C. Grant Willson, Ph.D. - Publications

Affiliations: 
1993- Chemical Engineering University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
Website:
https://www.cm.utexas.edu/grant_willson

109 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Doise J, Koh JH, Kim JY, Zhu Q, Kinoshita N, Suh HS, Rincondelgadillo P, Vandenberghe G, Willson CG, Ellison CJ. Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-Chi Block Copolymers. Acs Applied Materials & Interfaces. PMID 31752485 DOI: 10.1021/acsami.9b17858  0.68
2018 Sunday DF, Maher MJ, Hannon AF, Liman CD, Tein S, Blachut G, Asano Y, Ellison CJ, Willson CG, Kline RJ. Characterizing the Interface Scaling of High Block Copolymers near the Order-Disorder Transition. Macromolecules. 51: 173-180. PMID 29706666 DOI: 10.1021/acs.macromol.7b01982  0.68
2018 Parak WJ, Chan WWC, Chhowalla M, Farokhzad O, Glotzer S, Gogotsi Y, Hammond PT, Hersam MC, Javey A, Kagan CR, Kataoka K, Khademhosseini A, Kotov NA, Lee ST, Lee YH, ... ... Willson CG, et al. Helmuth Möhwald (1946-2018). Acs Nano. PMID 29676563 DOI: 10.1021/acsnano.8b02755  0.36
2017 Rebello N, Sethuraman V, Blachut G, Ellison CJ, Willson CG, Ganesan V. Influence of topographically patterned angled guidelines on directed self-assembly of block copolymers. Physical Review. E. 96: 052501. PMID 29347737 DOI: 10.1103/PhysRevE.96.052501  0.68
2017 Chan WWC, Chhowalla M, Farokhzad O, Glotzer S, Gogotsi Y, Hafner JH, Hammond PT, Hersam MC, Javey A, Kagan CR, Kataoka K, Khademhosseini A, Kotov NA, Lee ST, Li Y, ... ... Willson CG, et al. A Big Year Ahead for Nano in 2018. Acs Nano. 11: 11755-11757. PMID 29294604 DOI: 10.1021/acsnano.7b08851  0.36
2017 Chan WCW, Chhowalla M, Glotzer S, Gogotsi Y, Hafner JH, Hammond PT, Hersam MC, Javey A, Kagan CR, Kataoka K, Khademhosseini A, Kotov NA, Lee ST, Li Y, Möhwald H, ... ... Willson CG, et al. Our First and Next Decades at ACS Nano. Acs Nano. 11: 7553-7555. PMID 28830059 DOI: 10.1021/acsnano.7b05765  0.36
2017 Lane AP, Yang X, Maher MJ, Blachut G, Asano Y, Someya Y, Mallavarapu A, Sirard SM, Ellison CJ, Willson CG. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae. Acs Nano. PMID 28700207 DOI: 10.1021/acsnano.7b02698  0.68
2016 Chan WW, Chhowalla M, Glotzer S, Gogotsi Y, Hafner JH, Hammond PT, Hersam MC, Javey A, Kagan CR, Khademhosseini A, Kotov NA, Lee ST, Li Y, Möhwald H, Mulvaney PA, ... ... Willson CG, et al. Nanoscience and Nanotechnology Impacting Diverse Fields of Science, Engineering, and Medicine. Acs Nano. 10: 10615-10617. PMID 28024354 DOI: 10.1021/acsnano.6b08335  0.36
2016 Maher MJ, Self JL, Stasiak P, Blachut G, Ellison CJ, Matsen MW, Bates CM, Willson CG. Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films. Acs Nano. PMID 27787994 DOI: 10.1021/acsnano.6b05390  0.68
2016 Kagan CR, Fernandez LE, Gogotsi Y, Hammond PT, Hersam MC, Nel AE, Penner RM, Willson CG, Weiss PS. Nano Day: Celebrating the Next Decade of Nanoscience and Nanotechnology. Acs Nano. PMID 27712059 DOI: 10.1021/acsnano.6b06655  0.36
2016 Na SR, Wang X, Piner RD, Huang R, Willson CG, Liechti KM. Cracking of Polycrystalline Graphene on Copper Under Tension. Acs Nano. PMID 27652909 DOI: 10.1021/acsnano.6b05101  0.6
2016 Durand WJ, Carlson MC, Maher MJ, Blachut G, Santos LJ, Tein S, Ganesan V, Ellison CJ, Willson CG. Experimental and Modeling Study of Domain Orientation in Confined Block Copolymer Thin Films Macromolecules. 49: 308-316. DOI: 10.1021/acs.macromol.5b02262  0.88
2015 Chan WW, Glotzer S, Gogotsi Y, Hafner JH, Hammond PT, Hersam MC, Javey A, Kagan CR, Khademhosseini A, Kotov NA, Lee ST, Möhwald H, Mulvaney PA, Nel AE, Nordlander PJ, ... ... Willson CG, et al. Grand Plans for Nano. Acs Nano. 9: 11503-5. PMID 26689337 DOI: 10.1021/acsnano.5b07280  0.36
2015 Pandav G, Durand WJ, Ellison CJ, Willson CG, Ganesan V. Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes. Soft Matter. PMID 26411259 DOI: 10.1039/c5sm01951f  0.68
2015 Hayes CO, Bell WK, Cassidy BR, Willson CG. Synthesis and Characterization of a two stage, non-linear Photobase Generator. The Journal of Organic Chemistry. PMID 26153720 DOI: 10.1021/acs.joc.5b01078  0.88
2015 Cushen J, Wan L, Blachut G, Maher MJ, Albrecht TR, Ellison CJ, Willson CG, Ruiz R. Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST. Acs Applied Materials & Interfaces. 7: 13476-83. PMID 26004013 DOI: 10.1021/acsami.5b02481  0.88
2015 Maher MJ, Rettner CT, Bates CM, Blachut G, Carlson MC, Durand WJ, Ellison CJ, Sanders DP, Cheng JY, Willson CG. Directed self-assembly of silicon-containing block copolymer thin films. Acs Applied Materials & Interfaces. 7: 3323-8. PMID 25594107 DOI: 10.1021/am508197k  0.88
2015 Maher MJ, Bates CM, Durand WJ, Blachut G, Janes DW, Cheng JY, Sanders DP, Willson CG, Ellison CJ. Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly Journal of Photopolymer Science and Technology. 28: 611-615. DOI: 10.2494/photopolymer.28.611  0.88
2015 Hayes CO, Mueller BK, Liu P, Bell WK, Schwartz JM, Thedford RP, Kohl PA, Willson CG. Directly patternable benzocyclobutene and methacrylate silsesquioxanes for microelectronics packaging Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan. 123: 800-804. DOI: 10.2109/jcersj2.123.800  0.88
2015 Mueller BK, Schwartz JM, Sutlief AE, Bell WK, Hayes CO, Elce E, Willson CG, Kohl PA. Chemically amplified, positive tone, polynorbornene dielectric for microelectronics packaging Ecs Journal of Solid State Science and Technology. 4: N3001-N3007. DOI: 10.1149/2.0011501jss  0.88
2015 Dick AR, Bell WK, Luke B, Maines E, Mueller B, Kohl PA, Rawlings B, Willson CG. Directly patternable dielectric based on fluorinated polyimide Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085793  0.88
2015 Matsuzawa K, Mesch R, Olah M, Wang W, Phillips ST, Willson CG. Aromatizing unzipping polyester for EUV photoresist Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085780  0.88
2015 Durand WJ, Blachut G, Maher MJ, Sirard S, Tein S, Carlson MC, Asano Y, Zhou SX, Lane AP, Bates CM, Ellison CJ, Willson CG. Design of high-χ block copolymers for lithography Journal of Polymer Science, Part a: Polymer Chemistry. 53: 344-352. DOI: 10.1002/pola.27370  0.88
2014 Chan WC, Gogotsi Y, Hafner JH, Hammond PT, Hersam MC, Javey A, Kagan CR, Khademhosseini A, Kotov NA, Lee ST, Möhwald H, Mulvaney PA, Nel AE, Nordlander PJ, Parak WJ, ... ... Willson CG, et al. A year for nanoscience. Acs Nano. 8: 11901-3. PMID 25533169 DOI: 10.1021/nn5070716  0.88
2014 Deschner R, Tang H, Allen P, Hall C, Hlis R, Ellington A, Willson CG. Progress Report on the Generation of Polyfunctional Microscale Particles for Programmed Self-Assembly. Chemistry of Materials : a Publication of the American Chemical Society. 26: 1457-1462. PMID 24803723 DOI: 10.1021/cm403637v  0.88
2014 Zhai Y, Mathew L, Rao R, Sreenivasan SV, Willson CG, Banerjee SK. Vertical finFET with salicide contact for potential power applications Ecs Journal of Solid State Science and Technology. 3: Q203-Q206. DOI: 10.1149/2.0151410jss  0.88
2014 Ogawa T, Jacobsson BM, Deschner R, Bell W, Lin MW, Hagiwara Y, Takei S, Hanabata M, Willson CG. Planarizing material for reverse-tone step and flash imprint lithography Journal of Micro/Nanolithography, Mems, and Moems. 13. DOI: 10.1117/1.JMM.13.3.031302  0.88
2014 Cushen JD, Shanmuganathan K, Janes DW, Willson CG, Ellison CJ. Synthesis of amphiphilic naturally-derived oligosaccharide-block-wax oligomers and their self-assembly Acs Macro Letters. 3: 839-844. DOI: 10.1021/mz500389g  0.88
2014 Maher MJ, Bates CM, Blachut G, Carlson MC, Self JL, Janes DW, Durand WJ, Lane AP, Ellison CJ, Willson CG. Photopatternable interfaces for block copolymer lithography Acs Macro Letters. 3: 824-828. DOI: 10.1021/mz500370r  0.88
2014 Bates CM, Maher MJ, Janes DW, Ellison CJ, Willson CG. Block copolymer lithography Macromolecules. 47: 2-12. DOI: 10.1021/ma401762n  0.88
2014 Maher MJ, Bates CM, Blachut G, Sirard S, Self JL, Carlson MC, Dean LM, Cushen JD, Durand WJ, Hayes CO, Ellison CJ, Willson CG. Interfacial design for block copolymer thin films Chemistry of Materials. 26: 1471-1479. DOI: 10.1021/cm403813q  0.88
2014 Takei S, Ogawa T, Deschner R, Willson CG. Reduction of pattern peeling in step-and-flash imprint lithography Microelectronic Engineering. 116: 44-50. DOI: 10.1016/j.mee.2013.10.010  0.88
2014 Cushen JD, Wan L, Pandav G, Mitra I, Stein GE, Ganesan V, Ruiz R, Willson CG, Ellison CJ. Ordering poly(trimethylsilyl styrene-block- D,L -lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents Journal of Polymer Science, Part B: Polymer Physics. 52: 36-45. DOI: 10.1002/polb.23408  0.88
2014 Bell WK, Rawlings BM, Long BK, Webb RC, Keitz BK, Häußling L, Willson CG. Poling and crosslinking processes in NLO polymers Journal of Polymer Science, Part a: Polymer Chemistry. 52: 2769-2775. DOI: 10.1002/pola.27298  0.88
2013 Parak WJ, Chan WC, Hafner JH, Hammond PT, Hersam MC, Javey A, Khademhosseini A, Kotov NA, Mulvaney P, Nel AE, Nordlander PJ, Penner RM, Rogach AL, Schaak RE, Stevens MM, ... ... Willson CG, et al. Be critical but fair. Acs Nano. 7: 8313-6. PMID 24143923 DOI: 10.1021/nn405306e  0.88
2013 Kim S, Bates CM, Thio A, Cushen JD, Ellison CJ, Willson CG, Bates FS. Consequences of surface neutralization in diblock copolymer thin films. Acs Nano. 7: 9905-19. PMID 24131385 DOI: 10.1021/nn403616r  0.88
2013 DeKosky BJ, Ippolito GC, Deschner RP, Lavinder JJ, Wine Y, Rawlings BM, Varadarajan N, Giesecke C, Dörner T, Andrews SF, Wilson PC, Hunicke-Smith SP, Willson CG, Ellington AD, Georgiou G. High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire. Nature Biotechnology. 31: 166-9. PMID 23334449 DOI: 10.1038/nbt.2492  0.88
2013 Turro NJ, Li Y, Jockusch S, Hagiwara Y, Okazaki M, Mesch RA, Schuster DI, Willson CG. Study of a two-stage photobase generator for photolithography in microelectronics. The Journal of Organic Chemistry. 78: 1735-41. PMID 23106122 DOI: 10.1021/jo302149u  0.88
2013 Ellison CJ, Cushen JD, Willson CG. Thin film block copolymer assembly in mixtures of highly selective solvents Journal of Photopolymer Science and Technology. 26: 45-47. DOI: 10.2494/photopolymer.26.45  0.88
2013 Bates CM, Maher MJ, Thio A, Dean LM, Cushen JD, Durand WJ, Blachut G, Li L, Ellison CJ, Willson CG. Polarity-switching top coats for silicon-containing block copolymer orientation control Journal of Photopolymer Science and Technology. 26: 223-224. DOI: 10.2494/photopolymer.26.223  0.88
2013 Ogawa T, Hellebusch DJ, Lin MW, Jacobsson BM, Bell W, Willson CG. Reactive fluorinated surfactant for step and flash imprint lithography Journal of Micro/Nanolithography, Mems, and Moems. 12. DOI: 10.1117/1.JMM.12.3.031114  0.88
2013 Chan WCW, Gogotsi Y, Hafner JH, Hammond PT, Hersam MC, Javey A, Kagan CR, Khademhosseini A, Kotov NA, Möhwald H, Mulvaney PA, Nel AE, Nordlander PJ, Parak WJ, Penner RM, ... ... Willson CG, et al. Exciting Times for Nano Acs Nano. 7: 10437-10439. DOI: 10.1021/nn4064055  0.88
2013 Janes DW, Thode CJ, Willson CG, Nealey PF, Ellison CJ. Light-activated replication of block copolymer fingerprint patterns Macromolecules. 46: 4510-4519. DOI: 10.1021/ma400065t  0.88
2013 Bates CM, Pantoja MAB, Strahan JR, Dean LM, Mueller BK, Ellison CJ, Nealey PF, Willson CG. Synthesis and thin-film orientation of poly(styrene-block- trimethylsilylisoprene) Journal of Polymer Science, Part a: Polymer Chemistry. 51: 290-297. DOI: 10.1002/pola.26375  0.88
2012 Bonnell DA, Buriak JM, Chan WC, Hafner JH, Hammond PT, Hersam MC, Javey A, Kotov NA, Nel AE, Nordlander PJ, Parak WJ, Penner RM, Rogach AL, Schaak RE, Stevens MM, ... ... Willson CG, et al. We take it personally. Acs Nano. 6: 10417-9. PMID 23256549 DOI: 10.1021/nn305696y  0.88
2012 Bates CM, Seshimo T, Maher MJ, Durand WJ, Cushen JD, Dean LM, Blachut G, Ellison CJ, Willson CG. Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains. Science (New York, N.Y.). 338: 775-9. PMID 23139327 DOI: 10.1126/science.1226046  0.88
2012 Tang H, Deschner R, Allen P, Cho Y, Sermas P, Maurer A, Ellington AD, Willson CG. Analysis of DNA-guided self-assembly of microspheres using imaging flow cytometry. Journal of the American Chemical Society. 134: 15245-8. PMID 22938015 DOI: 10.1021/ja3066896  0.88
2012 Cushen JD, Otsuka I, Bates CM, Halila S, Fort S, Rochas C, Easley JA, Rausch EL, Thio A, Borsali R, Willson CG, Ellison CJ. Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications. Acs Nano. 6: 3424-33. PMID 22456229 DOI: 10.1021/nn300459r  0.88
2012 Bonnell DA, Hafner JH, Hersam MC, Kotov NA, Buriak JM, Hammond PT, Javey A, Nordlander P, Parak WJ, Schaak RE, Wee AT, Weiss PS, Rogach AL, Stevens MM, Willson CG. Recycling is not always good: the dangers of self-plagiarism. Acs Nano. 6: 1-4. PMID 22268423 DOI: 10.1021/nn3000912  0.88
2012 Cushen JD, Bates CM, Rausch EL, Dean LM, Zhou SX, Willson CG, Ellison CJ. Thin film self-assembly of poly(trimethylsilylstyrene-b-d, l-lactide) with sub-10 nm domains Macromolecules. 45: 8722-8728. DOI: 10.1021/ma301238j  0.88
2012 Zhai Y, Palard M, Mathew L, Hussain MM, Willson CG, Tutuc E, Banerjee SK. Fabrication of three-dimensional MIS nano-capacitor based on nano-imprinted single crystal silicon nanowire arrays Micro and Nanosystems. 4: 333-338.  0.88
2011 Bates CM, Strahan JR, Santos LJ, Mueller BK, Bamgbade BO, Lee JA, Katzenstein JM, Ellison CJ, Willson CG. Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin films. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 2000-6. PMID 21214210 DOI: 10.1021/la1042958  0.88
2011 Gu X, Cho Y, Kawakami T, Hagiwara Y, Rawlings B, Mesch R, Ogata T, Kim T, Seshimo T, Wang W, Sundaresan AK, Turro NJ, Gronheid R, Blackwell J, Bristol R, ... Willson CG, et al. Photobase generator enabled pitch division: A progress report Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879861  0.88
2011 Cho Y, Gu X, Hagiwara Y, Kawakami T, Ogata T, Rawlings B, Li Y, Sundaresan AK, Turro NJ, Bristol R, Blackwell JM, Willson CG. Polymer bound photobase generators and photoacid generators for pitch division lithography Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.879771  0.88
2011 Bruce RL, Weilnboeck F, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Alizadeh A. On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29. DOI: 10.1116/1.3607604  0.88
2011 Takei S, Ogawa T, Willson CG. Study of fluorinated silicon-based resist material and photoreactive underlayer for defect reduction in step and repeat ultraviolet nanoimprint lithography Micro and Nano Letters. 6: 422-424. DOI: 10.1049/mnl.2011.0213  0.88
2011 Tierney HL, Bonnell DA, Buriak JM, Hafner JH, Hammond PT, Hersam MC, Javey A, Kotov NA, Nordlander P, Parak WJ, Rogach AL, Schaak RE, Stevens MM, Wee ATS, Willson CG, et al. ACS nano in 2011 and looking forward to 2012 Acs Nano. 5: 9301-9302. DOI: 10.1021/nn204760v  0.88
2011 Bielawski CW, Willson CG. Polymers for Microelectronics Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications. 4: 2263-2293. DOI: 10.1002/9783527631421.ch54  0.88
2010 Gu X, Bates C, Cho Y, Costner E, Marzuka F, Nagai T, Ogata T, Shi C, Sundaresan AK, Turro NJ, Bristol R, Zimmerman P, Willson CG. A new materials-based pitch division technique Journal of Photopolymer Science and Technology. 22: 773-781. DOI: 10.2494/photopolymer.22.773  0.88
2010 Takei S, Ogawa T, Deschner R, Jen K, Nihira T, Hanabata M, Willson CG. Silicon-containing spin-on underlayer material for step and flash nanoimprint lithography Japanese Journal of Applied Physics. 49: 0752011-0752015. DOI: 10.1143/JJAP.49.075201  0.88
2010 Takei S, Ogawa T, Deschner R, Jen K, Hanabata M, Willson CG. Development of spin-on hard mask materials under resist in nano imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.853200  0.88
2010 Chauhan S, Somervell M, Carcasi M, Scheer S, Bonnecaze RT, Mack C, Willson CG. Particle generation during photoresist dissolution Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848424  0.88
2010 Carcasi M, Somervell M, Scheer S, Chauhan S, Strahan J, Willson CG. Extension of 248 nm Monte Carlo, mesoscale models to 193 nm platforms Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846658  0.88
2010 Gu X, Bates CM, Cho Y, Kawakami T, Nagai T, Ogata T, Sundaresan AK, Turro NJ, Bristol R, Zimmerman P, Willson CG. Photobase generator assisted pitch division Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.846395  0.88
2010 Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Bell W, Long B, Willson CG. Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 751-757. DOI: 10.1116/1.3455496  0.88
2010 Nest D, Chung TY, Végh JJ, Graves DB, Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS Journal of Physics D: Applied Physics. 43. DOI: 10.1088/0022-3727/43/8/085204  0.88
2010 Bruce RL, Weilnboeck F, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB. Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films Journal of Applied Physics. 107. DOI: 10.1063/1.3373587  0.88
2010 Takei S, Ogawa T, Deschner R, Hanabata M, Willson CG. Advanced step and flash nanoimprint lithography using UV-sensitive hard mask underlayer material Micro and Nano Letters. 5: 117-120. DOI: 10.1049/mnl.2010.0014  0.88
2010 Parak WJ, Weiss PS, Bonnell DA, Buriak JM, Hafner JH, Hammond PT, Hersam MC, Kotov NA, Schaak RE, Willson CG. Editorial: Virtual issue on nanotoxicology Acs Nano. 4: 5513-5514. DOI: 10.1021/nn1026406  0.88
2009 Costner EA, Long BK, Navar C, Jockusch S, Lei X, Zimmerman P, Campion A, Turro NJ, Willson CG. Fundamental optical properties of linear and cyclic alkanes: VUV absorbance and index of refraction. The Journal of Physical Chemistry. A. 113: 9337-47. PMID 19630422 DOI: 10.1021/jp903435c  0.48
2009 Zhang PL, Zhang XF, Wen TD, Xu LF, Shi LX, Webber SE, Willson CG, Dean K. Thin oxidation study with various thermodynamic parameters Ecs Transactions. 18: 575-580. DOI: 10.1149/1.3096504  0.88
2009 Costner EA, Lin MW, Jen WL, Willson CG. Nanoimprint lithography materials development for semiconductor device fabrication Annual Review of Materials Research. 39: 155-180. DOI: 10.1146/annurev-matsci-082908-145336  0.88
2009 Gronheid R, Fonseca C, Leeson MJ, Adams JR, Strahan JR, Willson CG, Smith BW. EUV resist requirements: Absorbance and acid yield Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814716  0.88
2009 Chauhan S, Somervell M, Scheer S, Mack C, Bonnecaze RT, Willson CG. Polymer dissolution model: An energy adaptation of the critical ionization theory Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814344  0.88
2009 Takei S, Lin MW, Yoon S, Ohashi T, Nakajima Y, Willson CG. Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.813530  0.88
2009 Strahan JR, Adams JR, Jen WL, Vanleenhove A, Neikirk CC, Rochelle T, Gronheid R, Willson CG. Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3274005  0.88
2009 Meiring JE, Lee S, Costner EA, Schmid MJ, Michaelson TB, Willson CG, Grayson SM. Pattern recognition of shape-encoded hydrogel biosensor arrays Optical Engineering. 48. DOI: 10.1117/1.3099722  0.88
2009 Lee S, Jen K, Willson CG, Byers J, Zimmerman P, Turro NJ. Materials modeling and development for use in double-exposure lithography applications Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3095589  0.88
2009 Chauhan S, Palmieri F, Bonnecaze RT, Willson CG. Feature filling modeling for step and flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 1926-1932. DOI: 10.1116/1.3147212  0.88
2009 Bruce RL, Engelmann S, Lin T, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, V́gh JJ, Nest D, Graves DB, Alizadeh A. Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 27: 1142-1155. DOI: 10.1116/1.3136864  0.88
2009 Chauhan S, Palmieri F, Bonnecaze RT, Willson CG. Pinning at template feature edges for step and flash imprint lithography Journal of Applied Physics. 106. DOI: 10.1063/1.3122599  0.88
2009 Weiss PS, Hammond PT, Bonnnell DA, Kotov NA, Buriak JM, Willson CG, Lewis PA. Editorial: Gaining strength, increasing our impact Acs Nano. 3: 3815-3816. DOI: 10.1021/nn901694k  0.88
2009 Takei S, Yoon S, Ohashi T, Horiguchi Y, Nakajima Y, Lin MW, Willson CG. Correlation between simulation and experiment using UV curable gap fill materials for global planarization International Journal of Nanoscience. 8: 103-106.  0.88
2008 Tao L, Ramachandran S, Nelson CT, Lin M, Overzet LJ, Goeckner M, Lee G, Willson CG, Wu W, Hu W. Durable diamond-like carbon templates for UV nanoimprint lithography. Nanotechnology. 19: 105302. PMID 21817695 DOI: 10.1088/0957-4484/19/10/105302  0.88
2008 Weiss PS, Bonnell DA, Hammond PT, Willson CG, Lewis PA. ACS Nano. Our paper anniversary. Acs Nano. 2: 1505-6. PMID 19206351 DOI: 10.1021/nn800484t  0.88
2008 Willson CG, Roman BJ. The future of lithography: SEMATECH Litho Forum 2008. Acs Nano. 2: 1323-8. PMID 19206298 DOI: 10.1021/nn800410c  0.88
2008 Lee S, Byers J, Jen K, Zimmerman P, Rice B, Turro NJ, Willson CG. An analysis of double exposure lithography options Proceedings of Spie - the International Society For Optical Engineering. 6924. DOI: 10.1117/12.773030  0.88
2008 Costner EA, Matsumoto K, Long BK, Taylor JC, Wojtczak W, Willson CG. New high index fluids: exploiting anomalous dispersion for immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772979  0.88
2008 Matsumoto K, Costner E, Nishimura I, Ueda M, Willson CG. High index resists for 193 nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772958  0.88
2008 Chao BH, Palmieri F, Jen WL, McMichael DH, Willson CG, Owens J, Berger R, Sotoodeh K, Wilks B, Pham J, Carpio R, LaBelle E, Wetzel J. Dual damascene BEOL processing using multilevel step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772908  0.88
2008 Lin MW, Hellebusch DJ, Wu K, Kim EK, Lu K, Tao L, Liechti KM, Ekerdt JG, Ho PS, Hu W, Willson CG. Interfacial adhesion studies for step and flash imprint lithography Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772797  0.88
2008 Nishimura I, Heath WH, Matsumoto K, Jen WL, Lee SS, Neikirk C, Shimokawa T, Ito K, Fujiwara K, Willson CG. Non-chemically amplified resists for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772646  0.88
2008 V́gh JJ, Nest D, Graves DB, Bruce R, Engelmann S, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar+ and Ar+ /radical chemistries Journal of Applied Physics. 104. DOI: 10.1063/1.2963708  0.88
2008 Matsumoto K, Costner EA, Nishimura I, Ueda M, Willson CG. High index resist for 193 nm immersion lithography Macromolecules. 41: 5674-5680. DOI: 10.1021/ma800295s  0.88
2008 O'Connor NA, Berro AJ, Lancaster JR, Xinyu G, Jockusch S, Nagai T, Ogata T, Lee S, Zimmerman P, Willson CG, Turro NJ. Toward the design of a sequential two photon photoacid generator for double exposure photolithography Chemistry of Materials. 20: 7374-7376. DOI: 10.1021/cm802343u  0.88
2007 Wu K, Wang X, Kim EK, Willson CG, Ekerdt JG. Experimental and theoretical investigation on surfactant segregation in imprint lithography. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 1166-70. PMID 17241028 DOI: 10.1021/la061736y  0.88
2006 Koh K, Liu G, Willson CG. Grafting and patterned grafting of block copolymer nanotubes onto inorganic substrates. Journal of the American Chemical Society. 128: 15921-7. PMID 17147405 DOI: 10.1021/ja066684d  0.88
2006 Dickey MD, Gupta S, Leach KA, Collister E, Willson CG, Russell TP. Novel 3-D structures in polymer films by coupling external and internal fields. Langmuir : the Acs Journal of Surfaces and Colloids. 22: 4315-8. PMID 16618181 DOI: 10.1021/la052954e  0.84
2006 Schmid MJ, Manthiram K, Grayson SM, Willson JC, Meiring JE, Bell KM, Ellington AD, Willson CG. Feature multiplexing--improving the efficiency of microarray devices. Angewandte Chemie (International Ed. in English). 45: 3338-41. PMID 16607663 DOI: 10.1002/anie.200502151  0.88
2006 Grayson SM, Long BK, Kusomoto S, Osborn BP, Callahan RP, Chambers CR, Willson CG. Synthesis and characterization of norbornanediol isomers and their fluorinated analogues. The Journal of Organic Chemistry. 71: 341-4. PMID 16388654 DOI: 10.1021/jo0513156  0.88
2005 Leach KA, Gupta S, Dickey MD, Willson CG, Russell TP. Electric field and dewetting induced hierarchical structure formation in polymer/polymer/air trilayers. Chaos (Woodbury, N.Y.). 15: 047506. PMID 16396599 DOI: 10.1063/1.2132248  0.88
2005 Wu K, Bailey TC, Willson CG, Ekerdt JG. Surface hydration and its effect on fluorinated SAM formation on SiO2 surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 21: 11795-801. PMID 16316116 DOI: 10.1021/la0516330  0.88
2005 Conley NR, Hung RJ, Willson CG. A new synthetic route to authentic N-substituted aminomaleimides. The Journal of Organic Chemistry. 70: 4553-5. PMID 15903346 DOI: 10.1021/jo048031q  0.88
2005 Gates BD, Xu Q, Stewart M, Ryan D, Willson CG, Whitesides GM. New approaches to nanofabrication: molding, printing, and other techniques. Chemical Reviews. 105: 1171-96. PMID 15826012 DOI: 10.1021/cr030076o  0.88
2002 Lin EK, Soles CL, Goldfarb DL, Trinque BC, Burns SD, Jones RL, Lenhart JL, Angelopoulos M, Willson CG, Satija SK, Wu WL. Direct measurement of the reaction front in chemically amplified photoresists. Science (New York, N.Y.). 297: 372-5. PMID 12130778 DOI: 10.1126/science.1072092  0.88
1977 Slama JT, Willson CG, Grimshaw CE, Rapoport H. Stereochemistry of the porphyrin-protein bond of cytochrome c. Stereochemical comparison of Rhodospirillum rubrum, yeast, and horse heart porphyrins c. Biochemistry. 16: 1750-4. PMID 192273  0.88
1976 Willson CG, Gilon C, Donzel B, Goodman M. Synthesis of pyroglutamyl-histidyl-thiazolidine-4-carboxamide, a biologically active analog of the thyrotropin releasing factor. Biopolymers. 15: 2317-22. PMID 825153 DOI: 10.1002/bip.1976.360151122  0.88
1975 Slama JT, Smith HW, Willson CG, Rapoport H. Porphyrin-protein bond of cytochrome C. Structure of porphyrin C. Journal of the American Chemical Society. 97: 6556-62. PMID 171295  0.88
1974 Jacobson SJ, Willson CG, Rapoport H. Mechanism of cystine racemization in strong acid. The Journal of Organic Chemistry. 39: 1074-7. PMID 4847772  0.6
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