Koji Sugisaki, Ph.D.

Linguistics Mie University, Tsu-shi, Mie-ken, Japan 
Child Language Acquisition
"Koji Sugisaki"
Cross-listing: LinguisTree


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William Snyder grad student 1998-2003 University of Connecticut
 (Innate constraints on language variation: Evidence from child language.)
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Otaki K, Kohara N, Sugisaki K, et al. (2014) Ultra high-precision wavefront metrology using EUV low brightness source Fringe 2013 - 7th International Workshop On Advanced Optical Imaging and Metrology. 385-392
Odate S, Koike C, Toba H, et al. (2011) Angular spectrum calculations for arbitrary focal length with a scaled convolution. Optics Express. 19: 14268-76
Zhu Y, Odate S, Sugaya A, et al. (2011) Method for designing phase-calculation algorithms for two-dimensional grating phase-shifting interferometry. Applied Optics. 50: 2815-22
Sugisaki K, Okada M, Otaki K, et al. (2008) EUV wavefront measurement of six-mirror optic using EWMS Proceedings of Spie - the International Society For Optical Engineering. 6921
Zhu Y, Sugisaki K, Okada M, et al. (2007) Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Applied Optics. 46: 6783-92
Sugisaki K, Snyder W. (2005) The parameter of preposition stranding: A view from child English Language Acquisition. 13: 349-361
Sugisaki K, Okada M, Zhu Y, et al. (2005) Comparisons between EUV at-wavelength metrological methods Proceedings of Spie - the International Society For Optical Engineering. 5921: 1-8
Zhu Y, Sugisaki K, Okada M, et al. (2005) Experimental comparison of absolute PDI and lateral shearing interferometer Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5752: 1192-1199
Hasegawa M, Ouchi C, Hasegawa T, et al. (2004) Recent progress of EUV wavefront metrology in EUVA Proceedings of Spie - the International Society For Optical Engineering. 5533: 27-36
Sekine Y, Suzuki A, Hasegawa M, et al. (2004) Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 104-108
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