Year |
Citation |
Score |
2015 |
Mu Y, Jiao Y, Sampurno Y, Zhuang Y, Theng S, Philipossian A. Effect of temperature in titanium chemical mechanical planarization Japanese Journal of Applied Physics. 54. DOI: 10.7567/Jjap.54.076502 |
0.756 |
|
2015 |
Wu C, Sampurno Y, Liao X, Jiao Y, Theng S, Zhuang Y, Borucki L, Philipossian A. Pad surface thermal management during copper chemical mechanical planarization Ecs Journal of Solid State Science and Technology. 4: P206-P212. DOI: 10.1149/2.0101507Jss |
0.741 |
|
2013 |
Wu C, Zhuang Y, Liao X, Jiao Y, Sampurno YA, Theng S, Sun F, Naman A, Philipossian A. Aggressive diamond characterization and wear analysis during chemical mechanical planarization Ecs Journal of Solid State Science and Technology. 2. DOI: 10.1149/2.036301Jss |
0.73 |
|
2012 |
Jiao Y, Zhuang Y, Wei X, Sampurno Y, Meled A, Theng S, Cheng J, Hooper D, Moinpour M, Philipossiana A. Pad wear analysis during interlayer dielectric chemical mechanical planarization Ecs Journal of Solid State Science and Technology. 1. DOI: 10.1149/2.022205Jss |
0.689 |
|
2011 |
Jiao Y, Sampurno YA, Zhuang Y, Wei X, Meled A, Philipossian A. Tribological, thermal, and kinetic characterization of 300-mm copper chemical mechanical planarization process Japanese Journal of Applied Physics. 50. DOI: 10.1143/Jjap.50.05Ec02 |
0.675 |
|
2011 |
Meled A, Zhuang Y, Sampurno YA, Theng S, Jiao Y, Borucki L, Philipossian A. Analysis of a novel slurry injection system in chemical mechanical planarization Japanese Journal of Applied Physics. 50. DOI: 10.1143/Jjap.50.05Ec01 |
0.673 |
|
2010 |
Jiao Y, Zhuang Y, Han Z, Liao X, Sampuno YA, Naman A, Philipossian A. Effect of temperature on pad surface contact area in chemical mechanical planarization Advanced Metallization Conference (Amc). 286-287. DOI: 10.1149/2.016202Ssl |
0.67 |
|
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