Lei Yuan, Ph.D. - Publications
Affiliations: | 2005 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesYear | Citation | Score | |||
---|---|---|---|---|---|
2006 | Neureuther AR, Pease RFW, Yuan L, Parizi KB, Esfandyarpour H, Poppe WJ, Liddle JA, Anderson EH. Shot noise models for sequential processes and the role of lateral mixing Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1902-1908. DOI: 10.1116/1.2218875 | 0.66 | |||
2002 | Cheng M, Yuan L, Croffie E, Neureuther A. Improving resist resolution and sensitivity via electric-field enhanced postexposure baking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 734-740. DOI: 10.1116/1.1464835 | 0.703 | |||
2000 | Cheng M, Croffie E, Yuan L, Neureuther A. Enhancement of resist resolution and sensitivity via applied electric field Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3318-3322. DOI: 10.1116/1.1324646 | 0.69 | |||
2000 | Croffie E, Yuan L, Cheng M, Neureuther A, Houlihan F, Cirelli R, Watson P, Nalamasu O, Gabor A. Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3340-3344. DOI: 10.1116/1.1324636 | 0.684 | |||
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