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Wanxue Zeng, Ph.D. - Publications

Affiliations: 
2004 State University of New York, Albany, Albany, NY, United States 
Area:
Materials Science Engineering, Chemical Engineering
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3 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2008 Consiglio S, Zeng W, Berliner N, Eisenbraun ET. Plasma-assisted atomic layer deposition of conductive hafnium nitride using tetrakis(ethylmethylamino)hafnium for CMOS gate electrode applications Journal of the Electrochemical Society. 155. DOI: 10.1149/1.2827995  0.309
2004 Zeng W, Eisenbraun E, Frisch H, Sullivan JJ, Kaloyeros AE, Margalit J, Beck K. CVD of tantalum oxide dielectric thin films for nanoscale device applications Journal of the Electrochemical Society. 151. DOI: 10.1149/1.1766312  0.516
2000 Eisenbraun E, Upham A, Dash R, Zeng W, Hoefnagels J, Lane S, Anjum D, Dovidenko K, Kaloyeros A, Arkles B, Sullivan JJ. Low temperature inorganic chemical vapor deposition of Ti-Si-N diffusion barrier liners for gigascale copper interconnect applications Journal of Vacuum Science & Technology B. 18: 2011-2015. DOI: 10.1116/1.1306304  0.568
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