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Costas J. Spanos - Publications

Affiliations: 
Electrical Engineering and Computer Science University of California, Berkeley, Berkeley, CA, United States 
Area:
Energy (ENE); Integrated Circuits (INC); Physical Electronics (PHY); Semiconductor manufacturing; Solid-State Devices
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97 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Jain P, Poon J, Singh JP, Spanos C, Sanders SR, Panda SK. A Digital Twin Approach for Fault Diagnosis in Distributed Photovoltaic Systems Ieee Transactions On Power Electronics. 35: 940-956. DOI: 10.1109/Tpel.2019.2911594  0.308
2020 Li D, Zhou Y, Hu G, Spanos CJ. Handling Incomplete Sensor Measurements in Fault Detection and Diagnosis for Building HVAC Systems Ieee Transactions On Automation Science and Engineering. 17: 833-846. DOI: 10.1109/Tase.2019.2948101  0.638
2020 Zou H, Chen C, Li M, Yang J, Zhou Y, Xie L, Spanos CJ. Adversarial Learning-Enabled Automatic WiFi Indoor Radio Map Construction and Adaptation With Mobile Robot Ieee Internet of Things Journal. 7: 6946-6954. DOI: 10.1109/Jiot.2020.2979413  0.639
2020 Tekler ZD, Low R, Zhou Y, Yuen C, Blessing L, Spanos C. Near-real-time plug load identification using low-frequency power data in office spaces: Experiments and applications Applied Energy. 275: 115391. DOI: 10.1016/J.Apenergy.2020.115391  0.314
2019 Zhou Y, Arghandeh R, Zou H, Spanos CJ. Nonparametric Event Detection in Multiple Time Series for Power Distribution Networks Ieee Transactions On Industrial Electronics. 66: 1619-1628. DOI: 10.1109/Tie.2018.2840508  0.667
2019 Li D, Zhou Y, Hu G, Spanos CJ. Identifying Unseen Faults for Smart Buildings by Incorporating Expert Knowledge With Data Ieee Transactions On Automation Science and Engineering. 16: 1412-1425. DOI: 10.1109/Tase.2018.2876611  0.612
2019 Zou H, Zhou Y, Arghandeh R, Spanos CJ. Multiple Kernel Semi-Representation Learning With Its Application to Device-Free Human Activity Recognition Ieee Internet of Things Journal. 6: 7670-7680. DOI: 10.1109/Jiot.2019.2901927  0.648
2019 Zou H, Zhou Y, Yang J, Spanos CJ. Unsupervised WiFi-Enabled IoT Device-User Association for Personalized Location-Based Service Ieee Internet of Things Journal. 6: 1238-1245. DOI: 10.1109/Jiot.2018.2868648  0.617
2019 Liu S, Schiavon S, Das HP, Jin M, Spanos CJ. Personal thermal comfort models with wearable sensors Building and Environment. 162: 106281. DOI: 10.1016/J.Buildenv.2019.106281  0.556
2019 Konstantakopoulos IC, Barkan AR, He S, Veeravalli T, Liu H, Spanos C. A deep learning and gamification approach to improving human-building interaction and energy efficiency in smart infrastructure Applied Energy. 237: 810-821. DOI: 10.1016/J.Apenergy.2018.12.065  0.32
2018 Weekly K, Jin M, Zou H, Hsu C, Soyza C, Bayen A, Spanos C. Building-in-Briefcase: A Rapidly-Deployable Environmental Sensor Suite for the Smart Building. Sensors (Basel, Switzerland). 18. PMID 29710839 DOI: 10.3390/S18051381  0.305
2018 Zhou Y, Arghandeh R, Spanos CJ. Partial Knowledge Data-Driven Event Detection for Power Distribution Networks Ieee Transactions On Smart Grid. 9: 5152-5162. DOI: 10.1109/Tsg.2017.2681962  0.637
2018 Konstantakopoulos IC, Ratliff LJ, Jin M, Sastry SS, Spanos CJ. A Robust Utility Learning Framework via Inverse Optimization Ieee Transactions On Control Systems and Technology. 26: 954-970. DOI: 10.1109/Tcst.2017.2699163  0.303
2018 Jin M, Bekiaris-Liberis N, Weekly K, Spanos CJ, Bayen AM. Occupancy Detection via Environmental Sensing Ieee Transactions On Automation Science and Engineering. 15: 443-455. DOI: 10.1109/Tase.2016.2619720  0.353
2018 Zou H, Zhou Y, Yang J, Spanos CJ. Towards occupant activity driven smart buildings via WiFi-enabled IoT devices and deep learning Energy and Buildings. 177: 12-22. DOI: 10.1016/J.Enbuild.2018.08.010  0.658
2018 Zou H, Zhou Y, Yang J, Spanos CJ. Device-free occupancy detection and crowd counting in smart buildings with WiFi-enabled IoT Energy and Buildings. 174: 309-322. DOI: 10.1016/J.Enbuild.2018.06.040  0.663
2018 Zou H, Zhou Y, Jiang H, Chien S, Xie L, Spanos CJ. WinLight: A WiFi-based occupancy-driven lighting control system for smart building Energy and Buildings. 158: 924-938. DOI: 10.1016/J.Enbuild.2017.09.001  0.625
2018 Kandasamy NK, Karunagaran G, Spanos C, Tseng KJ, Soong B. Smart lighting system using ANN-IMC for personalized lighting control and daylight harvesting Building and Environment. 139: 170-180. DOI: 10.1016/J.Buildenv.2018.05.005  0.315
2018 Jin M, Liu S, Schiavon S, Spanos C. Automated mobile sensing: Towards high-granularity agile indoor environmental quality monitoring Building and Environment. 127: 268-276. DOI: 10.1016/J.Buildenv.2017.11.003  0.575
2018 Muñoz-Carpintero D, Hu G, Spanos CJ. Stochastic Model Predictive Control with adaptive constraint tightening for non-conservative chance constraints satisfaction Automatica. 96: 32-39. DOI: 10.1016/J.Automatica.2018.06.026  0.33
2017 Zou H, Jin M, Jiang H, Xie L, Spanos CJ. WinIPS: WiFi-Based Non-Intrusive Indoor Positioning System With Online Radio Map Construction and Adaptation Ieee Transactions On Wireless Communications. 16: 8118-8130. DOI: 10.1109/Twc.2017.2757472  0.322
2017 Jin M, Jia R, Spanos CJ. Virtual Occupancy Sensing: Using Smart Meters to Indicate Your Presence Ieee Transactions On Mobile Computing. 16: 3264-3277. DOI: 10.1109/Tmc.2017.2684806  0.322
2017 Li D, Zhou Y, Hu G, Spanos CJ. Optimal Sensor Configuration and Feature Selection for AHU Fault Detection and Diagnosis Ieee Transactions On Industrial Informatics. 13: 1369-1380. DOI: 10.1109/Tii.2016.2644669  0.641
2017 Jia R, Spanos C. Occupancy modelling in shared spaces of buildings: a queueing approach Journal of Building Performance Simulation. 10: 406-421. DOI: 10.1080/19401493.2016.1267802  0.355
2017 Zou H, Jiang H, Yang J, Xie L, Spanos C. Non-intrusive occupancy sensing in commercial buildings Energy and Buildings. 154: 633-643. DOI: 10.1016/J.Enbuild.2017.08.045  0.317
2017 Xu Z, Hu G, Spanos CJ, Schiavon S. PMV-based event-triggered mechanism for building energy management under uncertainties☆ Energy and Buildings. 152: 73-85. DOI: 10.1016/J.Enbuild.2017.07.008  0.577
2016 Jia R, Jin M, Zou H, Yesilata Y, Xie L, Spanos C. MapSentinel: Can the Knowledge of Space Use Improve Indoor Tracking Further? Sensors (Basel, Switzerland). 16. PMID 27049387 DOI: 10.3390/S16040472  0.31
2016 Qiao Y, Spanos CJ. Variability-aware compact modeling and statistical circuit validation on SRAM test array Proceedings of Spie - the International Society For Optical Engineering. 9781. DOI: 10.1117/12.2219428  0.396
2016 Li D, Zhou Y, Hu G, Spanos CJ. Fault detection and diagnosis for building cooling system with a tree-structured learning method Energy and Buildings. 127: 540-551. DOI: 10.1016/J.Enbuild.2016.06.017  0.637
2013 Spanos CJ, Baek JY. Enhancing metrology by combining spatial variability and global inference Proceedings of Spie - the International Society For Optical Engineering. 8681. DOI: 10.1117/12.2021912  0.37
2013 Baek JY, Spanos CJ. Performance evaluation of blended metrology schemes incorporating virtual metrology Ieee Transactions On Semiconductor Manufacturing. 26: 506-515. DOI: 10.1109/Tsm.2013.2271999  0.328
2012 Qiao Y, Qian K, Spanos CJ. Variability aware compact model characterization for statistical circuit design optimization Proceedings of Spie - the International Society For Optical Engineering. 8327. DOI: 10.1117/12.916512  0.405
2012 Baek JY, Spanos CJ. Optimization of blended virtual and actual metrology schemes Proceedings of Spie - the International Society For Optical Engineering. 8324. DOI: 10.1117/12.916313  0.317
2011 Nikolić B, Park JH, Kwak J, Giraud B, Guo Z, Pang LT, Toh SO, Jevtić R, Qian K, Spanos C. Technology variability from a design perspective Ieee Transactions On Circuits and Systems I: Regular Papers. 58: 1996-2009. DOI: 10.1109/Tcsi.2011.2165389  0.353
2011 Cheng L, Gupta P, Spanos CJ, Qian K, He L. Physically justifiable die-level modeling of spatial variation in view of systematic across wafer variability Ieee Transactions On Computer-Aided Design of Integrated Circuits and Systems. 30: 388-401. DOI: 10.1109/Tcad.2010.2089568  0.376
2010 Patel K, Wallow T, Levinson HJ, Spanos CJ. Comparative study of line width roughness (LWR) in next-generation lithography (NGL) processes Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.848183  0.611
2010 Qian K, Spanos CJ. 45nm transistor variability study for memory characterization Proceedings of Spie - the International Society For Optical Engineering. 7641. DOI: 10.1117/12.846704  0.413
2010 Patel K, Lahiri SN, Spanos CJ. Robust estimation of line width roughness parameters Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6H18-C6H33. DOI: 10.1116/1.3517718  0.587
2009 Tang QY, Spanos CJ. Interval-value based circuit simulation for statistical circuit design Proceedings of Spie - the International Society For Optical Engineering. 7275. DOI: 10.1117/12.814262  0.496
2009 Qian K, Nikolic B, Spanos CJ. Hierarchical modeling of spatial variability with a 45nm example Proceedings of Spie - the International Society For Optical Engineering. 7275. DOI: 10.1117/12.814226  0.411
2009 Patel K, Liu TJK, Spanos CJ. Gate line edge roughness model for estimation of FinFET performance variability Ieee Transactions On Electron Devices. 56: 3055-3063. DOI: 10.1109/Ted.2009.2032605  0.362
2009 Pang LT, Qian K, Spanos CJ, Nikolic B. Measurement and analysis of variability in 45 nm strained-Si CMOS technology Ieee Journal of Solid-State Circuits. 44: 2233-2243. DOI: 10.1109/Jssc.2009.2022217  0.315
2008 Xue J, Spanos CJ, Neureuther AR. Probe-pattern grating focus monitor through scatterometry calibration Proceedings of Spie - the International Society For Optical Engineering. 6922. DOI: 10.1117/12.773191  0.47
2008 Patel K, Liu TJK, Spanos C. Impact of gate line edge roughness on double-gate FinFET performance variability Proceedings of Spie - the International Society For Optical Engineering. 6925. DOI: 10.1117/12.773065  0.591
2008 Qian K, Spanos CJ. A comprehensive model of process variability for statistical timing optimization Proceedings of Spie - the International Society For Optical Engineering. 6925. DOI: 10.1117/12.772980  0.413
2008 Tang QY, Spanos CJ. Layout optimization based on a generalized process variability model Proceedings of Spie - the International Society For Optical Engineering. 6925. DOI: 10.1117/12.772882  0.554
2008 Ben Y, Xue J, Spanos CJ. Using composite gratings for optical system characterization through scatterometry Proceedings of Spie - the International Society For Optical Engineering. 6925. DOI: 10.1117/12.772785  0.51
2008 Zeng D, Tan Y, Spanos CJ. Dimensionality reduction methods in virtual metrology Proceedings of Spie - the International Society For Optical Engineering. 6922. DOI: 10.1117/12.772739  0.563
2008 Zhang Q, Poolla K, Spanos CJ. One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process Journal of Process Control. 18: 937-945. DOI: 10.1016/J.Jprocont.2008.04.016  0.362
2007 Neureuther A, Poppe W, Holwill J, Chin E, Wang L, Yang JS, Miller M, Ceperley D, Clifford C, Kikuchi K, Choi J, Dornfeld D, Friedberg P, Spanos C, Hoang J, et al. Collaborative platform, tool-kit, and physical models for DfM Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.721199  0.791
2007 Tang QY, Friedberg P, Cheng G, Spanos CJ. Circuit size optimization with multiple sources of variation and position dependant correlation Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.711794  0.785
2007 Zhang Q, Tang C, Cain J, Hui A, Hsieh T, Maccrae N, Singh B, Poolla K, Spanos CJ. Across-wafer CD uniformity control through lithography and etch process: Experimental verification Proceedings of Spie - the International Society For Optical Engineering. 6518. DOI: 10.1117/12.711232  0.657
2007 Friedberg P, Cheung W, Cheng G, Tang QY, Spanos CJ. Modeling spatial gate length variation in the 0.2μm to 1.15mm separation range Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.710668  0.786
2007 Zhang Q, Poolla K, Spanos CJ. Across wafer critical dimension uniformity enhancement through lithography and etch process sequence: Concept, approach, modeling, and experiment Ieee Transactions On Semiconductor Manufacturing. 20: 488-505. DOI: 10.1109/Tsm.2007.907627  0.352
2006 Friedberg P, Cheung W, Spanos CJ. Spatial modeling of micron-scale gate length variation Proceedings of Spie - the International Society For Optical Engineering. 6155. DOI: 10.1117/12.656521  0.784
2006 Xue J, Moen K, Spanos CJ. Integrated aerial image sensor: Design, modeling, and assembly Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 3088-3093. DOI: 10.1116/1.2393296  0.488
2006 Cain JP, Naulleau PP, Gullikson EM, Spanos CJ. Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1234-1237. DOI: 10.1116/1.2194946  0.638
2006 Cain JP, Naulleau P, Spanos CJ. Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 326-330. DOI: 10.1116/1.2162578  0.639
2005 Cain JP, Naulleau P, Spanos CJ. Lithographic measurement of EUV flare in the 0.3-NA micro exposure tool optic at the advanced light source Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 301-311. DOI: 10.1117/12.600620  0.585
2005 Cain JP, Naulleau P, Spanos CJ. Modeling of EUV photoresists with a resist point spread function Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 1101-1109. DOI: 10.1117/12.600439  0.605
2005 Cain JP, Naulleau P, Spanos CJ. Critical dimension sensitivity to post-exposure bake temperature variation in EUV photoresists Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 1092-1100. DOI: 10.1117/12.600432  0.604
2005 Cain JP, Naulleau P, Spanos CJ. Resist-based measurement of the contrast transfer function in a 0.3-NA EUV microfield optic Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 741-748. DOI: 10.1117/12.600427  0.608
2005 Cain JP, McIntyre G, Naulleau P, Pawloski A, La Fontaine B, Wood O, Spanos CJ, Neureuther AR. Two-wave pattern shift aberration monitor for centrally obscured optical systems Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 1230-1237. DOI: 10.1117/12.600399  0.609
2005 Friedberg P, Cao Y, Cain J, Wang R, Rabaey J, Spanos C. Modeling within-field gate length spatial variation for process-design co-optimization Proceedings of Spie - the International Society For Optical Engineering. 5756: 178-188. DOI: 10.1117/12.600028  0.792
2005 Chang R, Spanos CJ. Dishing-radius model of copper CMP dishing effects Ieee Transactions On Semiconductor Manufacturing. 18: 297-303. DOI: 10.1109/Tsm.2005.845110  0.576
2005 Friedberg P, Cao Y, Cain J, Wang R, Rabaey J, Spanos C. Modeling within-die spatial correlation effects for process-design co-optimization Proceedings - International Symposium On Quality Electronic Design, Isqed. 516-521. DOI: 10.1109/ISQED.2005.82  0.789
2005 Friedberg P, Cheung W, Spanos CJ. Spatial variability of critical dimensions 2005 Proceedings - 22nd International Vlsi Multilevel Interconnection Conference, Vmic 2005. 539-546.  0.786
2004 Zhang Q, Friedberg P, Tang C, Singh B, Poolla K, Spanos CJ. Across-wafer CD uniformity enhancement through control of multi-zone PEB profiles Proceedings of Spie - the International Society For Optical Engineering. 5375: 276-286. DOI: 10.1117/12.537121  0.766
2004 Friedberg PD, Tang C, Singh B, Brueckner T, Gründke W, Schulz B, Spanos CJ. Time-based PEB adjustment for optimizing CD distributions Proceedings of Spie - the International Society For Optical Engineering. 5375: 703-712. DOI: 10.1117/12.535871  0.756
2004 Chang R, Cao Y, Spanos CJ. Modeling the electrical effects of metal dishing due to CMP for on-chip interconnect optimization Ieee Transactions On Electron Devices. 51: 1577-1583. DOI: 10.1109/Ted.2004.834898  0.583
2003 Cain JP, Spanos CJ. Electrical linewidth metrology for systematic CD variation characterization and causal analysis Proceedings of Spie - the International Society For Optical Engineering. 5038: 350-361. DOI: 10.1117/12.483664  0.604
2002 Zhang H, Cain J, Spanos CJ. Compact formulation of mask error factor for critical dimension control in optical lithography Proceedings of Spie - the International Society For Optical Engineering. 4689: 462-465. DOI: 10.1117/12.473483  0.611
2002 Cain JP, Zhang H, Spanos CJ. Optimum sampling for characterization of systematic variation in photolithography Proceedings of Spie - the International Society For Optical Engineering. 4689: 430-442. DOI: 10.1117/12.473480  0.622
2001 Niu X, Jakatdar N, Bao J, Spanos CJ. Specular spectroscopic scatterometry Ieee Transactions On Semiconductor Manufacturing. 14: 97-111. DOI: 10.1109/66.920722  0.767
1998 Niu X, Jakatdar NH, Spanos CJ. Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data High-Power Lasers and Applications. 3275: 172-179. DOI: 10.1117/12.304403  0.755
1998 Jakatdar N, Niu X, Spanos CJ. A neural network approach to rapid thin film characterization Proceedings of Spie - the International Society For Optical Engineering. 3275: 163-171. DOI: 10.1117/12.304402  0.756
1998 Lin Z, Spanos CJ, Milor LS, Lin YT. Circuit sensitivity to interconnect variation Ieee Transactions On Semiconductor Manufacturing. 11: 557-568. DOI: 10.1109/66.728552  0.339
1998 Jakatdar N, Niu X, Zhang H, Bao J, Spanos C. Novel metrology for the DUV photolithography sequence Characterization and Metrology For Ulsi Technology. 449: 548-552. DOI: 10.1063/1.56842  0.746
1996 Chen R, Huang H, Spanos CJ, Gatto M. Plasma etch modeling using optical emission spectroscopy Journal of Vacuum Science and Technology. 14: 1901-1906. DOI: 10.1116/1.580357  0.359
1996 Miranda AJ, Spanos CJ. Impedance modeling of a Cl2/He plasma discharge for very large scale integrated circuit production monitoring Journal of Vacuum Science and Technology. 14: 1888-1893. DOI: 10.1116/1.580355  0.327
1996 Palmer E, Ren W, Spanos CJ, Poolla K. Control of photoresist properties: A Kalman filter based approach Ieee Transactions On Semiconductor Manufacturing. 9: 208-214. DOI: 10.1109/66.492814  0.385
1996 Leang S, Ma SY, Thomson J, Bombay BJ, Spanos CJ. A control system for photolithographic sequences Ieee Transactions On Semiconductor Manufacturing. 9: 191-207. DOI: 10.1109/66.492813  0.327
1996 Leang S, Spanos CJ. A novel in-line automated metrology for photolithography Ieee Transactions On Semiconductor Manufacturing. 9: 101-107. DOI: 10.1109/66.484289  0.341
1995 Lee SF, Spanos CJ. Prediction of Wafer State After Plasma Processing Using Real-Time Tool Data Ieee Transactions On Semiconductor Manufacturing. 8: 252-261. DOI: 10.1109/66.400999  0.345
1995 Yu C, Spanos CJ, Boning DS, Chung JE, Liu Hy, Chang KJ, Bartelink DJ. Use of Short-Loop Electrical Measurements for Yield Improvement Ieee Transactions On Semiconductor Manufacturing. 8: 150-159. DOI: 10.1109/66.382279  0.42
1995 Lee SF, Boskin ED, Spanos CJ, Liu HC, Wen EH. RTSPC: A Software Utility for Real-Time SPC and Tool Data Analysis Ieee Transactions On Semiconductor Manufacturing. 8: 17-25. DOI: 10.1109/66.350754  0.315
1994 Boskin ED, Spanos CJ, Korsh GJ. A Method for Modeling the Manufacturability of IC Designs Ieee Transactions On Semiconductor Manufacturing. 7: 298-305. DOI: 10.1109/66.311333  0.398
1993 May GS, Spanos CJ. Automated Malfunction Diagnosis of Semiconductor Fabrication Equipment: A Plasma Etch Application Ieee Transactions On Semiconductor Manufacturing. 6: 28-40. DOI: 10.1109/66.210656  0.366
1992 Spanos CJ, Guo HF, Miller A, Levine-Parrill J. Real-Time Statistical Process Control Using Tool Data Ieee Transactions On Semiconductor Manufacturing. 5: 308-318. DOI: 10.1109/66.175363  0.355
1992 Spanos CJ. Statistical Process Control in Semiconductor Manufacturing Proceedings of the Ieee. 80: 819-830. DOI: 10.1016/0167-9317(91)90027-B  0.311
1991 Tam NN, Liu HY, Spanos C, Neureuther AR. A statistically based model of electron‐beam exposed, chemically amplified negative resist Journal of Vacuum Science & Technology B. 9: 3362-3369. DOI: 10.1116/1.585342  0.326
1991 May GS, Huang J, Spanos CJ. Statistical Experimental Design in Plasma Etch Modeling Ieee Transactions On Semiconductor Manufacturing. 4: 83-98. DOI: 10.1109/66.79720  0.352
1991 Chang NH, Spanos CJ. Continuous Equipment Diagnosis Using Evidence Integration: An LPCVD Application Ieee Transactions On Semiconductor Manufacturing. 4: 43-51. DOI: 10.1109/66.75851  0.36
1991 Ling Zm, Leang S, Spanos CJ. A lithography workcell monitoring and modeling scheme Microelectronic Engineering. 13: 537-540. DOI: 10.1016/0167-9317(91)90149-8  0.376
1991 Spanos CJ. Creating and using equipment models in semiconductor manufacturing Microelectronic Engineering. 10: 199-205. DOI: 10.1016/0167-9317(91)90022-6  0.335
1990 Lin KK, Spanos CJ. Statistical Equipment Modeling for VLSI Manufacturing: An Application for LPCVD Ieee Transactions On Semiconductor Manufacturing. 3: 216-229. DOI: 10.1109/66.61971  0.353
1983 Spanos CJ, Director SW. PROMETHEUS: A PROGRAM FOR VLSI PROCESS PARAMETER EXTRACTION . 176-177.  0.548
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