| Year |
Citation |
Score |
| 2017 |
Chen Y, Wood O, Rankin J, Gullikson E, Meyer-Ilse J, Sun L, Qi ZJ, Goodwin F, Kye J. Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy Proceedings of Spie. 10143. DOI: 10.1117/12.2258121 |
0.325 |
|
| 2017 |
Chen Y, Sun L, Qi ZJ, Zhao S, Goodwin F, Matthew I, Plachecki V. Tip-to-tip variation mitigation in extreme ultraviolet lithography for 7 nm and beyond metallization layers and design rule analysis Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35. DOI: 10.1116/1.4994908 |
0.308 |
|
| 2016 |
Hay D, Bagge P, Khaw I, Sun L, Wood O, Chen Y, Kim RH, Qi ZJ, Shi Z. Thin absorber extreme ultraviolet photomask based on Ni-TaN nanocomposite material. Optics Letters. 41: 3791-4. PMID 27519090 DOI: 10.1364/Ol.41.003791 |
0.327 |
|
| 2016 |
Rodríguez-Manzo JA, Qi ZJ, Crook A, Ahn JH, Johnson AT, Drndic M. In Situ Transmission Electron Microscopy Modulation of Transport in Graphene Nanoribbons. Acs Nano. PMID 27010816 DOI: 10.1021/Acsnano.6B01419 |
0.534 |
|
| 2016 |
Qi ZJ, Rankin JH, Lawliss M, Badger KD, Turley C. Toward defect-free fabrication of extreme ultraviolet photomasks Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.2.023502 |
0.377 |
|
| 2016 |
Qi ZJ, Rankin J, Narita E, Kagawa M. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.2.021005 |
0.361 |
|
| 2016 |
Seki K, Isogawa T, Kagawa M, Akima S, Kodera Y, Badger K, Qi ZJ, Lawliss M, Rankin J, Bonam R. Printability of buried extreme ultraviolet lithography photomask defects Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.2.021004 |
0.333 |
|
| 2015 |
Qi ZJ, Daniels C, Hong SJ, Park YW, Meunier V, Drndi? M, Johnson AT. Electronic transport of recrystallized freestanding graphene nanoribbons. Acs Nano. 9: 3510-20. PMID 25738404 DOI: 10.1021/Nn507452G |
0.546 |
|
| 2015 |
Qi ZJ, Hong SJ, Rodríguez-Manzo JA, Kybert NJ, Gudibande R, Drndi? M, Park YW, Johnson AT. Electronic transport in heterostructures of chemical vapor deposited graphene and hexagonal boron nitride. Small (Weinheim An Der Bergstrasse, Germany). 11: 1402-8. PMID 25367876 DOI: 10.1002/Smll.201402543 |
0.546 |
|
| 2015 |
Rodriguez-Manzo JA, Qi ZJ, Puster M, Balan A, Johnson ATC, Drndic M. Fabrication and Simultaneous Electrical Measurement of Graphene Nanoribbon Devices Inside a S/TEM Microscopy and Microanalysis. 21: 1155-1156. DOI: 10.1017/S143192761500656X |
0.457 |
|
| 2014 |
Qi ZJ, Rodríguez-Manzo JA, Botello-Méndez AR, Hong SJ, Stach EA, Park YW, Charlier JC, Drndi? M, Johnson AT. Correlating atomic structure and transport in suspended graphene nanoribbons. Nano Letters. 14: 4238-44. PMID 24954396 DOI: 10.1021/Nl501872X |
0.526 |
|
| 2013 |
Han GH, Rodríguez-Manzo JA, Lee CW, Kybert NJ, Lerner MB, Qi ZJ, Dattoli EN, Rappe AM, Drndic M, Johnson AT. Continuous growth of hexagonal graphene and boron nitride in-plane heterostructures by atmospheric pressure chemical vapor deposition. Acs Nano. 7: 10129-38. PMID 24182310 DOI: 10.1021/Nn404331F |
0.56 |
|
| 2013 |
Qi ZJ, Rodríguez-Manzo JA, Hong SJ, Park YW, Stach EA, Drndić M, Johnson ATC. Direct electron beam patterning of sub-5nm monolayer graphene interconnects Proceedings of Spie. 8680. DOI: 10.1117/12.2013724 |
0.544 |
|
| 2013 |
Badger KD, Qi ZJ, Gallagher EE, Seki K, McIntyre GR. Illuminating extreme ultraviolet lithography mask defect printability Journal of Micro-Nanolithography Mems and Moems. 12: 21004-21004. DOI: 10.1117/1.Jmm.12.2.021004 |
0.333 |
|
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