, et al. Water Splitting: Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor (Adv. Mater. Interfaces 18/2017) Advanced Materials Interfaces. 4. DOI: 10.1002/Admi.201770093 |
0.38 |
|
| 2017 |
Peeters D, Sadlo A, Lowjaga K, Reyes OM, Wang L, Mai L, Gebhard M, Rogalla D, Becker H, Giner I, Grundmeier G, Mitoraj D, Grafen M, Ostendorf A, Beranek R, ... Devi A, et al. Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor Advanced Materials Interfaces. 4: 1700155. DOI: 10.1002/Admi.201700155 |
0.528 |
|
| 2016 |
O' Donoghue R, Peeters D, Rogalla D, Becker HW, Rechmann J, Henke S, Winter M, Devi A. Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer depositions of zinc oxide. Dalton Transactions (Cambridge, England : 2003). PMID 27853779 DOI: 10.1039/C6Dt03571J |
0.723 |
|
| 2016 |
Devi A, Sathyanarayana HP, Kailasam V. Letters From Our Readers. The Angle Orthodontist. 86: 1058. PMID 27792422 DOI: 10.2319/0003-3219-86.6.1058 |
0.171 |
|
| 2016 |
Devi A, Srinivasan B, Padmanabhan S. Ideal parameter to assess efficacy of fixed functional appliance: angular or linear? European Journal of Orthodontics. 38: 337. PMID 27053726 DOI: 10.1093/ejo/cjw025 |
0.176 |
|
| 2016 |
Gebhard M, Mitschker F, Wiesing M, Giner I, Torun B, Arcos Tdl, Awakowicz P, Grundmeier G, Devi A. An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor Journal of Materials Chemistry C. 4: 1057-1065. DOI: 10.1039/C5Tc03385C |
0.63 |
|
| 2015 |
Kim SJ, Dang VS, Xu K, Barreca D, Maccato C, Carraro G, Bhakta RK, Winter M, Becker HW, Rogalla D, Sada C, Fischer RA, Devi A. MOCVD of TiO2 thin films from a modified titanium alkoxide precursor Physica Status Solidi (a) Applications and Materials Science. 212: 1563-1570. DOI: 10.1002/Pssa.201532271 |
0.688 |
|
| 2015 |
Karle S, Dang VS, Prenzel M, Rogalla D, Becker HW, Devi A. Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates Chemical Vapor Deposition. 21: 335-342. DOI: 10.1002/Cvde.201507189 |
0.626 |
|
| 2014 |
Banerjee M, Seidel RW, Winter M, Becker HW, Rogalla D, Devi A. Novel β-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for solution based processing of ZrO2 thin films. Dalton Transactions (Cambridge, England : 2003). 43: 2384-96. PMID 24302073 DOI: 10.1039/C3Dt52335G |
0.562 |
|
| 2014 |
Gebhard M, Hellwig M, Parala H, Xu K, Winter M, Devi A. Indium-tris-guanidinates: a promising class of precursors for water assisted atomic layer deposition of In2O3 thin films Dalton Transactions. 43: 937-940. PMID 24264622 DOI: 10.1039/C3Dt52746H |
0.62 |
|
| 2014 |
Kurek A, Gordon PG, Karle S, Devi A, Barry ST. Recent advances using guanidinate ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) applications Australian Journal of Chemistry. 67: 989-996. DOI: 10.1071/Ch14172 |
0.56 |
|
| 2014 |
Roozeboom F, Barreca D, Devi A, Parala H, Ritala M. Atomic-scale engineering of multifunctional nano-sized materials and films Physica Status Solidi (a). 211: 249-250. DOI: 10.1002/Pssa.201470214 |
0.493 |
|
| 2014 |
Srinivasan NB, Thiede TB, De Los Arcos T, Rogalla D, Becker HW, Devi A, Fischer RA. MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics Physica Status Solidi (a) Applications and Materials Science. 211: 260-266. DOI: 10.1002/Pssa.201330127 |
0.721 |
|
| 2014 |
Dang VS, Parala H, Kim JH, Xu K, Srinivasan NB, Edengeiser E, Havenith M, Wieck AD, De Los Arcos T, Fischer RA, Devi A. Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition Physica Status Solidi (a) Applications and Materials Science. 211: 416-424. DOI: 10.1002/Pssa.201330115 |
0.639 |
|
| 2014 |
Devi A, Kessels WE. Preface to the CVD Special Issue: Atomic‐Scale‐Engineered Materials (ASEM) Chemical Vapor Deposition. 20: 186-188. DOI: 10.1002/Cvde.201477896 |
0.337 |
|
| 2014 |
Banerjee M, Dang VS, Bledowski M, Beranek R, Becker HW, Rogalla D, Edengeiser E, Havenith M, Wieck AD, Devi A. MOCVD of TiO2 thin films using a heteroleptic titanium complex: Precursor evaluation and investigation of optical, photoelectrochemical and electrical properties Chemical Vapor Deposition. 20: 224-233. DOI: 10.1002/Cvde.201407125 |
0.628 |
|
| 2014 |
Dang VS, Banerjee M, Zhu H, Srinivasan NB, Parala H, Pfetzing-Micklich J, Wieck AD, Devi A. Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO2 Films Chemical Vapor Deposition. DOI: 10.1002/Cvde.201407124 |
0.641 |
|
| 2014 |
Kaipio M, Blanquart T, Banerjee M, Xu K, Niinistö J, Longo V, Mizohata K, Devi A, Ritala M, Leskelä M. Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors Chemical Vapor Deposition. 20: 209-216. DOI: 10.1002/Cvde.201407115 |
0.63 |
|
| 2014 |
Barreca D, Carraro G, Peeters D, Gasparotto A, Maccato C, Kessels WMM, Longo V, Rossi F, Bontempi E, Sada C, Devi A. Surface Decoration of ϵ‐Fe2O3 Nanorods by CuO Via a Two‐Step CVD/Sputtering Approach** Chemical Vapor Deposition. 20: 313-319. DOI: 10.1002/Cvde.201407108 |
0.482 |
|
| 2013 |
Krasnopolski M, Hrib CG, Seidel RW, Winter M, Becker HW, Rogalla D, Fischer RA, Edelmann FT, Devi A. Homoleptic gadolinium amidinates as precursors for MOCVD of oriented gadolinium nitride (GdN) thin films. Inorganic Chemistry. 52: 286-96. PMID 23231638 DOI: 10.1021/Ic301826S |
0.678 |
|
| 2013 |
Xu K, Chaudhuri AR, Parala H, Schwendt D, Arcos Tdl, Osten HJ, Devi A. Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties Journal of Materials Chemistry C. 1: 3939-3946. DOI: 10.1039/C3Tc30401A |
0.607 |
|
| 2013 |
Blanquart T, Niinistö J, Aslam N, Banerjee M, Tomczak Y, Gavagnin M, Longo V, Puukilainen E, Wanzenboeck HD, Kessels WMM, Devi A, Hoffmann-Eifert S, Ritala M, Leskelä M. [Zr(NEtMe)2(guan-NEtMe)2] as a novel ALD precursor: ZrO2 film growth and mechanistic studies Chemistry of Materials. 25: 3088-3095. DOI: 10.1021/Cm401279V |
0.628 |
|
| 2013 |
Reiners M, Xu K, Aslam N, Devi A, Waser R, Hoffmann-Eifert S. Growth and Crystallization of TiO2 Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium Chemistry of Materials. 25: 2934-2943. DOI: 10.1021/Cm303703R |
0.565 |
|
| 2013 |
Srinivasan NB, Thiede TB, de los Arcos T, Gwildies V, Krasnopolski M, Becker HW, Rogalla D, Devi A, Fischer RA. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors Surface and Coatings Technology. 230: 130-136. DOI: 10.1016/J.Surfcoat.2013.06.024 |
0.703 |
|
| 2013 |
Krasnopolski M, Seidel RW, Goddard R, Breidung J, Winter MV, Devi A, Fischer RA. A Z′ = 6 crystal structure of (E)-N,N′-dicyclohexylacetamidine Journal of Molecular Structure. 1031: 239-245. DOI: 10.1016/J.Molstruc.2012.10.003 |
0.506 |
|
| 2013 |
Devi A. ‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications Coordination Chemistry Reviews. 257: 3332-3384. DOI: 10.1016/J.Ccr.2013.07.025 |
0.458 |
|
| 2013 |
Peeters D, Carraro G, Maccato C, Parala H, Gasparotto A, Barreca D, Sada C, Kartaschew K, Havenith M, Rogalla D, Becker H, Devi A. Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization Physica Status Solidi (a). 211: 316-322. DOI: 10.1002/Pssa.201330079 |
0.506 |
|
| 2013 |
Kim SJ, Xu K, Parala H, Beranek R, Bledowski M, Sliozberg K, Becker HW, Rogalla D, Barreca D, Maccato C, Sada C, Schuhmann W, Fischer RA, Devi A. Intrinsic nitrogen-doped CVD-grown TiO2 thin films from all-N-coordinated Ti precursors for photoelectrochemical applications Chemical Vapor Deposition. 19: 45-52. DOI: 10.1002/Cvde.201206996 |
0.6 |
|
| 2012 |
Addla D, Bhima, Sridhar B, Devi A, Kantevari S. Design, synthesis and antimicrobial evaluation of novel 1-benzyl 2-butyl-4-chloroimidazole embodied 4-azafluorenones via molecular hybridization approach. Bioorganic & Medicinal Chemistry Letters. 22: 7475-80. PMID 23147074 DOI: 10.1016/j.bmcl.2012.10.042 |
0.242 |
|
| 2012 |
Milanov AP, Xu K, Cwik S, Parala H, de los Arcos T, Becker HW, Rogalla D, Cross R, Paul S, Devi A. Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors. Dalton Transactions (Cambridge, England : 2003). 41: 13936-47. PMID 23023387 DOI: 10.1039/C2Dt31219K |
0.838 |
|
| 2012 |
Meyer R, Hamann S, Ehmann M, Thienhaus S, Jaeger S, Thiede T, Devi A, Fischer RA, Ludwig A. Microgradient-heaters as tools for high-throughput experimentation. Acs Combinatorial Science. 14: 531-6. PMID 22931380 DOI: 10.1021/Co3000488 |
0.645 |
|
| 2012 |
Simon Q, Barreca D, Gasparotto A, Maccato C, Tondello E, Sada C, Comini E, Sberveglieri G, Banerjee M, Xu K, Devi A, Fischer RA. CuO/ZnO nanocomposite gas sensors developed by a plasma-assisted route. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry. 13: 2342-8. PMID 22532392 DOI: 10.1002/Cphc.201101062 |
0.603 |
|
| 2012 |
Bekermann D, Gasparotto A, Barreca D, Maccato C, Comini E, Sada C, Sberveglieri G, Devi A, Fischer RA. Co3O4/ZnO nanocomposites: from plasma synthesis to gas sensing applications. Acs Applied Materials & Interfaces. 4: 928-34. PMID 22260293 DOI: 10.1021/Am201591W |
0.57 |
|
| 2012 |
Simon Q, Barreca D, Gasparotto A, Maccato C, Tondello E, Sada C, Comini E, Devi A, Fischer RA. Ag/ZnO nanomaterials as high performance sensors for flammable and toxic gases. Nanotechnology. 23: 025502. PMID 22166305 DOI: 10.1088/0957-4484/23/2/025502 |
0.591 |
|
| 2012 |
Barreca D, Carraro G, Devi A, Fois E, Gasparotto A, Seraglia R, Maccato C, Sada C, Tabacchi G, Tondello E, Venzo A, Winter M. β-Fe2O3 nanomaterials from an iron(II) diketonate-diamine complex: a study from molecular precursor to growth process. Dalton Transactions (Cambridge, England : 2003). 41: 149-55. PMID 22048471 DOI: 10.1039/C1Dt11342A |
0.41 |
|
| 2012 |
Schwarzkopf J, Schmidbauer M, Remmele T, Duk A, Kwasniewski A, Bin Anooz S, Devi A, Fornari R. Strain-induced phase transitions in epitaxial NaNbO3thin films grown by metal–organic chemical vapour deposition Journal of Applied Crystallography. 45: 1015-1023. DOI: 10.1107/S0021889812035911 |
0.429 |
|
| 2012 |
Sliem MA, Schmidt DA, Bétard A, Kalidindi SB, Gross S, Havenith M, Devi A, Fischer RA. Surfactant-induced nonhydrolytic synthesis of phase-pure ZrO2 nanoparticles from metal-organic and oxocluster precursors Chemistry of Materials. 24: 4274-4282. DOI: 10.1021/Cm301128A |
0.515 |
|
| 2012 |
Xu K, Ranjith R, Laha A, Parala H, Milanov AP, Fischer RA, Bugiel E, Feydt J, Irsen S, Toader T, Bock C, Rogalla D, Osten HJ, Kunze U, Devi A. Atomic layer deposition of Gd 2O 3 and Dy 2O 3: A study of the ALD characteristics and structural and electrical properties Chemistry of Materials. 24: 651-658. DOI: 10.1021/Cm2020862 |
0.659 |
|
| 2012 |
Banerjee M, Srinivasan NB, Zhu H, Kim SJ, Xu K, Winter M, Becker HW, Rogalla D, De Los Arcos T, Bekermann D, Barreca D, Fischer RA, Devi A. Fabrication of ZrO 2 and ZrN films by metalorganic chemical vapor deposition employing new Zr precursors Crystal Growth and Design. 12: 5079-5089. DOI: 10.1021/Cg3010147 |
0.71 |
|
| 2012 |
De Los Arcos T, Cwik S, Milanov AP, Gwildies V, Parala H, Wagner T, Birkner A, Rogalla D, Becker HW, Winter J, Ludwig A, Fischer RA, Devi A. Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition Thin Solid Films. 522: 11-16. DOI: 10.1016/J.Tsf.2011.12.007 |
0.86 |
|
| 2012 |
Devi A, Cwik S, Xu K, Milanov AP, Noei H, Wang Y, Barreca D, Meijer J, Rogalla D, Kahn D, Cross R, Parala H, Paul S. Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition Thin Solid Films. 520: 4512-4517. DOI: 10.1016/J.Tsf.2011.10.141 |
0.849 |
|
| 2012 |
Xu K, Milanov AP, Parala H, Wenger C, Baristiran-Kaynak C, Lakribssi K, Toader T, Bock C, Rogalla D, Becker HW, Kunze U, Devi A. Atomic layer deposition of HfO 2 thin films employing a heteroleptic hafnium precursor Chemical Vapor Deposition. 18: 27-35. DOI: 10.1002/Cvde.201106934 |
0.645 |
|
| 2011 |
Gasparotto A, Barreca D, Bekermann D, Devi A, Fischer RA, Maccato C, Tondello E. Plasma processing of nanomaterials: emerging technologies for sensing and energy applications. Journal of Nanoscience and Nanotechnology. 11: 8206-13. PMID 22097556 DOI: 10.1166/Jnn.2011.5023 |
0.53 |
|
| 2011 |
Hellwig M, Parala H, Cybinksa J, Barreca D, Gasparotto A, Niermann B, Becker HW, Rogalla D, Feydt J, Irsen S, Mudring AV, Winter J, Fischer RA, Devi A. Atomic vapor deposition approach to In2O3 thin films. Journal of Nanoscience and Nanotechnology. 11: 8094-100. PMID 22097536 DOI: 10.1166/Jnn.2011.5024 |
0.71 |
|
| 2011 |
Gasparotto A, Barreca D, Bekermann D, Devi A, Fischer RA, Fornasiero P, Gombac V, Lebedev OI, Maccato C, Montini T, Van Tendeloo G, Tondello E. F-Doped Co3O4 photocatalysts for sustainable H2 generation from water/ethanol. Journal of the American Chemical Society. 133: 19362-5. PMID 22053896 DOI: 10.1021/Ja210078D |
0.575 |
|
| 2011 |
Milanov AP, Seidel RW, Barreca D, Gasparotto A, Winter M, Feydt J, Irsen S, Becker HW, Devi A. Malonate complexes of dysprosium: synthesis, characterization and application for LI-MOCVD of dysprosium containing thin films. Dalton Transactions (Cambridge, England : 2003). 40: 62-78. PMID 21079835 DOI: 10.1039/C0Dt00455C |
0.601 |
|
| 2011 |
Ngwashi DK, Cross RBM, Paul S, Milanov AP, Devi A. High mobility ZnO thin film transistors using the novel deposition of high-k dielectrics. Mrs Proceedings. 1315. DOI: 10.1557/Opl.2011.721 |
0.566 |
|
| 2011 |
Hellwig M, Parala H, Cybinksa J, Barreca D, Gasparotto A, Niermann B, Becker HW, Rogalla D, Feydt J, Irsen S, Mudring AV, Winter J, Fischer RA, Devi A. Atomic vapor deposition approach to In 2O 3 thin films Journal of Nanoscience and Nanotechnology. 11: 8094-8100. DOI: 10.1166/jnn.2011.5024 |
0.606 |
|
| 2011 |
Bekermann D, Gasparotto A, Barreca D, Devi A, Fischer RA. p-Co3O4/n-ZnO, Obtained by PECVD, Analyzed by X-ray Photoelectron Spectroscopy Surface Science Spectra. 18: 36-45. DOI: 10.1116/11.20111003 |
0.603 |
|
| 2011 |
Barreca D, Devi A, Fischer RA, Bekermann D, Gasparotto A, Gavagnin M, MacCato C, Tondello E, Bontempi E, Depero LE, Sada C. Strongly oriented Co3O4 thin films on MgO(100) and MgAl2O4(100) substrates by PE-CVD Crystengcomm. 13: 3670-3673. DOI: 10.1039/C1Ce05280B |
0.707 |
|
| 2011 |
Thiede TB, Krasnopolski M, Milanov AP, De Los Arcos T, Ney A, Becker HW, Rogalla D, Winter J, Devi A, Fischer RA. Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare-earth nitride thin films Chemistry of Materials. 23: 1430-1440. DOI: 10.1021/Cm102840V |
0.7 |
|
| 2011 |
Schwarzkopf J, Schmidbauer M, Duk A, Kwasniewski A, Anooz SB, Wagner G, Devi A, Fornari R. Growth of epitaxial sodium-bismuth-titanate films by metal-organic chemical vapor phase deposition Thin Solid Films. 520: 239-244. DOI: 10.1016/J.Tsf.2011.07.050 |
0.511 |
|
| 2011 |
Schwarzkopf J, Dirsyte R, Devi A, Kwasniewski A, Schmidbauer M, Wagner G, Michling M, Schmeisser D, Fornari R. Influence of Na on the structure of Bi4Ti3O12 films deposited by liquid-delivery spin MOCVD Thin Solid Films. 519: 5754-5759. DOI: 10.1016/J.Tsf.2010.12.206 |
0.504 |
|
| 2011 |
Dudek P, Schmidt R, Lukosius M, Lupina G, Wenger C, Abrutis A, Albert M, Xu K, Devi A. Basic investigation of HfO2 based metal–insulator–metal diodes Thin Solid Films. 519: 5796-5799. DOI: 10.1016/J.Tsf.2010.12.195 |
0.582 |
|
| 2011 |
Barreca D, Bekermann D, Comini E, Devi A, Fischer RA, Gasparotto A, Gavagnin M, MacCato C, Sada C, Sberveglieri G, Tondello E. Plasma enhanced-CVD of undoped and fluorine-doped Co3O 4 nanosystems for novel gas sensors Sensors and Actuators, B: Chemical. 160: 79-86. DOI: 10.1016/J.Snb.2011.07.016 |
0.589 |
|
| 2011 |
Simon Q, Barreca D, Bekermann D, Gasparotto A, MacCato C, Comini E, Gombac V, Fornasiero P, Lebedev OI, Turner S, Devi A, Fischer RA, Van Tendeloo G. Plasma-assisted synthesis of Ag/ZnO nanocomposites: First example of photo-induced H2 production and sensing International Journal of Hydrogen Energy. 36: 15527-15537. DOI: 10.1016/J.Ijhydene.2011.09.045 |
0.557 |
|
| 2011 |
Bekermann D, Ludwig A, Toader T, MacCato C, Barreca D, Gasparotto A, Bock C, Wieck AD, Kunze U, Tondello E, Fischer RA, Devi A. MOCVD of ZnO films from bis(ketoiminato)Zn(II) precursors: Structure, morphology and optical properties Chemical Vapor Deposition. 17: 155-161. DOI: 10.1002/Cvde.201006898 |
0.709 |
|
| 2010 |
Gwildies V, Thiede TB, Amirjalayer S, Alsamman L, Devi A, Fischer RA. All-nitrogen coordinated amidinato/imido complexes of molybdenum and tungsten: syntheses and characterization. Inorganic Chemistry. 49: 8487-94. PMID 20712359 DOI: 10.1021/Ic101060S |
0.606 |
|
| 2010 |
Bekermann D, Gasparotto A, Barreca D, Devi A, Fischer RA, Kete M, Lavrencic Stangar U, Lebedev OI, Maccato C, Tondello E, Van Tendeloo G. ZnO nanorod arrays by plasma-enhanced CVD for light-activated functional applications. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry. 11: 2337-40. PMID 20564275 DOI: 10.1002/Cphc.201000333 |
0.587 |
|
| 2010 |
Milanov AP, Xu K, Laha A, Bugiel E, Ranjith R, Schwendt D, Osten HJ, Parala H, Fischer RA, Devi A. Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition. Journal of the American Chemical Society. 132: 36-7. PMID 20000721 DOI: 10.1021/Ja909102J |
0.698 |
|
| 2010 |
Ranjith R, Laha A, Bugiel E, Osten HJ, Xu K, Milanov AP, Devi A. Downscaling of defect-passivated Gd2O3 thin films on p-Si(0 0 1) wafers grown by H2O-assisted atomic layer deposition Semiconductor Science and Technology. 25: 105001. DOI: 10.1088/0268-1242/25/10/105001 |
0.616 |
|
| 2010 |
Barreca D, Bekermann D, Comini E, Devi A, Fischer RA, Gasparotto A, MacCato C, Sada C, Sberveglieri G, Tondello E. Urchin-like ZnO nanorod arrays for gas sensing applications Crystengcomm. 12: 3419-3421. DOI: 10.1039/C0Ce00139B |
0.568 |
|
| 2010 |
Bekermann D, Gasparotto A, Barreca D, Bovo L, Devi A, Fischer RA, Lebedev OI, Maccato C, Tondello E, Tendeloo GV. Highly Oriented ZnO Nanorod Arrays by a Novel Plasma Chemical Vapor Deposition Process Crystal Growth & Design. 10: 2011-2018. DOI: 10.1021/Cg1002012 |
0.619 |
|
| 2010 |
Schwarzkopf J, Dirsyte R, Devi A, Schmidbauer M, Wagner G, Fornari R. Depositions of SrRuO3 thin films on oxide substrates with liquid-delivery spin MOCVD Thin Solid Films. 518: 4675-4679. DOI: 10.1016/J.Tsf.2009.12.057 |
0.573 |
|
| 2010 |
Barreca D, Bekermann D, Comini E, Devi A, Fischer RA, Gasparotto A, Maccato C, Sberveglieri G, Tondello E. 1D ZnO nano-assemblies by Plasma-CVD as chemical sensors for flammable and toxic gases Sensors and Actuators B-Chemical. 149: 1-7. DOI: 10.1016/J.Snb.2010.06.048 |
0.606 |
|
| 2010 |
Barreca D, Bekermann D, Devi A, Fischer RA, Gasparotto A, Maccato C, Tondello E, Rossi M, Orlanducci S, Terranova ML. Novel insight into the alignment and structural ordering of supported ZnO nanorods Chemical Physics Letters. 500: 287-290. DOI: 10.1016/J.Cplett.2010.10.030 |
0.58 |
|
| 2010 |
Xu K, Milanov AP, Winter M, Barreca D, Gasparotto A, Becker HW, Devi A. Heteroleptic guanidinate- and amidinate-based complexes of hafnium as new precursors for MOCVD of HfO2 European Journal of Inorganic Chemistry. 1679-1688. DOI: 10.1002/Ejic.200901225 |
0.604 |
|
| 2010 |
Bekermann D, Rogalla D, Becker HW, Winter M, Fischer RA, Devi A. Volatile, monomeric, and fluorine-free precursors for the metal organic chemical vapor deposition of zinc oxide European Journal of Inorganic Chemistry. 1366-1372. DOI: 10.1002/Ejic.200901037 |
0.673 |
|
| 2010 |
Devi A, Hellwig M, Barreca D, Parala H, Thomas R, Becker HW, Katiyar RS, Fischer RA, Tondello E. Growth and characterization of ti-ta-o thin films on si substrates by liquid injection MOCVD for high-k applications from modified titanium and tantalum precursors Chemical Vapor Deposition. 16: 157-165. DOI: 10.1002/Cvde.200906813 |
0.707 |
|
| 2010 |
Devi A, Sussek H, Pritzkow H, Winter M, Fischer RA. ChemInform Abstract: Molecular Precursors to Group 13 Nitrides. Part 14. Synthesis and Structures of (N3)2Ga[(CH2)3NMe2], (N3)Ga[(CH2)3NMe2]2 and (N3)3Ga(NR3) (R: CH3, C2H5). Cheminform. 31: no-no. DOI: 10.1002/CHIN.200006017 |
0.246 |
|
| 2009 |
Milanov AP, Thiede TB, Devi A, Fischer RA. Homoleptic gadolinium guanidinate: a single source precursor for metal-organic chemical vapor deposition of gadolinium nitride thin films. Journal of the American Chemical Society. 131: 17062-3. PMID 19894714 DOI: 10.1021/Ja907952G |
0.699 |
|
| 2009 |
Bandoli G, Barreca D, Gasparotto A, Seraglia R, Tondello E, Devi A, Fischer RA, Winter M, Fois E, Gamba A, Tabacchi G. An integrated experimental and theoretical investigation on Cu(hfa)2. TMEDA: structure, bonding and reactivity. Physical Chemistry Chemical Physics : Pccp. 11: 5998-6007. PMID 19588023 DOI: 10.1039/B904145A |
0.531 |
|
| 2009 |
Pothiraja R, Milanov A, Parala H, Winter M, Fischer RA, Devi A. Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films. Dalton Transactions (Cambridge, England : 2003). 654-63. PMID 19378558 DOI: 10.1039/B810528F |
0.606 |
|
| 2009 |
Pothiraja R, Milanov AP, Barreca D, Gasparotto A, Becker HW, Winter M, Fischer RA, Devi A. Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films. Chemical Communications (Cambridge, England). 1978-80. PMID 19333463 DOI: 10.1039/B821128K |
0.636 |
|
| 2009 |
Bandoli G, Barreca D, Gasparotto A, Maccato C, Seraglia R, Tondello E, Devi A, Fischer RA, Winter M. A cobalt(II) hexafluoroacetylacetonate ethylenediamine complex as a CVD molecular source of cobalt oxide nanostructures. Inorganic Chemistry. 48: 82-9. PMID 19053346 DOI: 10.1021/Ic801212V |
0.599 |
|
| 2009 |
Milanov AP, Fischer RA, Devi A. Synthesis, characterization, and thermal properties of homoleptic rare-earth guanidinates: promising precursors for MOCVD and ALD of rare-earth oxide thin films. Inorganic Chemistry. 47: 11405-16. PMID 18989919 DOI: 10.1021/Ic801432B |
0.67 |
|
| 2009 |
Mih TA, Paul S, Milanov AP, Bhakta R, Devi A. Capacitance-voltage analysis of ZrO2 thin films deposited by thermal MOCVD technique Ecs Transactions. 25: 901-907. DOI: 10.1149/1.3207684 |
0.516 |
|
| 2009 |
Hellwig M, Xu K, Barreca D, Gasparotto A, Niermann B, Winter J, Becker HW, Rogalla D, Fischer RA, Devi A. MOCVD of gallium oxide thin films using homoleptic gallium complexes: Precursor evaluation and thin film characterisation Ecs Transactions. 25: 617-624. DOI: 10.1149/1.3207648 |
0.532 |
|
| 2009 |
Milanov AP, Thiede T, Hellwig M, Parala H, Bock C, Becker HW, Ngwashi DK, Cross RBM, Paul S, Kunze U, Fischer RA, Devi A. Rare-earth based oxide and nitride thin films employing volatile homoleptic guanidinate precursors Ecs Transactions. 25: 143-150. DOI: 10.1149/1.3207585 |
0.591 |
|
| 2009 |
Milanov AP, Toader T, Parala H, Barreca D, Gasparotto A, Bock C, Becker H, Ngwashi DK, Cross R, Paul S, Kunze U, Fischer RA, Devi A. Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors Chemistry of Materials. 21: 5443-5455. DOI: 10.1021/Cm902123M |
0.701 |
|
| 2009 |
Bekermann D, Barreca D, Gasparotto A, Becker HW, Fischer RA, Devi A. Investigation of niobium nitride and oxy-nitride films grown by MOCVD Surface and Coatings Technology. 204: 404-409. DOI: 10.1016/J.Surfcoat.2009.07.029 |
0.681 |
|
| 2009 |
Hellwig M, Xu K, Barreca D, Gasparotto A, Winter M, Tondello E, Fischer RA, Devi A. Novel Gallium Complexes with Malonic Diester Anions as Molecular Precursors for the MOCVD of Ga2O3 Thin Films European Journal of Inorganic Chemistry. 2009: 1110-1117. DOI: 10.1002/Ejic.200801062 |
0.699 |
|
| 2007 |
Devi A, Bhakta R, Milanov A, Hellwig M, Barreca D, Tondello E, Thomas R, Ehrhart P, Winter M, Fischer R. Synthesis and characterisation of zirconium-amido guanidinato complex: a potential precursor for ZrO2 thin films. Dalton Transactions (Cambridge, England : 2003). 1671-6. PMID 17443259 DOI: 10.1039/b616861b |
0.682 |
|
| 2007 |
Katoch S, Devi A, Kulkarni P. Ocular defects in cerebral palsy. Indian Journal of Ophthalmology. 55: 154-6. PMID 17322613 DOI: 10.4103/0301-4738.30717 |
0.18 |
|
| 2007 |
Thomas R, Rije E, Ehrhart P, Milanov A, Bhakta R, Bauneman A, Devi A, Fischer R, Waser R. Thin films of HfO2 for high- k gate oxide applications from engineered alkoxide- and amide-based MOCVD precursors Journal of the Electrochemical Society. 154. DOI: 10.1149/1.2431324 |
0.683 |
|
| 2007 |
Bhakta R, Bettinger HF, Devi A. Investigation of thermal decomposition of titanium MOCVD precursor [Ti(O1Pr)2(thd)2], using matrix isolation-ftir technique Ecs Transactions. 2: 89-104. DOI: 10.1149/1.2408906 |
0.385 |
|
| 2007 |
Barreca D, Gasparotto A, Milanov A, Tondello E, Devi A, Fischer RA. Gd2O3 Nanostructured Thin Films Analyzed by XPS Surface Science Spectra. 14: 60-67. DOI: 10.1116/11.20080703 |
0.683 |
|
| 2007 |
Barreca D, Gasparotto A, Milanov A, Tondello E, Devi A, Fischer RA. Nanostructured Dy2O3 films: An XPS Investigation Surface Science Spectra. 14: 52-59. DOI: 10.1116/11.20080702 |
0.683 |
|
| 2007 |
Barreca D, Milanov A, Fischer RA, Devi A, Tondello E. Hafnium oxide thin film grown by ALD: An XPS study Surface Science Spectra. 14: 34-40. DOI: 10.1116/11.20080401 |
0.658 |
|
| 2007 |
Devi A, Bhakta R, Milanov A, Hellwig M, Barreca D, Tondello E, Thomas R, Ehrhart P, Winter M, Fischer R. Synthesis and characterisation of zirconium-amido guanidinato complex: A potential precursor for ZrO2 thin films Dalton Transactions. 1671-1676. DOI: 10.1039/B616861B |
0.718 |
|
| 2007 |
Hellwig M, Milanov A, Barreca D, Deborde J, Thomas R, Winter M, Kunze U, Fischer RA, Devi A. Stabilization of Amide-Based Complexes of Niobium and Tantalum Using Malonates as Chelating Ligands : Precursor Chemistry and Thin Film Deposition Chemistry of Materials. 19: 6077-6087. DOI: 10.1021/Cm0630441 |
0.669 |
|
| 2007 |
Milanov A, Thomas R, Hellwig M, Merz K, Becker HW, Ehrhart P, Fischer RA, Waser R, Devi A. LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors Surface and Coatings Technology. 201: 9109-9116. DOI: 10.1016/J.Surfcoat.2007.04.055 |
0.708 |
|
| 2007 |
Thomas R, Bhakta R, Ehrhart P, Fischer RA, Waser R, Devi A. Liquid injection MOCVD of TiO2 and SrTiO3 thin films from [Ti(OPri)2(tbaoac)2]: Film properties and compatibility with [Sr(thd)2] Surface and Coatings Technology. 201: 9135-9140. DOI: 10.1016/J.Surfcoat.2007.04.038 |
0.7 |
|
| 2007 |
Xia W, Wang Y, Hagen V, Heel A, Kasper G, Patil U, Devi A, Muhler M. The synthesis of ZrO2/SiO2 nanocomposites by the two-step CVD of a volatile halogen-free Zr alkoxide in a fluidized-bed reactor Chemical Vapor Deposition. 13: 37-41. DOI: 10.1002/Cvde.200606533 |
0.479 |
|
| 2007 |
Thomas R, Bhakta R, Milanov A, Devi A, Ehrhart P. Thin films of ZrO2 for high-k applications employing engineered alkoxide- and amide-based MOCVD precursors Chemical Vapor Deposition. 13: 98-104. DOI: 10.1002/Cvde.200606512 |
0.62 |
|
| 2006 |
Milanov A, Bhakta R, Baunemann A, Becker HW, Thomas R, Ehrhart P, Winter M, Devi A. Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2. Inorganic Chemistry. 45: 11008-18. PMID 17173460 DOI: 10.1021/Ic061056I |
0.593 |
|
| 2006 |
Rao LG, Bhandary SV, Devi AR, Gangadharan S. Floppy eyelid syndrome in an infant. Indian Journal of Ophthalmology. 54: 217-8. PMID 16921233 DOI: 10.4103/0301-4738.27090 |
0.164 |
|
| 2006 |
Baunemann A, Hellwig M, Varade A, Bhakta RK, Winter M, Shivashankar SA, Fischer RA, Devi A. Precursor chemistry for TiO2: titanium complexes with a mixed nitrogen/oxygen ligand sphere. Dalton Transactions (Cambridge, England : 2003). 3485-90. PMID 16832499 DOI: 10.1039/b601995a |
0.514 |
|
| 2006 |
Baunemann A, Hellwig M, Varade A, Bhakta RK, Winter M, Shivashankar SA, Fischer RA, Devi A. Precursor chemistry for TiO2: Titanium complexes with a mixed nitrogen/oxygen ligand sphere Dalton Transactions. 3485-3490. DOI: 10.1039/B601995A |
0.568 |
|
| 2006 |
Milanov A, Bhakta R, Thomas R, Ehrhart P, Winter M, Waser R, Devi A. Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films Journal of Materials Chemistry. 16: 437-440. DOI: 10.1039/B509380E |
0.541 |
|
| 2006 |
Thomas R, Milanov A, Bhakta R, Patil U, Winter M, Ehrhart P, Waser R, Devi A. Liquid-injection MOCVD of ZrO2 thin films using zirconium bis(diethylamido)-bis(di-tert-butylmalonato) as a novel precursor Chemical Vapor Deposition. 12: 295-300. DOI: 10.1002/Cvde.200506481 |
0.648 |
|
| 2006 |
Patil U, Thomas R, Milanov A, Bhakta R, Ehrhart P, Waser R, Becker R, Becker HW, Winter M, Merz K, Fischer RA, Devi A. MOCVD of ZrO2 and HfO2 thin films from modified monomeric precursors Chemical Vapor Deposition. 12: 172-180. DOI: 10.1002/Cvde.200506394 |
0.671 |
|
| 2006 |
Devi A, Schmid R, Muller J, Fischer RA. Materials Chemistry of Group 13 Nitrides Cheminform. 37. DOI: 10.1002/CHIN.200644214 |
0.241 |
|
| 2005 |
Milanov AP, Bhakta R, Winter M, Merz K, Devi A. Bis(2-butyl-N,N'-diisopropylamidinato)dichlorohafnium(IV). Acta Crystallographica. Section C, Crystal Structure Communications. 61: m370-2. PMID 15997069 DOI: 10.1107/S0108270105016872 |
0.403 |
|
| 2005 |
Milanov AP, Bhakta R, Winter M, Merz K, Devi A. Bis(2-butyl-N,N′-diisopropyl-amidinato)dichlorohafnium(IV) Acta Crystallographica Section C: Crystal Structure Communications. 61. DOI: 10.1107/S0108270105016872 |
0.302 |
|
| 2005 |
Thomas R, Regnery S, Ehrhart P, Waser R, Patil U, Bhakta R, Devi A. High-k dielectric materials by metalorganic chemical vapor deposition: Growth and characterization Ferroelectrics. 327: 111-119. DOI: 10.1080/00150190500316531 |
0.654 |
|
| 2005 |
Kim Y, Baunemann A, Parala H, Devi A, Fischer RA. Metal-Organic CVD of Conductive and Crystalline Hafnium Nitride Films† Chemical Vapor Deposition. 11: 294-297. DOI: 10.1002/Cvde.200504204 |
0.515 |
|
| 2004 |
Kakati S, Doley B, Barman B, Devi A. Symmetric peripheral gangrene and falciparum malaria. The Journal of the Association of Physicians of India. 52: 498-9. PMID 15645963 |
0.168 |
|
| 2004 |
Baunemann A, Thomas R, Becker R, Winter M, Fischer RA, Ehrhart P, Waser R, Devi A. Mononuclear precursor for MOCVD of HfO2 thin films. Chemical Communications (Cambridge, England). 1610-1. PMID 15263942 DOI: 10.1039/B405015K |
0.664 |
|
| 2004 |
Bhakta R, Thomas M, Hipler F, Bettinger HF, Müller J, Ehrhart P, Devi A. MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri) 2(tbaoac)2] Journal of Materials Chemistry. 14: 3231-3238. DOI: 10.1039/B405963H |
0.626 |
|
| 2003 |
Patil U, Winter M, Becker HW, Devi A. Synthesis and structure of mixed isopropoxide-β-ketoester and β-ketoamide zirconium complexes: Potential precursors for MOCVD of ZrO 2 Journal of Materials Chemistry. 13: 2177-2184. DOI: 10.1039/B304419J |
0.548 |
|
| 2003 |
Khanderi J, Wohlfart A, Parala H, Devi A, Hambrock J, Birkner A, Fischer RA. MOCVD of gallium nitride nanostructures using (N3)2Ga{(CH2)3NR2}, R = Me, Et, as a single molecule precursor: morphology control and materials characterization Journal of Materials Chemistry. 13: 1438-1446. DOI: 10.1039/B301727C |
0.605 |
|
| 2003 |
Becker R, Devi A, Weiß J, Weckenmann U, Winter M, Kiener C, Becker HW, Fischer RA. A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand Chemical Vapor Deposition. 9: 149-156. DOI: 10.1002/Cvde.200306236 |
0.685 |
|
| 2003 |
Bhakta R, Hipler F, Devi A, Regnery S, Ehrhart P, Waser R. Mononuclear Mixed β-Ketoester-alkoxide Compound of Titanium as a Promising Precursor for Low-Temperature MOCVD of TiO2 Thin films Advanced Materials. 15: 295-298. DOI: 10.1002/Cvde.200304151 |
0.49 |
|
| 2002 |
Wohlfart A, Devi A, Maile E, Fischer RA. Morphology controlled growth of arrays of GaN nanopillars and randomly distributed GaN nanowires on sapphire using (N3)2Ga[(CH2)3NMe2] as a single molecule precursor. Chemical Communications (Cambridge, England). 998-9. PMID 12123087 DOI: 10.1039/B201858F |
0.514 |
|
| 2002 |
Devi A, Shivashankar SA, Samuelson AG. MOCVD of aluminium oxide films using aluminium β-diketonates as precursors Journal De Physique Iv. 12: 139-146. DOI: 10.1051/Jp4:20020088 |
0.6 |
|
| 2002 |
Parala H, Devi A, Bhakta R, Fischer RA. Synthesis of nano-scale TiO2 particles by a nonhydrolytic approach Journal of Materials Chemistry. 12: 1625-1627. DOI: 10.1039/B202767D |
0.501 |
|
| 2002 |
Mukhopadhyay S, Shalini K, Lakshmi R, Devi A, Shivashankar SA. Metalorganic chemical vapor deposition of Cu films from bis(t-butyl-3-oxo-butanoato)copper(II): thermodynamic investigation and experimental verification Surface & Coatings Technology. 150: 205-211. DOI: 10.1016/S0257-8972(01)01540-7 |
0.579 |
|
| 2002 |
Mane AU, Shalini K, Wohlfart A, Devi A, Shivashankar SA. Strongly oriented thin films of Co3O4 deposited on single-crystal MgO(1 0 0) by low-pressure, low-temperature MOCVD Journal of Crystal Growth. 240: 157-163. DOI: 10.1016/S0022-0248(02)00860-6 |
0.595 |
|
| 2002 |
Mukhopadhyay S, Shalini K, Devi A, Shivashankar S. Thermodynamic investigation of the MOCVD of copper films from bis (2,2,6,6-tetramethyl-3,5-heptadionato)copper(II) Bulletin of Materials Science. 25: 391-398. DOI: 10.1007/Bf02708016 |
0.58 |
|
| 2002 |
Devi A, Shivashankar SA, Samuelson AG. MOCVD of aluminium oxide films using aluminium β-diketonates as precursors Journal De Physique. Iv : Jp. 12: Pr4/139-Pr4/146. |
0.443 |
|
| 2001 |
Wohlfart A, Devi A, Hipler F, Becker HW, Fischer RA. Growth of porous columnar α-GaN layers on c-plane Al2O3 by MOCVD using Bisazido dimethylaminopropyl gallium as single source precursor Journal De Physique Iv. 11. DOI: 10.1051/Jp4:2001387 |
0.542 |
|
| 2001 |
Devi A, Parala H, Rogge W, Wohlfart A, Birkner A, Fischer RA. Growth of InN whiskers from single source precursor Journal De Physique Iv. 11. DOI: 10.1051/Jp4:2001373 |
0.616 |
|
| 2001 |
Becker R, Weiß J, Devi A, Fischer RA. Chemical vapour deposition of copper using copper(II) alkoxides Journal De Physique Iv. 11. DOI: 10.1051/Jp4:2001372 |
0.568 |
|
| 2001 |
Parala H, Devi A, Rogge W, Birkner A, Fischer RA. Synthesis of GaN particles in porous matrices by chemical vapor infiltration of single molecule precursors Journal De Physique Iv. 11. DOI: 10.1051/Jp4:2001360 |
0.558 |
|
| 2001 |
Parala H, Devi A, Hipler F, Maile E, Birkner A, Becker HW, Fischer RA. Investigations on InN whiskers grown by chemical vapour deposition Journal of Crystal Growth. 231: 68-74. DOI: 10.1016/S0022-0248(01)01463-4 |
0.599 |
|
| 2001 |
Parala H, Devi A, Wohlfart A, Winter M, Fischer RA. An Efficient Chemical Solution Deposition Method for Epitaxial Gallium Nitride Layers Using a Single‐Molecule Precursor Advanced Functional Materials. 11: 224-228. DOI: 10.1002/1616-3028(200106)11:3<224::Aid-Adfm224>3.0.Co;2-4 |
0.604 |
|
| 2000 |
Fischer RA, Wohlfart A, Devi A, Rogge W. Growth kinetics of GaN thin films grown by OMVPE using single source precursors Mrs Internet Journal of Nitride Semiconductor Research. 5: 152-158. DOI: 10.1557/S109257830000421X |
0.652 |
|
| 2000 |
Singh MP, Mukhopadhayay S, Devi A, Shivashankar SA. A Study of Nucleation and Growth in MOCVD: The Growth of Thin Films of Alumina Mrs Proceedings. 648. DOI: 10.1557/Proc-648-P6.47 |
0.633 |
|
| 2000 |
Mane A, Shalini K, Devi A, Lakshmi R, Dharmaprakash MS, Paranjape M, Shivashankar SA. CVD of Thin Films of Copper and Cobalt from Different Precursors: Growth Kinetics and Microstructure Mrs Proceedings. 614. DOI: 10.1557/Proc-614-G6.11 |
0.617 |
|
| 2000 |
Sussek H, Stark O, Devi A, Pritzkow H, Fischer RA. Precursor chemistry of Group III nitrides Journal of Organometallic Chemistry. 602: 29-36. DOI: 10.1016/S0022-328X(00)00114-5 |
0.586 |
|
| 2000 |
Devi A, Rogge W, Wohlfart A, Hipler F, Becker HW, Fischer RA. A Study of Bisazido(dimethylamino‐propyl)gallium as a Precursor for the OMVPE of Gallium Nitride Thin Films in a Cold‐Wall Reactor System under Reduced Pressure Chemical Vapor Deposition. 6: 245-252. DOI: 10.1002/1521-3862(200010)6:5<245::Aid-Cvde245>3.0.Co;2-1 |
0.691 |
|
| 2000 |
Winkler H, Devi A, Manz A, Wohlfart A, Rogge W, Fischer RA. Epitaxy, Composites and Colloids of Gallium Nitride Achieved by Transformation of Single Source Precursor Physica Status Solidi (a). 177: 27-35. DOI: 10.1002/(Sici)1521-396X(200001)177:1<27::Aid-Pssa27>3.0.Co;2-# |
0.618 |
|
| 1999 |
Fischer RA, Wohlfart A, Devi A, Rogge W. Growth Kinetics of GaN Thin Films Grown by OMVPE Using Single Source Precursors Mrs Proceedings. 595. DOI: 10.1557/Proc-595-F99W3.18 |
0.695 |
|
| 1999 |
Devi A, Rogge W, Fischer RA, Stowasser F, Sussek H, Becker HW, Schäfer J, Wolfrum J. OMVPE of GaN using (N3)2Ga[(CH2)3N(CH3)2] (BAZIGA) in a cold wall reactor Journal De Physique Iv. 9. DOI: 10.1051/Jp4:1999874 |
0.662 |
|
| 1999 |
Devi A, Shivashankar SA. Thermal analysis of metalorganic complexes of copper for evaluation as CVD precursors Journal of Thermal Analysis and Calorimetry. 55: 259-270. DOI: 10.1023/A:1010173230897 |
0.439 |
|
| 1999 |
Devi A, Fischer RA. CVD of Compound Semiconductors: Precursor Synthesis, Development and Applications. Anthony C. Jones, P. O'Brien Wiley‐VCH Verlagsgesellschaft mbH, Weinheim 1997, 338 Seiten, geb., DM 248,‐, ISBN 3‐527‐29294‐2 Chemie Ingenieur Technik. 71: 1212-1213. DOI: 10.1002/Cite.330711029 |
0.5 |
|
| 1999 |
Devi A, Sussek H, Pritzkow H, Winter M, Fischer RA. Synthesis and Structures of (N3)2Ga[(CH2)3NMe2], (N3)Ga[(CH2)3NMe2]2 and (N3)3Ga(NR3) (R = CH3, C2H5) European Journal of Inorganic Chemistry. 1999: 2127-2134. DOI: 10.1002/(Sici)1099-0682(199912)1999:12<2127::Aid-Ejic2127>3.0.Co;2-N |
0.574 |
|
| 1998 |
Devi A, Goswami J, Lakshmi R, Shivashankar SA, Chandrasekaran S. A novel Cu(II) chemical vapor deposition precursor: Synthesis, characterization, and chemical vapor deposition Journal of Materials Research. 13: 687-692. DOI: 10.1557/Jmr.1998.0086 |
0.639 |
|
| 1998 |
Devi A, Shivashankar S. Thermal chemical vapour deposition of copper films from copper ethylacetoacetate: microstructure and electrical resistivity Journal of Materials Science Letters. 17: 367-369. DOI: 10.1023/A:1006518714011 |
0.593 |
|
| 1996 |
Patnaik S, Guru Row TN, Raghunathan L, Devi A, Goswami J, Shivashankar SA, Chandrasekaran S, Robinson WT. Low-Temperature Structure of Two Copper-Based Precursors for MOCVD: Aquabis(tert-butyl acetoacetato)copper(II) and Bis(dipivaloylmethanido)copper(II) Acta Crystallographica Section C Crystal Structure Communications. 52: 891-894. DOI: 10.1107/S0108270195012157 |
0.569 |
|
| 1996 |
Goswami J, Raghunathan L, Devi A, Shivashankar SA, Chandrasekaran S. Chemical vapour deposition of thin copper films using a new metalorganic precursor Journal of Materials Science Letters. 15: 573-575. DOI: 10.1007/Bf00579254 |
0.656 |
|
| 1994 |
Goswami J, Shivashankar SA, Raghunathan L, Devi A, Ramanathan KV. Comparison of growth and microstructure of copper films deposited from different Cu(II) precursors Mrs Proceedings. 337. DOI: 10.1557/Proc-337-691 |
0.481 |
|
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