Year |
Citation |
Score |
2009 |
Qiu H, Srivastava SN, Thompson KC, Neumann MJ, Ruzic DN. Effectiveness of Mo-Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics Optical Engineering. 48. DOI: 10.1117/1.3126002 |
0.775 |
|
2008 |
Qiu H, Srivastava SN, Thompson KC, Neumann MJ, Ruzic DN. Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics. Applied Optics. 47: 2443-51. PMID 18449311 DOI: 10.1364/Ao.47.002443 |
0.768 |
|
2008 |
Qiu H, Srivastava SN, Thompson KC, Neumann MJ, Ruzic DN. Temperature dependence of Mo-Au Gibbsian segregating alloys Journal of Micro/Nanolithography, Mems, and Moems. 7. DOI: 10.1117/1.2964218 |
0.754 |
|
2007 |
Qiu H, Srivastava SN, Anderson JC, Ruzic DN. Gibbsian Segregating (GS) alloys: A potential solution to minimize collector degradation Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.712465 |
0.71 |
|
2007 |
Neumann MJ, Defrees RA, Qiu H, Ruzic DN, Khodykin O, Ershov A, Bristol RL. Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications Journal of Micro/Nanolithography, Mems, and Moems. 6. DOI: 10.1117/1.2750651 |
0.754 |
|
2007 |
Srivastava SN, Thompson KC, Antonsen EL, Qiu H, Spencer JB, Papke D, Ruzic DN. Lifetime measurements on collector optics from Xe and Sn extreme ultraviolet sources Journal of Applied Physics. 102. DOI: 10.1063/1.2756525 |
0.63 |
|
2006 |
Qiu H, Thompson KC, Srivastava SN, Antonsen EL, Alman DA, Jurczyk BE, Ruzic DN. Optical exposure characterization and comparisons for discharge produced plasma Sn extreme ultraviolet system Journal of Microlithography, Microfabrication and Microsystems. 5. DOI: 10.1117/1.2358124 |
0.752 |
|
2006 |
Qiu H, Alman DA, Thompson KC, Spencer JB, Antonsen EL, Jurczyk BE, Ruzic DN, Spila TP. Characterization of collector optic material samples before and after exposure in laser produced plasma and discharge produced plasma extreme ultraviolet sources Journal of Microlithography, Microfabrication and Microsystems. 5. DOI: 10.1117/1.2243082 |
0.723 |
|
2005 |
Neumann MJ, Shin H, Qiu H, Ritz E, DeFrees RA, Hendricks MR, Alman DA, Jurczyk BE, Ruzic DN, Bristol R. Evaluating advanced fuel candidates in surface cleaning of optics by plasma exposure (scope) Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 1125-1136. DOI: 10.1117/12.600117 |
0.769 |
|
2005 |
Qiu H, Alman DA, Thompson KC, Coventry MD, Spencer JB, Hendricks MR, Antonsen EL, Jurczyk BE, Ruzic DN, Spila TP, Edwards G, Wurm S, Wood O, Bristol R. Characterization of collector optic material samples before and after exposure in LPP and DPP EUV sources Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 1211-1222. DOI: 10.1117/12.600093 |
0.655 |
|
2005 |
Alman DA, Qiu H, Thompson KC, Antonsen EL, Spencer JB, Hendricks MR, Jurczyk BE, Ruzic DN, Spila T, Edwards G, Wurm S, Wood O, Bristol R. UIUC collector erosion and optical lifetime project results: Time dependent exposures Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 1118-1124. DOI: 10.1117/12.599978 |
0.571 |
|
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