| Year |
Citation |
Score |
| 2016 |
Torres CM, Laperrousaz B, Berguiga L, Provera EB, Elezgaray J, Nicolini FE, Maguer-Satta V, Arneodo A, Argoul F. Enlightening intracellular complexity of living cells with quantitative phase microscopy Proceedings of Spie. 9718. DOI: 10.1117/12.2211314 |
0.304 |
|
| 2014 |
Elezgaray J, Berguiga L, Argoul F. Plasmon-based tomographic microscopy. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 31: 155-61. PMID 24561951 DOI: 10.1364/Josaa.31.000155 |
0.303 |
|
| 2011 |
Berguiga L, Roland T, Monier K, Elezgaray J, Argoul F. Amplitude and phase images of cellular structures with a scanning surface plasmon microscope. Optics Express. 19: 6571-6586. PMID 21451685 DOI: 10.1364/Oe.19.006571 |
0.309 |
|
| 2010 |
Elezgaray J, Roland T, Berguiga L, Argoul F. Modeling of the scanning surface plasmon microscope. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 27: 450-7. PMID 20208934 DOI: 10.1364/Josaa.27.000450 |
0.306 |
|
| 2009 |
Roland T, Khalil A, Tanenbaum A, Berguiga L, Delichère P, Bonneviot L, Elezgaray J, Arneodo A, Argoul F. Revisiting the physical processes of vapodeposited thin gold films on chemically modified glass by atomic force and surface plasmon microscopies Surface Science. 603: 3307-3320. DOI: 10.1016/J.Susc.2009.09.021 |
0.314 |
|
| 2009 |
Zhang S, Hugo N, Li W, Roland T, Berguiga L, Elezgaray J, Argoul F. Impedance spectroscopy of the potential response of MUO and AUT self-assembled monolayers on polycrystalline thin gold films Journal of Electroanalytical Chemistry. 629: 138-146. DOI: 10.1016/J.Jelechem.2009.02.007 |
0.301 |
|
| 2009 |
Roland T, Berguiga L, Fahys A, Haftek Z, Milani P, Hugo N, Bouvet P, Elezgaray J, Argoul F. High Resolution Surface Plasmon Microscopy: From Nano-colloids To Single Nucleosome Imaging Biophysical Journal. 96. DOI: 10.1016/J.Bpj.2008.12.208 |
0.324 |
|
| 2007 |
Zhang S, Moskalenko C, Berguiga L, Elezgaray J, Argoul F. Gouy diffuse layer modelling in phosphate buffers Journal of Electroanalytical Chemistry. 603: 107-112. DOI: 10.1016/J.Jelechem.2007.01.023 |
0.308 |
|
| 2004 |
Tassius C, Moskalenko C, Minard P, Desmadril M, Elezgaray J, Argoul F. Probing the dynamics of a confined enzyme by surface plasmon resonance Physica a-Statistical Mechanics and Its Applications. 342: 402-409. DOI: 10.1016/J.Physa.2004.04.101 |
0.301 |
|
| 2003 |
Saliba R, Mingotaud C, Argoul F, Ravaine S. Morphological control of gold electrodeposits grown at the gas-liquid interface Journal of the Electrochemical Society. 150: C175-C183. DOI: 10.1149/1.1545457 |
0.318 |
|
| 2003 |
Saliba R, Mingotaud C, Argoul F, Ravaine S. Ramified gold deposits at the gas | liquid interface Journal of Electroanalytical Chemistry. 544: 129-135. DOI: 10.1016/S0022-0728(03)00061-5 |
0.31 |
|
| 2002 |
Saliba R, Mingotaud C, Argoul F, Ravaine S. Spontaneous oscillations in gold electrodeposition Electrochemistry Communications. 4: 629-632. DOI: 10.1016/S1388-2481(02)00391-0 |
0.322 |
|
| 2002 |
Ravaine S, Saliba R, Mingotaud C, Argoul F. Electroless formation of gold deposits under positively charged surfactant monolayers Colloids and Surfaces a: Physicochemical and Engineering Aspects. 198: 401-407. DOI: 10.1016/S0927-7757(01)00986-4 |
0.307 |
|
| 2001 |
Saliba R, Mingotaud C, Argoul F, Ravaine S. Electroless deposition of gold films under organized monolayers Journal of the Electrochemical Society. 148: C65-C69. DOI: 10.1149/1.1344542 |
0.31 |
|
| 2001 |
Bonnefont A, Argoul F, Bazant MZ. Analysis of diffuse-layer effects on time-dependent interfacial kinetics Journal of Electroanalytical Chemistry. 500: 52-61. DOI: 10.1016/S0022-0728(00)00470-8 |
0.334 |
|
| 2000 |
Leger C, Elezgaray J, Argoul F. Internal structure of dense electrodeposits Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics. 61: 5452-63. PMID 11031598 DOI: 10.1103/Physreve.61.5452 |
0.345 |
|
| 2000 |
Elezgaray J, Leger C, Argoul F. Dense branching morphology in electrodeposition experiments: characterization and mean-field modeling Physical Review Letters. 84: 3129-32. PMID 11019029 DOI: 10.1103/Physrevlett.84.3129 |
0.319 |
|
| 2000 |
Chen B, Miller CA, Walsh JM, Warren PB, Ruddock JN, Garrett PR, Argoul F, Leger C. Dissolution Rates of Pure Nonionic Surfactants Langmuir. 16: 5276-5283. DOI: 10.1021/La9913497 |
0.308 |
|
| 2000 |
Léger C, Elezgaray J, Argoul F. Probing interfacial dynamics by phase-shift interferometry in thin cell electrodeposition Journal of Electroanalytical Chemistry. 486: 204-219. DOI: 10.1016/S0022-0728(00)00143-1 |
0.336 |
|
| 1999 |
Bonnefont A, Kostecki R, McLarnon F, Arrayet JC, Servant L, Argoul F. In situ atomic force microscopy imaging of electrodeposition of mixed layers of copper/cuprous oxide Journal of the Electrochemical Society. 146: 4101-4104. DOI: 10.1149/1.1392598 |
0.329 |
|
| 1999 |
Léger C, Argoul F, Bazant MZ. Front Dynamics during Diffusion-Limited Corrosion of Ramified Electrodeposits The Journal of Physical Chemistry B. 103: 5841-5851. DOI: 10.1021/Jp990486+ |
0.341 |
|
| 1999 |
Ravaine S, Breton C, Mingotaud C, Argoul F. Electrodeposition of two-dimensional silver films under dihexadecyl phosphate monolayers Materials Science and Engineering: C. 8: 437-444. DOI: 10.1016/S0928-4931(99)00036-3 |
0.322 |
|
| 1999 |
Léger C, Servant L, Bruneel JL, Argoul F. Growth patterns in electrodeposition Physica a-Statistical Mechanics and Its Applications. 263: 305-314. DOI: 10.1016/S0378-4371(98)00484-1 |
0.364 |
|
| 1998 |
Elezgaray J, Léger C, Argoul F. Linear Stability Analysis of Unsteady Galvanostatic Electrodeposition in the Two‐Dimensional Diffusion‐Limited Regime Journal of the Electrochemical Society. 145: 2016-2024. DOI: 10.1149/1.1838592 |
0.311 |
|
| 1998 |
Léger C, Elezgaray J, Argoul F. Dynamical characterization of one-dimensional stationary growth regimes in diffusion-limited electrodeposition processes Physical Review E. 58: 7700-7709. DOI: 10.1103/Physreve.58.7700 |
0.354 |
|
| 1998 |
Faure C, Decoster N, Argoul F. AC field induced two-dimensional aggregation of multilamellar vesicles European Physical Journal B. 5: 87-97. DOI: 10.1007/S100510050422 |
0.305 |
|
| 1997 |
Argoul F, Arneodo A, Elezgaray J, Kuhn A. Dynamical characterization of electroless deposition in the diffusion-limited regime Fractals. 5: 75-86. DOI: 10.1142/S0218348X97000085 |
0.544 |
|
| 1997 |
Léger C, Elezgaray J, Argoul F. Experimental Demonstration Of Diffusion-Limited Dynamics In Electrodeposition Physical Review Letters. 78: 5010-5013. DOI: 10.1103/Physrevlett.78.5010 |
0.321 |
|
| 1997 |
Texier F, Gadret G, Léger C, Argoul F. Convection Induced Self-Organization in Electroless Deposition Experiments Journal De Physique Ii. 7: 663-675. DOI: 10.1051/Jp2:1997150 |
0.314 |
|
| 1996 |
Argoul F, Freysz E, Kuhn A, Léger C, Potin L. Interferometric characterization of growth dynamics during dendritic electrodeposition of zinc. Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics. 53: 1777-1788. PMID 9964439 DOI: 10.1103/Physreve.53.1777 |
0.495 |
|
| 1995 |
Huth JM, Swinney HL, McCormick WD, Kuhn A, Argoul F. Role of convection in thin-layer electrodeposition Physical Review E. 51: 3444-3458. DOI: 10.1103/Physreve.51.3444 |
0.626 |
|
| 1995 |
Argoul F, Kuhn A. The influence of transport and reaction processes on the morphology of a metal electrodeposit in thin gap geometry Physica a-Statistical Mechanics and Its Applications. 213: 209-231. DOI: 10.1016/0378-4371(94)00162-M |
0.521 |
|
| 1995 |
Kuhn A, Argoul F. Diffusion-Limited Kinetics In Thin-Gap Electroless Deposition Journal of Electroanalytical Chemistry. 397: 93-104. DOI: 10.1016/0022-0728(95)04157-X |
0.53 |
|
| 1994 |
Kuhn A, Argoul F, Muzy JF, Arneodo A. Structural analysis of electroless deposits in the diffusion-limited regime. Physical Review Letters. 73: 2998-3001. PMID 10057256 DOI: 10.1103/Physrevlett.73.2998 |
0.514 |
|
| 1994 |
Kuhn A, Argoul F. Spatiotemporal Morphological Transitions In Thin-Layer Electrodeposition - The Hecker Effect Physical Review E. 49: 4298-4305. PMID 9961723 DOI: 10.1103/Physreve.49.4298 |
0.53 |
|
| 1994 |
Arneodo A, Argoul F, Kuhn A, Muzy JF. Wavelet Based Structural Analysis of Electroless Deposits in the Diffusion Limited Regime Mrs Proceedings. 367. DOI: 10.1557/Proc-367-43 |
0.555 |
|
| 1994 |
Kuhn A, Argoul F. Determination of Ionic Mobilities by Thin-Layer Electrodeposition Journal of Chemical Education. 71. DOI: 10.1021/Ed071Pa273 |
0.464 |
|
| 1994 |
Kuhn A, Argoul F. Revisited Experimental-Analysis Of Morphological-Changes In Thin-Layer Electrodeposition Journal of Electroanalytical Chemistry. 371: 93-100. DOI: 10.1016/0022-0728(93)03234-G |
0.533 |
|
| 1993 |
Arneodo A, Argoul F, Muzy JF, Tabard M, Bacry E. Beyond Classical Multifractal Analysis Using Wavelets: Uncovering A Multiplicative Process Hidden In The Geometrical Complexity Of Diffusion Limited Aggregates Fractals. 1: 629-649. DOI: 10.1142/S0218348X93000666 |
0.325 |
|
| 1993 |
Kuhn A, Argoul F. Influence Of Chemical Perturbations On The Surface Roughness Of Thin Layer Electrodeposits Fractals. 1: 451-459. DOI: 10.1142/S0218348X93000472 |
0.536 |
|
| 1993 |
Argoul F, Huth J, Merzeau P, Arnéodo A, Swinney HL. Experimental evidence for homoclinic chaos in an electrochemical growth process Physica D: Nonlinear Phenomena. 62: 170-185. DOI: 10.1016/0167-2789(93)90279-A |
0.552 |
|
| 1993 |
Arnéodo A, Argoul F, Elezgaray J, Richetti P. Homoclinic chaos in chemical systems Physica D: Nonlinear Phenomena. 62: 134-169. DOI: 10.1016/0167-2789(93)90278-9 |
0.353 |
|
| 1993 |
Argoul F, Kuhn A. Experimental demonstration of the origin of interfacial rhythmicity in electrodeposition of zinc dendrites Journal of Electroanalytical Chemistry. 359: 81-96. DOI: 10.1016/0022-0728(93)80401-3 |
0.535 |
|
| 1992 |
Arneodo A, Argoul F, Bacry E, Muzy JF, Tabard M. Golden mean arithmetic in the fractal branching of diffusion-limited aggregates. Physical Review Letters. 68: 3456-3459. PMID 10045708 DOI: 10.1103/Physrevlett.68.3456 |
0.317 |
|
| 1992 |
Arneodo A, Argoul F, Muzy JF, Tabard M. Structural five-fold symmetry in the fractal morphology of diffusion-limited aggregates Physica a-Statistical Mechanics and Its Applications. 188: 217-242. DOI: 10.1016/0378-4371(92)90269-V |
0.356 |
|
| 1992 |
Arneodo A, Argoul F, Muzy JF, Tabard M. Uncovering Fibonacci sequences in the fractal morphology of diffusion-limited aggregates Physics Letters A. 171: 31-36. DOI: 10.1016/0375-9601(92)90128-9 |
0.318 |
|
| 1991 |
Arneodo A, Argoul F, Couder Y, Rabaud M. Anisotropic Laplacian growths: From diffusion-limited aggregates to dendritic fractals. Physical Review Letters. 66: 2332-2335. PMID 10043458 DOI: 10.1103/Physrevlett.66.2332 |
0.314 |
|
| 1990 |
Couder Y, Argoul F, Arneodo A, Maurer J, Rabaud M. Statistical properties of fractal dendrites and anisotropic diffusion-limited aggregates Physical Review A. 42: 3499-3503. PMID 9904431 DOI: 10.1103/Physreva.42.3499 |
0.333 |
|
| 1990 |
Argoul F, Arneodo A. Experimental evidence for deterministic chaos in electrochemical deposition Journal De Physique. 51: 2477-2487. DOI: 10.1051/Jphys:0199000510210247700 |
0.312 |
|
| 1989 |
Argoul F, Arneodo A, Grasseau G, Swinney HL. Argoul et al. reply Physical Review Letters. 63: 1323. DOI: 10.1103/Physrevlett.63.1323 |
0.437 |
|
| 1989 |
Argoul F, Arnéodo A, Grasseau G, Gagne Y, Hopfinger EJ, Frisch U. Wavelet analysis of turbulence reveals the multifractal nature of the Richardson cascade Nature. 338: 51-53. DOI: 10.1038/338051A0 |
0.309 |
|
| 1988 |
Argoul F, Arneodo A, Grasseau G, Swinney HL. Self-similarity of diffusion-limited aggregates and electrodeposition clusters Physical Review Letters. 61: 2558-2561. DOI: 10.1103/Physrevlett.61.2558 |
0.512 |
|
| 1987 |
Argoul F, Arneodo A, Richetti P, Roux JC, Swinney HL. Chemical chaos: From hints to confirmation Accounts of Chemical Research. 20: 436-442. DOI: 10.1021/Ar00144A002 |
0.469 |
|
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