Timothy Brian Stachowiak - Publications

Affiliations: 
2007 University of California, Berkeley, Berkeley, CA 

15 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2014 Khusnatdinov N, Ye Z, Luo K, Stachowiak T, Lu X, Irving JW, Shafran M, Longsine W, Traub M, Truskett V, Fletcher B, Liu W, Xu F, LaBrake D, Sreenivasan SV. High throughput jet and flash imprint lithography for advanced semiconductor memory Proceedings of Spie - the International Society For Optical Engineering. 9049. DOI: 10.1117/12.2048189  0.76
2012 Ward JW, Nichols J, Stachowiak TB, Ngo Q, Egerton EJ. Reduction of CNT interconnect resistance for the replacement of Cu for future technology nodes Ieee Transactions On Nanotechnology. 11: 56-62. DOI: 10.1109/TNANO.2011.2148725  0.76
2011 Sinton S, Cates C, Fried A, Stachowiak T, Higginbotham G, Winzer S, Epstein J, Robinson A, Meinhold M, Holihan E, Jones F, Hauge R, Pint C, Léonard F. Effective carbon nanotube materials and design strategies for CNT-based electronics Technical Proceedings of the 2011 Nsti Nanotechnology Conference and Expo, Nsti-Nanotech 2011. 1: 139-142.  0.76
2008 Augustin V, Stachowiak T, Svec F, Fréchet JM. CEC separation of peptides using a poly(hexyl acrylate-co-1,4-butanediol diacrylate-co-[2-(acryloyloxy)ethyl]trimethyl ammonium chloride) monolithic column. Electrophoresis. 29: 3875-86. PMID 18850656 DOI: 10.1002/elps.200700883  0.76
2007 Logan TC, Clark DS, Stachowiak TB, Svec F, Fréchet JM. Photopatterning enzymes on polymer monoliths in microfluidic devices for steady-state kinetic analysis and spatially separated multi-enzyme reactions. Analytical Chemistry. 79: 6592-8. PMID 17658765 DOI: 10.1021/ac070705k  0.76
2007 Stachowiak TB, Mair DA, Holden TG, Lee LJ, Svec F, Fréchet JM. Hydrophilic surface modification of cyclic olefin copolymer microfluidic chips using sequential photografting. Journal of Separation Science. 30: 1088-93. PMID 17566345 DOI: 10.1002/jssc.200600515  0.76
2006 Stachowiak TB, Svec F, Fréchet JMJ. Patternable protein resistant surfaces for multifunctional microfluidic devices via surface hydrophilization of porous polymer monoliths using photografting Chemistry of Materials. 18: 5950-5957. DOI: 10.1021/cm0617034  0.76
2006 Stachowiak TB, Svec F, Fréchet JMJ. Hydrophilic, protein-resistant surface modification of polymer monoliths via photografting for multifunctional microfluidic devices Micro Total Analysis Systems - Proceedings of Microtas 2006 Conference: 10th International Conference On Miniaturized Systems For Chemistry and Life Sciences. 227-229.  0.76
2004 Stachowiak TB, Svec F, Fréchet JM. Chip electrochromatography. Journal of Chromatography. A. 1044: 97-111. PMID 15354431 DOI: 10.1016/j.chroma.2004.04.075  0.76
2003 Stachowiak TB, Rohr T, Hilder EF, Peterson DS, Yi M, Svec F, Fréchet JM. Fabrication of porous polymer monoliths covalently attached to the walls of channels in plastic microdevices. Electrophoresis. 24: 3689-93. PMID 14613194 DOI: 10.1002/elps.200305536  0.76
2002 Stewart MD, Becker DJ, Stachowiak TB, Schmid GM, Michaelson TB, Tran HV, Willson CG. Acid mobility in chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 4690: 943-951. DOI: 10.1117/12.474168  0.76
2002 Stewart MD, Tran HV, Schmid GM, Stachowiak TB, Becker DJ, Willson CG. Acid catalyst mobility in resist resins Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2946-2952. DOI: 10.1116/1.1523027  0.76
2001 Rathsack BM, Tattersall PI, Tabery CE, Lou K, Stachowiak TB, Medeiros DR, Albelo JA, Pirogovsky PY, McKean DR, Willson CG. The rational design of bleachable non-chemically amplified DUV photoactive compounds Proceedings of Spie - the International Society For Optical Engineering. 4345: 543-556. DOI: 10.1117/12.436887  0.76
2000 Rathsack BM, Tabery CE, Stachowiak TB, Albelo J, Willson CG. Simulation based formulation of a non-chemically amplified resist for 257 nm laser mask fabrication Proceedings of Spie - the International Society For Optical Engineering. 3999: I/-.  0.76
1999 Rathsack BM, Tabery CE, Stachowiak TB, Dallas T, Xu CB, Pochkowski M, Willson CG. Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator Proceedings of Spie - the International Society For Optical Engineering. 3873: 80-92.  0.76
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