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Junyan Dai, Ph.D. - Publications

Affiliations: 
2004 Cornell University, Ithaca, NY, United States 
Area:
polymers
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2019 Zhang B, Liu W, Meng L, Zhang Z, Zhang L, Wu X, Dai J, Mao G, Wei Y. Study of the perpendicular self-assembly of a novel high- block copolymer without any neutral layer on a silicon substrate. Rsc Advances. 9: 3828-3837. PMID 35518108 DOI: 10.1039/c8ra10319d  0.626
2016 Ablikim M, Achasov MN, Ahmed S, Ai XC, Albayrak O, Albrecht M, Ambrose DJ, Amoroso A, An FF, An Q, Bai JZ, Baldini Ferroli R, Ban Y, Bennett DW, Bennett JV, ... ... Dai JP, et al. Observation of an Anomalous Line Shape of the η^{'}π^{+}π^{-} Mass Spectrum near the pp[over ¯] Mass Threshold in J/ψ→γη^{'}π^{+}π^{-}. Physical Review Letters. 117: 042002. PMID 27494467 DOI: 10.1103/Physrevlett.117.042002  0.347
2016 Ablikim M, Achasov MN, Ai XC, Albayrak O, Albrecht M, Ambrose DJ, Amoroso A, An FF, An Q, Bai JZ, Baldini Ferroli R, Ban Y, Bennett DW, Bennett JV, Bertani M, ... ... Dai JP, et al. Observation of h_{c} Radiative Decay h_{c}→γη^{'} and Evidence for h_{c}→γη. Physical Review Letters. 116: 251802. PMID 27391715 DOI: 10.1103/Physrevlett.116.251802  0.324
2006 Dai J, Chang SW, Hamad A, Yang D, Felix N, Ober CK. Molecular glass resists for high-resolution patterning Chemistry of Materials. 18: 3404-3411. DOI: 10.1021/Cm052452M  0.621
2006 Bratton D, Yang D, Dai J, Ober CK. Recent progress in high resolution lithography Polymers For Advanced Technologies. 17: 94-103. DOI: 10.1002/Pat.662  0.517
2002 Bae YC, Douki K, Yu T, Dai J, Schmaljohann D, Koerner H, Ober CK, Conley W. Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones Chemistry of Materials. 14: 1306-1313. DOI: 10.1021/Cm010789S  0.676
2001 Bae YC, Douki K, Yu T, Dai J, Schmaljohann D, Kang SH, Kim KH, Koerner H, Conley W, Miller D, Balasubramanian R, Holl S, Ober CK. Rejuvenation of 248nm Resist Backbones for 157nm Lithography. Journal of Photopolymer Science and Technology. 14: 613-620. DOI: 10.2494/Photopolymer.14.613  0.68
2000 Schmaljohann D, Young CB, Dai J, Weibel GL, Hamad AH, Ober CK. Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography. Journal of Photopolymer Science and Technology. 13: 451-458. DOI: 10.2494/Photopolymer.13.451  0.656
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