Year |
Citation |
Score |
2020 |
Thampy S, Ashburn N, Dillon S, Chabal YJ, Cho K, Hsu JWP. Role of Surface Oxygen Vacancies in Intermediate Formationon Mullite-type Oxides upon NO Adsorption Journal of Physical Chemistry C. 124: 15913-15919. DOI: 10.1021/Acs.Jpcc.0C03443 |
0.36 |
|
2020 |
Assi H, Cocq K, Cure J, Casterou G, Lux KC, Collière V, Vendier L, Fau P, Maraval V, Fajerwerg K, Chabal YJ, Chauvin R, Kahn ML. Reorganization of a photosensitive carbo-benzene layer in a triptych nanocatalyst with enhancement of the photocatalytic hydrogen production from water International Journal of Hydrogen Energy. 45: 24765-24778. DOI: 10.1016/J.Ijhydene.2020.06.255 |
0.311 |
|
2019 |
Ashburn N, Zheng Y, Thampy S, Dillon S, Chabal YJ, Hsu JWP, Cho K. Integrated Experimental-Theoretical Approach to Determine Reliable Molecular Reaction Mechanisms on Transition Metal Oxide Surfaces. Acs Applied Materials & Interfaces. PMID 31353881 DOI: 10.1021/Acsami.9B09700 |
0.406 |
|
2019 |
Zheng Y, Thampy S, Ashburn N, Dillon S, Wang L, Jangjou Y, Tan K, Kong F, Nie Y, Kim MJ, Epling WS, Chabal YJ, Hsu JWP, Cho K. Stable and Active Oxidation Catalysis by Cooperative Lattice Oxygen Redox on SmMnO Mullite Surface. Journal of the American Chemical Society. PMID 31251057 DOI: 10.1021/Jacs.9B03334 |
0.329 |
|
2019 |
Hricovini K, Günther R, Thiry P, Taleb-Ibrahimi A, Indlekofer G, Bonnet JE, Dumas P, Petroff Y, Blase X, Zhu X, Louie SG, Chabal YJ, Thiry PA. Electronic structure and its dependence on local order for H/Si(111)-(1 x 1) surfaces. Physical Review Letters. 70: 1992-1995. PMID 10053438 DOI: 10.1103/Physrevlett.70.1992 |
0.434 |
|
2019 |
Rahman R, Klesko JP, Dangerfield A, Fang M, Lehn JM, Dezelah CL, Kanjolia RK, Chabal YJ. Mechanistic study of the atomic layer deposition of scandium oxide films using Sc(MeCp)2(Me2pz) and ozone Journal of Vacuum Science & Technology A. 37: 011504. DOI: 10.1116/1.5059695 |
0.486 |
|
2019 |
Thampy S, Ashburn N, Liu C, Xiong K, Dillon S, Zheng Y, Chabal YJ, Cho K, Hsu JWP. Superior low-temperature NO catalytic performance of PrMn2O5 over SmMn2O5 mullite-type catalysts Catalysis Science & Technology. 9: 2758-2766. DOI: 10.1039/C9Cy00490D |
0.377 |
|
2019 |
Thampy S, Ashburn N, Dillon S, Liu C, Xiong K, Mattson EC, Zheng Y, Chabal YJ, Cho K, Hsu JWP. Critical Role of Mullite-type Oxides’ Surface Chemistry on Catalytic NO Oxidation Performance The Journal of Physical Chemistry C. 123: 5385-5393. DOI: 10.1021/Acs.Jpcc.8B10670 |
0.417 |
|
2019 |
Tan K, Jensen S, Feng L, Wang H, Yuan S, Ferreri M, Klesko JP, Rahman R, Cure J, Li J, Zhou H, Thonhauser T, Chabal YJ. Reactivity of Atomic Layer Deposition Precursors with OH/H2O-Containing Metal Organic Framework Materials Chemistry of Materials. 31: 2286-2295. DOI: 10.1021/Acs.Chemmater.8B01844 |
0.386 |
|
2018 |
Peña LF, Veyan JF, Todd MA, Derecskei-Kovacs A, Chabal YJ. Vapor Phase Cleaning and Corrosion Inhibition of Copper Films by Ethanol and Heterocyclic Amines. Acs Applied Materials & Interfaces. PMID 30335353 DOI: 10.1021/Acsami.8B13438 |
0.373 |
|
2018 |
Rahman R, Klesko JP, Dangerfield A, Mattson EC, Chabal YJ. Selective Growth of Interface Layers from Reactions of Sc(MeCp)(Mepz) with Oxide Substrates. Acs Applied Materials & Interfaces. PMID 30211529 DOI: 10.1021/Acsami.8B09264 |
0.446 |
|
2018 |
Rahman R, Mattson EC, Klesko JP, Dangerfield A, Rivillon-Amy S, Smith DC, Hausmann D, Chabal YJ. Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform. Acs Applied Materials & Interfaces. PMID 30179460 DOI: 10.1021/Acsami.8B10899 |
0.411 |
|
2018 |
Peña LF, Mattson EC, Nanayakkara CE, Oyekan KA, Mallikarjunan A, Chandra H, Xiao M, Lei X, Pearlstein RM, Derecskei-Kovacs A, Chabal YJ. In-situ IR Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29381069 DOI: 10.1021/Acs.Langmuir.7B03522 |
0.463 |
|
2018 |
Cure J, Assi H, Cocq K, Marín L, Fajerwerg K, Fau P, Beche E, Chabal YJ, Esteve A, Rossi C. Controlled Growth and Grafting of High-Density Au Nanoparticles on Zinc Oxide Thin Films by Photo-Deposition. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29316786 DOI: 10.1021/Acs.Langmuir.7B04105 |
0.325 |
|
2018 |
Tan K, Jensen S, Zuluaga S, Chapman EK, Wang H, Rahman R, Cure J, Kim TH, Li J, Thonhauser T, Chabal YJ. The role of hydrogen bonding on transport of co-adsorbed gases in metal organic frameworks materials. Journal of the American Chemical Society. PMID 29295618 DOI: 10.1021/Jacs.7B09943 |
0.308 |
|
2018 |
Fuentes-Fernandez E, Jensen S, Tan K, Zuluaga S, Wang H, Li J, Thonhauser T, Chabal Y. Controlling Chemical Reactions in Confined Environments: Water Dissociation in MOF-74 Applied Sciences. 8: 270. DOI: 10.3390/App8020270 |
0.324 |
|
2018 |
Iachella M, Cure J, Djafari Rouhani M, Chabal Y, Rossi C, Estève A. Water Dissociation and Further Hydroxylation of Perfect and Defective Polar ZnO Model Surfaces The Journal of Physical Chemistry C. 122: 21861-21873. DOI: 10.1021/Acs.Jpcc.8B04967 |
0.372 |
|
2018 |
Gao Y, Iachella M, Mattson E, Lucero AT, Kim J, Djafari Rouhani M, Chabal Y, Rossi C, Estève A. Al Interaction with ZnO Surfaces The Journal of Physical Chemistry C. 122: 17856-17864. DOI: 10.1021/Acs.Jpcc.8B04952 |
0.423 |
|
2018 |
Mattson EC, Chabal YJ. Understanding Thermal Evolution and Monolayer Doping of Sulfur-Passivated GaAs(100) The Journal of Physical Chemistry C. 122: 8414-8422. DOI: 10.1021/Acs.Jpcc.8B01316 |
0.369 |
|
2018 |
Mattson EC, Cabrera Y, Rupich SM, Wang Y, Oyekan KA, Mustard TJ, Halls MD, Bechtel HA, Martin MC, Chabal YJ. Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning Chemistry of Materials. 30: 6192-6206. DOI: 10.1021/Acs.Chemmater.8B03149 |
0.614 |
|
2018 |
Klesko JP, Rahman R, Dangerfield A, Nanayakkara CE, L’Esperance T, Moser DF, Peña LF, Mattson EC, Dezelah CL, Kanjolia RK, Chabal YJ. Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water Chemistry of Materials. 30: 970-981. DOI: 10.1021/Acs.Chemmater.7B04790 |
0.421 |
|
2018 |
Thampy S, Zheng Y, Dillon S, Liu C, Jangjou Y, Lee Y, Epling WS, Xiong K, Chabal YJ, Cho K, Hsu JW. Superior catalytic performance of Mn-Mullite over Mn-Perovskite for NO oxidation Catalysis Today. 310: 195-201. DOI: 10.1016/J.Cattod.2017.05.008 |
0.363 |
|
2017 |
Guo T, Sampat S, Rupich SM, Hollingsworth JA, Buck M, Htoon H, Chabal YJ, Gartstein YN, Malko AV. Biexciton and trion energy transfer from CdSe/CdS giant nanocrystals to Si substrates. Nanoscale. 9: 19398-19407. PMID 29210416 DOI: 10.1039/C7Nr06272A |
0.336 |
|
2017 |
Pluchery O, Caillard L, Dollfus P, Chabal YJ. Gold Nanoparticles on Functionalized Silicon Substrate Under Coulomb Blockade Regime: An Experimental and Theoretical Investigation. The Journal of Physical Chemistry. B. PMID 29069545 DOI: 10.1021/Acs.Jpcb.7B06979 |
0.323 |
|
2017 |
Calais T, Bourrier D, Bancaud A, Chabal YJ, Esteve A, Rossi C. DNA grafting and arrangement on oxide surfaces for self-assembly of Al and CuO nanoparticles. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28960992 DOI: 10.1021/Acs.Langmuir.7B02159 |
0.345 |
|
2017 |
Marín L, Gao Y, Vallet M, Abdallah I, Warot-Fonrose B, Tenailleau C, Lucero AT, Kim J, Esteve A, Chabal YJ, Rossi C. Performance enhancement via incorporation of ZnO nanolayers in energetic Al:CuO multilayers. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28950064 DOI: 10.1021/Acs.Langmuir.7B02964 |
0.366 |
|
2017 |
Cabrera Y, Rupich SM, Shaw R, Anand B, de Anda Villa M, Rahman R, Dangerfield A, Gartstein YN, Malko AV, Chabal YJ. Energy transfer from colloidal nanocrystals to strongly absorbing perovskites. Nanoscale. PMID 28613340 DOI: 10.1039/C7Nr02234D |
0.307 |
|
2017 |
Nanayakkara CE, Liu G, Vega A, Dezelah CL, Kanjolia RK, Chabal YJ. Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28534625 DOI: 10.1021/Acs.Langmuir.7B00716 |
0.394 |
|
2017 |
Kerrigan MM, Klesko JP, Rupich SM, Dezelah CL, Kanjolia RK, Chabal YJ, Winter CH. Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid. The Journal of Chemical Physics. 146: 052813. PMID 28178839 DOI: 10.1063/1.4968848 |
0.411 |
|
2017 |
Mattson EC, Michalak DJ, Veyan JF, Chabal YJ. Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces. The Journal of Chemical Physics. 146: 052805. PMID 28178834 DOI: 10.1063/1.4964679 |
0.423 |
|
2017 |
Gao Y, Marín L, Mattson EC, Cure J, Nanayakkara CE, Veyan J, Lucero AT, Kim J, Rossi C, Estève A, Chabal YJ. Basic Mechanisms of Al Interaction with the ZnO Surface The Journal of Physical Chemistry C. 121: 12780-12788. DOI: 10.1021/Acs.Jpcc.7B02661 |
0.366 |
|
2017 |
Dangerfield A, Nanayakkara CE, Mallikarjunan A, Lei X, Pearlstein RM, Derecskei-Kovacs A, Cure J, Estève A, Chabal YJ. Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride Chemistry of Materials. 29: 6022-6029. DOI: 10.1021/Acs.Chemmater.7B01816 |
0.403 |
|
2017 |
Walsh LA, Mohammed S, Sampat SC, Chabal YJ, Malko AV, Hinkle CL. Oxide-related defects in quantum dot containing Si-rich silicon nitride films Thin Solid Films. 636: 267-272. DOI: 10.1016/J.Tsf.2017.06.022 |
0.401 |
|
2016 |
Tan K, Zuluaga S, Fuentes E, Mattson EC, Veyan JF, Wang H, Li J, Thonhauser T, Chabal YJ. Trapping gases in metal-organic frameworks with a selective surface molecular barrier layer. Nature Communications. 7: 13871. PMID 27958274 DOI: 10.1038/Ncomms13871 |
0.375 |
|
2016 |
Liu LH, Michalak DJ, Chopra TP, Pujari SP, Cabrera W, Dick D, Veyan JF, Hourani R, Halls MD, Zuilhof H, Chabal YJ. Surface etching, chemical modification and characterization of silicon nitride and silicon oxide-selective functionalization of Si3N4 and SiO2. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 28: 094014. PMID 26870908 DOI: 10.1088/0953-8984/28/9/094014 |
0.731 |
|
2016 |
Pluchery O, Zhang Y, Benbalagh R, Caillard L, Gallet JJ, Bournel F, Lamic-Humblot AF, Salmeron M, Chabal YJ, Rochet F. Static and dynamic electronic characterization of organic monolayers grafted on a silicon surface. Physical Chemistry Chemical Physics : Pccp. 18: 3675-84. PMID 26757829 DOI: 10.1039/C5Cp05943G |
0.426 |
|
2016 |
Peng W, Anand B, Liu L, Sampat S, Bearden BE, Malko AV, Chabal YJ. Influence of growth temperature on bulk and surface defects in hybrid lead halide perovskite films. Nanoscale. 8: 1627-34. PMID 26691199 DOI: 10.1039/C5Nr06222E |
0.35 |
|
2016 |
Longo RC, Mattson EC, Vega A, Cabrera W, Cho K, Chabal Y, Thissen P. Atomic Mechanism of Arsenic Monolayer Doping on oxide-free Silicon(111) Mrs Advances. 1: 2345-2353. DOI: 10.1557/Adv.2016.466 |
0.495 |
|
2016 |
Perkins CK, Mansergh RH, Ramos JC, Nanayakkara CE, Park D, Goberna-Ferrón S, Fullmer LB, Arens JT, Gutierrez-Higgins MT, Jones YR, Lopez JI, Rowe TM, Whitehurst DM, Nyman M, Chabal YJ, et al. Low-index, smooth Al_2O_3 films by aqueous solution process Optical Materials Express. 7: 273. DOI: 10.1364/Ome.7.000273 |
0.333 |
|
2016 |
Mattson EC, Michalak DJ, Cabrera W, Veyan JF, Chabal YJ. Initial nitride formation during plasma-nitridation of cobalt surfaces Applied Physics Letters. 109: 091602. DOI: 10.1063/1.4961943 |
0.433 |
|
2016 |
Zuluaga S, Fuentes-Fernandez EMA, Tan K, Arter CA, Li J, Chabal YJ, Thonhauser T. Chemistry in confined spaces: reactivity of the Zn-MOF-74 channels Journal of Materials Chemistry. 4: 13176-13182. DOI: 10.1039/C6Ta04388G |
0.326 |
|
2016 |
Zuluaga S, Fuentes-Fernandez EMA, Tan K, Xu F, Li J, Chabal YJ, Thonhauser T. Understanding and controlling water stability of MOF-74 Journal of Materials Chemistry A. 4: 5176-5183. DOI: 10.1039/C5Ta10416E |
0.302 |
|
2016 |
Dick D, Ballard JB, Longo RC, Randall JN, Cho K, Chabal YJ. Toward Selective Ultra-High-Vacuum Atomic Layer Deposition of Metal Oxides on Si(100) The Journal of Physical Chemistry C. 120: 24213-24223. DOI: 10.1021/Acs.Jpcc.6B08130 |
0.512 |
|
2016 |
Pena LF, Nanayakkara CE, Mallikarjunan A, Chandra H, Xiao M, Lei X, Pearlstein RM, Derecskei-Kovacs A, Chabal YJ. Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone Journal of Physical Chemistry C. 120: 10927-10935. DOI: 10.1021/Acs.Jpcc.6B01803 |
0.434 |
|
2016 |
Longo RC, Owen JHG, McDonnell S, Dick D, Ballard JB, Randall JN, Wallace RM, Chabal YJ, Cho K. Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations Journal of Physical Chemistry C. 120: 2628-2641. DOI: 10.1021/Acs.Jpcc.5B09053 |
0.501 |
|
2016 |
Nanayakkara CE, Vega A, Liu G, Dezelah CL, Kanjolia RK, Chabal YJ. Role of Initial Precursor Chemisorption on Incubation Delay for Molybdenum Oxide Atomic Layer Deposition Chemistry of Materials. 28: 8591-8597. DOI: 10.1021/Acs.Chemmater.6B03423 |
0.412 |
|
2016 |
Longo RC, Mattson EC, Vega A, Cabrera W, Cho K, Chabal YJ, Thissen P. Mechanism of Arsenic Monolayer Doping of Oxide-Free Si(111) Chemistry of Materials. 28: 1975-1979. DOI: 10.1021/Acs.Chemmater.5B04394 |
0.387 |
|
2016 |
Chopra TP, Longo RC, Cho K, Chabal YJ. Ammonia modification of oxide-free Si(111) surfaces Surface Science. DOI: 10.1016/J.Susc.2016.01.002 |
0.511 |
|
2015 |
Sahasrabudhe G, Rupich SM, Jhaveri J, Berg AH, Nagamatsu KA, Man G, Chabal YJ, Kahn A, Wagner S, Sturm JC, Schwartz J. Low-Temperature Synthesis of a TiO2/Si Heterojunction. Journal of the American Chemical Society. PMID 26579554 DOI: 10.1021/Jacs.5B09750 |
0.467 |
|
2015 |
Ballard JB, Dick DD, McDonnell SJ, Bischof M, Fu J, Owen JH, Owen WR, Alexander JD, Jaeger DL, Namboodiri P, Fuchs E, Chabal YJ, Wallace RM, Reidy R, Silver RM, et al. Atomically Traceable Nanostructure Fabrication. Journal of Visualized Experiments : Jove. PMID 26274555 DOI: 10.3791/52900 |
0.39 |
|
2015 |
Deibert BJ, Zhang J, Smith PF, Chapman KW, Rangan S, Banerjee D, Tan K, Wang H, Pasquale N, Chen F, Lee KB, Dismukes GC, Chabal YJ, Li J. Surface and Structural Investigation of a MnOx Birnessite-Type Water Oxidation Catalyst Formed under Photocatalytic Conditions. Chemistry (Weinheim An Der Bergstrasse, Germany). PMID 26263021 DOI: 10.1002/Chem.201501930 |
0.382 |
|
2015 |
Peng W, Rupich SM, Shafiq N, Gartstein YN, Malko AV, Chabal YJ. Silicon Surface Modification and Characterization for Emergent Photovoltaic Applications Based on Energy Transfer. Chemical Reviews. PMID 26244614 DOI: 10.1021/Acs.Chemrev.5B00085 |
0.375 |
|
2015 |
Marín L, Nanayakkara CE, Veyan JF, Warot-Fonrose B, Joulie S, Estève A, Tenailleau C, Chabal YJ, Rossi C. Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces. Acs Applied Materials & Interfaces. 7: 11713-8. PMID 25988997 DOI: 10.1021/Acsami.5B02653 |
0.323 |
|
2015 |
Peng W, Sampat S, Rupich SM, Anand B, Nguyen HM, Taylor D, Beardon BE, Gartstein YN, Chabal YJ, Malko AV. Hybrid light sensor based on ultrathin Si nanomembranes sensitized with CdSe/ZnS colloidal nanocrystal quantum dots. Nanoscale. 7: 8524-30. PMID 25896572 DOI: 10.1039/C5Nr00334B |
0.368 |
|
2015 |
Caillard L, Sattayaporn S, Lamic-Humblot AF, Casale S, Campbell P, Chabal YJ, Pluchery O. Controlling the reproducibility of Coulomb blockade phenomena for gold nanoparticles on an organic monolayer/silicon system. Nanotechnology. 26: 065301. PMID 25611611 DOI: 10.1088/0957-4484/26/6/065301 |
0.301 |
|
2015 |
Cabrera W, Halls MD, Chabal YJ. Chemical nature and control of high-k dielectric/III-V interfaces Ecs Transactions. 66: 65-76. DOI: 10.1149/06606.0065ecst |
0.564 |
|
2015 |
Skibinski ES, Debenedetti WJI, Rupich SM, Chabal YJ, Hines MA. Frustrated Etching during H/Si(111) Methoxylation Produces Fissured Fluorinated Surfaces, whereas Direct Fluorination Preserves the Atomically Flat Morphology Journal of Physical Chemistry C. 119: 26029-26037. DOI: 10.1021/Acs.Jpcc.5B08889 |
0.814 |
|
2015 |
Calais T, Playe B, Ducéré JM, Veyan JF, Rupich S, Hemeryck A, Djafari Rouhani M, Rossi C, Chabal YJ, Estève A. Role of Alumina Coatings for Selective and Controlled Bonding of DNA on Technologically Relevant Oxide Surfaces Journal of Physical Chemistry C. 119: 23527-23543. DOI: 10.1021/Acs.Jpcc.5B06820 |
0.44 |
|
2015 |
Thissen P, Fuchs E, Roodenko K, Peixoto T, Batchelor B, Smith D, Schmidt WG, Chabal Y. Nanopatterning on H-Terminated Si(111) Explained as Dynamic Equilibrium of the Chemical Reaction with Methanol Journal of Physical Chemistry C. 119: 16947-16953. DOI: 10.1021/Acs.Jpcc.5B03816 |
0.461 |
|
2015 |
Chopra TP, Longo RC, Cho K, Halls MD, Thissen P, Chabal YJ. Ethylenediamine Grafting on Oxide-Free H-, 1/3 ML F-, and Cl-Terminated Si(111) Surfaces Chemistry of Materials. 27: 6268-6281. DOI: 10.1021/Acs.Chemmater.5B03156 |
0.711 |
|
2015 |
Bernal-Ramos K, Saly MJ, Kanjolia RK, Chabal YJ. Atomic Layer Deposition of Cobalt Silicide Thin Films Studied by in Situ Infrared Spectroscopy Chemistry of Materials. 27: 4943-4949. DOI: 10.1021/Acs.Chemmater.5B00743 |
0.474 |
|
2014 |
Lanthony C, Guiltat M, Ducéré JM, Verdier A, Hémeryck A, Djafari-Rouhani M, Rossi C, Chabal YJ, Estève A. Elementary surface chemistry during CuO/Al nanolaminate-thermite synthesis: copper and oxygen deposition on aluminum (111) surfaces. Acs Applied Materials & Interfaces. 6: 15086-97. PMID 25089744 DOI: 10.1021/Am503126K |
0.39 |
|
2014 |
Dong H, Cabrera W, Qin X, Brennan B, Zhernokletov D, Hinkle CL, Kim J, Chabal YJ, Wallace RM. Silicon interfacial passivation layer chemistry for high-k/InP interfaces. Acs Applied Materials & Interfaces. 6: 7340-5. PMID 24750024 DOI: 10.1021/Am500752U |
0.441 |
|
2014 |
Zuluaga S, Canepa P, Tan K, Chabal YJ, Thonhauser T. Study of van der Waals bonding and interactions in metal organic framework materials. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 26: 133002. PMID 24613989 DOI: 10.1088/0953-8984/26/13/133002 |
0.305 |
|
2014 |
Gong C, Kim S, Zhou S, Hu Y, Acik M, De Heer W, Berger C, Bongiorno A, Riedo E, Chabal Y. Chemical bonding and stability of multilayer graphene oxide layers Proceedings of Spie - the International Society For Optical Engineering. 8987. DOI: 10.1117/12.2045554 |
0.374 |
|
2014 |
Ballard JB, Owen JHG, Owen W, Alexander JR, Fuchs E, Randall JN, Von Ehr JR, McDonnell S, Dick DD, Wallace RM, Chabal YJ, Bischof MR, Jaeger DL, Reidy RF, Fu J, et al. Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 32. DOI: 10.1116/1.4890484 |
0.365 |
|
2014 |
Longo RC, McDonnell S, Dick D, Wallace RM, Chabal YJ, Owen JHG, Ballard JB, Randall JN, Cho K. Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4864619 |
0.457 |
|
2014 |
Nijem N, Chabal YJ. Adsorbate Interactions in Metal Organic Frameworks Studied by Vibrational Spectroscopy Comments On Inorganic Chemistry. 34: 78-102. DOI: 10.1080/02603594.2014.940418 |
0.307 |
|
2014 |
Liu LH, Debenedetti WJI, Peixoto T, Gokalp S, Shafiq N, Veyan JF, Michalak DJ, Hourani R, Chabal YJ. Morphology and chemical termination of HF-etched Si3N4 surfaces Applied Physics Letters. 105. DOI: 10.1063/1.4905282 |
0.503 |
|
2014 |
Peng W, Debenedetti WJI, Kim S, Hines MA, Chabal YJ. Lowering the density of electronic defects on organic-functionalized Si(100) surfaces Applied Physics Letters. 104. DOI: 10.1063/1.4883367 |
0.685 |
|
2014 |
Cabrera W, Brennan B, Dong H, O'Regan TP, Povey IM, Monaghan S, O'Connor E, Hurley PK, Wallace RM, Chabal YJ. Diffusion of In0.53Ga0.47As elements through hafnium oxide during post deposition annealing Applied Physics Letters. 104. DOI: 10.1063/1.4860960 |
0.359 |
|
2014 |
Lublow M, Fischer A, Merschjann C, Yang F, Schedel-Niedrig T, Veyan J-, Chabal YJ. Graphitic carbon nitride nano-emitters on silicon: a photoelectrochemical heterojunction composed of earth-abundant materials for enhanced evolution of hydrogen Journal of Materials Chemistry. 2: 12697-12702. DOI: 10.1039/C4Ta01711K |
0.304 |
|
2014 |
Cabrera W, Halls MD, Povey IM, Chabal YJ. Role of interfacial aluminum silicate and silicon as barrier layers for atomic layer deposition of Al2O3 films on chemically cleaned InP(100) surfaces Journal of Physical Chemistry C. 118: 29164-29179. DOI: 10.1021/Jp5052084 |
0.685 |
|
2014 |
Cabrera W, Halls MD, Povey IM, Chabal YJ. Surface oxide characterization and interface evolution in atomic layer deposition of Al2O3 on InP(100) studied by in situ infrared spectroscopy Journal of Physical Chemistry C. 118: 5862-5871. DOI: 10.1021/Jp412455Y |
0.72 |
|
2014 |
Longo RC, Owen JHG, McDonnell S, Ballard JB, Wallace RM, Randall JN, Chabal YJ, Cho K. Ab initio study of H2 associative desorption on ad-dimer reconstructed Si(001) and Ge(001)-(2×1) surfaces Journal of Physical Chemistry C. 118: 10088-10096. DOI: 10.1021/Jp411903Z |
0.423 |
|
2014 |
Dick D, Veyan JF, Longo RC, McDonnell S, Ballard JB, Qin X, Dong H, Owen JHG, Randall JN, Wallace RM, Cho K, Chabal YJ. Digermane deposition on Si(100) and Ge(100): From adsorption mechanism to epitaxial growth Journal of Physical Chemistry C. 118: 482-493. DOI: 10.1021/Jp410145U |
0.473 |
|
2014 |
Tan K, Zuluaga S, Gong Q, Canepa P, Wang H, Li J, Chabal YJ, Thonhauser T. Water reaction mechanism in metal organic frameworks with coordinatively unsaturated metal ions: MOF-74 Chemistry of Materials. 26: 6886-6895. DOI: 10.1021/Cm5038183 |
0.386 |
|
2014 |
Acik M, Yagneswaran S, Peng W, Lee G, Lund BR, Smith DW, Chabal YJ. Spectroscopic evaluation of out-of-plane surface vibration bands from surface functionalization of graphite oxide by fluorination Carbon. 77: 577-591. DOI: 10.1016/J.Carbon.2014.05.062 |
0.427 |
|
2014 |
Zhou S, Kim S, Di Gennaro E, Hu Y, Gong C, Lu X, Berger C, De Heer W, Riedo E, Chabal YJ, Aruta C, Bongiorno A. Film Structure of Epitaxial Graphene Oxide on SiC: Insight on the Relationship between Interlayer Spacing, Water Content, and Intralayer Structure Advanced Materials Interfaces. 1. DOI: 10.1002/Admi.201300106 |
0.336 |
|
2014 |
De Benedetti WJI, Nimmo MT, Rupich SM, Caillard LM, Gartstein YN, Chabal YJ, Malko AV. Efficient directed energy transfer through size-gradient nanocrystal layers into silicon substrates Advanced Functional Materials. 24: 5002-5010. DOI: 10.1002/Adfm.201400667 |
0.423 |
|
2013 |
Gong C, Huang C, Miller J, Cheng L, Hao Y, Cobden D, Kim J, Ruoff RS, Wallace RM, Cho K, Xu X, Chabal YJ. Metal contacts on physical vapor deposited monolayer MoS2. Acs Nano. 7: 11350-7. PMID 24219632 DOI: 10.1021/Nn4052138 |
0.321 |
|
2013 |
Nimmo MT, Caillard LM, De Benedetti W, Nguyen HM, Seitz O, Gartstein YN, Chabal YJ, Malko AV. Visible to near-infrared sensitization of silicon substrates via energy transfer from proximal nanocrystals: further insights for hybrid photovoltaics. Acs Nano. 7: 3236-45. PMID 23556540 DOI: 10.1021/Nn400924Y |
0.43 |
|
2013 |
Caillard L, Seitz O, Campbell PM, Doherty RP, Lamic-Humblot AF, Lacaze E, Chabal YJ, Pluchery O. Gold nanoparticles on oxide-free silicon-molecule interface for single electron transport. Langmuir : the Acs Journal of Surfaces and Colloids. 29: 5066-73. PMID 23488728 DOI: 10.1021/La304971V |
0.384 |
|
2013 |
Kwon J, Ducéré JM, Alphonse P, Bahrami M, Petrantoni M, Veyan JF, Tenailleau C, Estève A, Rossi C, Chabal YJ. Interfacial chemistry in Al/CuO reactive nanomaterial and its role in exothermic reaction. Acs Applied Materials & Interfaces. 5: 605-13. PMID 23289538 DOI: 10.1021/Am3019405 |
0.373 |
|
2013 |
Kim D, Thissen P, Viner G, Lee DW, Choi W, Chabal YJ, Lee JB. Recovery of nonwetting characteristics by surface modification of gallium-based liquid metal droplets using hydrochloric acid vapor. Acs Applied Materials & Interfaces. 5: 179-85. PMID 23206334 DOI: 10.1021/Am302357T |
0.404 |
|
2013 |
Nguyen HM, Seitz O, Gartstein YN, Chabal YJ, Malko AV. Energy transfer from colloidal nanocrystals into Si substrates studied via photoluminescence photon counts and decay kinetics Journal of the Optical Society of America B. 30: 2401. DOI: 10.1364/Josab.30.002401 |
0.304 |
|
2013 |
Debenedetti WJI, Chabal YJ. Functionalization of oxide-free silicon surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4819406 |
0.468 |
|
2013 |
Hemani GK, Vandenberghe WG, Brennan B, Chabal YJ, Walker AV, Wallace RM, Quevedo-Lopez M, Fischetti MV. Interfacial graphene growth in the Ni/SiO2 system using pulsed laser deposition Applied Physics Letters. 103. DOI: 10.1063/1.4821944 |
0.33 |
|
2013 |
Dong H, Cabrera W, Galatage RV, Santosh K, Brennan B, Qin X, McDonnell S, Zhernokletov D, Hinkle CL, Cho K, Chabal YJ, Wallace RM. Indium diffusion through high-k dielectrics in high-k/InP stacks Applied Physics Letters. 103. DOI: 10.1063/1.4817932 |
0.316 |
|
2013 |
Gong C, Floresca HC, Hinojos D, McDonnell S, Qin X, Hao Y, Jandhyala S, Mordi G, Kim J, Colombo L, Ruoff RS, Kim MJ, Cho K, Wallace RM, Chabal YJ. Rapid selective etching of PMMA residues from transferred graphene by carbon dioxide Journal of Physical Chemistry C. 117: 23000-23008. DOI: 10.1021/Jp408429V |
0.307 |
|
2013 |
McDonnell S, Longo RC, Seitz O, Ballard JB, Mordi G, Dick D, Owen JHG, Randall JN, Kim J, Chabal YJ, Cho K, Wallace RM. Controlling the atomic layer deposition of titanium dioxide on silicon: Dependence on surface termination Journal of Physical Chemistry C. 117: 20250-20259. DOI: 10.1021/Jp4060022 |
0.498 |
|
2013 |
Tan K, Canepa P, Gong Q, Liu J, Johnson DH, Dyevoich A, Thallapally PK, Thonhauser T, Li J, Chabal YJ. Mechanism of preferential adsorption of SO2 into two microporous paddle wheel frameworks M(bdc)(ted)0.5 Chemistry of Materials. 25: 4653-4662. DOI: 10.1021/Cm401270B |
0.33 |
|
2013 |
Ramos KB, Clavel G, Marichy C, Cabrera W, Pinna N, Chabal YJ. In Situ Infrared Spectroscopic Study of Atomic Layer-Deposited TiO2 Thin Films by Nonaqueous Routes Chemistry of Materials. 25: 1706-1712. DOI: 10.1021/Cm400164A |
0.431 |
|
2013 |
Bernal Ramos K, Saly MJ, Chabal YJ. Precursor design and reaction mechanisms for the atomic layer deposition of metal films Coordination Chemistry Reviews. 257: 3271-3281. DOI: 10.1016/J.Ccr.2013.03.028 |
0.333 |
|
2013 |
Liechti KM, Na SR, Wakamatsu M, Seitz O, Chabal Y. A High Vacuum Fracture Facility for Molecular Interactions Experimental Mechanics. 53: 231-241. DOI: 10.1007/S11340-012-9625-1 |
0.312 |
|
2013 |
Longo RC, Cho K, Schmidt WG, Chabal YJ, Thissen P. Monolayer doping via phosphonic acid grafting on silicon: Microscopic insight from infrared spectroscopy and density functional theory calculations Advanced Functional Materials. 23: 3471-3477. DOI: 10.1002/Adfm.201202808 |
0.341 |
|
2012 |
Thissen P, Vega A, Peixoto T, Chabal YJ. Controlled, low-coverage metal oxide activation of silicon for organic functionalization: unraveling the phosphonate bond. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 17494-505. PMID 23163566 DOI: 10.1021/La3038457 |
0.466 |
|
2012 |
Nijem N, Canepa P, Kong L, Wu H, Li J, Thonhauser T, Chabal YJ. Spectroscopic characterization of van der Waals interactions in a metal organic framework with unsaturated metal centers: MOF-74-Mg. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 24: 424203. PMID 23032253 DOI: 10.1088/0953-8984/24/42/424203 |
0.307 |
|
2012 |
Nguyen HM, Seitz O, Peng W, Gartstein YN, Chabal YJ, Malko AV. Efficient radiative and nonradiative energy transfer from proximal CdSe/ZnS nanocrystals into silicon nanomembranes. Acs Nano. 6: 5574-82. PMID 22584256 DOI: 10.1021/Nn301531B |
0.444 |
|
2012 |
Vega A, Thissen P, Chabal YJ. Environment-controlled tethering by aggregation and growth of phosphonic acid monolayers on silicon oxide. Langmuir : the Acs Journal of Surfaces and Colloids. 28: 8046-51. PMID 22554237 DOI: 10.1021/La300709N |
0.452 |
|
2012 |
Thissen P, Peixoto T, Longo RC, Peng W, Schmidt WG, Cho K, Chabal YJ. Activation of surface hydroxyl groups by modification of H-terminated Si(111) surfaces. Journal of the American Chemical Society. 134: 8869-74. PMID 22554133 DOI: 10.1021/Ja300270W |
0.476 |
|
2012 |
Feugmo CG, Champagne B, Caudano Y, Cecchet F, Chabal YJ, Liégeois V. Towards modelling the vibrational signatures of functionalized surfaces: carboxylic acids on H-Si(111) surfaces. Journal of Physics. Condensed Matter : An Institute of Physics Journal. 24: 124111. PMID 22394578 DOI: 10.1088/0953-8984/24/12/124111 |
0.461 |
|
2012 |
Jandhyala S, Mordi G, Lee B, Lee G, Floresca C, Cha PR, Ahn J, Wallace RM, Chabal YJ, Kim MJ, Colombo L, Cho K, Kim J. Atomic layer deposition of dielectrics on graphene using reversibly physisorbed ozone. Acs Nano. 6: 2722-30. PMID 22352388 DOI: 10.1021/Nn300167T |
0.337 |
|
2012 |
Roodenko K, Park SK, Kwon J, Wielunski L, Chabal YJ. Characterization of Ru thin-film conductivity upon atomic layer deposition on H-passivated Si(111) Journal of Applied Physics. 112. DOI: 10.1063/1.4766747 |
0.369 |
|
2012 |
Peng W, Seitz O, Chapman RA, Vogel EM, Chabal YJ. Probing the intrinsic electrical properties of thin organic layers/semiconductor interfaces using an atomic-layer-deposited Al 2O 3 protective layer Applied Physics Letters. 101. DOI: 10.1063/1.4742168 |
0.369 |
|
2012 |
Lublow M, Kubala S, Veyan JF, Chabal YJ. Colored porous silicon as support for plasmonic nanoparticles Journal of Applied Physics. 111. DOI: 10.1063/1.3703469 |
0.387 |
|
2012 |
Seitz O, Caillard L, Nguyen HM, Chiles C, Chabal YJ, Malko AV. Optimizing non-radiative energy transfer in hybrid colloidal-nanocrystal/silicon structures by controlled nanopillar architectures for future photovoltaic cells Applied Physics Letters. 100: 021902. DOI: 10.1063/1.3675634 |
0.418 |
|
2012 |
Lacina D, Yang L, Chopra I, Muckerman J, Chabal Y, Graetz J. Investigation of LiAlH 4-THF formation by direct hydrogenation of catalyzed Al and LiH Physical Chemistry Chemical Physics. 14: 6569-6576. DOI: 10.1039/C2Cp40493A |
0.35 |
|
2012 |
Shpaisman H, Seitz O, Yaffe O, Roodenko K, Scheres L, Zuilhof H, Chabal YJ, Sueyoshi T, Kera S, Ueno N, Vilan A, Cahen D. Structure Matters: Correlating temperature dependent electrical transport through alkyl monolayers with vibrational and photoelectron spectroscopies Chemical Science. 3: 851-862. DOI: 10.1039/C1Sc00639H |
0.33 |
|
2012 |
Arreaga-Salas DE, Sra AK, Roodenko K, Chabal YJ, Hinkle CL. Progression of solid electrolyte interphase formation on hydrogenated amorphous silicon anodes for lithium-ion batteries Journal of Physical Chemistry C. 116: 9072-9077. DOI: 10.1021/Jp300787P |
0.408 |
|
2012 |
Gong C, Acik M, Abolfath RM, Chabal Y, Cho K. Graphitization of graphene oxide with ethanol during thermal reduction Journal of Physical Chemistry C. 116: 9969-9979. DOI: 10.1021/Jp212584T |
0.302 |
|
2012 |
Kwon J, Saly M, Halls MD, Kanjolia RK, Chabal YJ. Substrate selectivity of ( tBu-Allyl)Co(CO) 3 during thermal atomic layer deposition of cobalt Chemistry of Materials. 24: 1025-1030. DOI: 10.1021/Cm2029189 |
0.709 |
|
2012 |
Thissen P, Thissen V, Wippermann S, Chabal YJ, Grundmeier G, Schmidt WG. pH-dependent structure and energetics of H2O/MgO(100) Surface Science. 606: 902-907. DOI: 10.1016/J.Susc.2012.01.018 |
0.354 |
|
2012 |
Thissen P, Seitz O, Chabal YJ. Wet chemical surface functionalization of oxide-free silicon Progress in Surface Science. 87: 272-290. DOI: 10.1016/J.Progsurf.2012.10.003 |
0.511 |
|
2011 |
Chopra IS, Chaudhuri S, Veyan JF, Chabal YJ. Turning aluminium into a noble-metal-like catalyst for low-temperature activation of molecular hydrogen. Nature Materials. 10: 884-9. PMID 21946610 DOI: 10.1038/Nmat3123 |
0.319 |
|
2011 |
Nijem N, Thissen P, Yao Y, Longo RC, Roodenko K, Wu H, Zhao Y, Cho K, Li J, Langreth DC, Chabal YJ. Understanding the preferential adsorption of CO2 over N2 in a flexible metal-organic framework. Journal of the American Chemical Society. 133: 12849-57. PMID 21736366 DOI: 10.1021/Ja2051149 |
0.306 |
|
2011 |
Seitz O, Fernandes PG, Mahmud GA, Wen HC, Stiegler HJ, Chapman RA, Vogel EM, Chabal YJ. One-step selective chemistry for silicon-on-insulator sensor geometries. Langmuir : the Acs Journal of Surfaces and Colloids. 27: 7337-40. PMID 21627085 DOI: 10.1021/La200471B |
0.381 |
|
2011 |
Zhao Y, Wu H, Emge TJ, Gong Q, Nijem N, Chabal YJ, Kong L, Langreth DC, Liu H, Zeng H, Li J. Enhancing gas adsorption and separation capacity through ligand functionalization of microporous metal-organic framework structures. Chemistry (Weinheim An Der Bergstrasse, Germany). 17: 5101-9. PMID 21433121 DOI: 10.1002/Chem.201002818 |
0.318 |
|
2011 |
Nijem N, Roodenko K, Zhao Y, Li J, Chabal YJ. Raman spectroscopy for probing guest-host interactions in metal organic frameworks Materials Research Society Symposium Proceedings. 1334: 1-5. DOI: 10.1557/Opl.2011.1311 |
0.303 |
|
2011 |
Chabal YJ, Seitz O, Aureau D, Thissen P, Peixoto T. Characterization of semiconductor surfaces during surface conditioning and functionalization Ecs Transactions. 41: 303-314. DOI: 10.1149/1.3630858 |
0.365 |
|
2011 |
Kong L, Chabal YJ, Langreth DC. First-principles approach to rotational-vibrational frequencies and infrared intensity for H2 adsorbed in nanoporous materials Physical Review B - Condensed Matter and Materials Physics. 83. DOI: 10.1103/Physrevb.83.121402 |
0.314 |
|
2011 |
Nguyen HM, Seitz O, Aureau D, Sra A, Nijem N, Gartstein YN, Chabal YJ, Malko AV. Spectroscopic evidence for nonradiative energy transfer between colloidal CdSe/ZnS nanocrystals and functionalized silicon substrates Applied Physics Letters. 98: 161904. DOI: 10.1063/1.3579545 |
0.471 |
|
2011 |
Seitz O, Fernandes PG, Tian R, Karnik N, Wen HC, Stiegler H, Chapman RA, Vogel EM, Chabal YJ. Control and stability of self-assembled monolayers under biosensing conditions Journal of Materials Chemistry. 21: 4384-4392. DOI: 10.1039/C1Jm10132C |
0.343 |
|
2011 |
Chopra IS, Chaudhuri S, Veyan J, Graetz J, Chabal YJ. Correction to Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption The Journal of Physical Chemistry C. 115: 23652-23652. DOI: 10.1021/Jp210087D |
0.354 |
|
2011 |
Roodenko K, Halls MD, Gogte Y, Seitz O, Veyan JF, Chabal YJ. Nature of hydrophilic aluminum fluoride and oxyaluminum fluoride surfaces resulting from XeF2 treatment of Al and Al2O3 Journal of Physical Chemistry C. 115: 21351-21357. DOI: 10.1021/Jp207839W |
0.71 |
|
2011 |
Veyan JF, Choi H, Huang M, Longo RC, Ballard JB, McDonnell S, Nadesalingam MP, Dong H, Chopra IS, Owen JHG, Kirk WP, Randall JN, Wallace RM, Cho K, Chabal YJ. Si 2H 6 dissociative chemisorption and dissociation on Si(100)-(2×1) and Ge(100)-(2×1) Journal of Physical Chemistry C. 115: 24534-24548. DOI: 10.1021/Jp207086U |
0.459 |
|
2011 |
Acik M, Lee G, Mattevi C, Pirkle A, Wallace RM, Chhowalla M, Cho K, Chabal Y. The role of oxygen during thermal reduction of graphene oxide studied by infrared absorption spectroscopy Journal of Physical Chemistry C. 115: 19761-19781. DOI: 10.1021/Jp2052618 |
0.321 |
|
2011 |
Chopra IS, Chaudhuri S, Veyan JF, Graetz J, Chabal YJ. Effect of titanium doping of Al(111) surfaces on alane formation, mobility, and desorption Journal of Physical Chemistry C. 115: 16701-16710. DOI: 10.1021/Jp203842R |
0.401 |
|
2011 |
Kwon J, Saly M, Kanjolia RK, Chabal YJ. Surface reactions of μ2-η2-( tBu-acetylene)dicobalthexacarbonyl with Oxidized and H-terminated Si(111) Surfaces Chemistry of Materials. 23: 2068-2074. DOI: 10.1021/Cm103028X |
0.512 |
|
2011 |
Lapin N, Seitz O, Chabal YJ. Infrared analysis of biomolecule attachment to functionalized silicon surfaces Biointerface Characterization by Advanced Ir Spectroscopy. 83-113. DOI: 10.1016/B978-0-444-53558-0.00004-7 |
0.787 |
|
2011 |
Sioncke S, Chabal YJ, Frank MM. Germanium Surface Conditioning and Passivation Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications. 429-472. DOI: 10.1002/9781118071748.ch12 |
0.382 |
|
2010 |
Nijem N, Veyan JF, Kong L, Wu H, Zhao Y, Li J, Langreth DC, Chabal YJ. Molecular hydrogen "pairing" interaction in a metal organic framework system with unsaturated metal centers (MOF-74). Journal of the American Chemical Society. 132: 14834-48. PMID 20925338 DOI: 10.1021/Ja104923F |
0.338 |
|
2010 |
Acik M, Mattevi C, Gong C, Lee G, Cho K, Chhowalla M, Chabal YJ. The role of intercalated water in multilayered graphene oxide. Acs Nano. 4: 5861-8. PMID 20886867 DOI: 10.1021/Nn101844T |
0.343 |
|
2010 |
Acik M, Lee G, Mattevi C, Chhowalla M, Cho K, Chabal YJ. Unusual infrared-absorption mechanism in thermally reduced graphene oxide. Nature Materials. 9: 840-5. PMID 20852618 DOI: 10.1038/Nmat2858 |
0.339 |
|
2010 |
Ojwang JG, Chaudhuri S, van Duin AC, Chabal YJ, Veyan JF, van Santen R, Kramer GJ, Goddard WA. Multiscale modeling of interaction of alane clusters on Al(111) surfaces: a reactive force field and infrared absorption spectroscopy approach. The Journal of Chemical Physics. 132: 084509. PMID 20192309 DOI: 10.1063/1.3302813 |
0.413 |
|
2010 |
Tian R, Seitz O, Li M, Hu WW, Chabal YJ, Gao J. Infrared characterization of interfacial Si-O bond formation on silanized flat SiO2/Si surfaces. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 4563-6. PMID 20180563 DOI: 10.1021/La904597C |
0.449 |
|
2010 |
Dai M, Kwon J, Halls MD, Gordon RG, Chabal YJ. Surface and interface processes during atomic layer deposition of copper on silicon oxide. Langmuir : the Acs Journal of Surfaces and Colloids. 26: 3911-7. PMID 20092316 DOI: 10.1021/La903212C |
0.719 |
|
2010 |
Nijem N, Veyan JF, Kong L, Li K, Pramanik S, Zhao Y, Li J, Langreth D, Chabal YJ. Interaction of molecular hydrogen with microporous metal organic framework materials at room temperature. Journal of the American Chemical Society. 132: 1654-64. PMID 20070080 DOI: 10.1021/Ja908817N |
0.336 |
|
2010 |
Michalak DJ, Amy SR, Aureau D, Dai M, Estève A, Chabal YJ. Nanopatterning Si(111) surfaces as a selective surface-chemistry route. Nature Materials. 9: 266-71. PMID 20062049 DOI: 10.1038/Nmat2611 |
0.616 |
|
2010 |
Roodenko K, Goldthorpe IA, McIntyre PC, Chabal YJ. Modified phonon confinement model for Raman spectroscopy of nanostructured materials Physical Review B - Condensed Matter and Materials Physics. 82. DOI: 10.1103/Physrevb.82.115210 |
0.312 |
|
2010 |
Veyan JF, Aureau D, Gogte Y, Campbell P, Yan XM, Chabal YJ. Comparative time-resolved study of the XeF2 etching of Mo and Si Journal of Applied Physics. 108. DOI: 10.1063/1.3520653 |
0.492 |
|
2010 |
Veyan JF, Halls MD, Rangan S, Aureau D, Yan XM, Chabal YJ. XeF2 -induced removal of SiO2 near Si surfaces at 300 K: An unexpected proximity effect. Journal of Applied Physics. 108. DOI: 10.1063/1.3517148 |
0.7 |
|
2010 |
Kwon J, Dai M, Halls MD, Chabal YJ. Suppression of substrate oxidation during ozone based atomic layer deposition of Al2 O3: Effect of ozone flow rate Applied Physics Letters. 97. DOI: 10.1063/1.3500821 |
0.722 |
|
2010 |
Petrantoni M, Rossi C, Salvagnac L, Conédéra V, Estève A, Tenailleau C, Alphonse P, Chabal YJ. Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro Journal of Applied Physics. 108: 084323. DOI: 10.1063/1.3498821 |
0.311 |
|
2010 |
Lee B, Mordi G, Kim MJ, Chabal YJ, Vogel EM, Wallace RM, Cho KJ, Colombo L, Kim J. Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices Applied Physics Letters. 97: 43107. DOI: 10.1063/1.3467454 |
0.315 |
|
2010 |
Kwon J, Chabal YJ. Effects of TaN, Ru, and Pt electrodes on thermal stability of hafnium-based gate stacks Journal of Applied Physics. 107. DOI: 10.1063/1.3429238 |
0.357 |
|
2010 |
Kwon J, Chabal YJ. Thermal stability comparison of TaN on HfO2 and Al2 O3 Applied Physics Letters. 96. DOI: 10.1063/1.3396189 |
0.355 |
|
2010 |
Roodenko K, Seitz O, Gogte Y, Veyan JF, Yan XM, Chabal YJ. Modification of the adhesive properties of XeF2-etched aluminum surfaces by deposition of organic self-assembled monolayers Journal of Physical Chemistry C. 114: 22566-22572. DOI: 10.1021/Jp1068076 |
0.486 |
|
2010 |
Aureau D, Varin Y, Roodenko K, Seitz O, Pluchery O, Chabal YJ. Controlled deposition of gold nanoparticles on well-defined organic monolayer grafted on silicon surfaces Journal of Physical Chemistry C. 114: 14180-14186. DOI: 10.1021/Jp104183M |
0.472 |
|
2010 |
Ferguson GA, Aureau D, Chabal Y, Raghavachari K. Effects of the local environment on Si-H stretching frequencies for the mixed coverage X/H:Si(111) surface (X = F, Cl, Br, and I) Journal of Physical Chemistry C. 114: 17644-17650. DOI: 10.1021/Jp104140U |
0.468 |
|
2010 |
Park SK, Kanjolia R, Anthis J, Odedra R, Boag N, Wielunski L, Chabal YJ. Atomic Layer Deposition of Ru/RuO2Thin Films Studied by In situ Infrared Spectroscopy Chemistry of Materials. 22: 4867-4878. DOI: 10.1021/Cm903793U |
0.431 |
|
2009 |
Seitz O, Dai M, Aguirre-Tostado FS, Wallace RM, Chabal YJ. Copper-metal deposition on self assembled monolayer for making top contacts in molecular electronic devices. Journal of the American Chemical Society. 131: 18159-67. PMID 19924992 DOI: 10.1021/Ja907003W |
0.532 |
|
2009 |
Dhar S, Seitz O, Halls MD, Choi S, Chabal YJ, Feldman LC. Chemical properties of oxidized silicon carbide surfaces upon etching in hydrofluoric acid. Journal of the American Chemical Society. 131: 16808-13. PMID 19919146 DOI: 10.1021/Ja9053465 |
0.713 |
|
2009 |
Lan A, Li K, Wu H, Kong L, Nijem N, Olson DH, Emge TJ, Chabal YJ, Langreth DC, Hong M, Li J. RPM3: a multifunctional microporous MOF with recyclable framework and high H2 binding energy. Inorganic Chemistry. 48: 7165-73. PMID 19722690 DOI: 10.1021/Ic9002115 |
0.311 |
|
2009 |
Dai M, Wang Y, Kwon J, Halls MD, Chabal YJ. Nitrogen interaction with hydrogen-terminated silicon surfaces at the atomic scale. Nature Materials. 8: 825-30. PMID 19684585 DOI: 10.1038/Nmat2514 |
0.774 |
|
2009 |
Lapin NA, Chabal YJ. Infrared characterization of biotinylated silicon oxide surfaces, surface stability, and specific attachment of streptavidin. The Journal of Physical Chemistry. B. 113: 8776-83. PMID 19489542 DOI: 10.1021/Jp809096M |
0.816 |
|
2009 |
Li M, Dai M, Chabal YJ. Atomic layer deposition of aluminum oxide on carboxylic acid-terminated self-assembled monolayers. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 1911-4. PMID 19140733 DOI: 10.1021/La803581K |
0.541 |
|
2009 |
Park SK, Roodenko K, Chabal YJ, Wielunski L, Kanjolia R, Anthis J, Odedra R, Boag N. Atomic layer deposition of ruthenium films on hydrogen terminated silicon Mrs Proceedings. 1156. DOI: 10.1557/Proc-1156-D04-02 |
0.353 |
|
2009 |
Dai M, Kwon J, Chabal YJ, Halls MD, Gordon RG. FTIR study of copper agglomeration during atomic layer deposition of copper Mrs Proceedings. 1155. DOI: 10.1557/Proc-1155-C11-06 |
0.723 |
|
2009 |
Kong L, Cooper VR, Nijem N, Li K, Li J, Chabal YJ, Langreth DC. Theoretical and experimental analysis of H2 binding in a prototypical metal-organic framework material Physical Review B - Condensed Matter and Materials Physics. 79. DOI: 10.1103/Physrevb.79.081407 |
0.315 |
|
2009 |
Hemeryck A, Estève A, Richard N, Djafari Rouhani M, Chabal YJ. Fundamental steps towards interface amorphization during silicon oxidation: Density functional theory calculations Physical Review B. 79. DOI: 10.1103/Physrevb.79.035317 |
0.433 |
|
2009 |
Singh S, Lapin N, Singh PK, Khan MA, Chabal YJ. Attachment of streptavidin-biotin on 3-aminopropyltriethoxysilane (APTES) modified porous silicon surfaces Aip Conference Proceedings. 1147: 443-449. DOI: 10.1063/1.3183471 |
0.792 |
|
2009 |
Ferguson GA, Rivillon S, Chabal Y, Raghavachari K. The structure and vibrational spectrum of the Si(111) - H/Cl surface Journal of Physical Chemistry C. 113: 21713-21720. DOI: 10.1021/Jp906614E |
0.482 |
|
2009 |
Kwon J, Dai M, Halls MD, Langereis E, Chabal YJ, Gordon RG. In situ infrared characterization during atomic layer deposition of lanthanum oxide Journal of Physical Chemistry C. 113: 654-660. DOI: 10.1021/Jp806027M |
0.736 |
|
2009 |
Moutanabbir O, Chabal YJ, Chicoine M, Christiansen S, Krause-Rehberg R, Schiettekatte F, Scholz R, Seitz O, Senz S, Süßkraut F, Gösele U. Mechanisms of ion-induced GaN thin layer splitting Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms. 267: 1264-1268. DOI: 10.1016/J.Nimb.2009.01.028 |
0.351 |
|
2009 |
Dai M, Kwon J, Chabal YJ, Halls MD, Gordon RG. FTIR study of copper agglomeration during atomic layer deposition of copper Materials Research Society Symposium Proceedings. 1155: 41-46. |
0.638 |
|
2008 |
Pasternack RM, Rivillon Amy S, Chabal YJ. Attachment of 3-(Aminopropyl)triethoxysilane on silicon oxide surfaces: dependence on solution temperature. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 12963-71. PMID 18942864 DOI: 10.1021/La8024827 |
0.43 |
|
2008 |
Chaudhuri S, Rangan S, Veyan JF, Muckerman JT, Chabal YJ. Formation and bonding of alane clusters on Al(111) surfaces studied by infrared absorption spectroscopy and theoretical modeling. Journal of the American Chemical Society. 130: 10576-87. PMID 18636724 DOI: 10.1021/Ja800136K |
0.427 |
|
2008 |
Gruber-Woelfler H, Rivillon Amy S, Chabal YJ, Schitter G, Polo E, Ringwald M, Khinast JG. UV-induced immobilization of tethered zirconocenes on H-terminated silicon surfaces. Chemical Communications (Cambridge, England). 1329-31. PMID 18389123 DOI: 10.1039/B717817D |
0.471 |
|
2008 |
Paumier G, Sudor J, Gue AM, Vinet F, Li M, Chabal YJ, Estève A, Djafari-Rouhani M. Nanoscale actuation of electrokinetic flows on thermoreversible surfaces. Electrophoresis. 29: 1245-52. PMID 18348218 DOI: 10.1002/Elps.200700396 |
0.331 |
|
2008 |
Sundararaghavan HG, Monteiro GA, Lapin NA, Chabal YJ, Miksan JR, Shreiber DI. Genipin-induced changes in collagen gels: correlation of mechanical properties to fluorescence. Journal of Biomedical Materials Research. Part A. 87: 308-20. PMID 18181104 DOI: 10.1002/Jbm.A.31715 |
0.73 |
|
2008 |
Chabal YJ. Chemistry, structures, dynamics and kinetics of adsorbates on surfaces by Fourier transform infrared spectroscopy Advances in Laser Science-Iii. 172: 471-476. DOI: 10.1063/1.37451 |
0.46 |
|
2008 |
Na HJ, Lee JC, Heh D, Sivasubramani P, Kirsch PD, Oh JW, Majhi P, Rivillon S, Chabal YJ, Lee BH, Choi R. Effective surface passivation methodologies for high performance germanium metal oxide semiconductor field effect transistors Applied Physics Letters. 93. DOI: 10.1063/1.3028025 |
0.414 |
|
2008 |
Seltzer SJ, Rampulla DM, Rivillon-Amy S, Chabal YJ, Bernasek SL, Romalis MV. Testing the effect of surface coatings on alkali atom polarization lifetimes Journal of Applied Physics. 104. DOI: 10.1063/1.2985913 |
0.334 |
|
2008 |
Michalak DJ, Amy SR, Estève A, Chabal YJ. Investigation of the chemical purity of silicon surfaces reacted with liquid methanol Journal of Physical Chemistry C. 112: 11907-11919. DOI: 10.1021/Jp8030539 |
0.498 |
|
2008 |
Ferguson GA, Raghavachari K, Michalak DJ, Chabal Y. Adsorbate-surface phonon interactions in deuterium-passivated Si(111)-(1 × 1) Journal of Physical Chemistry C. 112: 1034-1039. DOI: 10.1021/Jp0758768 |
0.454 |
|
2008 |
Kwon J, Dai M, Halls MD, Chabal YJ. Detection of a formate surface intermediate in the atomic layer deposition of high-k dielectrics using ozone Chemistry of Materials. 20: 3248-3250. DOI: 10.1021/Cm703667H |
0.721 |
|
2008 |
Prabhakaran K, Kurian J, Kumar KNP, Chabal YJ. Formation of periodic nanostructure network through substrate-mediated assembly Applied Surface Science. 255: 2063-2068. DOI: 10.1016/J.Apsusc.2008.06.205 |
0.41 |
|
2007 |
Hemeryck A, Mayne AJ, Richard N, Estève A, Chabal YJ, Djafari Rouhani M, Dujardin G, Comtet G. Difficulty for oxygen to incorporate into the silicon network during initial O2 oxidation of Si(100)-(2x1). The Journal of Chemical Physics. 126: 114707. PMID 17381228 DOI: 10.1063/1.2566299 |
0.467 |
|
2007 |
Dai M, Kwon J, Ho MT, Wang Y, Rivillon S, Li M, Chabal YJ, Boleslawski M. In-situ Infrared Absorption Monitoring of Atomic Layer Deposition of Metal Oxides on Functionalized Si and Ge Surfaces Mrs Proceedings. 996. DOI: 10.1557/Proc-0996-H07-04 |
0.603 |
|
2007 |
Frank MM, Wang Y, Ho MT, Brewer RT, Moumen N, Chabal YJ. Hydrogen Barrier Layer Against Silicon Oxidation during Atomic Layer Deposition of Al2 O3 and Hf O2 Journal of the Electrochemical Society. 154: G44-G48. DOI: 10.1149/1.2405839 |
0.416 |
|
2007 |
Zahler JM, Fontcuberta I Morral A, Griggs MJ, Atwater HA, Chabal YJ. Role of hydrogen in hydrogen-induced layer exfoliation of germanium Physical Review B - Condensed Matter and Materials Physics. 75. DOI: 10.1103/Physrevb.75.035309 |
0.351 |
|
2007 |
Wang Y, Dai M, Ho MT, Wielunski LS, Chabal YJ. Infrared characterization of hafnium oxide grown by atomic layer deposition using ozone as the oxygen precursor Applied Physics Letters. 90. DOI: 10.1063/1.2430908 |
0.528 |
|
2007 |
Stokes MA, Kortan R, Amy SR, Katz HE, Chabal YJ, Kloc C, Siegrist T. Erratum: Molecular ordering in bis(phenylenyl)bithiophenes (Journal of Materials Chemistry (2007) 17) Journal of Materials Chemistry. 17: 3461-3462. DOI: 10.1039/B711339K |
0.539 |
|
2007 |
Stokes MA, Kortan R, Amy SR, Katz HE, Chabal YJ, Kloc C, Siegrist T. Molecular ordering in bis(phenylenyl)bithiophenes Journal of Materials Chemistry. 17: 3427-3432. DOI: 10.1039/B701035D |
0.573 |
|
2007 |
Amy SR, Michalak DJ, Chabal YJ, Wielunski L, Hurley PT, Lewis NS. Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces Journal of Physical Chemistry C. 111: 13053-13061. DOI: 10.1021/Jp071793F |
0.448 |
|
2007 |
Wang Y, Ho MT, Goncharova LV, Wielunski LS, Rivillon-Amy S, Chabal YJ, Gustafsson T, Moumen N, Boleslawski M. Characterization of ultra-thin hafnium oxide films grown on silicon by atomic layer deposition using tetrakis(ethylmethyl-amino) hafnium and water precursors Chemistry of Materials. 19: 3127-3138. DOI: 10.1021/Cm061761P |
0.458 |
|
2006 |
Michalak DJ, Rivillon S, Chabal YJ, Estève A, Lewis NS. Infrared spectroscopic investigation of the reaction of hydrogen-terminated, (111)-oriented, silicon surfaces with liquid methanol. The Journal of Physical Chemistry. B. 110: 20426-34. PMID 17034227 DOI: 10.1021/Jp0624303 |
0.497 |
|
2006 |
Webb LJ, Rivillon S, Michalak DJ, Chabal YJ, Lewis NS. Transmission infrared spectroscopy of methyl- and ethyl-terminated silicon(111) surfaces. The Journal of Physical Chemistry. B. 110: 7349-56. PMID 16599509 DOI: 10.1021/Jp054618C |
0.472 |
|
2006 |
Soukiassian P, Silly MG, Radtke C, Enriquez H, D'angelo M, Derycke V, Aristov VY, Amy F, Chabal YJ, Moras P, Pedio M, Gardonio S, Ottaviani C, Perfetti P. Hydrogen nanochemistry achieving clean and pre-oxidized silicon carbide surface metallization Materials Science Forum. 667-672. DOI: 10.4028/Www.Scientific.Net/Msf.527-529.667 |
0.494 |
|
2006 |
Amy SR, Chabal YJ, Amy F, Kahn A, Krugg C, Kirsch P. Wet Chemical Cleaning of Germanium Surfaces for Growth of High-k Dielectrics Mrs Proceedings. 917. DOI: 10.1557/Proc-0917-E01-05 |
0.489 |
|
2006 |
Wang Y, Dai M, Ho MT, Rivillon S, Chabal YJ. In situ infrared absorption spectroscopy for thin film growth by atomic layer deposition Materials Research Society Symposium Proceedings. 967: 549-568. DOI: 10.1117/12.681331 |
0.515 |
|
2006 |
Edge LF, Schlom DG, Rivillon S, Chabal YJ, Agustin MP, Stemmer S, Lee T, Kim MJ, Craft HS, Maria JP, Hawley ME, Holländer B, Schubert J, Eisenbeiser K. Thermal stability of amorphous LaScO 3 films on silicon Applied Physics Letters. 89. DOI: 10.1063/1.2222302 |
0.345 |
|
2006 |
Rivillon S, Chabal YJ. Alkylation of silicon(111) surfaces Journal De Physique. Iv : Jp. 132: 195-198. DOI: 10.1051/Jp4:2006132037 |
0.467 |
|
2005 |
Langner A, Panarello A, Rivillon S, Vassylyev O, Khinast JG, Chabal YJ. Controlled silicon surface functionalization by alkene hydrosilylation. Journal of the American Chemical Society. 127: 12798-9. PMID 16159263 DOI: 10.1021/Ja054634N |
0.493 |
|
2005 |
Beverina A, Frank MM, Shang H, Rivillon S, Amy F, Hsueh CL, Paruchuri VK, Mo RT, Copel M, Gusev EP, Gribelyuk, Chabal YJ. High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation Solid State Phenomena. 3-6. DOI: 10.4028/Www.Scientific.Net/Ssp.103-104.3 |
0.452 |
|
2005 |
Rivillon S, Chabal YJ, Webb LJ, Michalak DJ, Lewis NS, Halls MD, Raghavachari K. Chlorination of hydrogen-terminated silicon (111) surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1100-1106. DOI: 10.1116/1.1861941 |
0.711 |
|
2005 |
Fontcuberta I Morral A, Zahler JM, Griggs MJ, Atwater HA, Chabal YJ. Spectroscopic studies of the mechanism for hydrogen-induced exfoliation of InP Physical Review B - Condensed Matter and Materials Physics. 72. DOI: 10.1103/Physrevb.72.085219 |
0.35 |
|
2005 |
Rivillon S, Chabal YJ, Amy F, Kahn A. Hydrogen passivation of germanium (100) surface using wet chemical preparation Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2142084 |
0.465 |
|
2005 |
Rivillon S, Brewer RT, Chabal YJ. Water reaction with chlorine-terminated silicon (111) and (100) surfaces Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2119426 |
0.436 |
|
2005 |
Ho MT, Wang Y, Brewer RT, Wielunski LS, Chabal YJ, Moumen N, Boleslawski M. In situ infrared spectroscopy of hafnium oxide growth on hydrogen-terminated silicon surfaces by atomic layer deposition Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2058226 |
0.48 |
|
2005 |
Frank MM, Wilk GD, Starodub D, Gustafsson T, Garfunkel E, Chabal YJ, Grazul J, Muller DA. Hf O 2 and Al 2 O 3 gate dielectrics on GaAs grown by atomic layer deposition Applied Physics Letters. 86: 1-3. DOI: 10.1063/1.1899745 |
0.372 |
|
2005 |
Wielunski LS, Chabal Y, Paunescu M, Ho MT, Brewer R, Reyes JE. Ion backscattering study of ultra-thin oxides: Al2O3 and AlHfOx films on Si Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions With Materials and Atoms. 241: 377-381. DOI: 10.1016/J.Nimb.2005.07.045 |
0.411 |
|
2004 |
de Boer B, Frank MM, Chabal YJ, Jiang W, Garfunkel E, Bao Z. Metallic contact formation for molecular electronics: interactions between vapor-deposited metals and self-assembled monolayers of conjugated mono- and dithiols. Langmuir : the Acs Journal of Surfaces and Colloids. 20: 1539-42. PMID 15801409 DOI: 10.1021/La0356349 |
0.326 |
|
2004 |
Lita B, Pluchery O, Opila RL, Chabal YJ, Bunea G, Holman JP, Bekos EJ. Wet chemical cleaning of plasma oxide grown on heated (001) InP surfaces Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 1885-1892. DOI: 10.1116/1.1774202 |
0.368 |
|
2004 |
Brewer RT, Ho MT, Zhang KZ, Goncharova LV, Starodub DG, Gustafsson T, Chabal YJ, Moumen N. Ammonia pretreatment for high-k dielectric growth on silicon Applied Physics Letters. 85: 3830-3832. DOI: 10.1063/1.1807024 |
0.4 |
|
2004 |
Rivillon S, Amy F, Chabal YJ, Frank MM. Gas phase chlorination of hydrogen-passivated silicon surfaces Applied Physics Letters. 85: 2583-2585. DOI: 10.1063/1.1796536 |
0.499 |
|
2004 |
Edge LF, Schlom DG, Brewer RT, Chabal YJ, Williams JR, Chambers SA, Hinkle C, Lucovsky G, Yang Y, Stemmer S, Copel M, Holländer B, Schubert J. Suppression of subcutaneous oxidation during the deposition of amorphous lanthanum aluminate on silicon Applied Physics Letters. 84: 4629-4631. DOI: 10.1063/1.1759065 |
0.398 |
|
2004 |
Queeney KT, Herbots N, Shaw JM, Atluri V, Chabal YJ. Infrared spectroscopic analysis of an ordered Si/SiO 2 interface Applied Physics Letters. 84: 493-495. DOI: 10.1063/1.1644030 |
0.432 |
|
2004 |
Frank MM, Sayan S, Dörmann S, Emge TJ, Wielunski LS, Garfunkel E, Chabal YJ. Hafnium oxide gate dielectrics grown from an alkoxide precursor: Structure and defects Materials Science and Engineering B: Solid-State Materials For Advanced Technology. 109: 6-10. DOI: 10.1016/J.Mseb.2003.10.020 |
0.361 |
|
2003 |
Derycke V, Soukiassian PG, Amy F, Chabal YJ, D'angelo MD, Enriquez HB, Silly MG. Nanochemistry at the atomic scale revealed in hydrogen-induced semiconductor surface metallization. Nature Materials. 2: 253-8. PMID 12690399 DOI: 10.1038/Nmat835 |
0.466 |
|
2003 |
Morral AFi, Zahler JM, Atwater HA, Frank MM, Chabal YJ, Ahrenkiel P, Wanlass M. Electrical and Structural Characterization of the Interface of Wafer Bonded InP/Si Mrs Proceedings. 763. DOI: 10.1557/Proc-763-B2.8 |
0.419 |
|
2003 |
Halls MD, Raghavachari K, Frank MM, Chabal YJ. Atomic layer deposition of Al2O3 on H-passivated Si: Al(CH3)2OH surface reactions with H/Si(100)-2 × 1 Physical Review B - Condensed Matter and Materials Physics. 68: 1613021-1613024. DOI: 10.1103/Physrevb.68.161302 |
0.692 |
|
2003 |
Amy F, Chabal YJ. Interaction of H, O2, and H2O with 3C-SiC surfaces Journal of Chemical Physics. 119: 6201-6209. DOI: 10.1063/1.1602052 |
0.418 |
|
2003 |
Pluchery O, Chabal YJ, Opila RL. Wet chemical cleaning of InP surfaces investigated by in situ and ex situ infrared spectroscopy Journal of Applied Physics. 94: 2707-2715. DOI: 10.1063/1.1596719 |
0.435 |
|
2003 |
Frank MM, Chabal YJ, Green ML, Delabie A, Brijs B, Wilk GD, Ho M, Rosa EBOd, Baumvol IJR, Stedile FC. Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon Applied Physics Letters. 83: 740-742. DOI: 10.1063/1.1595719 |
0.439 |
|
2003 |
Frank MM, Chabal YJ, Wilk GD. Nucleation and interface formation mechanisms in atomic layer deposition of gate oxides Applied Physics Letters. 82: 4758-4760. DOI: 10.1063/1.1585129 |
0.385 |
|
2003 |
Queeney KT, Weldon MK, Chabal YJ, Raghavachari K. The microscopic origin of optical phonon evolution during water oxidation of Si(100) Journal of Chemical Physics. 119: 2307-2313. DOI: 10.1063/1.1582832 |
0.446 |
|
2003 |
De Boer B, Meng H, Perepichka DF, Zheng J, Frank MM, Chabal YJ, Bao Z. Synthesis and characterization of conjugated mono- and dithiol oligomers and characterization of their self-assembled monolayers Langmuir. 19: 4272-4284. DOI: 10.1021/La0341052 |
0.339 |
|
2003 |
Kwo J, Hong M, Busch B, Muller DA, Chabal YJ, Kortan AR, Mannaerts JP, Yang B, Ye P, Gossmann H, Sergent AM, Ng KK, Bude J, Schulte WH, Garfunkel E, et al. Advances in high κ gate dielectrics for Si and III-V semiconductors Journal of Crystal Growth. 251: 645-650. DOI: 10.1016/S0022-0248(02)02192-9 |
0.397 |
|
2002 |
Frank MM, Chabal YJ, Wilk GD. In situ spectroscopic approach to atomic layer deposition Materials Research Society Symposium - Proceedings. 745: 41-46. DOI: 10.1557/Proc-745-N2.4 |
0.431 |
|
2002 |
Busch BW, Pluchery O, Chabal YJ, Muller DA, Opila RL, Raynien Kwo J, Garfunkel E. Materials Characterization of Alternative Gate Dielectrics Mrs Bulletin. 27: 206-211. DOI: 10.1557/Mrs2002.72 |
0.364 |
|
2002 |
Chabal YJ, Raghavachari K, Zhang X, Garfunkel E. Silanone ( Si = O ) on Si(100): intermediate for initial silicon oxidation Physical Review B. 66: 1-4. DOI: 10.1103/Physrevb.66.161315 |
0.419 |
|
2002 |
Fukidome H, Pluchery O, Queeney KT, Caudano Y, Raghavachari K, Weldon MK, Chaban EE, Christman SB, Kobayashi H, Chabal YJ. In situ vibrational study of SiO2/liquid interfaces Surface Science. 502: 498-502. DOI: 10.1016/S0039-6028(01)01998-7 |
0.415 |
|
2002 |
Caudano Y, Thiry PA, Chabal YJ. Investigation of the bending vibrations of vicinal H/Si(1 1 1) surfaces by infrared spectroscopy Surface Science. 502: 91-95. DOI: 10.1016/S0039-6028(01)01904-5 |
0.46 |
|
2002 |
Pluchery O, Eng J, Opila RL, Chabal YJ. Vibrational study of indium phosphide oxides Surface Science. 502: 75-80. DOI: 10.1016/S0039-6028(01)01901-X |
0.36 |
|
2002 |
Chabal YJ, Raghavachari K. Applications of infrared absorption spectroscopy to the microelectronics industry Surface Science. 502: 41-50. DOI: 10.1016/S0039-6028(01)01896-9 |
0.391 |
|
2002 |
Weldon MK, Queeney KT, Eng J, Raghavachari K, Chabal YJ. The surface science of semiconductor processing: Gate oxides in the ever-shrinking transistor Surface Science. 500: 859-878. DOI: 10.1016/S0039-6028(01)01585-0 |
0.392 |
|
2001 |
Queeney KT, Chabal YJ, Raghavachari K. Role of interdimer interactions in NH3 dissociation on si(100)-(2x1). Physical Review Letters. 86: 1046-9. PMID 11178006 DOI: 10.1103/Physrevlett.86.1046 |
0.44 |
|
2001 |
Eng J, Opila RL, Rosamilia JM, Sapjeta BJ, Chabal YJ, Boone T, Masaitis R, Sorsch T, Green ML. The evolution of chemical oxides into ultrathin oxides: A spectroscopic characterization Solid State Phenomena. 76: 145-148. DOI: 10.4028/Www.Scientific.Net/Ssp.76-77.145 |
0.333 |
|
2001 |
Zhang X, Chabal YJ, Christman SB, Chaban EE, Garfunkel E. Oxidation of H-covered flat and vicinal Si(111)-1×1 surfaces Journal of Vacuum Science and Technology. 19: 1725-1729. DOI: 10.1116/1.1335680 |
0.499 |
|
2001 |
Zhang X, Garfunkel E, Chabal YJ, Christman SB, Chaban EE. Stability of HF-etched Si(100) surfaces in oxygen ambient Applied Physics Letters. 79: 4051-4053. DOI: 10.1063/1.1425461 |
0.478 |
|
2001 |
Estève A, Chabal YJ, Raghavachari K, Weldon MK, Queeney KT, Djafari Rouhani M. Water-saturated Si(100)-(2×1): Kinetic Monte Carlo simulations of thermal oxygen incorporation Journal of Applied Physics. 90: 6000-6005. DOI: 10.1063/1.1417994 |
0.416 |
|
2001 |
Kwo J, Hong M, Kortan AR, Queeney KL, Chabal YJ, Opila RL, Muller DA, Chu SNG, Sapjeta BJ, Lay TS, Mannaerts JP, Boone T, Krautter HW, Krajewski JJ, Sergnt AM, et al. Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si Journal of Applied Physics. 89: 3920-3927. DOI: 10.1063/1.1352688 |
0.399 |
|
2001 |
Queeney KT, Fukidome H, Chaban EE, Chabal YJ. In-Situ FTIR Studies of Reactions at the Silicon/Liquid Interface: Wet Chemical Etching of Ultrathin SiO2 on Si(100)† Journal of Physical Chemistry B. 105: 3903-3907. DOI: 10.1021/Jp003409J |
0.459 |
|
2001 |
Queeney KT, Fukidome H, Chaban EE, Chabal YJ. In-Situ FTIR Studies of Reactions at the Silicon/Liquid Interface: Wet Chemical Etching of Ultrathin SiO2 on Si(100) Journal of Physical Chemistry B. 105: 3903-3907. |
0.354 |
|
2000 |
Chabal YJ, Isaacs ED, Weldon MK. Mechanistic studies of wafer bonding and thin silicon film exfoliation Materials Research Society Symposium - Proceedings. 587. DOI: 10.1557/Proc-587-O4.4 |
0.396 |
|
2000 |
Weldon MK, Queeney KT, Gurevich AB, Stefanov BB, Chabal YJ, Raghavachari K. Si-H bending modes as a probe of local chemical structure: Thermal and chemical routes to decomposition of H2O on Si(100)-(2×1) Journal of Chemical Physics. 113: 2440-2446. DOI: 10.1063/1.482061 |
0.483 |
|
2000 |
Queeney KT, Weldon MK, Chang JP, Chabal YJ, Gurevich AB, Sapjeta J, Opila RL. Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon Journal of Applied Physics. 87: 1322-1330. DOI: 10.1063/1.372017 |
0.406 |
|
2000 |
Kwo J, Hong M, Kortan AR, Queeney KT, Chabal YJ, Mannaerts JP, Boone T, Krajewski JJ, Sergent AM, Rosamilia JM. High ε gate dielectrics Gd2O3 and Y2O3 for silicon Applied Physics Letters. 77: 130-132. DOI: 10.1063/1.126899 |
0.342 |
|
1999 |
Chabal YJ, Weldon MK, Gurevich AB, Christman SB. Infrared absorption studies of wet chemical oxides: Thermal evolution of impurities Diffusion and Defect Data Pt.B: Solid State Phenomena. 65: 253-256. DOI: 10.4028/Www.Scientific.Net/Ssp.65-66.253 |
0.381 |
|
1999 |
Dumas P, Weldon MK, Chabal YJ, Williams GP. Molecules at surfaces and interfaces studied using vibrational spectroscopies and related techniques Surface Review and Letters. 6: 225-255. DOI: 10.1142/S0218625X99000263 |
0.398 |
|
1999 |
Queeney KT, Chabal YJ, Stefanov BB, Raghavachari K. Mechanistic studies of silicon oxidation Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 1795-1802. DOI: 10.1116/1.590829 |
0.364 |
|
1999 |
Honke R, Jakob P, Chabal YJ, Dvořák A, Tausendpfund S, Stigler W, Pavone P, Mayer AP, Schröder U. Anharmonic adlayer vibrations on the Si(111):H surface Physical Review B. 59: 10996-11013. DOI: 10.1103/Physrevb.59.10996 |
0.45 |
|
1999 |
Gurevich AB, Weldon MK, Chabal YJ, Opila RL, Sapjeta J. Thermal evolution of impurities in wet chemical silicon oxides Applied Physics Letters. 74: 1257-1259. DOI: 10.1063/1.123517 |
0.374 |
|
1999 |
Diebold AC, Venables D, Chabal Y, Muller D, Weldon M, Garfunkel E. Characterization and production metrology of thin transistor gate oxide films Materials Science in Semiconductor Processing. 2: 103-147. DOI: 10.1016/S1369-8001(99)00009-8 |
0.37 |
|
1999 |
Chabal YJ, Weldon MK, Caudano Y, Stefanov BB, Raghavachari K. Spectroscopic studies of H-decorated interstitials and vacancies in thin-film silicon exfoliation Physica B: Condensed Matter. 273: 152-163. DOI: 10.1016/S0921-4526(99)00435-4 |
0.41 |
|
1999 |
Queeney KT, Chabal YJ, Weldon MK, Raghavachari K. Silicon oxidation and ultra-thin oxide formation on silicon studied by infrared absorption spectroscopy Physica Status Solidi (a) Applied Research. 175: 77-88. DOI: 10.1002/(Sici)1521-396X(199909)175:1<77::Aid-Pssa77>3.0.Co;2-F |
0.355 |
|
1998 |
Jackson WB, Franz A, Chabal Y, Weldon MK, Jin H, Abelson JR. Hydrogen Structures in Heavily Hydrogenated Crystalline and Amorphous Silicon Mrs Proceedings. 513. DOI: 10.1557/Proc-513-381 |
0.42 |
|
1998 |
Stefanov BB, Gurevich AB, Weldon MK, Raghavachari K, Chabal YJ. Silicon epoxide: Unexpected intermediate during silicon oxide formation Physical Review Letters. 81: 3908-3911. DOI: 10.1103/Physrevlett.81.3908 |
0.442 |
|
1998 |
Gurevich AB, Stefanov BB, Weldon MK, Chabal YJ, Raghavachari K. Heterogeneous nucleation of oxygen on silicon: Hydroxyl-mediated interdimer coupling on Si(100)-(2 × 1) Physical Review B - Condensed Matter and Materials Physics. 58: R13434-R13437. DOI: 10.1103/Physrevb.58.R13434 |
0.375 |
|
1998 |
Eng J, Raghavachari K, Struck LM, Chabal YJ, Bent BE, Banaszak-Holl MM, McFeely FR, Michaels AM, Flynn GW, Christman SB, Chaban EE, Williams GP, Radermacher K, Mantl S. An infrared study of H8Si8O12 cluster adsorption on Si(100) surfaces Journal of Chemical Physics. 108: 8680-8688. DOI: 10.1063/1.476411 |
0.41 |
|
1998 |
Weldon MK, Collot M, Chabal YJ, Venezia VC, Agarwal A, Haynes TE, Eaglesham DJ, Christman SB, Chaban EE. Mechanism of silicon exfoliation induced by hydrogen/helium co-implantation Applied Physics Letters. 73: 3721-3723. DOI: 10.1063/1.122875 |
0.343 |
|
1998 |
Alers GB, Werder DJ, Chabal Y, Lu HC, Gusev EP, Garfunkel E, Gustafsson T, Urdahl RS. Intermixing at the tantalum oxide/silicon interface in gate dielectric structures Applied Physics Letters. 73: 1517-1519. DOI: 10.1063/1.122191 |
0.397 |
|
1998 |
Martin MG, Avila J, Gruyters M, Teodorescu C, Dumas P, Chabal YJ, Asensio MC. Initial stage of the growth of Fe on Si(111)(1 × 1)-H Applied Surface Science. 123: 156-160. DOI: 10.1016/S0169-4332(97)00485-6 |
0.441 |
|
1997 |
Luo H, Chidsey CED, Chabal Y. Infrared Spectroscopy of Covalently Bonded Species on Silicon
Surfaces: Deuterium, Chlorine, and Cobalt Tetracarbonyl Mrs Proceedings. 477. DOI: 10.1557/Proc-477-415 |
0.507 |
|
1997 |
Weldon MK, Marsico VE, Chabal YJ, Agarwal A, Eaglesham DJ, Sapjeta J, Brown WL, Jacobson DC, Caudano Y, Christman SB, Chaban EE. On the mechanism of the hydrogen-induced exfoliation of silicon Journal of Vacuum Science & Technology B. 15: 1065-1073. DOI: 10.1116/1.589416 |
0.406 |
|
1997 |
Weldon MK, Stefanov BB, Raghavachari K, Chabal YJ. Initial H2O-induced oxidation of Si(100)-(2 × 1) Physical Review Letters. 79: 2851-2854. DOI: 10.1103/Physrevlett.79.2851 |
0.375 |
|
1997 |
Eng J, Raghavachari K, Struck LM, Chabal YJ, Bent BE, Flynn GW, Christman SB, Chaban EE, Williams GP, Radermacher K, Mantl S. A vibrational study of ethanol adsorption on Si(100) Journal of Chemical Physics. 106: 9889-9898. DOI: 10.1063/1.473877 |
0.455 |
|
1997 |
Struck LM, Eng J, Bent BE, Flynn GW, Chabal YJ, Christman SB, Chaban EE, Raghavachari K, Williams GP, Radermacher K, Mantl S. Vibrational study of silicon oxidation: H2O on Si(100) Surface Science. 380: 444-454. DOI: 10.1016/S0039-6028(97)00041-1 |
0.415 |
|
1997 |
Dumas P, Suhren M, Chabal YJ, Hirschmugl CJ, Williams GP. Adsorption and reactivity of NO on Cu(111): A synchrotron infrared reflection absorption spectroscopic study Surface Science. 371: 200-212. DOI: 10.1016/S0039-6028(96)00987-9 |
0.358 |
|
1997 |
Chabal YJ, Weldon MK, Marsico VE. Applications of infrared absorption spectroscopy to the microelectronic industry Journal De Physique. Iv : Jp. 7. |
0.31 |
|
1996 |
Chabal YJ. Physics and chemistry of silicon wafer bonding investigated by infrared absorption spectroscopy Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 14: 3095-3106. DOI: 10.1116/1.589070 |
0.491 |
|
1996 |
Dumas P, Gruyters M, Rudolf P, He Y, Yu L, Gensterblum G, Caudano R, Chabal Y. Vibrational study of C60 overlayers on Surface Science. 368: 330-336. DOI: 10.1016/S0039-6028(97)80028-3 |
0.446 |
|
1996 |
Weldon MK, Marsico VE, Chabal YJ, Hamann DR, Christman SB, Chaban EE. Infrared spectroscopy as a probe of fundamental processes in microelectronics : silicon wafer cleaning and bonding Surface Science. 368: 163-178. DOI: 10.1016/S0039-6028(96)01046-1 |
0.475 |
|
1996 |
Raghavachari K, Chabal YJ, Struck LM. Vibrational interactions at surfaces: H2O on Si(100) Chemical Physics Letters. 252: 230-235. DOI: 10.1016/0009-2614(96)00096-6 |
0.399 |
|
1995 |
Schuppler S, Friedman SL, Marcus MA, Adler DL, Xie Y, Ross FM, Chabal YJ, Harris TD, Brus LE, Brown WL, Chaban EE, Szajowski PF, Christman SB, Citrin PH. Size, shape, and composition of luminescent species in oxidized Si nanocrystals and H-passivated porous Si. Physical Review. B, Condensed Matter. 52: 4910-4925. PMID 9981675 DOI: 10.1103/Physrevb.52.4910 |
0.406 |
|
1995 |
Chabal YJ, Hines MA, Feijóo D. Characterization of silicon surfaces and interfaces by optical vibrational spectroscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 13: 1719-1727. DOI: 10.1116/1.579758 |
0.642 |
|
1995 |
Pietsch GJ, Chabal YJ, Higashi GS. Infrared-absorption spectroscopy of Si(100) and Si(111) surfaces after chemomechanical polishing Journal of Applied Physics. 78: 1650-1658. DOI: 10.1063/1.360721 |
0.479 |
|
1995 |
Dumas P, Chabal YJ, Gunther R, Ibrahimi AT, Petroff Y. Vibrational characterization and electronic properties of long range-ordered, ideally hydrogen-terminated Si(111) Progress in Surface Science. 48: 313-324. DOI: 10.1016/0079-6816(95)93437-C |
0.492 |
|
1995 |
Pietsch GJ, Chabal YJ, Higashi GS. The atomic-scale removal mechanism during chemo-mechanical polishing of Si(100) and Si(111) Surface Science. 331: 395-401. DOI: 10.1016/0039-6028(95)00292-8 |
0.474 |
|
1994 |
Schuppler S, Friedman SL, Marcus MA, Adler DL, Xie Y, Ross FM, Harris TD, Brown WL, Chabal YJ, Brus LE, Citrin PH. Dimensions of luminescent oxidized and porous silicon structures. Physical Review Letters. 72: 2648-2651. PMID 10055937 DOI: 10.1103/Physrevlett.72.2648 |
0.393 |
|
1994 |
Schuppler S, Friedman SL, Marcus MA, Adler D, Xie Y, Ross FM, Harris TD, Brown W, Chabal YJ, Szajowski PJ, Chaban EE, Brus LE, Citrin PH. Size, Shape, and Crystallinity of Luminescent Structures in Oxidized Si Nanoclusters and H-Passivated Porous Si Mrs Proceedings. 358. DOI: 10.1557/Proc-358-407 |
0.413 |
|
1994 |
Aydil ES, Gottscho RA, Chabal YJ. Real-time monitoring of surface chemistry during plasma processing Pure and Applied Chemistry. 66: 1381-1388. DOI: 10.1351/Pac199466061381 |
0.39 |
|
1994 |
Hirschmugl CJ, Chabal YJ, Hoffmann FM, Williams GP. Low-frequency dynamics of CO/Cu breakdown of Born-Oppenheimer approximation Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 12: 2229-2234. DOI: 10.1116/1.579120 |
0.307 |
|
1994 |
Hines MA, Chabal YJ, Harris TD, Harris AL. Measuring the structure of etched silicon surfaces with Raman spectroscopy The Journal of Chemical Physics. 101: 8055-8072. DOI: 10.1063/1.468232 |
0.652 |
|
1994 |
Kuhnke K, Harris AL, Chabal YJ, Jakob P, Morin M. Transient vibrational mode renormalization in dipole-coupled adsorbates at surfaces The Journal of Chemical Physics. 100: 6896-6906. DOI: 10.1063/1.467005 |
0.386 |
|
1994 |
Feijoó D, Chabal YJ, Christman SB. Silicon wafer bonding studied by infrared absorption spectroscopy Applied Physics Letters. 65: 2548-2550. DOI: 10.1063/1.112631 |
0.4 |
|
1994 |
Pietsch GJ, Higashi GS, Chabal YJ. Chemomechanical polishing of silicon: Surface termination and mechanism of removal Applied Physics Letters. 64: 3115-3117. DOI: 10.1063/1.111365 |
0.43 |
|
1994 |
Vinh LT, Eddrief M, Sébenne CA, Dumas P, Taleb‐Ibrahimi A, Gunther R, Chabal YJ, Derrien J. Low temperature formation of Si(111)7×7 surfaces from chemically prepared H/Si(111)‐(1×1) surfaces Applied Physics Letters. 64: 3308-3310. DOI: 10.1063/1.111288 |
0.487 |
|
1994 |
Taleb-Ibrahimi A, Gunther R, Dumas P, Indlekofer G, Chabal YJ, Petroff Y. High resolution photoemission spectroscopy of flat and stepped non reconstructed H/Si(111) surfaces Journal De Physique. Iv : Jp. 4. DOI: 10.1051/Jp4:1994911 |
0.495 |
|
1994 |
Jakob P, Chabal YJ, Kuhnke K, Christman SB. Monohydride structures on chemically prepared silicon surfaces Surface Science. 302: 49-56. DOI: 10.1016/0039-6028(94)91095-2 |
0.515 |
|
1993 |
Hines MA, Chabal YJ, Harris TD, Harris AL. Raman studies of steric hindrance and surface relaxation of stepped H-terminated silicon surfaces. Physical Review Letters. 71: 2280-2283. PMID 10054633 DOI: 10.1103/Physrevlett.71.2280 |
0.657 |
|
1993 |
Jakob P, Chabal YJ, Raghavachari K, Christman SB. Discrete nature of inhomogeneity on stepped H/Si(111) surfaces: Spectroscopic identification of individual terrace sizes. Physical Review. B, Condensed Matter. 47: 6839-6842. PMID 10004674 DOI: 10.1103/Physrevb.47.6839 |
0.463 |
|
1993 |
Raghavachari K, Higashi GS, Chabal YJ, Trucks GW. First-principles study of the etching reactions of HF and H2O with Si/SiO2 surfaces Materials Research Society Symposium Proceedings. 315: 437-446. DOI: 10.1557/Proc-315-437 |
0.482 |
|
1993 |
CHABAL Y, HARRIS A, RAGHAVACHARI K, TULLY J. INFRARED SPECTROSCOPY OF H-TERMINATED SILICON SURFACES International Journal of Modern Physics B. 7: 1031-1078. DOI: 10.1142/S0217979293002237 |
0.495 |
|
1993 |
Kuhnke K, Morin M, Jakob P, Levinos NJ, Chabal YJ, Harris AL. Vibrational energy transfer among adsorbate modes: Picosecond dynamics on stepped H/Si(111) The Journal of Chemical Physics. 99: 6114-6125. DOI: 10.1063/1.465907 |
0.374 |
|
1993 |
Aydil ES, Zhou Z, Giapis KP, Chabal Y, Gregus JA, Gottscho RA. Real‐time,insitumonitoring of surface reactions during plasma passivation of GaAs Applied Physics Letters. 62: 3156-3158. DOI: 10.1063/1.109113 |
0.436 |
|
1993 |
Harris AL, Kuhnke K, Morin M, Jakob P, Levinos NJ, Chabal YJ. Vibrational energy flow at stepped H/Si(111): phonons, dipoles and screening Faraday Discussions. 96: 217. DOI: 10.1039/Fd9939600217 |
0.336 |
|
1993 |
Hines MA, Harris TD, Harris AL, Chabal YJ. Looking up the down staircase: Surface Raman spectroscopy as a probe of adsorbate orientation Journal of Electron Spectroscopy and Related Phenomena. 64: 183-191. DOI: 10.1016/0368-2048(93)80078-Z |
0.632 |
|
1993 |
Jakob P, Chabal YJ, Raghavachari K. The role of kinks in the Si-H vibrational spectrum of vicinal Si(111)-〈112〉 surfaces Journal of Electron Spectroscopy and Related Phenomena. 64: 59-66. DOI: 10.1016/0368-2048(93)80061-P |
0.447 |
|
1993 |
Morin M, Kuhnke K, Jakob P, Chabal YJ, Levinos NJ, Harris A. Interadsorbate vibrational energy flow on stepped vicinal H/Si(111) surfaces Journal of Electron Spectroscopy and Related Phenomena. 11-21. DOI: 10.1016/0368-2048(93)80057-S |
0.412 |
|
1993 |
Dumas P, Chabal YJ, Jakob P. Vibrational properties of H/Si(111)-(1 × 1) surfaces: infrared absorption and electron energy loss spectroscopic studies Applied Surface Science. 65: 580-586. DOI: 10.1016/0169-4332(93)90722-N |
0.475 |
|
1993 |
Jakob P, Chabal YJ, Raghavachari K, Dumas P, Christman SB. Imperfections on the chemically prepared, ideally H-terminated Si(111)-(1 × 1) surfaces Surface Science. 285: 251-258. DOI: 10.1016/0039-6028(93)90436-N |
0.465 |
|
1993 |
Chabal YJ. Infrared spectroscopy of semiconductor surfaces: H-terminated silicon surfaces Journal of Molecular Structure. 292: 65-80. DOI: 10.1016/0022-2860(93)80090-I |
0.498 |
|
1993 |
Raghavachari K, Jakob P, Chabal YJ. Step relaxation and surface stress at H-terminated vicinal Si(111) Chemical Physics Letters. 206: 156-160. DOI: 10.1016/0009-2614(93)85533-T |
0.469 |
|
1992 |
Bouzidi S, Coletti F, Debever JM, Thiry PA, Dumas P, Chabal YJ. Inverse-photoemission spectroscopy of the unreconstructed, ideally H-terminated Si(111) surface Physical Review B. 45: 1187-1192. PMID 10001593 DOI: 10.1103/Physrevb.45.1187 |
0.372 |
|
1992 |
Chabal YJ. Etching of Silicon (111) and (100) Surfaces in HF Solutions: H-Termination, Atomic Structure and Overall Morphology Mrs Proceedings. 259: 349. DOI: 10.1557/Proc-259-349 |
0.497 |
|
1992 |
Dumas P, Chabal YJ. Electron energy loss spectroscopy of H-terminated Si(111) and Si(100) prepared by chemical etching Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 10: 2160-2165. DOI: 10.1116/1.577998 |
0.464 |
|
1992 |
Morin M, Jakob P, Levinos NJ, Chabal YJ, Harris AL. Vibrational energy transfer on hydrogen-terminated vicinal Si(111) surfaces: Interadsorbate energy flow The Journal of Chemical Physics. 96: 6203-6212. DOI: 10.1063/1.462637 |
0.445 |
|
1992 |
Dumas P, Chabal YJ, Jakob P. Morphology of hydrogen-terminated Si(111) and Si(100) surfaces upon etching in HF and buffered-HF solutions Surface Science. 269: 867-878. DOI: 10.1016/0039-6028(92)91363-G |
0.474 |
|
1992 |
Bouzidi S, Coletti F, Debever JM, Thiry PA, Dumas P, Chabal YJ. Conduction-bands asymmetry of Si(111) revealed by inverse photoemission Surface Science. 829-832. DOI: 10.1016/0039-6028(92)91356-G |
0.367 |
|
1992 |
Jakob P, Chabal YJ, Raghavachari K, Becker RS, Becker AJ. Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions Surface Science. 275: 407-413. DOI: 10.1016/0039-6028(92)90813-L |
0.488 |
|
1991 |
Jakob P, Chabal YJ. Chemical etching of vicinal Si(111): Dependence of the surface structure and the hydrogen termination on the pH of the etching solutions The Journal of Chemical Physics. 95: 2897-2909. DOI: 10.1063/1.460892 |
0.462 |
|
1991 |
Prybyla JA, Estrup PJ, Chabal YJ. Phase transitions, surface structures, and adsorbate bonding in the H/Mo(100) chemisorption system The Journal of Chemical Physics. 94: 6274-6295. DOI: 10.1063/1.460417 |
0.392 |
|
1991 |
Jakob P, Dumas P, Chabal YJ. Influence of silicon oxide on the morphology of HF-etched Si(111) surfaces: Thermal versus chemical oxide Applied Physics Letters. 59: 2968-2970. DOI: 10.1063/1.105814 |
0.495 |
|
1991 |
Higashi GS, Becker RS, Chabal YJ, Becker AJ. Comparison of Si(111) surfaces prepared using aqueous solutions of NH 4F versus HF Applied Physics Letters. 58: 1656-1658. DOI: 10.1063/1.105155 |
0.464 |
|
1991 |
Chabal YJ. Infrared spectroscopy of hydrogen on silicon surfaces Physica B: Physics of Condensed Matter. 170: 447-456. DOI: 10.1016/0921-4526(91)90159-C |
0.495 |
|
1991 |
Chabal YJ, Dumas P, Guyot-Sionnest P, Higashi GS. Vibrational dynamics of the ideally H-terminated Si(111) surface Surface Science. 242: 524-530. DOI: 10.1016/0039-6028(91)90321-I |
0.42 |
|
1991 |
Dumas P, Chabal YJ. Electron-energy-loss characterization of the H-terminated Si(111) and Si(100) surfaces obtained by etching in NH4F Chemical Physics Letters. 181: 537-543. DOI: 10.1016/0009-2614(91)80309-L |
0.475 |
|
1990 |
Dumas P, Chabal YJ, Higashi GS. Coupling of an adsorbate vibration to a substrate surface phonon: H on Si(111). Physical Review Letters. 65: 1124-1127. PMID 10043111 DOI: 10.1103/Physrevlett.65.1124 |
0.446 |
|
1990 |
Trucks GW, Raghavachari K, Higashi GS, Chabal YJ. Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation. Physical Review Letters. 65: 504-507. PMID 10042937 DOI: 10.1103/Physrevlett.65.504 |
0.474 |
|
1990 |
Hirschmugl CJ, Williams GP, Hoffmann FM, Chabal YJ. Adsorbate-substrate resonant interactions observed for CO on Cu(100) in the far infrared. Physical Review Letters. 65: 480-483. PMID 10042931 DOI: 10.1103/Physrevlett.65.480 |
0.321 |
|
1990 |
Becker RS, Higashi GS, Chabal YJ, Becker AJ. Atomic-scale conversion of clean Si(111):H-1 x 1 to Si(111)-2 x 1 by electron-stimulated desorption. Physical Review Letters. 65: 1917-1920. PMID 10042397 DOI: 10.1103/Physrevlett.65.1917 |
0.373 |
|
1990 |
Guyot-Sionnest P, Dumas P, Chabal YJ, Higashi GS. Lifetime of an adsorbate-substrate vibration: H on Si(111). Physical Review Letters. 64: 2156-2159. PMID 10041598 DOI: 10.1103/Physrevlett.64.2156 |
0.393 |
|
1990 |
vom Felde A, Kern K, Higashi GS, Chabal YJ, Christman SB, Bahr CC, Cardillo MJ. Oxidation of GaAs(110) with NO2: Infrared spectroscopy. Physical Review. B, Condensed Matter. 42: 5240-5248. PMID 9996088 DOI: 10.1103/Physrevb.42.5240 |
0.319 |
|
1990 |
Trucks GW, Raghavachari K, Higashi GS, Chabal YJ. Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation Physical Review Letters. 65: 504-507. DOI: 10.1103/PhysRevLett.65.504 |
0.368 |
|
1990 |
Dumas P, Chabal YJ, Higashi GS. Coupling of an adsorbate vibration to a substrate surface phonon: H on Si(111) Physical Review Letters. 65: 1124-1127. DOI: 10.1103/PhysRevLett.65.1124 |
0.34 |
|
1990 |
Reutt-Robey JE, Doren DJ, Chabal YJ, Christman SB. CO diffusion on Pt(111) with time-resolved Infrared-pulsed molecular beam methods: Critical tests and analysis The Journal of Chemical Physics. 93: 9113-9129. DOI: 10.1063/1.459202 |
0.327 |
|
1990 |
Higashi GS, Chabal YJ, Trucks GW, Raghavachari K. Ideal hydrogen termination of the Si (111) surface Applied Physics Letters. 56: 656-658. DOI: 10.1063/1.102728 |
0.499 |
|
1990 |
Berrada K, Dumas P, Chabal YJ, Dubot P. Adsorption states and orientation of N-alkyl anhydride molecules on oxidized aluminium surface Journal of Electron Spectroscopy and Related Phenomena. 54: 1153-1162. DOI: 10.1016/0368-2048(90)80305-T |
0.365 |
|
1990 |
Doak RB, Chabal YJ, Higashi GS, Dumas P. Inelastic helium scattering measurements of surface phonons in hydrogen-terminated Si(111) (1 × 1) Journal of Electron Spectroscopy and Related Phenomena. 54: 291-298. DOI: 10.1016/0368-2048(90)80221-U |
0.488 |
|
1990 |
Hirschmugl CJ, Williams GP, Hoffmann FM, Chabal YJ. Adsorbate-substrate resonant interactions observed for Co on Cu(100) and (111) in the far-ir using synchrotron radiation Journal of Electron Spectroscopy and Related Phenomena. 54: 109-114. DOI: 10.1016/0368-2048(90)80203-M |
0.305 |
|
1990 |
Dumas P, Chabal YJ, Higashi GS. Lineshape of the Si-H stretching vibration for the ideally H-terminated Si(111)1×1 Journal of Electron Spectroscopy and Related Phenomena. 54: 103-108. DOI: 10.1016/0368-2048(90)80202-L |
0.462 |
|
1990 |
Guyot-Sionnest P, Dumas P, Chabal YJ. Lifetime of an adsorbate-substrate vibration measured by sum frequency generation : H on Si(111) Journal of Electron Spectroscopy and Related Phenomena. 54: 27-38. DOI: 10.1016/0368-2048(90)80198-J |
0.353 |
|
1990 |
Chabal YJ. Molecular diffusion on metal surfaces: time-resolved infrared spectroscopy and other techniques Vacuum. 41: 70-73. DOI: 10.1016/0042-207X(90)90275-4 |
0.33 |
|
1990 |
Kern K, Chabal Y, Higashi G, Vom Felde A, Cardillo M. Low temperature adsorption and reaction of NO on GaAs(110) Chemical Physics Letters. 168: 203-207. DOI: 10.1016/0009-2614(90)85130-5 |
0.41 |
|
1989 |
Chabal YJ, Higashi GS, Raqhavachari K, Burrows VA. Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 7: 2104-2109. DOI: 10.1557/Proc-131-191 |
0.514 |
|
1989 |
Reutt-Robey JE, ChabaL YJ, Doren DJ, Christman SB. CO diffusion on Pt(111) by time-resolved surface infrared spectroscopy Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 7: 2227-2234. DOI: 10.1116/1.575963 |
0.35 |
|
1988 |
Reutt-Robey JE, Doren DJ, Chabal YJ, Christman SB. Microscopic CO diffusion on a Pt(111) surface by time-resolved infrared spectroscopy. Physical Review Letters. 61: 2778-2781. PMID 10039220 DOI: 10.1103/Physrevlett.61.2778 |
0.354 |
|
1988 |
Reutt JE, Chabal YJ, Christman SB. Coupling of H vibration to substrate electronic states in Mo(100)-p(1×1)H and W(100)-p(1×1)H: Example of strong breakdown of adiabaticity Physical Review B. 38: 3112-3132. DOI: 10.1103/Physrevb.38.3112 |
0.372 |
|
1988 |
Swanson JR, Friend CM, Chabal YJ. Erratum: Laser‐assisted deposition of iron on Si(111)‐(7×7): The mechanism and energetics of Fe(CO)5 decomposition [J. Chem. Phys. 87, 5028 (1987)] The Journal of Chemical Physics. 89: 2593-2593. DOI: 10.1063/1.455741 |
0.308 |
|
1988 |
Burrows VA, Chabal YJ, Higashi GS, Raghavachari K, Christman SB. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology Applied Physics Letters. 53: 998-1000. DOI: 10.1063/1.100053 |
0.489 |
|
1988 |
Chabal YJ. Surface infrared spectroscopy Surface Science Reports. 8: 211-357. DOI: 10.1016/0167-5729(88)90011-8 |
0.416 |
|
1987 |
Swanson JR, Friend C, Chabal Y. Laser-Assisted Deposition of Fe and W: Photodecomposition of Fe(CO)5, and W(CO)6 on Si(111)-(7×7) Mrs Proceedings. 101. DOI: 10.1557/Proc-101-201 |
0.38 |
|
1987 |
Prybyla JA, Estrup PJ, Chabal YJ. Summary Abstract: Reconstruction, adsorbate bonding, and desorption kinetics of H/Mo(100) Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 5: 791-792. DOI: 10.1116/1.574347 |
0.318 |
|
1987 |
Chabal YJ, Patel CKN. Molecular hydrogen in a-Si: H Reviews of Modern Physics. 59: 835-844. DOI: 10.1103/Revmodphys.59.835 |
0.369 |
|
1987 |
Prybyla JA, Estrup PJ, Ying SC, Chabal YJ, Christman SB. Reconstructive phase transitions and effective adsorbate-adsorbate interactions: H/Mo(100) and H/W(100) Physical Review Letters. 58: 1877-1880. DOI: 10.1103/Physrevlett.58.1877 |
0.383 |
|
1987 |
Swanson JR, Friend CM, Chabal YJ. Laser‐assisted deposition of iron on Si(111)‐(7×7): The mechanism and energetics of Fe(CO)5 decomposition The Journal of Chemical Physics. 87: 5028-5037. DOI: 10.1063/1.452819 |
0.34 |
|
1987 |
Reutt JE, Chabal YJ, Christman SB. Hydrogen phonon spectra on transition metal surfaces: infrared reflection-absorption investigations of Mo(l00), W(100), and Pt(111) Journal of Electron Spectroscopy and Related Phenomena. 44: 325-332. DOI: 10.1016/0368-2048(87)87033-0 |
0.389 |
|
1987 |
Chabal YJ, Christman SB, Arrecis JJ, Prybyla JA, Estrup PJ. Hydrogen-induced reconstruction on W(100) and Mo(100) by surface infrared spectroscopy Journal of Electron Spectroscopy and Related Phenomena. 44: 17-26. DOI: 10.1016/0368-2048(87)87003-2 |
0.407 |
|
1987 |
Burrows VA, Sundaresan S, Chabal YJ, Christman SB. Studies on self-sustained reaction-rate oscillations. II. The role of carbon and oxides in the oscillatory oxidation of carbon monoxide on platinum Surface Science. 180: 110-135. DOI: 10.1016/0039-6028(87)90039-2 |
0.397 |
|
1986 |
Swanson JR, Friend CM, Chabal YJ. Deposition of Iron on Si(111)-(7×7): Photo- and Electron-Assisted Decomposition of Fe(CO)5 Mrs Proceedings. 75. DOI: 10.1557/Proc-75-559 |
0.355 |
|
1986 |
Chabal YJ. Infrared absorption measurement of the overtone of the wagging mode of hydrogen on W(100) Journal of Vacuum Science and Technology. 4: 1324-1328. DOI: 10.1116/1.573602 |
0.345 |
|
1986 |
Arrecis JJ, Chabal YJ, Christman SB. H-induced structural phase transitions on W(100) by surface infrared spectroscopy Physical Review B. 33: 7906-7916. DOI: 10.1103/Physrevb.33.7906 |
0.373 |
|
1986 |
Chabal YJ. Dynamics of H Chemisorbed on Si(100) and W(100) Studied by High-Resolution Infrared Spectroscopy Studies in Surface Science and Catalysis. 26: 159-174. DOI: 10.1016/0368-2048(86)85086-1 |
0.399 |
|
1986 |
Chabal YJ. High-resolution infrared spectroscopy of adsorbates on semiconductor surfaces: Hydrogen on Si(100) and Ge(100) Surface Science. 168: 594-608. DOI: 10.1016/0039-6028(86)90890-3 |
0.497 |
|
1985 |
Chabal YJ, Raghavachari K. New ordered structure for the H-saturated Si(100) surface: The (3 x 1) phase. Physical Review Letters. 54: 1055-1058. PMID 10030917 DOI: 10.1103/Physrevlett.54.1055 |
0.338 |
|
1985 |
Tully JC, Chabal YJ, Raghavachari K, Bowman JM, Lucchese RR. Infrared linewidths and vibrational lifetimes at surfaces: H on Si(100). Physical Review. B, Condensed Matter. 31: 1184-1186. PMID 9935883 DOI: 10.1103/Physrevb.31.1184 |
0.456 |
|
1985 |
Chabal YJ. Infrared study of the chemisorption of hydrogen and water on vicinal Si(100) 2×1 surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 3: 1448-1451. DOI: 10.1116/1.572757 |
0.407 |
|
1985 |
Chabal YJ. Electronic Damping of Hydrogen Vibration on the W(100) Surface Physical Review Letters. 55: 845-848. DOI: 10.1103/Physrevlett.55.845 |
0.355 |
|
1985 |
Chabal YJ, Raghavachari K. New ordered structure for the H-saturated Si(100) surface: The (3×1) phase Physical Review Letters. 54: 1055-1058. DOI: 10.1103/PhysRevLett.54.1055 |
0.34 |
|
1985 |
Burrows VA, Sundaresan S, Chabal YJ, Christman SB. Studies on self-sustained reaction-rate oscillations. I. Real-time surface infrared measurements during oscillatory oxidation of carbon monoxide on platinum Surface Science. 160: 122-138. DOI: 10.1016/0039-6028(85)91031-3 |
0.372 |
|
1985 |
Riffe DM, Hanssen LM, Sievers AJ, Chabal YJ, Christman SB. Linewidth of H chemisorbed on W(100): An infrared study Surface Science. 161: L559-L564. DOI: 10.1016/0039-6028(85)90721-6 |
0.689 |
|
1985 |
Chabal YJ, Patel CKN. Effects of high pressure molecular hydrogen in a-Si:H Journal of Non-Crystalline Solids. 77: 201-212. DOI: 10.1016/0022-3093(85)90640-4 |
0.358 |
|
1984 |
Chabal YJ, Raghavachari K. Surface infrared study of Si(100)-(2×1)H Physical Review Letters. 53: 282-285. DOI: 10.1103/Physrevlett.53.282 |
0.447 |
|
1984 |
Chabal YJ, Patel CKN. Infrared absorption in a-Si: H: First observation of gaseous molecular H2 and Si-H overtone Physical Review Letters. 53: 210-213. DOI: 10.1103/Physrevlett.53.210 |
0.412 |
|
1984 |
Chabal YJ, Patel CKN. Solid hydrogen in amorphous silicon: Phase transition Physical Review Letters. 53: 1771-1774. DOI: 10.1103/Physrevlett.53.1771 |
0.345 |
|
1984 |
Chabal YJ, Christman SB. Evidence of dissociation of water on the Si(100)2 × 1 surface Physical Review B. 29: 6974-6976. DOI: 10.1103/Physrevb.29.6974 |
0.432 |
|
1984 |
Chabal YJ. Hydride formation on the Si(100):H2O surface Physical Review B. 29: 3677-3680. DOI: 10.1103/Physrevb.29.3677 |
0.476 |
|
1984 |
Sievers AJ, Schlesinger Z, Chabal YJ. IR SPECTROSCOPY WITH SURFACE ELECTROMAGNETIC WAVES Journal De Physique (Paris), Colloque. 45: 167-178. DOI: 10.1051/Jphyscol:1984525 |
0.354 |
|
1984 |
Chabal YJ, Patel CKN. INFRARED ABSORPTION IN a-Si:H: FIRST OBSERVATION OF THE GAS-SOLID TRANSITION OF OCCLUDED MOLECULAR H//2 Physica B: Physics of Condensed Matter &Amp; C: Atomic, Molecular and Plasma Physics, Optics. 126: 461-462. DOI: 10.1016/0378-4363(84)90205-5 |
0.366 |
|
1983 |
Chabal YJ, Christman SB, Chaban EE, Yin MT. Summary Abstract: Surface state optical absorption on the clean Si(100)2 ˟ 1 surface Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 1: 1241-1242. DOI: 10.1116/1.572295 |
0.429 |
|
1983 |
Chabal YJ. Hydrogen vibration on Si(111) 7 × 7: Evidence for a unique chemisorption site Physical Review Letters. 50: 1850-1853. DOI: 10.1103/Physrevlett.50.1850 |
0.43 |
|
1983 |
Chabal YJ, Higashi GS, Christman SB. Hydrogen chemisorption on Si(111)-(7×7) and -(1×1) surfaces. A comparative infrared study Physical Review B. 28: 4472-4479. DOI: 10.1103/Physrevb.28.4472 |
0.472 |
|
1983 |
Chabal YJ, Chaban EE, Christman SB. High resolution infrared study of hydrogen chemisorbed on Si(100) Studies in Surface Science and Catalysis. 14: 35-40. DOI: 10.1016/0368-2048(83)80037-1 |
0.395 |
|
1982 |
Franciosi A, Weaver JH, O’Neill DG, Chabal Y, Rowe JE, Poate JM, Bisi O, Calandra C. Chemical bonding at the Si–metal interface: Si–Ni and Si–Cr Journal of Vacuum Science and Technology. 21: 624-627. DOI: 10.1116/1.571800 |
0.621 |
|
1982 |
Chabal YJ, Rowe JE, Poate JM, Franciosi A, Weaver JH. Stoichiometry and structural disorder effects on the electronic structure of Ni and Pd silicides Physical Review B. 26: 2748-2758. DOI: 10.1103/Physrevb.26.2748 |
0.588 |
|
1982 |
Chabal YJ, Hamann DR, Rowe JE, Schlüter M. Photoemission and band-structure results for NiSi2 Physical Review B. 25: 7598-7602. DOI: 10.1103/Physrevb.25.7598 |
0.506 |
|
1981 |
Chabal YJ, Allara DL, Teicher D, Rowe JE. High frequency modulation interferometric study of electron stimulated infrared (ir) luminescence in insb Proceedings of Spie - the International Society For Optical Engineering. 289: 82. DOI: 10.1117/12.932134 |
0.442 |
|
1981 |
Chabal YJ, Rowe JE, Christman SB. LASER QUENCHED AND IMPURITY INDUCED METASTABLE Si (111) 1 multiplied by 1 SURFACES Journal of Vacuum Science &Amp; Technology. 20: 763-769. DOI: 10.1116/1.571454 |
0.612 |
|
1981 |
Chabal YJ, Rowe JE, Zwemer DA. Buckling reconstruction on laser-annealed Si(111) surfaces Physical Review Letters. 46: 600-603. DOI: 10.1103/Physrevlett.46.600 |
0.593 |
|
1981 |
Chabal YJ, Rowe JE, Christman SB. Nature of vicinal laser-annealed Si(111) surfaces Physical Review B. 24: 3303-3309. DOI: 10.1103/Physrevb.24.3303 |
0.64 |
|
1981 |
Chabal YJ, Sievers AJ. Infrared study of hydrogen chemisorbed on W(100) by surface- electromagnetic-wave spectroscopy Physical Review B. 24: 2921-2934. DOI: 10.1103/Physrevb.24.2921 |
0.393 |
|
1980 |
Chabal YJ, Culbertson RJ, Feldman LC, Rowe JE. Si(111): Ni SURFACES STUDIES BY AES, UPS, LEED, AND ION SCATTERING Journal of Vacuum Science &Amp; Technology. 18: 880-882. DOI: 10.1116/1.570983 |
0.644 |
|
1980 |
Chabal YJ, Sievers AJ. High-resolution infrared study of hydrogen (1×1) on tungsten (100) Physical Review Letters. 44: 944-947. DOI: 10.1103/Physrevlett.44.944 |
0.358 |
|
1978 |
Chabal YJ, Sievers AJ. IR STUDY OF MOLECULES ADSORBED ON METAL SURFACES BY SURFACE ELECTROMAGNETIC WAVE SPECTROSCOPY J Vac Sci Technol. 15: 638-641. DOI: 10.1116/1.569647 |
0.34 |
|
1978 |
Chabal YJ, Sievers AJ. Surface electromagnetic wave launching at the edge of a metal film Applied Physics Letters. 32: 90-92. DOI: 10.1063/1.89947 |
0.305 |
|
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