Timothy Grotjohn
Affiliations: | Electrical Engineering - Doctor of Philosophy | Michigan State University, East Lansing, MI |
Area:
Electronics and Electrical Engineering, Computer EngineeringGoogle:
"Timothy Grotjohn"Children
Sign in to add traineeDavid Story | grad student | 2006 | Michigan State |
John D. Lekki | grad student | 2008 | Michigan State |
Stanley S. Zuo | grad student | 2009 | Michigan State |
Jeffri J. Narendra | grad student | 2010 | Michigan State |
Dzung T. Tran | grad student | 2010 | Michigan State |
Thamira Hindo | grad student | 2014 | Michigan State |
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Publications
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Demlow SN, Rechenberg R, Grotjohn T. (2014) The effect of substrate temperature and growth rate on the doping efficiency of single crystal boron doped diamond Diamond and Related Materials. 49: 19-24 |
Gu Y, Lu J, Grotjohn T, et al. (2012) Microwave plasma reactor design for high pressure and high power density diamond synthesis Diamond and Related Materials. 24: 210-214 |
Rao X, Hammack S, Carter C, et al. (2011) Microwave-plasma-coupled re-ignition of methane-and-oxygen mixture under auto-ignition temperature Ieee Transactions On Plasma Science. 39: 3307-3313 |
Ramamurti R, Becker M, Schuelke T, et al. (2008) Synthesis of boron-doped homoepitaxial single crystal diamond by microwave plasma chemical vapor deposition Diamond and Related Materials. 17: 1320-1323 |
Ramamurti R, Becker M, Schuelke T, et al. (2008) Boron doped diamond deposited by microwave plasma-assisted CVD at low and high pressures Diamond and Related Materials. 17: 481-485 |
Grotjohn T, Liske R, Hassouni K, et al. (2005) Scaling behavior of microwave reactors and discharge size for diamond deposition Diamond and Related Materials. 14: 288-291 |
Salam FM, Piwek C, Erten G, et al. (1997) Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks Ieee Transactions On Control Systems Technology. 5: 598-613 |
Srivastava AK, Dahimene M, Grotjohn T, et al. (1992) Experimental characterization of a compact ECR ion source Review of Scientific Instruments. 63: 2556-2558 |