Lei Zhuge, Ph.D.

2002 University of Southern California, Los Angeles, CA, United States 
Electronics and Electrical Engineering
"Lei Zhuge"


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Victor O. K. Li grad student 2002 USC
 (Admission control and burst scheduling in multiservice cellular CDMA systems.)
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Zhang HY, He HJ, Zhang Z, et al. (2015) Structure, optical properties and thermal stability of HfErO films deposited by simultaneous RF and VHF magnetron sputtering Applied Physics a: Materials Science and Processing. 119: 517-524
Wu M, Huang T, Jin C, et al. (2014) Effect of multiple frequency H2/ar plasma treatment on the optical, electrical, and structural properties of AZO films Ieee Transactions On Plasma Science. 42: 3687-3690
Zhang HY, Yang XM, Yu T, et al. (2013) Role of high-frequency power in C4F8 dual-frequency capacitively coupled plasmas treating high-k HfO2 films Journal of Physics D: Applied Physics. 46
Yu T, Jin CG, Zhang HY, et al. (2013) Effect of Ta incorporation on the microstructure, electrical and optical properties of Hf1-xTaxO high-k film prepared by dual ion beam sputtering deposition Vacuum. 92: 58-64
Wang F, Wu MZ, Wang YY, et al. (2013) Influence of thickness and annealing temperature on the electrical, optical and structural properties of AZO thin films Vacuum. 89: 127-131
Zhou F, Wang Q, Yue B, et al. (2013) Mechanical properties and bonding structure of boron carbon nitride films synthesized by dual ion beam sputtering Materials Chemistry and Physics. 138: 215-224
Jin CG, Yu T, Bo Y, et al. (2012) Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition Vacuum. 86: 1078-1082
Jin C, Yu T, Wu Z, et al. (2012) Effect of low energy ion bombardment on structure and photoluminescence characterization of Al-doped ZnO thin films Thin Solid Films. 524: 39-43
Yu T, Jin C, Yang X, et al. (2012) The structure and electrical properties of HfTaON high-k films prepared by DIBSD Applied Surface Science. 258: 2953-2958
Jin CG, Yu T, Zhao Y, et al. (2011) Room temperature deposition of amorphous SiC thin films using low energy ion bombardment Physica E: Low-Dimensional Systems and Nanostructures. 43: 1863-1866
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