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Wei-Liang Chen, Ph.D. - Publications

Affiliations: 
2013-2018 Chemical And Biomolecular Engineering Cornell University, Ithaca, NY, United States 
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Sheng W, Amin I, Neumann C, Dong R, Zhang T, Wegener E, Chen WL, Förster P, Tran HQ, Löffler M, Winter A, Rodriguez RD, Zschech E, Ober CK, Feng X, et al. Polymer Brushes on Hexagonal Boron Nitride. Small (Weinheim An Der Bergstrasse, Germany). e1805228. PMID 30932320 DOI: 10.1002/Smll.201805228  0.469
2019 Sheng W, Amin I, Neumann C, Dong R, Zhang T, Wegener E, Chen W, Förster P, Tran HQ, Löffler M, Winter A, Rodriguez RD, Zschech E, Ober CK, Feng X, et al. Polymer Brushes: Polymer Brushes on Hexagonal Boron Nitride (Small 19/2019) Small. 15: 1970099. DOI: 10.1002/Smll.201970099  0.465
2019 Menzel M, Chen W, Simancas K, Xu H, Prucker O, Ober CK, Rühe J. Entropic death of nonpatterned and nanopatterned polyelectrolyte brushes Journal of Polymer Science Part a: Polymer Chemistry. 57: 1283-1295. DOI: 10.1002/Pola.29384  0.451
2017 Liu HY, Chen WL, Ober CK, Daniel S. Biologically Complex Planar Cell Plasma Membranes Supported on Polyelectrolyte Cushions Enhance Transmembrane Protein Mobility and Retain Native Orientation. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29020444 DOI: 10.1021/Acs.Langmuir.7B02945  0.395
2017 Chen WL, Menzel M, Watanabe T, Prucker O, Rühe J, Ober CK. Reduced lateral confinement and its effect on stability in patterned strong polyelectrolyte brushes. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28266860 DOI: 10.1021/Acs.Langmuir.7B00165  0.465
2017 Ditter D, Chen W, Best A, Zappe H, Koynov K, Ober CK, Zentel R. MEMS analogous micro-patterning of thermotropic nematic liquid crystalline elastomer films using a fluorinated photoresist and a hard mask process Journal of Materials Chemistry C. 5: 12635-12644. DOI: 10.1039/C7Tc03958A  0.402
2017 Chen W, Menzel M, Prucker O, Wang E, Ober CK, Rühe J. Morphology of Nanostructured Polymer Brushes Dependent on Production and Treatment Macromolecules. 50: 4715-4724. DOI: 10.1021/Acs.Macromol.7B00714  0.475
2017 Chen W, Cordero R, Tran H, Ober CK. 50th Anniversary Perspective: Polymer Brushes: Novel Surfaces for Future Materials Macromolecules. 50: 4089-4113. DOI: 10.1021/Acs.Macromol.7B00450  0.48
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