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Kazutoshi Takenoshita, Ph.D. - Publications

Affiliations: 
2006 University of Central Florida, Orlando, FL, United States 
Area:
Fluid and Plasma Physics, Electronics and Electrical Engineering
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27 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2008 Hou KC, George S, Mordovanakis AG, Takenoshita K, Nees J, Lafontaine B, Richardson M, Galvanauskas A. High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets. Optics Express. 16: 965-74. PMID 18542171 DOI: 10.1364/Oe.16.000965  0.775
2008 Kamtaprasad RD, Bernath RT, Takenoshita K, George S, Richardson MC. EUV spectroscopy of tin-doped laser plasma source Frontiers in Optics. DOI: 10.1364/Fio.2008.Fwu4  0.827
2008 Kamtaprasad R, Bernath R, Takenoshita K, George S, Richardson M. EUV spectroscopy of tin-doped laser plasma source Optics Infobase Conference Papers.  0.832
2007 George SA, Hou KC, Takenoshita K, Galvanauskas A, Richardson MC. 13.5 nm EUV generation from tin-doped droplets using a fiber laser. Optics Express. 15: 16348-56. PMID 19550925 DOI: 10.1364/Oe.15.016348  0.806
2007 George SA, Silfvast WT, Takenoshita K, Bernath RT, Koay CS, Shimkaveg G, Richardson MC. Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas. Optics Letters. 32: 997-9. PMID 17375180 DOI: 10.1364/Ol.32.000997  0.822
2007 Richardson MC, Takenoshita K, Schmid T. Tin inventory for HVM EUVL sources Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.713463  0.658
2007 Takenoshita K, George SA, Schmid T, Koay CS, Cunado J, Bernath R, Brown C, Al-Rabban MM, Silfvast WT, Richardson MC. Characterization of the tin-doped droplet laser plasma EUVL sources for HVM Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.713461  0.832
2007 Schmid T, George SA, Cunado J, Teerawattanasook S, Bernath R, Brown C, Takenoshita K, Koay CS, Richardson M. High repetition-rate LPP-source facility for EUVL Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.713457  0.825
2007 Takenoshita K, Schmid T, George SA, Cunado J, Richardson MC, Fulford B, Hendarson I, Hay N, Ellwi S. High power EUVL source demonstration of tin-doped droplet laser plasma generated by industrial solid state lasers Optics Infobase Conference Papers. DOI: 10.1109/QELS.2007.4431518  0.775
2007 Cunado J, Takenoshita K, George SA, Schmid T, Bernath R, Brown C, Duncan J, Richardson MC. Stabilized droplet target delivery for high power EUV generation for lithography Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-Leos. 484-485. DOI: 10.1109/LEOS.2007.4382490  0.749
2007 Takenoshita K, Schmid T, George SA, Cunado J, Richardson MC, Fulford B, Hendarson I, Hay N, Ellwi S. High power EUVL source demonstration of tin-doped droplet laser plasma generated by industrial solid state lasers Conference On Lasers and Electro-Optics, 2007, Cleo 2007. DOI: 10.1109/CLEO.2007.4453741  0.767
2006 Richardson M, Koay CS, Takenoshita K, Keyser C, George S, Al-Rabban M, Bakshi V. Laser plasma EUV sources based on droplet target technology Euv Sources For Lithography. 687-718. DOI: 10.1117/3.613774.Ch26  0.819
2006 George SA, Silfvast W, Takenoshita K, Bemath R, Koay CS, Shimkaveg G, Richardson M, Al-Rabban M, Scott H. EUV generation from lithium laser plasma for lithography Proceedings of Spie - the International Society For Optical Engineering. 6151. DOI: 10.1117/12.660584  0.816
2005 Richardson M, Koay CS, Takenoshita K, Keyser C, Bernath R, George S, Teerawattansook S. Diagnostics for laser plasma EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5580: 434-442. DOI: 10.1117/12.597349  0.829
2005 George S, Koay CS, Takenoshita K, Bernath R, Al-Rabban M, Keyser C, Bakshi V, Scott H, Richardson M. EUV spectroscopy of mass-limited Sn-doped laser microplasmas Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 779-788. DOI: 10.1117/12.596781  0.815
2005 Takenoshita K, Koay CS, Teerawattansook S, Richardson M, Bakshi V. Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 563-571. DOI: 10.1117/12.596764  0.656
2005 Koay CS, George S, Takenoshita K, Bernath R, Fujiwara E, Richardson M, Bakshi V. High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 279-292. DOI: 10.1117/12.596753  0.847
2005 Takenoshita K, Koay CS, George S, Teerawattansook S, Richardson M, Bakshi V. Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2879-2884. DOI: 10.1116/1.2131879  0.77
2005 Richardson M, Koay CS, Takenoshita K, George S, Bernath R, Al-Rabban MM, Bakshi V. Efficient 13.5 nm EUV generation from a laser plasma Quantum Electronics and Laser Science Conference (Qels). 3: 1947-1949.  0.844
2004 Richardson M, Koay CS, Takenoshita K, Keyser C, George S, Teerawattansook S, Al-Rabban M, Scott H. Laser plasma EUVL sources - Progress and challenges Proceedings of Spie - the International Society For Optical Engineering. 5374: 447-453. DOI: 10.1117/12.541586  0.827
2004 Koay CS, Takenoshita K, Fujiwara E, Al-Rabban M, Richardson M. Spectroscopic studies of the Sn-based droplet laser plasma EUV source Proceedings of Spie - the International Society For Optical Engineering. 5374: 964-970. DOI: 10.1117/12.541575  0.814
2004 Takenoshita K, Koay CS, Teerawattanasook S, Richardson M. Debris studies for the tin-based droplet laser-plasma EUV source Proceedings of Spie - the International Society For Optical Engineering. 5374: 954-963. DOI: 10.1117/12.541533  0.784
2004 Richardson M, Koay CS, Keyser C, Takenoshita K, Fujiwara E, Al-Rabban M. High efficiency tin-based EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5196: 119-127. DOI: 10.1117/12.514083  0.714
2004 Richardson M, Koay CS, Takenoshita K, Keyser C, Al-Rabban M. High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 785-790.  0.841
2003 Koay CS, Keyser C, Takenoshita K, Fujiwara E, Al-Rabban M, Richardson MC, Turcu ICE, Rieger H, Stone A, Morris JH. High conversion efficiency tin material laser plasma source for EUVL Proceedings of Spie - the International Society For Optical Engineering. 5037: 801-806. DOI: 10.1117/12.504572  0.845
2003 Takenoshita K, Koay CS, Richardson M, Turcu ICE. The repeller field debris mitigation approach for EUV sources Proceedings of Spie - the International Society For Optical Engineering. 5037: 792-800. DOI: 10.1117/12.504570  0.65
2003 Keyser C, Koay CS, Takenoshita K, Richardson M, Al-Rabban M, Turcu E. High conversion efficiency mass-limited laser plasma source for EUV lithography Osa Trends in Optics and Photonics Series. 88: 1988-1991.  0.841
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