| Year |
Citation |
Score |
| 2016 |
Stowers J, Anderson J, Cardineau B, Clark B, De Schepper P, Edson J, Greer M, Jiang K, Kocsis M, Meyers S, Telecky A, Grenville A, De Simone D, Gillijns W, Vandenberghe G. Metal oxide EUV photoresist performance for N7 relevant patterns and processes Proceedings of Spie - the International Society For Optical Engineering. 9779. DOI: 10.1117/12.2219527 |
0.616 |
|
| 2015 |
Jin Y, Li Q, Chen M, Li G, Zhao Y, Xiao X, Wang J, Jiang K, Fan S. Large area nanoscale metal meshes for use as transparent conductive layers. Nanoscale. PMID 26395496 DOI: 10.1039/c5nr04528b |
0.36 |
|
| 2015 |
Grenville A, Anderson JT, Clark BL, De Schepper P, Edson J, Greer M, Jiang K, Kocsis M, Meyers ST, Stowers JK, Telecky AJ, De Simone D, Vandenberghe G. Integrated fab process for metal oxide EUV photoresist Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2086006 |
0.624 |
|
| 2015 |
Anderson JT, Wang W, Jiang K, Gustafsson T, Xu C, Gafunkel EL, Keszler DA. Chemically amplified dehydration of thin oxide films Acs Sustainable Chemistry and Engineering. 3: 1081-1085. DOI: 10.1021/Sc500824A |
0.581 |
|
| 2013 |
Jiang K, Meyers ST, Anderson MD, Johnson DC, Keszler DA. Functional ultrathin films and nanolaminates from aqueous solutions Chemistry of Materials. 25: 210-214. DOI: 10.1021/Cm303268P |
0.741 |
|
| 2011 |
Jiang K, Anderson JT, Hoshino K, Li D, Wager JF, Keszler DA. Low-energy path to dense HfO2 thin films with aqueous precursor Chemistry of Materials. 23: 945-952. DOI: 10.1021/Cm102082J |
0.583 |
|
| 2009 |
Jiang K, Zakutayev A, Stowers J, Anderson MD, Tate J, McIntyre DH, Johnson DC, Keszler DA. Low-temperature, solution processing of TiO2 thin films and fabrication of multilayer dielectric optical elements Solid State Sciences. 11: 1692-1699. DOI: 10.1016/J.Solidstatesciences.2009.05.026 |
0.739 |
|
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