Javier Garcia-Frias
Affiliations: | University of Delaware, Newark, DE, United States |
Area:
Electronics and Electrical Engineering, Information Science, Computer ScienceGoogle:
"Javier Garcia-Frias"Children
Sign in to add traineeYujing Zeng | grad student | 2005 | University of Delaware |
Hanqing Lou | grad student | 2006 | University of Delaware |
Jose I. Esnaola | grad student | 2011 | University of Delaware |
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Publications
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Hassanin M, Garcia-Frias J. (2020) Analog Mappings for Non-Linear Channels With Applications to Underwater Channels Ieee Transactions On Communications. 68: 445-455 |
Fuentes P, Martinez JE, Crespo PM, et al. (2020) Approach for the construction of non-Calderbank-Steane-Shor low-density-generator-matrix–based quantum codes Physical Review A. 102 |
Etxezarreta Martinez J, Crespo PM, Garcia-Frías J. (2019) On the Performance of Interleavers for Quantum Turbo Codes. Entropy (Basel, Switzerland). 21 |
Granada I, Crespo PM, Garcia-Frías J. (2019) Combining the Burrows-Wheeler Transform and RCM-LDGM Codes for the Transmission of Sources with Memory at High Spectral Efficiencies. Entropy (Basel, Switzerland). 21 |
Martinez JE, Crespo PM, Garcia-Frías J. (2019) Depolarizing Channel Mismatch and Estimation Protocols for Quantum Turbo Codes Entropy. 21: 1133 |
Etxezarreta Martinez J, Crespo PM, Garcia-Frías J. (2019) On the Performance of Interleavers for Quantum Turbo Codes Entropy. 21: 633 |
Granada I, Crespo P, Garcia-Frías J. (2019) Combining the Burrows-Wheeler Transform and RCM-LDGM Codes for the Transmission of Sources with Memory at High Spectral Efficiencies Entropy. 21: 378 |
Granada I, Crespo PM, Garcia-Frías J. (2019) Asymptotic BER EXIT chart analysis for high rate codes based on the parallel concatenation of analog RCM and digital LDGM codes Eurasip Journal On Wireless Communications and Networking. 2019 |
Wang Z, Ma X, Arce GR, et al. (2018) Information theoretical approaches in computational lithography. Optics Express. 26: 16736-16751 |
Ma X, Zhang H, Wang Z, et al. (2017) Information theoretical aspects in coherent optical lithography systems Optics Express. 25: 29043 |