Ting-Ying Chung, Ph.D. - Publications
Affiliations: | 2012 | Chemical Engineering | University of California, Berkeley, Berkeley, CA, United States |
Year | Citation | Score | |||
---|---|---|---|---|---|
2016 | Chang YY, Glorieux B, Hsu CH, Sun CC, Yu LZ, Yang TH, Chung TY. Influence of ZrO2 particles on the optical properties of pc-LEDs Optical Materials. 55: 55-61. DOI: 10.1016/j.optmat.2016.03.025 | 0.349 | |||
2015 | Wei R, Zhang S, Cui Y, Ong RC, Chung TS, Helmer BJ, de Wit JS. Highly permeable forward osmosis (FO) membranes for high osmotic pressure but viscous draw solutes Journal of Membrane Science. 496: 132-141. DOI: 10.1016/j.memsci.2015.08.054 | 0.522 | |||
2013 | Chung TY, Ning N, Chu JW, Graves DB, Bartis E, Joonil Seog, Oehrlein GS. Plasma deactivation of endotoxic biomolecules: Vacuum ultraviolet photon and radical beam effects on lipid A Plasma Processes and Polymers. 10: 167-180. DOI: 10.1002/Ppap.201200087 | 0.535 | |||
2011 | Chung TY, Graves DB, Weilnboeck F, Bruce RL, Oehrlein GS, Li M, Hudson EA. Ion and vacuum ultraviolet photon beam effects in 193nm photoresist surface roughening: The role of the adamantyl pendant group Plasma Processes and Polymers. 8: 1068-1079. DOI: 10.1002/Ppap.201100071 | 0.584 | |||
2009 | Nest D, Chung TY, Graves DB, Engelmann S, Bruce RL, Weilnboeck F, Oehrlein GS, Wang D, Andes C, Hudson EA. Understanding the roughening and degradation of 193 nm photoresist during plasma processing: synergistic roles of vacuum ultraviolet radiation and ion bombardment Plasma Processes and Polymers. 6: 649-657. DOI: 10.1002/Ppap.200900039 | 0.533 | |||
Show low-probability matches. |