Year |
Citation |
Score |
2023 |
Chen X, Shan W, Wu D, Patel SB, Cai N, Li C, Ye S, Liu Z, Hwang S, Zakharov DN, Boscoboinik JA, Wang G, Zhou G. Atomistic mechanisms of water vapor-induced surface passivation. Science Advances. 9: eadh5565. PMID 37910618 DOI: 10.1126/sciadv.adh5565 |
0.481 |
|
2016 |
Shan W, Liu Q, Li J, Cai N, Saidi WA, Zhou G. Hydrogen-induced atomic structure evolution of the oxygen-chemisorbed Cu(110) surface. The Journal of Chemical Physics. 145: 234704. PMID 28010088 DOI: 10.1063/1.4972070 |
0.511 |
|
2014 |
Cai N, Liu Q, Tong X, Zhou G. X-ray photoelectron spectroscopy study of the passivation of NiAl(100) by water vapor. Langmuir : the Acs Journal of Surfaces and Colloids. 30: 774-83. PMID 24417205 DOI: 10.1021/La4039649 |
0.572 |
|
2014 |
Liu Q, Li L, Cai N, Saidi WA, Zhou G. Oxygen chemisorption-induced surface phase transitions on Cu(110) Surface Science. 627: 75-84. DOI: 10.1016/J.Susc.2014.04.017 |
0.523 |
|
2014 |
Li L, Cai N, Saidi WA, Zhou G. Role of oxygen in Cu(1 1 0) surface restructuring in the vicinity of step edges Chemical Physics Letters. 613: 64-69. DOI: 10.1016/J.Cplett.2014.08.050 |
0.493 |
|
2013 |
Cai N, Qin H, Tong X, Zhou G. Growth of ultrathin amorphous alumina films during the oxidation of NiAl(100) Surface Science. 618: 20-26. DOI: 10.1016/J.Susc.2013.09.011 |
0.564 |
|
2012 |
Cai N, Zhou G, Müller K, Starr DE. Temperature and pressure dependent Mott potentials and their influence on self-limiting oxide film growth Applied Physics Letters. 101: 171605. DOI: 10.1063/1.4764552 |
0.558 |
|
2012 |
Cai N, Zhou G, Müller K, Starr DE. Comparative Study of the Passivation of Al(111) by Molecular Oxygen and Water Vapor The Journal of Physical Chemistry C. 117: 172-178. DOI: 10.1021/Jp305740S |
0.594 |
|
2011 |
Cai N, Zhou G, Müller K, Starr DE. Tuning the limiting thickness of a thin oxide layer on Al(111) with oxygen gas pressure. Physical Review Letters. 107: 035502. PMID 21838375 DOI: 10.1103/Physrevlett.107.035502 |
0.581 |
|
2011 |
Cai N, Zhou G, Müller K, Starr DE. Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature Physical Review B. 84. DOI: 10.1103/Physrevb.84.125445 |
0.585 |
|
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